CN2270341Y - Multipurpose plasma torch for film making equipment - Google Patents
Multipurpose plasma torch for film making equipment Download PDFInfo
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- CN2270341Y CN2270341Y CN 96219045 CN96219045U CN2270341Y CN 2270341 Y CN2270341 Y CN 2270341Y CN 96219045 CN96219045 CN 96219045 CN 96219045 U CN96219045 U CN 96219045U CN 2270341 Y CN2270341 Y CN 2270341Y
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- electrode
- insulated tube
- plasma torch
- utility
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Abstract
The utility model relates to a film making device, in particular to a device used in the film making devices for doping and activating gas. The utility model provides a multipurpose plasma torch with simple structure, which can be directly arranged in a vacuum chamber and can be used for doping and activating gas. The utility model adopts double-electric discharge structure which is serially connected by corona discharge and point discharge. The film making device is composed of an insulating tube (1), an electrode (2), an electrode (3), a current-limiting resistance (4), a high voltage source (5) and a flange, wherein the cone-shaped insulating tube (1) is hermetically fixed in the vacuum chamber by the flange; the electrode (3) is connected with the current-limiting resistance (4); the other end of the current-limiting resistance (4) is connected with the high voltage output terminal of the high voltage source (5); the electrode (2) is connected with an earth terminal. The utility model can be used in a plurality of film making devices. The utility model has the advantage of simple and convenient operation, and is a practical device for the exploration of novel thin film materials and the preparation of high quality thin films.
Description
The utility model relates to membrane equipment, especially for a kind of device of doping in the membrane equipment and activated gas.
Membrane science and technology are one of new material development forward position most active fields.In order to explore new material and the high performance thin-film material of preparation, people have adopted various means and measure, improve film quality as adopting active gases, and adopting mixes obtains new material and improve film performance, and these all are to prepare the method that film generally uses at present.In order to obtain active gases, what have takes microwave excitation, as document (1) C.Niuetal., Science Vol.261,334 (1993). the employing ozone generator that has, as document (2) T.Terashima et al., Phys.Rev.Lett.Vol.65,2684 (1990). the employing ion beam source that has, as document (3) X.D.Wuet al., Appl.Phys.Lett.Vol.65,1961 (1994). these activated gas methods are not only installed and the complicated cost height of equipment, and owing to decomposition in the pipeline transmission and reason such as compound, the activated gas that generally arrives in the vacuum chamber only is 5%～13%, and its effect is also desirable not enough.In order to mix, the development trend of membrane equipment is that different film-forming methods and equipment are combined, and makes membrane equipment more sophisticated and huge.In a word, no matter activated gas or doping mostly all needs special equipment or special device, not only spend many costs height, and because the system complex operation also is very inconvenient.
The purpose of this utility model is to overcome the shortcoming of above-mentioned prior art and method, but provide a kind of simple in structure, can conveniently be used for the membrane equipment not only activated gas but also the multipurpose plasma torch that can mix simultaneously.
Task of the present utility model is finished like this:
The utility model utilizes the characteristic of gas corona discharge (or radio frequency discharge) and point discharge, makes by insulated tube, 2 the two discharge of tandem multipurpose plasma torch that electrode, protection current-limiting resistance, power supply and flange are formed.Insulated tube is the ingress pipe of working gas simultaneously, and insulated tube can be used insulating material such as quartz, glass, aluminium oxide or pottery.Insulated tube is made front end 1-10 conical nozzle, also can make bending on demand, purpose be make nozzle towards with near the service area, make activated gas and alloy directly arrive substrate.With metal flange insulated tube is had the nozzle end sealing and fixing in vacuum chamber, sealed attachment between insulated tube and the flange, can adopt rubber, fluorubber sealing maybe can cut down different ways such as burning envelope by the different requirements of low vacuum, high vacuum and the ultra high vacuum of making the film vacuum chamber.Adopt rubber, fluorubber or metal " O " ring sealed attachment between flange and the vacuum chamber.Current-limiting resistance connects with the electrode leads to client at insulated tube center and the high-voltage output end of power supply, and the outer electrode of insulated tube can directly pass through flange ground connection.
Fig. 1 is the utility model structural representation.
Drawing is described as follows:
1-look edge pipe; 2-electrode (tubular); 3-electrode (column); The 4-current-limiting resistance;
The 5-power supply; The 6-flange; The 7-air inlet
According to the size of the operating air pressure of vacuum system film decision insulated tube (1) front end nozzle, control the air pressure of insulated tube (1) lining by the control ventilation flow rate.The hundreds of torr that the air pressure of insulated tube (1) lining is maintained be easy to generate corona discharge (or radio frequency discharge) is to several torrs.This moment is when the output voltage values of power supply (5) rises to certain voltage, between electrode (2) and electrode (3), will produce uniform corona discharge (or radio frequency discharge), simultaneously general vacuum chamber outer wall all is metal material and ground connection, electrode (3) connects high potential, and electrode (3) will produce point discharge to vacuum chamber.
