DE10159835B4 - Vacuum pumping system - Google Patents
Vacuum pumping system Download PDFInfo
- Publication number
- DE10159835B4 DE10159835B4 DE2001159835 DE10159835A DE10159835B4 DE 10159835 B4 DE10159835 B4 DE 10159835B4 DE 2001159835 DE2001159835 DE 2001159835 DE 10159835 A DE10159835 A DE 10159835A DE 10159835 B4 DE10159835 B4 DE 10159835B4
- Authority
- DE
- Germany
- Prior art keywords
- vacuum pump
- high vacuum
- pump
- valve
- backing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
- F04C28/02—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids specially adapted for several pumps connected in series or in parallel
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
- F04C23/001—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of similar working principle
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
- F04C23/005—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of dissimilar working principle
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
- F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D17/00—Radial-flow pumps, e.g. centrifugal pumps; Helico-centrifugal pumps
- F04D17/08—Centrifugal pumps
- F04D17/16—Centrifugal pumps for displacing without appreciable compression
- F04D17/168—Pumps specially adapted to produce a vacuum
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D19/00—Axial-flow pumps
- F04D19/02—Multi-stage pumps
- F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
- F04D19/046—Combinations of two or more different types of pumps
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
Abstract
Vakuumpumpsystem, bestehend aus einer Hochvakuumpumpe (1), an deren Saugseite ein Rezipient (2) anschließbar ist und eine nach höherem Druck hin ausstoßende Vorvakuumpumpe (3), welche mit der Gasaustrittsseite der Hochvakuumpumpe verbunden ist, dadurch gekennzeichnet, dass zwischen der Vorvakuumpumpe (3) und der Hochvakuumpumpe (1) ein System von parallel angeordneten Leitwertbegrenzer (5–8) und jeweils zugehörigem Ventil (15–18) angebracht ist, so dass die Leitwertbegrenzer (5–8) einzeln oder in Kombination mittels der zugehörigen Ventile (15–18) zwischen Vorvakuumpumpe und Hochvakuumpumpe geschaltet werden können.Vacuum pump system, consisting of a high vacuum pump (1), to the suction side of which a recipient (2) can be connected and a backing pump (3) which expels towards a higher pressure and which is connected to the gas outlet side of the high vacuum pump, characterized in that between the backing pump (3 ) and the high vacuum pump (1) a system of conductance limiters (5–8) arranged in parallel and each associated valve (15–18) is attached, so that the conductance limiters (5–8) individually or in combination using the associated valves (15– 18) can be switched between the backing pump and high vacuum pump.
Description
Die Erfindung betrifft ein Vakuumpumpsystem nach dem Oberbegriff des 1. Schutzanspruches.The invention relates to a vacuum pumping system according to the preamble of the first protection claim.
Vakuumpumpsysteme der hier zur Diskussion stehenden Art werden unter anderem eingesetzt bei Anlagen zur Durchführung von Vakuumprozessen, wie chemische Verfahren, oder in der Halbleiterfertigung. Zur Bereitstellung und Aufrechterhaltung von bestimmten Drücken eines Gases oder eines Gasgemisches, unter welchem der jeweilige Prozess abläuft, müssen Einrichtungen vorhanden sein, mit denen definierte und reproduzierbare vakuumtechnische Größen, wie Druck- und Saugvermögen, eingestellt werden können.Vacuum pump systems of the type under discussion are used, inter alia, in systems for carrying out vacuum processes, such as chemical processes, or in semiconductor production. In order to provide and maintain certain pressures of a gas or a gas mixture under which the respective process takes place, facilities must be provided with which defined and reproducible vacuum-related variables, such as pressure and suction capacity, can be set.
In der
Solche komplexen Systeme stellen ziemlich aufwändige Lösungen dar. Die mit viel Elektronik bestückten Regeleinrichtungen und deren Ansteuerung sind fehleranfällig und nicht für alle Anwendungsfälle geeignet.Such complex systems represent rather expensive solutions. The control devices equipped with a lot of electronics and their control are error-prone and not suitable for all applications.
