DE10132125A1 - Production of a textured metal layer e.g. superconducting strips comprises epitaxially growing on a textured substrate by electrodeposition using a bath - Google Patents

Production of a textured metal layer e.g. superconducting strips comprises epitaxially growing on a textured substrate by electrodeposition using a bath

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Publication number
DE10132125A1
DE10132125A1 DE10132125A DE10132125A DE10132125A1 DE 10132125 A1 DE10132125 A1 DE 10132125A1 DE 10132125 A DE10132125 A DE 10132125A DE 10132125 A DE10132125 A DE 10132125A DE 10132125 A1 DE10132125 A1 DE 10132125A1
Authority
DE
Germany
Prior art keywords
textured
metal layer
bath
electrodeposition
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE10132125A
Other languages
German (de)
Inventor
Marc Vogelaere
Ursus Krueger
Ralf-Reiner Volkmar
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Priority to DE10132125A priority Critical patent/DE10132125A1/en
Publication of DE10132125A1 publication Critical patent/DE10132125A1/en
Withdrawn legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B7/00—Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions
    • C30B7/12—Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions by electrolysis
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/52—Alloys
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B7/00—Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B7/00—Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions
    • C30B7/005—Epitaxial layer growth

Abstract

Production of a textured metal layer comprises epitaxially growing on a textured substrate by electrodeposition using a bath made from AgPd, AgSn, Al, Au, AuNi, AuCo, Bi, Cr, Cu, CuSn, CuZn, Fe, In, Mn, Ni, NiP, NiFe, NiW, NiCo, Pb, PbSn, Pd, PdNi, PdCo, Pt, Rh, Sn or SnNi.

Description

Die Erfindung bezieht sich auf ein Verfahren zum Erzeugen einer texturierten Metallschicht durch epitaktisches Aufwachsen auf einem texturierten Substrat mittels Elektrodeposition. The invention relates to a method for producing a textured metal layer by epitaxial growth on a textured substrate using electrode deposition.

Ein Verfahren dieser Art ist aus dem Aufsatz "Fabrication of cube-textured Ag-buffered Ni substrates by electro-epitaxial deposition" von Godall, Moore, Pecz, Grime, Salter und Grovenor in der Zeitschrift "Superconductor Science and Technology" 14 (2001), S. 124-129 bekannt. Bei diesem bekannten Verfahren wird eine texturierte Metallschicht mittels Elektrodeposition als Silber-Film auf einem geeigneten texturierten Substrat aus Ni und Ni-Legierungen hergestellt. Diese texturierte Metallschicht kann dann ihrerseits als ein Silber-Substrat zum Herstellen beispielsweise texturierter supraleitender Bänder benutzt werden. A method of this kind is described in the article "Fabrication of cube-textured Ag-buffered Ni substrates by electro-epitaxial deposition "by Godall, Moore, Pecz, Grime, Salter and Grovenor in the journal "Superconductor Science and Technology "14 (2001), pp. 124-129. In this known The method is a textured metal layer Electrode deposition as a silver film on a suitable Textured substrate made from Ni and Ni alloys. This Textured metal layer can then be used as a turn Silver substrate for making textured, for example superconducting tapes are used.

Der Erfindung liegt die Aufgabe zugrunde, ein Verfahren der eingangs angegebenen Art so zu verbessern, dass es mit vergleichsweise geringen Kosten durchgeführt werden kann. The invention has for its object a method of to improve at the beginning so that it with comparatively low cost can be carried out.

Zur Lösung dieser Aufgabe wird bei dem eingangs angegebenen Verfahren erfindungsgemäß zur Elektrodeposition ein Bad mit AgPd, AgSn, Al, Au, AuNi, AuCo, Bi, Cr, Cu, CuSn, CuZn, Fe, In, Mn, Ni, NiP, NiFe, NiW, NiCo, Pb, PbSn, Pd, PdNi, PdCo, Pt, Rh, Sn, SnNi verwendet. To solve this problem is given at the beginning Method according to the invention for electrode deposition using a bath AgPd, AgSn, Al, Au, AuNi, AuCo, Bi, Cr, Cu, CuSn, CuZn, Fe, In, Mn, Ni, NiP, NiFe, NiW, NiCo, Pb, PbSn, Pd, PdNi, PdCo, Pt, Rh, Sn, SnNi used.

Der wesentliche Vorteil des erfindungsgemäßen Verfahrens besteht darin, dass mit ihm galvanische Bäder unterschiedlicher Zusammensetzung verwendet werden können, so dass entsprechend dem jeweiligen Anwendungsfall eines supraleitenden Leiters Metallschichten aus unterschiedlichen Metallen als Substrat bei dessen Herstellung verwendet werden können. The main advantage of the method according to the invention is that with it galvanic baths of different Composition can be used so that accordingly the respective application of a superconducting conductor Metal layers made of different metals as a substrate can be used in its manufacture.

