DD132456A1 - Trockener filmfotoresist - Google Patents

Trockener filmfotoresist

Info

Publication number
DD132456A1
DD132456A1 DD7700200502A DD20050277A DD132456A1 DD 132456 A1 DD132456 A1 DD 132456A1 DD 7700200502 A DD7700200502 A DD 7700200502A DD 20050277 A DD20050277 A DD 20050277A DD 132456 A1 DD132456 A1 DD 132456A1
Authority
DD
German Democratic Republic
Prior art keywords
dry film
film photoresist
photoresist
dry
film
Prior art date
Application number
DD7700200502A
Other languages
German (de)
English (en)
Inventor
Vladimir N Kuznetsov
Original Assignee
Vladimir N Kuznetsov
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vladimir N Kuznetsov filed Critical Vladimir N Kuznetsov
Publication of DD132456A1 publication Critical patent/DD132456A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Laminated Bodies (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
DD7700200502A 1976-08-10 1977-08-09 Trockener filmfotoresist DD132456A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SU762382553A SU941918A1 (ru) 1976-08-10 1976-08-10 Сухой пленочный фоторезист

Publications (1)

Publication Number Publication Date
DD132456A1 true DD132456A1 (de) 1978-09-27

Family

ID=20669322

Family Applications (1)

Application Number Title Priority Date Filing Date
DD7700200502A DD132456A1 (de) 1976-08-10 1977-08-09 Trockener filmfotoresist

Country Status (7)

Country Link
US (1) US4234675A (enExample)
JP (1) JPS5340516A (enExample)
DD (1) DD132456A1 (enExample)
DE (1) DE2736058C2 (enExample)
FR (1) FR2361681A1 (enExample)
GB (1) GB1549952A (enExample)
SU (1) SU941918A1 (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4169732A (en) * 1978-01-09 1979-10-02 International Business Machines Corporation Photosensitive coating composition and use thereof
JPS55501072A (enExample) * 1978-12-25 1980-12-04
DE2922746A1 (de) * 1979-06-05 1980-12-11 Basf Ag Positiv arbeitendes schichtuebertragungsmaterial
DE3114931A1 (de) * 1981-04-13 1982-10-28 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes photopolymerisierbares kopiermaterial
US4752553A (en) * 1982-04-01 1988-06-21 M&T Chemicals Inc. High resolution solder mask photopolymers for screen coating over circuit traces
US4621043A (en) * 1983-01-31 1986-11-04 E. I. Du Pont De Nemours And Company Storage stable photopolymerizable composition
JPS59166944A (ja) * 1983-03-11 1984-09-20 Sekisui Chem Co Ltd 感光性組成物
DE3447355A1 (de) * 1984-12-24 1986-07-03 Basf Ag, 6700 Ludwigshafen Vernetzbares harz, lichtempfindliches aufzeichnungsmaterial auf basis dieses vernetzbaren harzes sowie verfahren zur herstellung einer flachdruckplatte mittels dieses lichtempfindlichen aufzeichnungsmaterials
DE3447357A1 (de) * 1984-12-24 1986-07-03 Basf Ag, 6700 Ludwigshafen Trockenfilmresist und verfahren zur herstellung von resistmustern
DE3504254A1 (de) 1985-02-08 1986-08-14 Basf Ag, 6700 Ludwigshafen Lichtempfindliches aufzeichnungselement
DE3619129A1 (de) * 1986-06-06 1987-12-10 Basf Ag Lichtempfindliches aufzeichnungselement
DE3619698A1 (de) * 1986-06-16 1987-12-17 Basf Ag Lichtempfindliches aufzeichnungselement
DE3706561A1 (de) * 1987-02-28 1988-09-08 Basf Ag Lichtempfindliches aufzeichnungsmaterial mit erhoehter flexibilitaet
JP2571800B2 (ja) * 1987-11-27 1997-01-16 イビデン株式会社 無電解めっき用感光性接着剤およびプリント配線板
DE3926708A1 (de) * 1989-08-12 1991-02-14 Basf Ag Photopolymerisierbares schichtuebertragungsmaterial
RU2190869C2 (ru) * 2000-03-31 2002-10-10 Российский химико-технологический университет им. Д.И.Менделеева Сухой пленочный фоторезист
RU2190871C2 (ru) * 2000-06-15 2002-10-10 Российский химико-технологический университет им. Д.И.Менделеева Сухой пленочный фоторезист
RU2190870C2 (ru) * 2000-06-15 2002-10-10 Российский химико-технологический университет им. Д.И.Менделеева Сухой пленочный фоторезист
US20030129501A1 (en) * 2002-01-04 2003-07-10 Mischa Megens Fabricating artificial crystalline structures
JP2006205678A (ja) * 2005-01-31 2006-08-10 Fuji Photo Film Co Ltd ノズルプレート製造方法及び液体吐出ヘッド並びにこれを備えた画像形成装置
CN101111803B (zh) * 2005-02-02 2011-07-20 可隆株式会社 正性干膜光致抗蚀剂以及用于制备该光致抗蚀剂的组合物
KR101222947B1 (ko) 2005-06-30 2013-01-17 엘지디스플레이 주식회사 인쇄용 용제, 및 그를 이용한 인쇄용 패턴 조성물 및 패턴 형성방법

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3245796A (en) * 1962-10-25 1966-04-12 Du Pont Photopolymerizable elements and processes
US3785817A (en) * 1970-10-05 1974-01-15 A Kuchta Transfer of photopolymer images by irradiation
DE2064080C3 (de) * 1970-12-28 1983-11-03 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Gemisch
ZA72345B (en) * 1971-02-04 1973-03-28 Dynachem Corp Polymerization compositions and processes
US3935330A (en) * 1971-12-08 1976-01-27 Union Carbide Corporation Two-step coating process
US3770438A (en) * 1971-12-09 1973-11-06 J Celeste Photopolymerizable transfer elements
JPS548091B2 (enExample) * 1971-12-10 1979-04-12
JPS4920292A (enExample) * 1972-06-16 1974-02-22
JPS527362B2 (enExample) * 1972-09-04 1977-03-02
JPS5625441B2 (enExample) * 1972-09-04 1981-06-12
US3949143A (en) * 1973-02-09 1976-04-06 American Can Company Epoxy resin coatings cured with phototropic aromatic nitro compounds
GB1443822A (en) * 1973-03-06 1976-07-28 Ciba Geigy Polymerisable compositions manufacture of compact bodies form ap
JPS49120701A (enExample) * 1973-03-27 1974-11-19
US3992275A (en) * 1974-11-25 1976-11-16 Celanese Corporation Low gloss ultraviolet curable coatings utilizing α,α,α-trichlorotoluene as a photoinitiator

Also Published As

Publication number Publication date
FR2361681A1 (fr) 1978-03-10
FR2361681B1 (enExample) 1980-04-11
DE2736058C2 (de) 1983-11-17
DE2736058A1 (de) 1978-02-16
JPS5340516A (en) 1978-04-13
US4234675A (en) 1980-11-18
SU941918A1 (ru) 1982-07-07
GB1549952A (en) 1979-08-08

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