Der Erfindung liegt die Aufgabe zu Grunde, ein Vakuumpumpsystem vorzustellen, welches die Möglichkeit bietet, vakuumtechnische Größen, wie Druck- und Saugvermögen, auf der Hochvakuumseite dem jeweiligen Prozess anzupassen und definiert und reproduzierbar einzustellen. Das System soll einen zuverlässigen und fehlerfreien Betrieb sicherstellen und mit wenig Aufwand und günstigen Herstellkosten zu verwirklichen sein.The object of the invention is to present a vacuum pump system which offers the possibility of adapting vacuum-technical variables, such as pressure and suction capacity, on the high-vacuum side to the respective process and to set it in a defined and reproducible manner. The system should ensure a reliable and error-free operation and be realized with little effort and low production costs.
Die Aufgabe wird durch die Merkmale des 1. Schutzanspruches gelöst. Die Ansprüche 2–4 beschreiben weitere Ausgestaltungsformen der Erfindung.The object is solved by the features of the first protection claim. Claims 2-4 describe further embodiments of the invention.
Die erfindungsgemäße Anordnung stellt ein Leitwertsystem zwischen Vorvakuumpumpe und Hochvakuumpumpe eines Pumpsystems dar, welches die Steuerung von vakuumtechnischen Größen, wie Druck- und Saugvermögen, auf der Hochvakuumseite erlaubt. Zwei verschiedene Ausführungsformen, eine mit mehreren Leitwertbegrenzern und jeweils zugehörigem Ventil und eine mit einem Leitwertbegrenzer und einem zugehörigen getakteten Ventil, sind als vorteilhafte Lösungen für die Aufgabenstellung angeführt.The arrangement according to the invention represents a master value system between the fore-vacuum pump and the high-vacuum pump of a pumping system, which permits the control of vacuum-technical variables, such as pressure and suction capacity, on the high-vacuum side. Two different embodiments, one with several Leitwertbegrenzern and each associated valve and one with a Leitwertbegrenzer and an associated clocked valve are listed as advantageous solutions for the task.
Durch die erste Anordnung können unterschiedliche Leitwerte zwischen Vorvakuumpumpe und Hochvakuumpumpe gestaltet werden. Diese Leitwerte werden durch Zuschaltung einzelner Leitwertbegrenzer mit verschiedenen Leitwerten oder auch durch die Kombination mehrerer Leitwertbegrenzer erreicht. Die Variation der Leitwerte bei der zweiten Ausführungsform erfolgt bei nur einem Leitwertbegrenzer und zugehörigem Ventil durch Öffnen und Schließen dieses Ventils nach vorgegebenen Taktzeiten, so dass im Mittel ein angestrebter Leitwert erreicht wird.The first arrangement makes it possible to design different conductance values between fore-vacuum pump and high-vacuum pump. These master values are achieved by connecting individual conductivity limiters with different conductivity values or by combining several conductivity limiters. The variation of the conductivities in the second embodiment is carried out at only one Leitwertbegrenzer and associated valve by opening and closing this valve after predetermined cycle times, so that on average a target conductance is achieved.
Beide Anordnungen sind optimal dazu geeignet, Druck- und Saugvermögen auf der Hochvakuumseite durch gezielte Variationen der Leitwerte auf der Vorvakuumseite zu beeinflussen. Dies geschieht unter Berücksichtung der Pumpeigenschaften der Hochvakuumpumpe und des jeweiligen Prozesses bzw. Prozessschrittes im Rezipienten. So kann auf Veränderungen im Prozessablauf schnell reagiert werden und vorgegebene Zustände können durch Variation der vorvakuumseitigen Leitwerte schnell realisiert werden. Das Zu- und Abschalten von Leitwerten bzw. die Wahl der Taktzeiten bei der zweiten Lösung können z. B. zeit- oder drehzahlgesteuert erfolgen. Das System besteht aus einfachen und betriebssicheren Bauteilen und kann gegenüber herkömmlichen Systemen mit geringeren Herstellungskosten verwirklicht werden. Daher ist es auch wenig fehleranfällig und gestattet einen zuverlässigen Betrieb.Both arrangements are optimally suitable for influencing the pressure and pumping capacity on the high-vacuum side by specific variations of the conductance values on the fore-vacuum side. This is done taking into account the pumping properties of the high vacuum pump and the respective process or process step in the recipient. Thus, it is possible to react quickly to changes in the process flow and given states can be realized quickly by varying the pre-vacuum-side conductances. The switching on and off of conductances or the choice of cycle times in the second solution can, for. B. time or speed controlled. The system consists of simple and reliable components and can be realized compared to conventional systems with lower production costs. Therefore, it is also less error prone and allows reliable operation.
