CN2919303Y - Baseplate supporting structure of photo exposing machine - Google Patents
Baseplate supporting structure of photo exposing machine Download PDFInfo
- Publication number
- CN2919303Y CN2919303Y CN 200620117021 CN200620117021U CN2919303Y CN 2919303 Y CN2919303 Y CN 2919303Y CN 200620117021 CN200620117021 CN 200620117021 CN 200620117021 U CN200620117021 U CN 200620117021U CN 2919303 Y CN2919303 Y CN 2919303Y
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- CN
- China
- Prior art keywords
- substrate
- base plate
- support structure
- exposure machine
- plate supports
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- Expired - Lifetime
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The utility model relates to a basal plate support structure for an exposure machine, the support structure can avoid the static on a basal plate carrier platform of the exposure machine due to long time operation, the fraction will occur when taking out the basal plate due to the static effect. The utility model of basal plate support structure of the exposure machine includes a platform with a plurality of support cushions, a driving rod and a plurality of basal plates supporting the base, and the basal plate support thimbles can support or undertake the basal plates, at least two basal plates, the space between the basal plates shall be less than the length of the basal plate, the height of the basal plate shall less than the height of the basal plate thimbles. When the basal plate bends or distort due to static effect on the platform, the basal plate will contact the basal plate support baffle to reduce the basal plate bending or distortion caused by the static effect.
Description
Technical field
The utility model refers to a kind of substrate support structure that is applicable to exposure machine especially about a kind of substrate support structure.
Background technology
When making the display panel of LCD; use base plate carrying platform on the board; regular meeting makes buildup of static electricity on carrying platform because of long-term the use, makes the substrate on the carrying platform easily cause fragmentation because of electrostatic effect displacement when the automated machine arm takes out substrate.
When making the display panel of LCD, photoresist has at the substrate periphery more and adheres to uneven phenomenon, therefore substrate is after finished surface printed line road makes, can utilize edge exposure machine (edge exposingapparatus) to carry out single exposure earlier at the substrate peripheral position, so that the photoresist that the substrate periphery applies reacts completely, be beneficial to the carrying out of subsequent etch technology.
With the edge exposure machine is example, and as shown in Figure 1, the main element of general edge exposure machine comprises: a pedestal 300; And be arranged at the platform back up pad 330 of driving stem 310, base plate supports thimble 320 and two subtends on the pedestal 300.In addition, there is a platform 400 to be used for carrying a substrate 500, and four corners on the platform 400 are respectively arranged with four supporting pads 410, on supporting pad 410, can carry the substrate 500 of desiring to carry out edge exposure, and can make substrate 500 and platform 400 keep a spacing by this supporting pad 410, be beneficial to the taking-up that finishes the exposure metacoxal plate.This board is cooperated a lamp box 100 and a mask 200 again, can carry out the usefulness of edge exposure.
In addition, driving stem 310 is linking platform 400 respectively with platform back up pad 330, and providing platform 400 enough support bearings, and when driving stem 310 driving platforms 400 carried out lift work, 330 of platform back up pads can provide supplemental support.
The manner of execution of edge exposure machine please refer to the action flow chart of Fig. 2 a～Fig. 2 f.Shown in Fig. 2 a, be positioned over the edge exposure machine that has as above-mentioned element when a substrate 500 after, cooperate lamp box and mask (Fig. 2 a does not show), then begin to carry out the edge exposure operation.After finishing exposure, the platform 400 of bearing substrate 500 falls toward moving down under the driving of driving stem 310, and the mechanical arm 600 that is used for taking out substrate is simultaneously awaited orders on the side, shown in Fig. 2 b.
When board overuses; can excessively cause buildup of static electricity because of rubbing between platform 400 and the substrate 500; and because four the mask supporting pads 410 in four corners on the platform 400 provide the support of substrate 500, so regular meeting causes the phenomenon of 500 times bending deformations of whole base plate, shown in Fig. 2 c.When platform 400 continues under the driving of driving stem 310 toward moving down when falling, substrate 500 can push up the base plate supports thimble 320 that correspondence is arranged at mask supporting pad 410, and continue to widen spacing with the platform 400 that descends, this moment is more normal because of electrostatic effect, cause and only depend on four base plate supports thimbles, 320 substrate supported 500 to slide, and make substrate 500 displacements, shown in Fig. 2 d.
Shown in Fig. 2 e～Fig. 2 f, when a mechanical arm 600 will carry out the step of substrate 500 taking-ups, substrate 500 is shifted because of electrostatic effect, and make that substrate 500 position on mechanical arm 600 of taking out is not good, when transporting, just drop and cause fragmentation, the loss substrate because of collision or carrying inequality easily.
On production line,, follow-up need having or not unusually by the checking board, avoid causing the product yield not good when fragmentation takes place.Therefore from fragmentation takes place, warp is determined the board state, comes back on the line to board to operate, and needs consuming time more than three hours at every turn.Therefore, if can reduce the probability that fragmentation takes place, then can reduce the checking required time of board, and can significantly increase the Production Line ability.
The utility model content
Technical problem to be solved in the utility model provides a kind of substrate support structure of exposure machine, because use the static of being accumulated for a long time, makes the phenomenon of substrate because of electrostatic effect displacement fragmentation when taking out to avoid exposure machine upper substrate carrying platform.
Another technical matters to be solved in the utility model provides a kind of substrate support structure of exposure machine, and the element that more can provide static to derive to avoid the accumulation of static, lowers electrostatic effect.
The substrate support structure of edge exposure machine of the present utility model cooperates a substrate, and it comprises: one has the platform of a plurality of exposure supporting pads, and exposure supporting pad wherein is in order to support or to accept the substrate that is cooperated, so that keep a gap between substrate and the platform; One has the pedestal of a driving stem and a plurality of base plate supports thimbles, wherein driving stem links platform, and the lifting of driving platform, and the base plate supports thimble is in order to support or to accept substrate, when driving stem driving platform continues down to bounce back, can make the base plate supports thimble on the pedestal penetrate platform and supporting pad, and support substrate; And at least two base plate supports plate washers, the distance of its setting is less than the maximal side of substrate; And base plate supports plate washer height is less than the height of base plate supports thimble, during down crooked the or distortion of the electrostatic force of accumulating on because of platform when the substrate on the platform, the end face of base plate supports plate washer will with substrate contacts, the support of substrate is provided, avoid mechanical arm when taking out substrate, because of making the substrate of taking-up, anti-electrostatic force is shifted fragmentation when causing transporting.
In the substrate support structure of the present utility model, the base plate supports plate washer has a thickness, and its thickness range is not limit, and is preferably between 1mm～5mm, to provide because of the curved down enough carrying strength of substrate of static.When board uses, on platform, can produce static because of friction, after static accumulates gradually, can make substrate curved or distortion down take place because of the electrostatic effect on the platform, this moment, substrate can contact with an end face of base plate supports plate washer, and at the end face of base plate supports plate washer, preferable coating or be pasted with an antistatic material layer, with the static of further derivation accumulation, reduce because of electrostatic force the curved or situation of being out of shape substrate under takes place.The antistatic material layer can be any existing antistatic material in the utility model, and preferable is a conductive tape.In addition, more can link on the base plate supports plate washer has an earth element, derives efficient to increase static, or further removes the residual static of possibility on the substrate.
In the substrate support structure of the present utility model, when the base plate supports thimble was accepted substrate, the setting of ligand board size was answered in the position of base plate supports plate washer, and preferable is located on or near in the edge of institute's cooperation substrate.In addition, pedestal upper substrate support pin is preferable be arranged at platform on the relative position of exposure supporting pad, better be corresponding one to one setting, and on the platform exposure supporting pad preferably in the socket mode, the base plate supports thimble on the binding pedestal.
In the utility model substrate support structure, does not limit the position that is provided with of base plate supports plate washer, and preferable can paired parallel subtend be arranged on the pedestal.And the spacing of the base plate supports plate washer that be arranged in parallel does not in pairs limit, and is preferably the width greater than the platform of accepting substrate, to avoid interference the lifting of platform.Simultaneously, the distance that the utility model base plate supports plate washer is provided with, the size setting of preferable cooperated with substrate, with can be when substrate occurs bending and deformation, it is good that the submarginal position of substrate can touch the base plate supports plate washer, better scheme, the distance that the base plate supports plate washer is provided with can be less than arbitrary length of side of substrate.
In the utility model substrate support structure, the height of the height of base plate supports plate washer and base plate supports thimble does not limit, preferable scheme, the height of base plate supports plate washer can be lower than the height of base plate supports thimble, when substrate occured bending and deformation and makes the part of substrate highly be lower than the base plate supports thimble, the submarginal position of substrate then just can touch the base plate supports plate washer.Therefore, the height of base plate supports plate washer in the utility model, preferable can differ 2mm～5mm with the height of base plate supports thimble.
In addition, in the utility model substrate support structure, the width of base plate supports plate washer is not limit, preferable can be provided with a large-area single plate washer on pedestal, the support shelves bar that several elongated shelves bars are formed of also can serving as reasons, as long as can when curved substrate is out of shape, provide support auxiliary any embodiment, all in opinion category of the present utility model.
And cooperate the action of the mechanical arm that picks and places substrate interference-free in order to make, what the width of the utility model base plate supports plate washer was preferable can be less than the width of a mechanical arm that is cooperated (or on the mechanical arm in order to pick and place the support of substrate).
In the utility model structure, preferablely on the pedestal more can comprise at least two platform back up pads, be arranged at the subtend dual side-edge on the pedestal, and link platform, to provide platform to support with driving stem or auxiliary during lifting.
Substrate support structure of the present utility model preferably is applicable on the edge exposure board, yet, except that the edge exposure machine, carrying platform on any needs reduction board and the electrostatic effect between substrate, substrate size are less than carrying platform, and do not influence the board in original mechanical arm scope of activities, all applicable substrate support structure of the present utility model.
Effect of the present utility model is significant: substrate support structure of the present utility model can provide the supplemental support of institute's bearing substrate, avoids because electrostatic effect causes the fragmentation of substrate, and then improves substrate yield and production efficiency.
Description of drawings
Fig. 1 is existing edge exposure board synoptic diagram.
Fig. 2 a～Fig. 2 f is the action synoptic diagram of existing edge exposure board.
Fig. 3 a～Fig. 3 f is the utility model one preferred embodiment, has the action synoptic diagram of the edge exposure board of substrate support structure.
The main element symbol description
100............ lamp box 200............ mask
300............ pedestal 310............ driving stem
320,321... base plate supports thimble 330............ platform back up pad
400............ platform 410............ (exposure or mask) supporting pad
500............ substrate 600............ mechanical arm
601,602... support 700............ base plate supports plate washer
Embodiment
Present embodiment cooperates the utility model substrate support structure to explain with the edge exposure machine.The employed edge exposure machine of present embodiment main element is identical with existing board, shown in Fig. 3 a, comprising: a pedestal 300; And be arranged at the platform back up pad 330 of driving stem 310, base plate supports thimble 320 and two subtends on the pedestal 300.
Edge exposure machine of the present utility model contains a platform 400, be used for carrying a substrate 500, and four corners on the platform 400 are respectively arranged with four supporting pads 410, on supporting pad 410, can carry the substrate 500 of desiring to carry out edge exposure, and can make substrate 500 and platform 400 keep a spacing by this supporting pad 410, be beneficial to the taking-up that finishes the exposure metacoxal plate.
Driving stem 310 in the utility model is linking platform 400 respectively with platform back up pad 330, and providing platform 400 enough support bearings, and when driving stem 310 driving platforms 400 carried out lift work, 330 of platform back up pads can provide supplemental support.
Different with existing edge exposure board is: subtend is provided with two base plate supports plate washers 700 (showing base plate supports plate washer on one side among the figure) on the pedestal 300, this base plate supports plate washer 700 is arranged between two base plate supports thimbles 320,321, and be positioned on the position that when substrate 500 times is curved, can touch, but be positioned at the outside, edge of platform 400, to avoid stopping the decline of platform 400.
The manner of execution that possesses the edge exposure machine that the utility model base plate supports plate washer is arranged please refer to the action flow chart of Fig. 3 b～3f.
Shown in Fig. 3 b, when a substrate 500 after finishing exposure on the board, the platform 400 of bearing substrate 500 falls toward moving down under the driving of driving stem 310, the mechanical arm 600 that is used for taking out substrate is simultaneously awaited orders on the side.Employed mechanical arm 600 has two supports 601,602 in the present embodiment, and for avoiding mechanical arm support 601,602 to touch base plate supports plate washer 700 when taking out substrate 500, therefore set base plate supports plate washer 700 width are less than the spacing of support 601,602.
Simultaneously, when platform 400 drops to certain altitude, substrate 500 on the platform 400 will be continued to support by base plate supports thimble 320,321, this moment, substrate 500 did not contact fully with base plate supports plate washer 700, and the gap of 2mm～5mm is arranged, as the buffer distance when substrate 500 takes place to bend down because of electrostatic effect, shown in Fig. 3 c.The same time, platform 400 continues to descend, and makes substrate 500 break away from mask supporting pads 410, and continues carrying by base plate supports thimble 320,321, and draw back spacing with platform 400 gradually.Electrostatic effect on the platform 400 will make substrate 500 that curved slightly down or distortion take place at this moment, and can contact with the upper side of base plate supports plate washer 700, shown in Fig. 3 d.
But this moment is because the weight of base plate supports plate washer 700 supplemental support whole base plate 500, therefore it is less that substrate 500 is subjected to the influence of electrostatic effect, simultaneously, in the present embodiment, the upper side of base plate supports plate washer 700 is pasted with a conductive tape and a ground wire (figure does not show), and the static on the substrate 500 is shifted out by conductive tape.And because base plate supports plate washer 700 auxiliary, substrate 500 can utilize mechanical arm 600, and substrate 500 is removed under the optimum position, shown in Fig. 3 e～Fig. 3 f.
By the use of the utility model base plate supports plate washer 700, can make substrate 500 because of the displacement phenomenon that platform 400 electrostatic effects cause reduces, therefore can reduce the board device authentication time, improve and produce yield and output.
The foregoing description only is to give an example for convenience of description, and the interest field that the utility model is advocated should be as the criterion with claims, but not only limits to the foregoing description.That is, except that the edge exposure machine, any need to reduce and substrate between electrostatic effect, and substrate size is less than the carrying platform on the board, and do not influence the board in the mechanical arm scope of activities, all applicable substrate support structure of the present utility model.
Claims (15)
1. the substrate support structure of an exposure machine cooperates a substrate, it is characterized in that, comprising:
One has the platform of a plurality of supporting pads, and described a plurality of supporting pads are in order to support or to accept the substrate of this cooperation, so that this substrate and this platform keep a spacing;
One has the pedestal of a driving stem and a plurality of base plate supports thimbles, and wherein this driving stem links this platform, and drives the lifting of this platform, and described a plurality of base plate supports thimble is in order to support or to accept this substrate; And
At least two base plate supports plate washers are arranged at this pedestal and take up an official post between two these base plate supports thimbles; The distance that described these base plate supports plate washers are provided with is less than the maximal side of this substrate; And described these base plate supports plate washer height are less than the height of described a plurality of base plate supports thimbles.
2. the substrate support structure of exposure machine as claimed in claim 1 is characterized in that, a thickness range of described these base plate supports plate washers is between 1mm～5mm.
3. the substrate support structure of exposure machine as claimed in claim 1 is characterized in that, an end face of described these base plate supports plate washers and this substrate contacts applies or be pasted with an antistatic material layer.
4. the substrate support structure of exposure machine as claimed in claim 3 is characterized in that, this antistatic material layer is a conductive tape.
5. the substrate support structure of exposure machine as claimed in claim 1 is characterized in that, described these base plate supports plate washers more link an earth element.
6. the substrate support structure of exposure machine as claimed in claim 1 is characterized in that, accepts this substrate state at described a plurality of base plate supports thimbles, and described these base plate supports plate washers are located on or near the edge in this substrate.
7. the substrate support structure of exposure machine as claimed in claim 1 is characterized in that, described a plurality of base plate supports thimbles are arranged at the relative position of described a plurality of supporting pads.
8. the substrate support structure of exposure machine as claimed in claim 1 is characterized in that, described a plurality of base plate supports thimbles and the corresponding one to one setting of described a plurality of supporting pads.
9. the substrate support structure of exposure machine as claimed in claim 1 is characterized in that, described a plurality of supporting pads are socketed on described a plurality of base plate supports thimble.
10. the substrate support structure of exposure machine as claimed in claim 1 is characterized in that, the paired parallel subtend setting of described these base plate supports plate washers.
11. the substrate support structure of exposure machine as claimed in claim 10 is characterized in that, supports the width of the spacing of plate washer greater than this platform in described paired parallel substrate.
12. the substrate support structure of exposure machine as claimed in claim 1 is characterized in that, the distance that described these base plate supports plate washers are provided with is less than arbitrary length of side of this substrate.