Be described further below in conjunction with three main applications:
1. activated gas
If the plasma torch that the utility model is provided is used for activated gas, electrode (3) is just selected for use and the not responsive conductor material of working gas.As working gas is oxygen, but aluminium or platinum are done electrode (3), because platinum is difficult for oxidation, and can form stable aluminum oxide film on the surface after the aluminaization.Point discharge when oxygen flow is crossed the corona discharge of electrode (2) and electrode (3) and electrode (3) and vacuum chamber just produces active ozone of chemical property and elemental oxygen, and break-evenly directly sprays into the service area, so activation efficiency is very high.
2. mix
If the plasma torch that the utility model is provided is made doped source and is used, and dopant material is a conductor.Electrode (3) is just made of being doped material.Specifically, as want to mix copper in film, electrode (3) is just done with copper.Working gas can be used argon gas.The ion argon that this moment, corona discharge produced will clash into and sputter copper, and is carried the into substrate of also arrival system of service area film by air-flow simultaneously.If the doped source material is gas phase, can directly feed or mix contain argon, helium gas feeds insulated tube (1), decomposed by electric field or activate directly arrival substrate of back.
3. activated gas and doping and usefulness
Some work promptly needs activated gas need mix again.At this moment, the plasma torch that provides of the utility model can activated gas and doping and usefulness.As want in yttrium barium copper oxide superconducting film, to mix silver to improve the current density of film, in this situation, except the required active oxygen of preparation superconducting oxide film, also to mix impurity silver, thereby can select for use filamentary silver to do electrode (3), working gas uses the mist of pure oxygen or oxygen and argon, just can be arrived substrate simultaneously by the oxygen of the silver of sputter and activation.
In sum, the plasma torch that the utility model provides not only can activated gas, doping, can also activated gas and doping and usefulness, so plasma torch provided by the utility model is a kind of multipurpose plasma torch that is used for membrane equipment.
Advantage of the present utility model is:
If the plasma torch that the utility model is provided is used for producing activation oxygen, in vacuum chamber, can obtain concentration greater than 20% ozone.If the plasma torch that the utility model is provided is used for mixing, along with the increase of electric field strength, be doped thing electrode (3) is increased by the speed of sputter thereupon, and working gas is if use the mist or the argon of argon, sputtering rate is just bigger, thereby scalable and controlled doping concentration.
Second: if the nozzle of insulated tube (1) front end is made tens microns aperture, under the condition that satisfies insulated tube (1) lining gas corona discharge (or radio frequency discharge) air pressure, can produce the draught head of six, seven orders of magnitude in insulated tube (1) inside and outside, therefore multipurpose plasma torch provided by the utility model, the multiple system film system that can be used for that different film-forming methods and different vacuum degrees require.Not only can be used for membrane equipments such as the laser deposition of operating air pressure from the hundreds of torr to several torrs, chemical deposition, also can be used for operating air pressure only is 10
-5～10
-7High-accuracy vacuum system film such as the molecular beam epitaxy (MBE) of the prepared atomic scale control of torr and laser molecular beam epitaxy (LMBE) system.
When the preparation large area film, distribute and doping in order to obtain uniform airflow, can adopt several nozzle parallel connections, also can be with several plasma torch parallel connections.In order to increase discharge power, also electrode (2) can be made interlayer water collar shape, and the water flowing cooling, further improve activated gas density and doping content.
Fig. 2 is the multiinjector structural representation.
Below in conjunction with drawings and Examples the utility model is described in detail:
Embodiment 1
Press accompanying drawing 1 and make an activated gas plasma torch device.
Quartz ampoule with external diameter φ 5mm wall thickness 0.5mm is fired into insulated tube (1), after drawing, insulated tube (1) front end burning grinds the nozzle of the about φ 0.5mm of latus rectum, the corrosion resistant plate of the thick 0.1mm of wide 100mm is made electrode (2) at insulated tube (1) apart from nozzle 10mm place bag two circles, and electrode (2) and ground connection flange (6) are joined with lead.Do electrode (3) with the carbon-point of φ 1mm, power supply (5) is selected output 7500V, the self-control AC transformer of 200mA for use.The output one end ground connection of transformer, the other end and resistance (4) link.Select for use the wire resistor of 100W50K Ω to do protection current-limiting resistance (4), it is connected on the high-voltage output end of electrode (3) and transformer.Encircle insulated tube (1) sealed attachment on the flange (6) of CF35 with fluorubber " O ".Selecting nitrogen for use is working gas, makes to be used for the laser membrane equipment, prepares the plasma active spray gun of superhard carbon nitrogen film.
Embodiment 2
Make an activated gas plasma torch device.
Do by embodiment 1, insulated tube (1) front end nozzle is about φ 0.05mm, does electrode (3) with the platinum wire of φ 0.5mm, through cutting down transition insulated tube (1) burning is enclosed on the flange (6) of CF35, makes the activated gas plasma torch that is used for molecular beam epitaxy.
Embodiment 3
Make a doping plasma torch device.
