DD80779A1 - - Google Patents

Info

Publication number
DD80779A1
DD80779A1 DD13960169A DD13960169A DD80779A1 DD 80779 A1 DD80779 A1 DD 80779A1 DD 13960169 A DD13960169 A DD 13960169A DD 13960169 A DD13960169 A DD 13960169A DD 80779 A1 DD80779 A1 DD 80779A1
Authority
DD
German Democratic Republic
Application number
DD13960169A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to DD13960169A priority Critical patent/DD80779A1/xx
Priority to GB352970A priority patent/GB1286793A/en
Priority to DE19702009307 priority patent/DE2009307C3/en
Priority to SU1421267A priority patent/SU398067A3/ru
Priority to PL14036370A priority patent/PL69869B1/pl
Priority to FR7016423A priority patent/FR2042416B1/fr
Publication of DD80779A1 publication Critical patent/DD80779A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DD13960169A 1969-05-05 1969-05-05 DD80779A1 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
DD13960169A DD80779A1 (en) 1969-05-05 1969-05-05
GB352970A GB1286793A (en) 1969-05-05 1970-01-24 Process and apparatus for the parallel alignment of a semi-conductor wafer relative to a mask
DE19702009307 DE2009307C3 (en) 1969-05-05 1970-02-27 Method and device for parallel alignment of a semiconductor wafer with respect to a mask
SU1421267A SU398067A3 (en) 1969-05-05 1970-04-03
PL14036370A PL69869B1 (en) 1969-05-05 1970-05-02
FR7016423A FR2042416B1 (en) 1969-05-05 1970-05-05

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD13960169A DD80779A1 (en) 1969-05-05 1969-05-05

Publications (1)

Publication Number Publication Date
DD80779A1 true DD80779A1 (en) 1971-03-20

Family

ID=5481173

Family Applications (1)

Application Number Title Priority Date Filing Date
DD13960169A DD80779A1 (en) 1969-05-05 1969-05-05

Country Status (6)

Country Link
DD (1) DD80779A1 (en)
DE (1) DE2009307C3 (en)
FR (1) FR2042416B1 (en)
GB (1) GB1286793A (en)
PL (1) PL69869B1 (en)
SU (1) SU398067A3 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT406100B (en) * 1996-08-08 2000-02-25 Thallner Erich Contact exposure method for fabricating semiconductor modules

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3674368A (en) * 1970-05-11 1972-07-04 Johannsmeier Karl Heinz Out of contact optical alignment and exposure apparatus
FR2507695B1 (en) * 1981-06-12 1986-05-23 Marchal Equip Auto HIGH VOLTAGE CURRENT DISTRIBUTOR, PARTICULARLY FOR IGNITION OF AN INTERNAL COMBUSTION ENGINE
US7578642B2 (en) * 2005-08-05 2009-08-25 The Boeing Corporation Flexible single rail drilling system
CN117572732A (en) * 2024-01-16 2024-02-20 上海图双精密装备有限公司 Leveling auxiliary device and leveling method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT406100B (en) * 1996-08-08 2000-02-25 Thallner Erich Contact exposure method for fabricating semiconductor modules

Also Published As

Publication number Publication date
PL69869B1 (en) 1973-10-31
FR2042416A1 (en) 1971-02-12
DE2009307B2 (en) 1973-11-29
DE2009307C3 (en) 1974-06-27
FR2042416B1 (en) 1974-06-14
DE2009307A1 (en) 1970-11-19
SU398067A3 (en) 1973-09-17
GB1286793A (en) 1972-08-23

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