Der obenbezeichneten Literaturstelle lässt sich ferner ein durch epitaktisches Aufwachsen auf einem texturierten Substrat erzeugte texturierte Metallschicht entnehmen. Der Erfindung liegt diesbezüglich die Aufgabe zugrunde, eine Metallschicht vorzuschlagen, die sich einfach unter Anpassung an ihren jeweiligen Verwendungszweck herstellen lässt. Zur Lösung dieser Aufgabe besteht die texturierte Metallschicht erfindungsgemäß aus AgPd, AgSn, Al, Au, AuNi, AuCo, Bi, Cr, Cu, CuSn, CuZn, Fe, In, Mn, Ni, NiP, NiFe, NiW, NiCo, Pb, PbSn, Pd, PdNi, PdCo, Pt, Rh, Sn, SnNi. The reference cited above can also be included by growing epitaxially on a textured Remove the textured metal layer created from the substrate. The In this regard, the invention is based on the object of a Propose metal layer that is just under customization can be made to their respective purpose. To solve this task there is the textured Metal layer according to the invention made of AgPd, AgSn, Al, Au, AuNi, AuCo, Bi, Cr, Cu, CuSn, CuZn, Fe, In, Mn, Ni, NiP, NiFe, NiW, NiCo, Pb, PbSn, Pd, PdNi, PdCo, Pt, Rh, Sn, SnNi.

Bei dem Erzeugen einer texturierten Metallschicht durch epitaktisches Aufwachsen mittels Elektrodeposition kann in einer Weise vorgegangen werden, wie dies aus der oben genannten Literaturstelle hervorgeht. Es ist nur jeweils ein galvanisches Bad mit einer Zusammensetzung hinsichtlich der Metalle vorzusehen, wie es oben beschrieben worden ist. When creating a textured metal layer epitaxial growth by means of electrode deposition can be done in one Were proceeded like this from the above Literature emerges. It is only a galvanic one at a time Bath with a composition in terms of metals to be provided as described above.

Claims (2)

1. Verfahren zum Erzeugen einer texturierten Metallschicht durch epitaktisches Aufwachsen auf einem texturierten Substrat mittels Elektrodeposition, dadurch gekennzeichnet, dass
zur Elektrodeposition ein Bad mit AgPd, AgSn, Al, Au, AuNi, AuCo, Bi, Cr, Cu, CuSn, CuZn, Fe, In, Mn, Ni, NiP, NiFe, NiW, NiCo, Pb, PbSn, Pd, PdNi, PdCo, Pt, Rh, Sn, SnNi verwendet wird. 1. A method for producing a textured metal layer by epitaxial growth on a textured substrate by means of electrode deposition, characterized in that
a bath with AgPd, AgSn, Al, Au, AuNi, AuCo, Bi, Cr, Cu, CuSn, CuZn, Fe, In, Mn, Ni, NiP, NiFe, NiW, NiCo, Pb, PbSn, Pd, PdNi for electrode deposition , PdCo, Pt, Rh, Sn, SnNi is used. 2. Durch epitaktisches Aufwachsen mittels Elektrodepositen auf einem texturierten Substrat erzeugte texturierte Metallschicht, dadurch gekennzeichnet, dass
die Metallschicht aus AgPd, AgSn, Al, Au, AuNi, AuCo, Bi, Cr, Cu, CuSn, CuZn, Fe, In, Mn, Ni, NiP, NiFe, NiW, NiCo, Pb, PbSn, Pd, PdNi, PdCo, Pt, Rh, Sn, SnNi besteht. 2. Textured metal layer produced by epitaxial growth by means of electrode deposits on a textured substrate, characterized in that
the metal layer made of AgPd, AgSn, Al, Au, AuNi, AuCo, Bi, Cr, Cu, CuSn, CuZn, Fe, In, Mn, Ni, NiP, NiFe, NiW, NiCo, Pb, PbSn, Pd, PdNi, PdCo , Pt, Rh, Sn, SnNi.
DE10132125A 2001-06-28 2001-06-28 Production of a textured metal layer e.g. superconducting strips comprises epitaxially growing on a textured substrate by electrodeposition using a bath Withdrawn DE10132125A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE10132125A DE10132125A1 (en) 2001-06-28 2001-06-28 Production of a textured metal layer e.g. superconducting strips comprises epitaxially growing on a textured substrate by electrodeposition using a bath

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10132125A DE10132125A1 (en) 2001-06-28 2001-06-28 Production of a textured metal layer e.g. superconducting strips comprises epitaxially growing on a textured substrate by electrodeposition using a bath

Publications (1)

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DE10132125A1 true DE10132125A1 (en) 2003-01-09

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DE10132125A Withdrawn DE10132125A1 (en) 2001-06-28 2001-06-28 Production of a textured metal layer e.g. superconducting strips comprises epitaxially growing on a textured substrate by electrodeposition using a bath

Country Status (1)

Country Link
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005103342A1 (en) * 2004-04-20 2005-11-03 Siemens Aktiengesellschaft Method for depositing a layer consisting of a shape memory alloy
KR100705092B1 (en) 2005-05-10 2007-04-06 엘지전자 주식회사 Manufacturing method of vibration absorbing pipe using the shape memory alloy
CN111187944A (en) * 2020-01-06 2020-05-22 河南师范大学 Preparation method of double-layer nickel-based composite baseband with strong cubic texture

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005103342A1 (en) * 2004-04-20 2005-11-03 Siemens Aktiengesellschaft Method for depositing a layer consisting of a shape memory alloy
DE102004020058A1 (en) * 2004-04-20 2005-11-10 Siemens Ag A method of depositing a layer of a shape memory alloy
DE102004020058B4 (en) * 2004-04-20 2009-11-26 Siemens Ag A method of depositing a layer of a shape memory alloy
KR100705092B1 (en) 2005-05-10 2007-04-06 엘지전자 주식회사 Manufacturing method of vibration absorbing pipe using the shape memory alloy
CN111187944A (en) * 2020-01-06 2020-05-22 河南师范大学 Preparation method of double-layer nickel-based composite baseband with strong cubic texture

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