Anhand der
In
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2001159835 DE10159835B4 (en) | 2001-12-06 | 2001-12-06 | Vacuum pumping system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2001159835 DE10159835B4 (en) | 2001-12-06 | 2001-12-06 | Vacuum pumping system |
Publications (2)
Publication Number | Publication Date |
---|---|
DE10159835A1 DE10159835A1 (en) | 2003-06-18 |
DE10159835B4 true DE10159835B4 (en) | 2012-02-23 |
Family
ID=7708190
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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DE2001159835 Expired - Fee Related DE10159835B4 (en) | 2001-12-06 | 2001-12-06 | Vacuum pumping system |
Country Status (1)
Country | Link |
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DE (1) | DE10159835B4 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2533933A (en) * | 2015-01-06 | 2016-07-13 | Edwards Ltd | Improvements in or relating to vacuum pumping arrangements |
US10316504B2 (en) * | 2015-08-05 | 2019-06-11 | Aqseptence Group, Inc. | Vacuum sewage system with monitoring system and method of use |
US11939760B2 (en) | 2020-03-30 | 2024-03-26 | Aqseptence Group, Inc. | Vacuum sewage system with monitoring system and variable speed pump and methods of use |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3828608A1 (en) * | 1988-08-23 | 1990-03-08 | Alcatel Hochvakuumtechnik Gmbh | Vacuum-pump device |
JPH03175163A (en) * | 1989-12-04 | 1991-07-30 | Nippon Chemicon Corp | Vacuum concentration exhaust device |
JPH05118286A (en) * | 1991-09-05 | 1993-05-14 | Ebara Corp | Gas supplying device for multi-stage vacuum pump |
DE19704234A1 (en) * | 1997-02-05 | 1998-08-06 | Pfeiffer Vacuum Gmbh | Method and device for controlling the pumping speed of vacuum pumps |
US5944049A (en) * | 1997-07-15 | 1999-08-31 | Applied Materials, Inc. | Apparatus and method for regulating a pressure in a chamber |
US6080679A (en) * | 1997-05-23 | 2000-06-27 | Canon Kabushiki Kaisha | High-speed soft evacuation process and system |
-
2001
- 2001-12-06 DE DE2001159835 patent/DE10159835B4/en not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3828608A1 (en) * | 1988-08-23 | 1990-03-08 | Alcatel Hochvakuumtechnik Gmbh | Vacuum-pump device |
JPH03175163A (en) * | 1989-12-04 | 1991-07-30 | Nippon Chemicon Corp | Vacuum concentration exhaust device |
JPH05118286A (en) * | 1991-09-05 | 1993-05-14 | Ebara Corp | Gas supplying device for multi-stage vacuum pump |
DE19704234A1 (en) * | 1997-02-05 | 1998-08-06 | Pfeiffer Vacuum Gmbh | Method and device for controlling the pumping speed of vacuum pumps |
US6080679A (en) * | 1997-05-23 | 2000-06-27 | Canon Kabushiki Kaisha | High-speed soft evacuation process and system |
US5944049A (en) * | 1997-07-15 | 1999-08-31 | Applied Materials, Inc. | Apparatus and method for regulating a pressure in a chamber |
Also Published As
Publication number | Publication date |
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DE10159835A1 (en) | 2003-06-18 |
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OM8 | Search report available as to paragraph 43 lit. 1 sentence 1 patent law | ||
8110 | Request for examination paragraph 44 | ||
R016 | Response to examination communication | ||
R016 | Response to examination communication | ||
R018 | Grant decision by examination section/examining division | ||
R020 | Patent grant now final |
Effective date: 20120524 |
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R119 | Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee |