DD52181A1 - Process for the production of thin layers on a support by means of ion beam sputtering and device for carrying out the process - Google Patents
Process for the production of thin layers on a support by means of ion beam sputtering and device for carrying out the processInfo
- Publication number
- DD52181A1 DD52181A1 DD11177965A DD11177965A DD52181A1 DD 52181 A1 DD52181 A1 DD 52181A1 DD 11177965 A DD11177965 A DD 11177965A DD 11177965 A DD11177965 A DD 11177965A DD 52181 A1 DD52181 A1 DD 52181A1
- Authority
- DD
- German Democratic Republic
- Prior art keywords
- carrying
- production
- support
- ion beam
- thin layers
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DD11177965A DD52181A1 (en) | 1965-07-03 | 1965-07-03 | Process for the production of thin layers on a support by means of ion beam sputtering and device for carrying out the process |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DD11177965A DD52181A1 (en) | 1965-07-03 | 1965-07-03 | Process for the production of thin layers on a support by means of ion beam sputtering and device for carrying out the process |
Publications (1)
Publication Number | Publication Date |
---|---|
DD52181A1 true DD52181A1 (en) | 1966-12-05 |
Family
ID=249731
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DD11177965A DD52181A1 (en) | 1965-07-03 | 1965-07-03 | Process for the production of thin layers on a support by means of ion beam sputtering and device for carrying out the process |
Country Status (1)
Country | Link |
---|---|
DD (1) | DD52181A1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0019725A1 (en) * | 1979-05-18 | 1980-12-10 | International Business Machines Corporation | Deposition method using an energetic particle beam |
DE102006024068A1 (en) * | 2006-05-23 | 2007-11-29 | Oerlikon Leybold Vacuum Gmbh | coating plant |
-
1965
- 1965-07-03 DD DD11177965A patent/DD52181A1/en unknown
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0019725A1 (en) * | 1979-05-18 | 1980-12-10 | International Business Machines Corporation | Deposition method using an energetic particle beam |
DE102006024068A1 (en) * | 2006-05-23 | 2007-11-29 | Oerlikon Leybold Vacuum Gmbh | coating plant |
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