DD96984A1 - - Google Patents

Info

Publication number
DD96984A1
DD96984A1 DD16360672A DD16360672A DD96984A1 DD 96984 A1 DD96984 A1 DD 96984A1 DD 16360672 A DD16360672 A DD 16360672A DD 16360672 A DD16360672 A DD 16360672A DD 96984 A1 DD96984 A1 DD 96984A1
Authority
DD
German Democratic Republic
Application number
DD16360672A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to DD16360672A priority Critical patent/DD96984A1/xx
Priority to DE19732312774 priority patent/DE2312774A1/de
Publication of DD96984A1 publication Critical patent/DD96984A1/xx
Priority to CS317573A priority patent/CS166979B1/cs
Priority to PL16325773A priority patent/PL86395B1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
DD16360672A 1972-06-12 1972-06-12 DD96984A1 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DD16360672A DD96984A1 (de) 1972-06-12 1972-06-12
DE19732312774 DE2312774A1 (de) 1972-06-12 1973-03-15 Verfahren zur herstellung duenner anorganischer filme auf unterlagen
CS317573A CS166979B1 (de) 1972-06-12 1973-05-03
PL16325773A PL86395B1 (de) 1972-06-12 1973-06-09

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD16360672A DD96984A1 (de) 1972-06-12 1972-06-12

Publications (1)

Publication Number Publication Date
DD96984A1 true DD96984A1 (de) 1973-04-12

Family

ID=5486942

Family Applications (1)

Application Number Title Priority Date Filing Date
DD16360672A DD96984A1 (de) 1972-06-12 1972-06-12

Country Status (4)

Country Link
CS (1) CS166979B1 (de)
DD (1) DD96984A1 (de)
DE (1) DE2312774A1 (de)
PL (1) PL86395B1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2371524A1 (fr) * 1976-11-18 1978-06-16 Alsthom Atlantique Procede de depot d'une couche mince par decomposition d'un gaz dans un plasma
DE3206421A1 (de) * 1982-02-23 1983-09-01 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von schichten aus hochschmelzenden metallen bzw. metallverbindungen durch abscheidung aus der dampfphase
DE3841730C2 (de) * 1988-12-10 1997-06-19 Widia Gmbh Verfahren zum Beschichten eines metallischen Grundkörpers mit einem nichtleitenden Beschichtungsmaterial

Also Published As

Publication number Publication date
DE2312774A1 (de) 1974-01-03
PL86395B1 (de) 1976-05-31
CS166979B1 (de) 1976-03-29

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