DE10194039D2 - Verfahren zur Umwandlung von Laserstrahlung in Röntgenstrahlung, insbesondere EUV-Strahlung, mittels eines von der Laserstrahlung erzeugten Plasmas - Google Patents
Verfahren zur Umwandlung von Laserstrahlung in Röntgenstrahlung, insbesondere EUV-Strahlung, mittels eines von der Laserstrahlung erzeugten PlasmasInfo
- Publication number
- DE10194039D2 DE10194039D2 DE10194039T DE10194039T DE10194039D2 DE 10194039 D2 DE10194039 D2 DE 10194039D2 DE 10194039 T DE10194039 T DE 10194039T DE 10194039 T DE10194039 T DE 10194039T DE 10194039 D2 DE10194039 D2 DE 10194039D2
- Authority
- DE
- Germany
- Prior art keywords
- laser radiation
- radiation
- rays
- plasma generated
- converting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10194039T DE10194039D2 (de) | 2000-09-20 | 2001-09-19 | Verfahren zur Umwandlung von Laserstrahlung in Röntgenstrahlung, insbesondere EUV-Strahlung, mittels eines von der Laserstrahlung erzeugten Plasmas |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2000147779 DE10047779A1 (de) | 2000-09-20 | 2000-09-20 | Verfahren zur Umwandlung von Laserstrahlung in Röntgenstrahlung, insbesondere EUV-Strahlung mittels eines von der Laserstrahlung erzeugten Plasmas |
PCT/DE2001/003635 WO2002026003A1 (de) | 2000-09-20 | 2001-09-19 | Verfahren zur umwandlung von laserstrahlung in röntgenstrahlung, insbesondere euv-strahlung, mittels eines von der laserstrahlung erzeugten plasmas |
DE10194039T DE10194039D2 (de) | 2000-09-20 | 2001-09-19 | Verfahren zur Umwandlung von Laserstrahlung in Röntgenstrahlung, insbesondere EUV-Strahlung, mittels eines von der Laserstrahlung erzeugten Plasmas |
Publications (1)
Publication Number | Publication Date |
---|---|
DE10194039D2 true DE10194039D2 (de) | 2003-09-11 |
Family
ID=7657774
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE2000147779 Withdrawn DE10047779A1 (de) | 2000-09-20 | 2000-09-20 | Verfahren zur Umwandlung von Laserstrahlung in Röntgenstrahlung, insbesondere EUV-Strahlung mittels eines von der Laserstrahlung erzeugten Plasmas |
DE10194039T Expired - Fee Related DE10194039D2 (de) | 2000-09-20 | 2001-09-19 | Verfahren zur Umwandlung von Laserstrahlung in Röntgenstrahlung, insbesondere EUV-Strahlung, mittels eines von der Laserstrahlung erzeugten Plasmas |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE2000147779 Withdrawn DE10047779A1 (de) | 2000-09-20 | 2000-09-20 | Verfahren zur Umwandlung von Laserstrahlung in Röntgenstrahlung, insbesondere EUV-Strahlung mittels eines von der Laserstrahlung erzeugten Plasmas |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1410696A1 (de) |
AU (1) | AU2002210368A1 (de) |
DE (2) | DE10047779A1 (de) |
WO (1) | WO2002026003A1 (de) |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4058486A (en) * | 1972-12-29 | 1977-11-15 | Battelle Memorial Institute | Producing X-rays |
-
2000
- 2000-09-20 DE DE2000147779 patent/DE10047779A1/de not_active Withdrawn
-
2001
- 2001-09-19 EP EP01978165A patent/EP1410696A1/de not_active Withdrawn
- 2001-09-19 AU AU2002210368A patent/AU2002210368A1/en not_active Abandoned
- 2001-09-19 WO PCT/DE2001/003635 patent/WO2002026003A1/de not_active Application Discontinuation
- 2001-09-19 DE DE10194039T patent/DE10194039D2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
WO2002026003A1 (de) | 2002-03-28 |
EP1410696A1 (de) | 2004-04-21 |
AU2002210368A1 (en) | 2002-04-02 |
DE10047779A1 (de) | 2002-03-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8139 | Disposal/non-payment of the annual fee |