DD106417A1 - - Google Patents

Info

Publication number
DD106417A1
DD106417A1 DD16806572A DD16806572A DD106417A1 DD 106417 A1 DD106417 A1 DD 106417A1 DD 16806572 A DD16806572 A DD 16806572A DD 16806572 A DD16806572 A DD 16806572A DD 106417 A1 DD106417 A1 DD 106417A1
Authority
DD
German Democratic Republic
Application number
DD16806572A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to DD16806572A priority Critical patent/DD106417A1/xx
Priority to DE19732355058 priority patent/DE2355058A1/de
Priority to CS839273A priority patent/CS169180B1/cs
Priority to PL16739373A priority patent/PL89600B1/pl
Priority to GB5840473A priority patent/GB1451643A/en
Priority to FR7346389A priority patent/FR2221535B3/fr
Priority to CH1816373A priority patent/CH597362A5/xx
Publication of DD106417A1 publication Critical patent/DD106417A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45576—Coaxial inlets for each gas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
DD16806572A 1972-12-27 1972-12-27 DD106417A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Priority Applications (7)

Application Number Priority Date Filing Date Title
DD16806572A DD106417A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1972-12-27 1972-12-27
DE19732355058 DE2355058A1 (de) 1972-12-27 1973-11-03 Verfahren und vorrichtung zur erzeugung duenner, homogener schichten auf unterlagen
CS839273A CS169180B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1972-12-27 1973-12-05
PL16739373A PL89600B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1972-12-27 1973-12-17
GB5840473A GB1451643A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1972-12-27 1973-12-17
FR7346389A FR2221535B3 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1972-12-27 1973-12-26
CH1816373A CH597362A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1972-12-27 1973-12-27

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD16806572A DD106417A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1972-12-27 1972-12-27

Publications (1)

Publication Number Publication Date
DD106417A1 true DD106417A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1974-06-12

Family

ID=5489648

Family Applications (1)

Application Number Title Priority Date Filing Date
DD16806572A DD106417A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1972-12-27 1972-12-27

Country Status (7)

Country Link
CH (1) CH597362A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CS (1) CS169180B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DD (1) DD106417A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE2355058A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2221535B3 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB1451643A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
PL (1) PL89600B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3741708A1 (de) * 1987-12-09 1989-06-22 Asea Brown Boveri Einrichtung zur materialabscheidung aus der gasphase

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0276796B1 (en) * 1987-01-27 1992-04-08 Asahi Glass Company Ltd. Gas feeding nozzle for a chemical vapor deposition apparatus
DE102005056322A1 (de) * 2005-11-25 2007-06-06 Aixtron Ag VPE-Reaktor mit koaxial zueinander angeordneten Quellgasrohren

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3741708A1 (de) * 1987-12-09 1989-06-22 Asea Brown Boveri Einrichtung zur materialabscheidung aus der gasphase

Also Published As

Publication number Publication date
GB1451643A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1976-10-06
FR2221535B3 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1976-10-22
DE2355058A1 (de) 1974-07-11
FR2221535A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1974-10-11
CS169180B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1976-07-29
CH597362A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1978-03-31
PL89600B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1976-11-30

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