CS205287B1 - Method of preparation of light sensitive copying layer for photomechanical negative printing plates - Google Patents
Method of preparation of light sensitive copying layer for photomechanical negative printing plates Download PDFInfo
- Publication number
- CS205287B1 CS205287B1 CS356576A CS356576A CS205287B1 CS 205287 B1 CS205287 B1 CS 205287B1 CS 356576 A CS356576 A CS 356576A CS 356576 A CS356576 A CS 356576A CS 205287 B1 CS205287 B1 CS 205287B1
- Authority
- CS
- Czechoslovakia
- Prior art keywords
- photomechanical
- preparation
- light sensitive
- printing plates
- sensitive copying
- Prior art date
Links
- 238000007639 printing Methods 0.000 title claims description 4
- 238000000034 method Methods 0.000 title description 12
- 238000002360 preparation method Methods 0.000 title description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 16
- 229920000642 polymer Polymers 0.000 claims description 15
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 claims description 4
- 229920003052 natural elastomer Polymers 0.000 claims description 4
- 229920001194 natural rubber Polymers 0.000 claims description 4
- 244000043261 Hevea brasiliensis Species 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 229920001577 copolymer Polymers 0.000 claims 1
- 239000000203 mixture Substances 0.000 description 8
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 2
- YACLQRRMGMJLJV-UHFFFAOYSA-N chloroprene Chemical compound ClC(=C)C=C YACLQRRMGMJLJV-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229920006037 cross link polymer Polymers 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- -1 azides Chemical class 0.000 description 1
- 150000001540 azides Chemical class 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- XEKOWRVHYACXOJ-UHFFFAOYSA-N ethyl acetate Substances CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 230000001404 mediated effect Effects 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 229920001084 poly(chloroprene) Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Description
Vynález sa týká sposobu přípravy svetlocítlivej kopirovacej vrstvy pre fotomechanické negatívnetiačové došky.The present invention relates to a process for the preparation of a light-sensitive copying layer for photomechanical negatives.
Tvorba kopírovaného obrazu je založená na presietení lineárnych makromolekul prírodného, alebo syntetických kaučukov biradikálmi oligomérneho styrénu, vznikajúcimi vo fotochemickom procese ožiarovania UV svetlom za a bez přítomnosti kyslíka.The production of the copied image is based on the cross-linking of linear macromolecules of natural or synthetic rubbers with oligomeric styrene biradicals, arising in the photochemical process of UV irradiation with and without oxygen.
V súčasnom období sa na výrobu kopírovacích vrstiev pre fotoreprodukciu používajú zložité polymérne kompozície. Optický záznam je sprostredkovaný zosietením rečazových molekul polyraérov na osvětlených miestach fotoreaktívnym sietovacím činidlům. Hustota vznikajúcej siete závisí od množstva absorbovaných světelných kvant. Ako sieťovacie činidla sa používajú zložité organické zlúčeniny ako azidy, diazidy a spiropyrány.Recently, complex polymer compositions have been used to produce photocopying layers. Optical recording is mediated by crosslinking of the polymer chain molecules at the illuminated sites with photoreactive crosslinking agents. The density of the resulting network depends on the amount of light quantum absorbed. Complex organic compounds such as azides, diazides and spiropyrans are used as crosslinking agents.
'Tvorba obrazu u všetkých kopírovacích kompozicí! je založená na zmene fyzikálnych a mechanických vlastností polymérov, hlavně rýchlosti napučievania a rozpustnosti. Principom tvorby obrazu je vznik nerozpustného zosieteného polyméru po osvětlení nezosieteného polyméru lučmi UV žiarenia. Okrem tohto postupu vzniku obrazu možno použit aj klasická fotopo 1 ytneriáciu osvětlením rozpuštěného monomeru za přítomnosti vhodného polymeri zač ného iniciátora.'Image creation for all copy compositions! it is based on a change in the physical and mechanical properties of the polymers, mainly the swelling rate and solubility. The principle of image formation is the formation of insoluble crosslinked polymer after illumination of the uncrosslinked polymer by UV rays. In addition to this image formation procedure, classical photopolymerization by illuminating the dissolved monomer in the presence of a suitable polymer initiator may also be used.
Závažným nedostatkom doteraz používaných postupov je zložitosč kopírovacích kompozicí!, ich náročná příprava z hladiska konkrétnej technologie a vysoká cena.A serious drawback of the processes used hitherto is the complexity of copy compositions !, their demanding preparation in terms of specific technology and high cost.
Tieto nedostatky v podstatnej miere odstraňuje sposob přípravy svetlocítlivej kopirovacej vrstvy pre fotomechanické negativné tlačové došky podlá vynálezu, ktorého podstata spočívá v tom, že sa sve11 oci11i vá polymérna vrstva připraví z polymérov butadiúnu, chloroprénu nebo prírodného kaučuku za přítomnosti 1 až 15 Z hmotnostných oligomornebo styrénu. Sve11oci11 ivá kompozicia sa připraví rozpuštěním zvlášť polymeru a zvlášť o 1 igomérneho styrénu vo vhodnom rozpúšťadle a ich roztoky podía vyžadovaného poměru sa zmicšajú.These drawbacks are substantially eliminated by the process of preparing a light-sensitive copying layer for photomechanical negative printing seals according to the invention, which is characterized in that the light-colored polymer layer is prepared from butadiene, chloroprene or natural rubber polymers in the presence of 1 to 15 wt. . The open composition is prepared by dissolving separately the polymer and especially 1 µg of styrene in a suitable solvent and mixing their solutions according to the desired ratio.
Koncentrácia polymeru v roztoku sa može v závislosti od sposobu nanášania na kovová podlož-** ku a požadovanej hrůbky vrstvy pohybovať v rozmedzí I až 10 7. hmot. Koncentrácia oligomérneho styrénu v roztoku je v rozsahu 0,5 až 10 Z hm. Ako rozpúšťadla je vhodné použiť chlórované a aromatické uhlovodíky. Získaným svet1ocitlivým roztokom sa ovrstvi kovová platina na hořizontálnej odstredivke máčaním alebo poliatim. Před vlastným nanesením sve11oci11 ivej vrstvy je potřebné povrch kovověj platné v závislosti od jej povrchovej struktury dokonale očistit a odmaštiť.The concentration of the polymer in the solution may be in the range of 1 to 10% by weight, depending on the method of application to the metal substrate and the desired layer thickness. The concentration of oligomeric styrene in the solution is in the range of 0.5 to 10% by weight. Suitable solvents are chlorinated and aromatic hydrocarbons. The resulting photosensitive solution is coated with a platinum metal on a horizontal centrifuge by dipping or pouring. Before applying the light coat, it is necessary to thoroughly clean and degrease the metal-valid surface, depending on its surface structure.
Osvětlením ovrstvenej kovověj vrstvy cez fubovoíná masku, alebo filmový negativ sa získá latentný obraz, pričom doba osvitu závisí od síly použitého zdroja a hrábky nanesencj vrstvy.Illumination of the coated metal layer through a mask or film negative produces a latent image, the exposure time depending on the strength of the source used and the thickness of the coating.
Proces vyvoiávania sa skládá z dvoch operácií. temperováním osvetlenej platné na teplotu 130 až 150 °C po dobu 5 mináť dochádza k rozloženiu oligomérneho styrénu a súčasne zosieteniu polymeru. Nezosietené míesta sa rozpustia a dokladné vyčistia chlorovanými alebo aromatickými uhlovodíkmi. Zbytky rozpášťadiel sa odstránia opátovným pitminútovým zahriatím celej platné na 110 °C. Zvýšenie hydrofility sa dosiahne vtieraním klasických ofsetových vlhčiacich roztokov na báze ety 1 én-g1yko1u. Po tejto úpravě vytvořený obraz sa vyfarbí a nakonzervuje.The development process consists of two operations. By tempering the light illuminated at 130 to 150 ° C for 5 minutes, the oligomeric styrene decomposes and the polymer crosslinks. Uncrosslinked spots are dissolved and documented cleaned with chlorinated or aromatic hydrocarbons. Residual solvents are removed by heating the whole temperature to 110 ° C again. An increase in hydrophilicity is achieved by rubbing in classical offset dampening solutions based on ethylene glycol. After this adjustment, the created image is colored and preserved.
PřikladlEXAMPLE
Svetlocitlivý roztok pozostáva z 2 g po 1 ybutad iénu a 0,1 g oligomérneho styrénu rozpuštěných v 100 ml benzenu, Hliníková platňa sa po dokonalom očistění účinkom kyselin a organických rozpúšťadíei ovrstvi nanesením svetlocitlivého roztoku v horizontálnej odstredivke.The photosensitive solution consists of 2 g of 1 Ybutadiene and 0.1 g of oligomeric styrene dissolved in 100 ml of benzene. After thorough cleaning with acids and organic solvents, the aluminum plate is coated by applying the photosensitive solution in a horizontal centrifuge.
Po dokonalom odpaření rozpúšťadla sa z negativu vykopíruje obraz presvietenim zdrojom UV světla /4 000 WZ zo vzdialenosti 1 m po dobu 90 s. Vykopírovaný obraz sa temperuje pri 130 °C po dobu 5 min. Vyvolávanie sa prevádza rozpúšťaním nezosietcného polymeru dífáznym procesom, rozpuštěním v trich1orety1énu.After complete evaporation of the solvent, the image is copied from the negative by illuminating with a UV light source / 4000 WZ from a distance of 1 m for 90 s. The copied image is tempered at 130 ° C for 5 min. The induction is carried out by dissolving the non-crosslinked polymer by a diphase process, dissolving in trichlorethylene.
P r i k 1 a d 2Example 1 and d 2
Svetlocitlivý na hmotu polymeru volávania obrazu.Light sensitive to the mass of the polymer calling the image.
roztok ako v příklade I, obsahujúci naviac 0,4 Z hmot. organického pigmentu za účelom zafarbenia polymérnej vrstvy, a tým zlepšcnia sledovania a vyĎalsí postup jc ako v příklade 1.solution as in Example I, containing in addition 0.4 wt. of an organic pigment to color the polymer layer, thereby improving traceability and a better process as in Example 1.
Příklad 3Example 3
Svetlocitlivý roztok obsahujúci 2 Z hmot. chloroprénu v chloroforme a 5 Z hmot. vzhladom na polymér oligomérneho styrénu. Ovrstvenie sa uskutoční na dokonale očistenom povrchu podkladu tlačovej platné. Ďalší postup ako v příklade 1.Light-sensitive solution containing 2% by weight of chloroprene in chloroform and 5 wt. relative to the oligomeric styrene polymer. The coating is carried out on a perfectly cleaned surface of the printing substrate. Proceed as in Example 1.
Př íklad 4Example 4
Svetlocitlivý roztok, obsahujúci 1 Z hmot. prírodného kaučuku v zmesi xylén-to 1uén-ety1acetát /1:4:0,2/ a 1 Z hmot. zmesi oligomérneho styrénu. Ďalší postup ako v příklade 1.Light-sensitive solution containing 1% by weight of natural rubber in a mixture of xylene-to-1-ene-ethyl acetate (1: 4: 0.2) and 1 wt. mixtures of oligomeric styrene. Proceed as in Example 1.
Výhodou navrhovaného postupu je jednoduchost pripravy sve11oci11 ivej kompozície, nízká cena a jednoduchá manipulácia. Navrhovaná kompozícia sa vyznačuje velkou ostrosťou kresby , vysokou mechanickou pevnosťou získaného reliéfncho obrazu a jednoduchosťou vyvolávaného procesu.The advantage of the proposed process is the ease of preparation of the composition, low cost and ease of handling. The proposed composition is characterized by high sharpness of the drawing, high mechanical strength of the obtained relief image and simplicity of the induced process.
Claims (1)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CS356576A CS205287B1 (en) | 1976-05-28 | 1976-05-28 | Method of preparation of light sensitive copying layer for photomechanical negative printing plates |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CS356576A CS205287B1 (en) | 1976-05-28 | 1976-05-28 | Method of preparation of light sensitive copying layer for photomechanical negative printing plates |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CS205287B1 true CS205287B1 (en) | 1981-05-29 |
Family
ID=5376104
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CS356576A CS205287B1 (en) | 1976-05-28 | 1976-05-28 | Method of preparation of light sensitive copying layer for photomechanical negative printing plates |
Country Status (1)
| Country | Link |
|---|---|
| CS (1) | CS205287B1 (en) |
-
1976
- 1976-05-28 CS CS356576A patent/CS205287B1/en unknown
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