CS251162B1 - Gas conditioning equipment for metallic products' thermal and chemothermal treatment vacuum installation - Google Patents

Abstract

The device deals with gas treatment and consists of from the hydrogen treatment section, the pro section nitrogen treatment and split section ammonia, which are connected to each other using flow control elements gas and ammonia chips. The next part will arrange zeni are dryers, decxo and electromagnetic devices valves. The device is intended for gas treatment in vacuum processes in vacuum vessels for thermal and chemical heat treatment of metal parts.

Description

(54)

KUČEROVA LILI ing., LIBEREC,

FREY AUGUSTIN,

ROUTNEROVA BLANKA ing., JABLONEC NAD NISOU, RYBAfi OLDRICH,

EXNER MILAN ing., LIBEREC

Gas treatment equipment for vacuum equipment for heat and chemical heat treatment of metal products

The apparatus solves a gas treatment and consists of a hydrogen treatment section, a nitrogen treatment section and a split ammonia treatment section which are connected to each other using gas flow control elements and an ammonia splitter. Another part of the equipment are dryers, decxo equipment and solenoid valves. The device is designed for gas treatment in vacuum processes in vacuum vessels for thermal and chemical heat treatment of metal parts.

251 162

231 162

BACKGROUND OF THE INVENTION The present invention relates to a gas treatment apparatus with the advantage of being used in vacuum processes in a plant for the thermal and chemical-heat treatment of components.

At present, gas treatment plants of only laboratory type or with one-sided use are known, either as gas driers or as ammonia splitters. In these devices, the regeneration of the filling is not addressed, thus ensuring their continuous use. The vacuum equipment used for heat treatment of mechanical parts is subjected to high vacuum heating, which at the same time creates a protective atmosphere during the heating of the parts, thus ensuring non-oxidation and non-decarburization of the surface of the parts. However, during hardening of components in the stream of untreated gases, the surfaces of the components are partially degraded by oxygenation or decarburization. Due to the unstable purity of the supplied gases in cylinders and containers, the surface quality of the components is influenced more or less by the amount of residual impurity of the supplied gases. This does not sufficiently achieve the effect of the vacuum technology. The price of these devices is high compared to conventional devices for heat and chemical heat treatment, therefore it is necessary to use these technological vacuum devices with maximum effect, which means to ensure maximum value of surface quality of components and use them not only for heat but also for chemical-heat treatment .

The principle of the solution according to the invention consists in that the device according to the invention consists of separate sections - a hydrogen treatment section, a nitrogen treatment section and a split treatment section

251 162 ammonia, wherein the hydrogen treatment section is connected with one branch to the nitrogen treatment section and another branch to the gas flow control device, the nitrogen treatment section is connected to the gas flow control device, and the split ammonia treatment section is connected to a gas flow control device coupled to the vacuum vessel, with a deoxo device within each section coupled to solenoid valves. It also has two dryers which are connected by non-return valves and a shut-off valve.

The device according to the invention is designed so that it has an increased capacity with the possibility of connection to several vacuum devices.

The gases treated in this way guarantee a purity of 99.999% and a dew point of -80 ° C, which corresponds to the residual air oxygen content of the atmosphere in the vessel evacuated to 1 x 10, the vacuum value used in these technologies. The higher effect is that it is a simple production concept that can be used for several types of gases with guaranteed technological effects for several industrial plants.

In the accompanying drawings, the device according to the invention is shown schematically, the individual drawings indicate: Fig. 1 - diagram of the overall arrangement of the gas treatment device, Fig. 2 - internal arrangement of single sections - nitrogen treatment section selected as an example; 4 shows a top view of a dryer with a portion exposed.

The device according to the invention in Fig. 1 consists of a high-pressure part, a medium-pressure part and a low-pressure part. The high-pressure part comprises cylinders 2 ^of the gases used, i.e. ammonia, hydrogen, nitrogen, a high-pressure battery 6 and pressure reducers lt which reduce the pressure of the individual gases at the inlet of the gas treatment plant. Own device

3 251 162 (medium pressure) consists of a hydrogen treatment section 1 (i.e., drying and desoxidation), a nitrogen treatment section 2, an ammonia blower 4, and an ammonia treatment section 2 (already split ammonia). From the individual sections the gases are led to the low-pressure part, ie the gas flow control device 13, where the exact value of the gas pressure is set - 5 kPa, the exact required flow of individual gases depending on anoha factors such as size, shape, surface technology. From the gas flow control device 13, the gases are routed through individual electromagnetic cores to a vacuum vessel 14. ·