13. the substrate support structure of exposure machine as claimed in claim 1 is characterized in that, the height of the height of described these base plate supports plate washers and described a plurality of base plate supports thimbles differs 2mm～5mm.
14. the substrate support structure of exposure machine as claimed in claim 1 is characterized in that, the width of described these base plate supports plate washers is less than the width of a mechanical arm that is cooperated.
15. the substrate support structure of exposure machine as claimed in claim 1 is characterized in that, more comprises at least two platform back up pads on this pedestal, supports this platform.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200620117021 CN2919303Y (en) | 2006-06-02 | 2006-06-02 | Baseplate supporting structure of photo exposing machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200620117021 CN2919303Y (en) | 2006-06-02 | 2006-06-02 | Baseplate supporting structure of photo exposing machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2919303Y true CN2919303Y (en) | 2007-07-04 |
Family
ID=38217123
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200620117021 Expired - Lifetime CN2919303Y (en) | 2006-06-02 | 2006-06-02 | Baseplate supporting structure of photo exposing machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN2919303Y (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101794077B (en) * | 2009-02-03 | 2012-02-29 | 王氏港建经销有限公司 | Operating platform and method of automatically installing shims |
| CN103809385A (en) * | 2012-11-12 | 2014-05-21 | 川宝科技股份有限公司 | Level angle adjusting mechanism and method for photomask structure of exposure machine |
| WO2014146365A1 (en) * | 2013-03-19 | 2014-09-25 | 深圳市华星光电技术有限公司 | Glass substrate support mechanism for exposure machine |
| WO2017076081A1 (en) * | 2015-11-04 | 2017-05-11 | 京东方科技集团股份有限公司 | Vacuum drying system and vacuum drying method |
| CN105590883B (en) * | 2015-10-14 | 2018-01-12 | 友达光电股份有限公司 | Heating machine platform |
| CN108319057A (en) * | 2018-03-29 | 2018-07-24 | 武汉华星光电技术有限公司 | Substrate edges processing method, mask plate |
| CN111916383A (en) * | 2020-09-09 | 2020-11-10 | 营口金辰机械股份有限公司 | Carrier-plate-free silicon wafer conveying mechanism of PECVD (plasma enhanced chemical vapor deposition) equipment and process chamber matched with conveying mechanism |
-
2006
- 2006-06-02 CN CN 200620117021 patent/CN2919303Y/en not_active Expired - Lifetime
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101794077B (en) * | 2009-02-03 | 2012-02-29 | 王氏港建经销有限公司 | Operating platform and method of automatically installing shims |
| CN103809385A (en) * | 2012-11-12 | 2014-05-21 | 川宝科技股份有限公司 | Level angle adjusting mechanism and method for photomask structure of exposure machine |
| WO2014146365A1 (en) * | 2013-03-19 | 2014-09-25 | 深圳市华星光电技术有限公司 | Glass substrate support mechanism for exposure machine |
| CN105590883B (en) * | 2015-10-14 | 2018-01-12 | 友达光电股份有限公司 | Heating machine platform |
| WO2017076081A1 (en) * | 2015-11-04 | 2017-05-11 | 京东方科技集团股份有限公司 | Vacuum drying system and vacuum drying method |
| US10508860B2 (en) | 2015-11-04 | 2019-12-17 | Boe Technology Group Co., Ltd. | Vacuum drying system and vacuum drying method |
| CN108319057A (en) * | 2018-03-29 | 2018-07-24 | 武汉华星光电技术有限公司 | Substrate edges processing method, mask plate |
| CN111916383A (en) * | 2020-09-09 | 2020-11-10 | 营口金辰机械股份有限公司 | Carrier-plate-free silicon wafer conveying mechanism of PECVD (plasma enhanced chemical vapor deposition) equipment and process chamber matched with conveying mechanism |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee |
Owner name: YOUDA PHOTOELECTRIC CO., LTD. Free format text: FORMER NAME OR ADDRESS: GUANGHUI ELECTRONIC CO., LTD. |
|
| CP03 | Change of name, title or address |
Address after: Postcode of Taiwan, Hsinchu: Patentee after: AU Optronics Corporation Address before: Taoyuan County, Taiwan province: Patentee before: Guanghui Electronic Co., Ltd. |
|
| CX01 | Expiry of patent term |
Granted publication date: 20070704 |
|
| EXPY | Termination of patent right or utility model |