CS166979B1 - - Google Patents
Info
- Publication number
- CS166979B1 CS166979B1 CS317573A CS317573A CS166979B1 CS 166979 B1 CS166979 B1 CS 166979B1 CS 317573 A CS317573 A CS 317573A CS 317573 A CS317573 A CS 317573A CS 166979 B1 CS166979 B1 CS 166979B1
- Authority
- CS
- Czechoslovakia
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DD16360672A DD96984A1 (de) | 1972-06-12 | 1972-06-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CS166979B1 true CS166979B1 (de) | 1976-03-29 |
Family
ID=5486942
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CS317573A CS166979B1 (de) | 1972-06-12 | 1973-05-03 |
Country Status (4)
| Country | Link |
|---|---|
| CS (1) | CS166979B1 (de) |
| DD (1) | DD96984A1 (de) |
| DE (1) | DE2312774A1 (de) |
| PL (1) | PL86395B1 (de) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2371524A1 (fr) * | 1976-11-18 | 1978-06-16 | Alsthom Atlantique | Procede de depot d'une couche mince par decomposition d'un gaz dans un plasma |
| DE3206421A1 (de) * | 1982-02-23 | 1983-09-01 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum herstellen von schichten aus hochschmelzenden metallen bzw. metallverbindungen durch abscheidung aus der dampfphase |
| DE3841730C2 (de) * | 1988-12-10 | 1997-06-19 | Widia Gmbh | Verfahren zum Beschichten eines metallischen Grundkörpers mit einem nichtleitenden Beschichtungsmaterial |
-
1972
- 1972-06-12 DD DD16360672A patent/DD96984A1/xx unknown
-
1973
- 1973-03-15 DE DE19732312774 patent/DE2312774A1/de active Pending
- 1973-05-03 CS CS317573A patent/CS166979B1/cs unknown
- 1973-06-09 PL PL16325773A patent/PL86395B1/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| DE2312774A1 (de) | 1974-01-03 |
| DD96984A1 (de) | 1973-04-12 |
| PL86395B1 (de) | 1976-05-31 |