DD107313A1 - - Google Patents
Info
- Publication number
- DD107313A1 DD107313A1 DD16948573A DD16948573A DD107313A1 DD 107313 A1 DD107313 A1 DD 107313A1 DD 16948573 A DD16948573 A DD 16948573A DD 16948573 A DD16948573 A DD 16948573A DD 107313 A1 DD107313 A1 DD 107313A1
- Authority
- DD
- German Democratic Republic
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45519—Inert gas curtains
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DD16948573A DD107313A1 (https=) | 1973-03-08 | 1973-03-08 | |
| DE19732354435 DE2354435A1 (de) | 1973-03-08 | 1973-10-31 | Verfahren zur herstellung duenner schichten auf unterlagen |
| CS842773A CS167686B1 (en) | 1973-03-08 | 1973-12-06 | Method of thin layers forming on base material |
| GB115774A GB1406020A (en) | 1973-03-08 | 1974-01-10 | Method of producing thin coating film on substrates |
| FR7405974A FR2220596B3 (https=) | 1973-03-08 | 1974-02-21 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DD16948573A DD107313A1 (https=) | 1973-03-08 | 1973-03-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DD107313A1 true DD107313A1 (https=) | 1974-07-20 |
Family
ID=5490450
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DD16948573A DD107313A1 (https=) | 1973-03-08 | 1973-03-08 |
Country Status (5)
| Country | Link |
|---|---|
| CS (1) | CS167686B1 (https=) |
| DD (1) | DD107313A1 (https=) |
| DE (1) | DE2354435A1 (https=) |
| FR (1) | FR2220596B3 (https=) |
| GB (1) | GB1406020A (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4435445A (en) * | 1982-05-13 | 1984-03-06 | Energy Conversion Devices, Inc. | Photo-assisted CVD |
| US6124427A (en) * | 1997-03-31 | 2000-09-26 | North Dakota State University | Organometallic single source precursors for inorganic films coatings and powders |
| DE19830842C1 (de) | 1998-07-09 | 1999-10-07 | Siemens Ag | Vorrichtung zum Abscheiden von Substanzen |
-
1973
- 1973-03-08 DD DD16948573A patent/DD107313A1/xx unknown
- 1973-10-31 DE DE19732354435 patent/DE2354435A1/de active Pending
- 1973-12-06 CS CS842773A patent/CS167686B1/cs unknown
-
1974
- 1974-01-10 GB GB115774A patent/GB1406020A/en not_active Expired
- 1974-02-21 FR FR7405974A patent/FR2220596B3/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR2220596B3 (https=) | 1976-12-03 |
| FR2220596A1 (https=) | 1974-10-04 |
| DE2354435A1 (de) | 1974-09-12 |
| CS167686B1 (en) | 1976-04-29 |
| GB1406020A (en) | 1975-09-10 |