Do by embodiment 1, do electrode (3) with copper wire, select power 500W for use, frequency is that the radio-frequency power supply of 13.6M is done power supply (5).Selecting argon for use is working gas, makes the doping plasma torch of mixing copper.
Embodiment 4
Make the plasma torch of an activated gas and doping and usefulness.
Do by embodiment 1, the front nozzle of insulated tube (1) is φ 1mm, select for use the filamentary silver of φ 1mm to do electrode (3), selecting power 500W, frequency for use is that the radio-frequency power supply of 13.6M is done power supply (5), make and be used for the laser membrane equipment, preparation YBCO superconducting thin film also mixes the activated gas of impurity silver and the plasma torch of doping and usefulness in ybco film.
Embodiment 5
Make four nozzle plasma torch as shown in Figure 2.
With external diameter φ 10mm, the glass tube of wall thickness 0.5mm is fired insulated tube (1), fires four external diameter φ 5mm wall thickness 0.5mm at insulated tube (1) front end, the nozzle of latus rectum 0.05mm, and four nozzles are parallel to each other, and being distributed in the length of side is foursquare four drift angles of 40mm.Do electrode (3) with the aluminium bar of external diameter φ 7mm, electrode (3) stretches to the aluminium wire of the part of four nozzles with external diameter φ 1mm.Do 2 on the open-ended ring of the long 2mm middle opening of external diameter φ 9mm internal diameter φ 7mm 1mm with polytetrafluoroethylene, be enclosed within the centre of electrode (3) and insulated tube, fixed electrode (3), opening part is used for ventilation.Power supply (5) is selected power 800W for use, and frequency is the radio-frequency power supply of 5.6M, makes the active-oxygen plasma spray gun that is used for the laser membrane equipment.
Embodiment 6
Make a high power plasma spray gun device.
Do by embodiment 4, make internal diameter φ 5mm (joining), the intermediate water cold mould electrode (2) of external diameter φ 10mm with insulated tube (1) is sliding with stainless steel.
Claims (3)
1. one kind is used for the doping of vacuum membrane equipment and the multipurpose plasma torch of activated gas, comprises insulated tube (1), electrode (2), (3), current-limiting resistance (4), power supply (5) and ring flange (6).Insulated tube (1) front end is made 1-10 conical nozzle, and in vacuum chamber, stay outside the vacuum chamber by the air inlet (7) of insulated tube (1), the exit of electrode (3) and current-limiting resistance (4) insulated tube (1) sealing and fixing for usefulness flange (6).Electrode (2) links with the ground end, and current-limiting resistance (4) links with the high-pressure side of electrode (3) and power supply (5).It is characterized in that: electrode (3) is to be contained in the insulated tube (1), and electrode (2) is coated on outside the insulated tube (1), is separated by insulated tube (1) between electrode (2) and the electrode (3).
2. by the described multipurpose plasma torch that is used for the vacuum membrane equipment of claim 1, it is characterized in that: also comprise cylinder electrode (2) is made an interlayer water collar type.
3. by the described multipurpose plasma torch that is used for the vacuum membrane equipment of claim 1, it is characterized in that: described power supply comprises AC power and radio-frequency power supply.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 96219045 CN2270341Y (en) | 1996-09-16 | 1996-09-16 | Multipurpose plasma torch for film making equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 96219045 CN2270341Y (en) | 1996-09-16 | 1996-09-16 | Multipurpose plasma torch for film making equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2270341Y true CN2270341Y (en) | 1997-12-10 |
Family
ID=33899738
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 96219045 Expired - Lifetime CN2270341Y (en) | 1996-09-16 | 1996-09-16 | Multipurpose plasma torch for film making equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN2270341Y (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102320409A (en) * | 2011-06-20 | 2012-01-18 | 上海万宏印刷有限公司 | Processing method for laminated paper bag |
| CN102828172A (en) * | 2012-09-18 | 2012-12-19 | 大连交通大学 | Method for preparing SiO2 thin film by using plasma enhanced chemical vapor deposition (PECVD) method |
| CN106148913A (en) * | 2015-01-15 | 2016-11-23 | 黄辉 | The chemical vapor deposition unit of a kind of semi-conducting material and method thereof |
-
1996
- 1996-09-16 CN CN 96219045 patent/CN2270341Y/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102320409A (en) * | 2011-06-20 | 2012-01-18 | 上海万宏印刷有限公司 | Processing method for laminated paper bag |
| CN102828172A (en) * | 2012-09-18 | 2012-12-19 | 大连交通大学 | Method for preparing SiO2 thin film by using plasma enhanced chemical vapor deposition (PECVD) method |
| CN106148913A (en) * | 2015-01-15 | 2016-11-23 | 黄辉 | The chemical vapor deposition unit of a kind of semi-conducting material and method thereof |
| CN106148913B (en) * | 2015-01-15 | 2018-10-23 | 黄辉 | A kind of chemical vapor deposition unit and its method of semi-conducting material |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CX01 | Expiry of patent term |