DD80779A1 - - Google Patents
Info
- Publication number
- DD80779A1 DD80779A1 DD13960169A DD13960169A DD80779A1 DD 80779 A1 DD80779 A1 DD 80779A1 DD 13960169 A DD13960169 A DD 13960169A DD 13960169 A DD13960169 A DD 13960169A DD 80779 A1 DD80779 A1 DD 80779A1
- Authority
- DD
- German Democratic Republic
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
- H10P72/57—Mask-wafer alignment
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DD13960169A DD80779A1 (cg-RX-API-DMAC7.html) | 1969-05-05 | 1969-05-05 | |
| GB3529/70A GB1286793A (en) | 1969-05-05 | 1970-01-24 | Process and apparatus for the parallel alignment of a semi-conductor wafer relative to a mask |
| DE2009307A DE2009307C3 (de) | 1969-05-05 | 1970-02-27 | Verfahren und Vorrichtung zum parallelen Ausrichten einer Halbleiterscheibe gegenüber einer Maske |
| SU1421267A SU398067A3 (cg-RX-API-DMAC7.html) | 1969-05-05 | 1970-04-03 | |
| PL1970140363A PL69869B1 (cg-RX-API-DMAC7.html) | 1969-05-05 | 1970-05-02 | |
| FR7016423A FR2042416B1 (cg-RX-API-DMAC7.html) | 1969-05-05 | 1970-05-05 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DD13960169A DD80779A1 (cg-RX-API-DMAC7.html) | 1969-05-05 | 1969-05-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DD80779A1 true DD80779A1 (cg-RX-API-DMAC7.html) | 1971-03-20 |
Family
ID=5481173
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DD13960169A DD80779A1 (cg-RX-API-DMAC7.html) | 1969-05-05 | 1969-05-05 |
Country Status (6)
| Country | Link |
|---|---|
| DD (1) | DD80779A1 (cg-RX-API-DMAC7.html) |
| DE (1) | DE2009307C3 (cg-RX-API-DMAC7.html) |
| FR (1) | FR2042416B1 (cg-RX-API-DMAC7.html) |
| GB (1) | GB1286793A (cg-RX-API-DMAC7.html) |
| PL (1) | PL69869B1 (cg-RX-API-DMAC7.html) |
| SU (1) | SU398067A3 (cg-RX-API-DMAC7.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AT406100B (de) * | 1996-08-08 | 2000-02-25 | Thallner Erich | Kontaktbelichtungsverfahren zur herstellung von halbleiterbausteinen |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3674368A (en) * | 1970-05-11 | 1972-07-04 | Johannsmeier Karl Heinz | Out of contact optical alignment and exposure apparatus |
| FR2507695B1 (fr) * | 1981-06-12 | 1986-05-23 | Marchal Equip Auto | Distributeur de courant haute tension, notamment pour un allumage de moteur a combustion interne |
| US7578642B2 (en) | 2005-08-05 | 2009-08-25 | The Boeing Corporation | Flexible single rail drilling system |
| CN117572732A (zh) * | 2024-01-16 | 2024-02-20 | 上海图双精密装备有限公司 | 调平辅助装置及调平方法 |
-
1969
- 1969-05-05 DD DD13960169A patent/DD80779A1/xx unknown
-
1970
- 1970-01-24 GB GB3529/70A patent/GB1286793A/en not_active Expired
- 1970-02-27 DE DE2009307A patent/DE2009307C3/de not_active Expired
- 1970-04-03 SU SU1421267A patent/SU398067A3/ru active
- 1970-05-02 PL PL1970140363A patent/PL69869B1/pl unknown
- 1970-05-05 FR FR7016423A patent/FR2042416B1/fr not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AT406100B (de) * | 1996-08-08 | 2000-02-25 | Thallner Erich | Kontaktbelichtungsverfahren zur herstellung von halbleiterbausteinen |
Also Published As
| Publication number | Publication date |
|---|---|
| PL69869B1 (cg-RX-API-DMAC7.html) | 1973-10-31 |
| FR2042416A1 (cg-RX-API-DMAC7.html) | 1971-02-12 |
| FR2042416B1 (cg-RX-API-DMAC7.html) | 1974-06-14 |
| DE2009307B2 (de) | 1973-11-29 |
| DE2009307C3 (de) | 1974-06-27 |
| GB1286793A (en) | 1972-08-23 |
| DE2009307A1 (de) | 1970-11-19 |
| SU398067A3 (cg-RX-API-DMAC7.html) | 1973-09-17 |