The principle of gas treatment is identical in section 1,2,2. Fig. 2 shows the internal arrangement of each of sections 1, 2 and 2. As an example of the treatment of gases in the section, the treatment of nitrogen N ₂ in section 2 is described. Nitrogen N ₂ is fed through 2 cylinders 2 through the high pressure battery 6 and pressure reducer 2. to dsoxa 8, in which, in the presence of hydrogen H ₂ , which is led from the cylinders 2 through the high-pressure battery 6 and the pressure reducer 7, also oxygen O _{2 is} bound to water in the deox 8 on the palladium catalyst. Oxygen-free gas, but enriched with water vapor, is routed through solenoid valve 2 to dryer 10 and 10, respectively. of the dryer 15 through an untreated gas inlet 18 (see FIG. 3).

In the dryer 10 resp. 15, the gas is degassed on molecular sieves 21 (see FIG. 4) with a pore size of up to 5 A.

In these dryers, the gas is dried to a dew point of - 60 ° C +

-80 ° C. From a dryer 10 _; respectively. 15 _t , the treated gas is discharged via the exhaust gas 17 (see FIG. 3) through a one-way valve (see FIG. 2) to the gas flow control device 13 (see FIG. 1) and from there to the vacuum vessel 14. performs chemical - thermal and heat treatment of metal parts.

Dryer 10 _; 5 _f can continue to pass as long as the dew point measured after deox 8 and dryer 10 or 15

251 162 does not exceed - 55 ° C. Once this value has been reached, the dryer charge 10 or 15 r of the molecular sieve 21 must be regenerated. The amount of gas that can be dried depends on the degree of contamination (oxygen and water content) it shows before treatment. The greater the contamination, the lower the amount of treated gas can be obtained. . Dryers 10 and 15 operate alternately.

FIG. 3 and FIG. 4 show the internal configuration of the dryers 10 and 15. The regeneration of the charge, e.g. of the dryer 15, proceeds in this manner. The dryer 10 operates at room temperature. The dried gas is largely discharged to the gas flow control device 13 and to the vacuum vessel 14. Part of the gas is discharged via a shut-off valve 16 (see FIG. 2) in the opposite direction of the inlet 23 (see FIG. 3) to a dryer 15. 19. The gas is preheated on the fins 22 and then flows through the filling of the molecular sieves 21, binds the water vapor and the wet goes through the outlet 24 (see Fig. 3) via the solenoid valve 12 (see Fig. 2) to the exhaust (not shown). ). 4 shows the arrangement of the molecular sieves 21 between the ribs 20, which allow a uniform temperature distribution during regeneration. The regeneration of the dryers 15 and 10 may alternate at regular intervals.

Similar way takes place in the section 1 and the hydrogen treatment section 2 previously digested with ammonia treatment of cleavage 2 ^except that the reaction in the deoxo 8 is not required coverings hydrogen.

The device according to the invention enables deoxidation, gas drying and ammonia cleavage followed by deoxidation and drying. The equipment can be used in high-capacity vacuum equipment, where it is necessary to use working gases of very high purity. These include eg equipment for diffusion processes in vacuum, vacuum furnaces for thermal and chemical heat treatment of metal parts.

Claims (1)

OBJECT OF THE INVENTION: 251 162 Gas treatment apparatus for vacuum equipment for the heat and chemical-heat treatment of metal products, having a gas flow control device and an ammonia splitter, characterized in that it consists of separate sections - a section (1) for the treatment of hydrogen, a section (2) a nitrogen treatment section and a section (3) for treating the split ammonia, wherein the hydrogen treatment section (1) is connected by one branch to the nitrogen treatment section (2) and the other branch to the gas flow control device 0.3); the nitrogen treatment is connected to the gas flow control device (13) and the split ammonia treatment section (3) is connected to the gas flow control device (13), which is connected to the vacuum vessel (14), inside each separate section (3). 1, 2, 3), a deoxo device (8), which is connected to the solenoid valves (9, 12), ^{and a} dryer (10fc dryer) (15), which are connected by return valves (11) and shut-off valve (16).