CS274988B2 - Cleaning solution for application in polymetallic systems - Google Patents
Cleaning solution for application in polymetallic systemsInfo
- Publication number
- CS274988B2 CS274988B2 CS232089A CS232089A CS274988B2 CS 274988 B2 CS274988 B2 CS 274988B2 CS 232089 A CS232089 A CS 232089A CS 232089 A CS232089 A CS 232089A CS 274988 B2 CS274988 B2 CS 274988B2
- Authority
- CS
- Czechoslovakia
- Prior art keywords
- application
- percent
- cleaning solution
- weight
- organic
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title abstract 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 abstract 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- 229940111121 antirheumatic drug quinolines Drugs 0.000 abstract 1
- 229960005070 ascorbic acid Drugs 0.000 abstract 1
- 235000010323 ascorbic acid Nutrition 0.000 abstract 1
- 239000011668 ascorbic acid Substances 0.000 abstract 1
- 239000003638 chemical reducing agent Substances 0.000 abstract 1
- 230000007797 corrosion Effects 0.000 abstract 1
- 238000005260 corrosion Methods 0.000 abstract 1
- 239000003112 inhibitor Substances 0.000 abstract 1
- 150000002537 isoquinolines Chemical class 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 150000007522 mineralic acids Chemical class 0.000 abstract 1
- 150000007524 organic acids Chemical class 0.000 abstract 1
- 150000003248 quinolines Chemical class 0.000 abstract 1
- 150000003462 sulfoxides Chemical class 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Landscapes
- Detergent Compositions (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
The cleaning liquor contains from 3 to 15 percent by weight of inorganic or organic acid C1 to C6, from 0.01 to 1 percent by weight of organic corrosion inhibitors, like sulfoxides, quinolines or isoquinolines or their mixtures, then from 0.2 to 5 percent by weight of organic reducing agent, like hydrazine or its derivatives or ascorbic acid or their mixture, the rest is water. The solution concerns material protection.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CS232089A CS274988B2 (en) | 1989-04-14 | 1989-04-14 | Cleaning solution for application in polymetallic systems |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CS232089A CS274988B2 (en) | 1989-04-14 | 1989-04-14 | Cleaning solution for application in polymetallic systems |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CS8902320A1 CS8902320A1 (en) | 1991-01-15 |
| CS274988B2 true CS274988B2 (en) | 1991-12-17 |
Family
ID=5359999
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CS232089A CS274988B2 (en) | 1989-04-14 | 1989-04-14 | Cleaning solution for application in polymetallic systems |
Country Status (1)
| Country | Link |
|---|---|
| CS (1) | CS274988B2 (en) |
-
1989
- 1989-04-14 CS CS232089A patent/CS274988B2/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CS8902320A1 (en) | 1991-01-15 |
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