CN220984543U

CN220984543U - Source supplementing device and semiconductor process equipment

Info

Publication number: CN220984543U
Application number: CN202322592954.3U
Authority: CN
Inventors: 李苗苗; 李建国; 刘岩
Original assignee: Beijing Naura Microelectronics Equipment Co Ltd
Current assignee: Beijing Naura Microelectronics Equipment Co Ltd
Priority date: 2023-09-22
Filing date: 2023-09-22
Publication date: 2024-05-17
Anticipated expiration: 2033-09-22

Abstract

The utility model provides a source supplementing device and semiconductor process equipment, which relate to the technical field of semiconductors and comprise the following components: the device comprises a first container and a second container, wherein an inlet of the first container is connected with a first gas conveying pipeline, the first gas conveying pipeline is used for inputting gas into the first container, a first opening and closing component is arranged on the first gas conveying pipeline, an outlet of the first container is connected with an inlet of the second container through a first supplementing source pipeline, a second opening and closing component is arranged on the first supplementing source pipeline, an outlet of the second container is connected with a second supplementing source pipeline, the second supplementing source pipeline is used for being connected with a supplementing source port of a source container, and a third opening and closing component is arranged on the second supplementing source pipeline; a second gas delivery line for delivering gas into the second container; the problem of among the prior art process source's source bottle changes frequently, influences process run time is solved.

Description

Source supplementing device and semiconductor process equipment

Technical Field

The utility model belongs to the technical field of semiconductors, and particularly relates to a source supplementing device and semiconductor process equipment.

Background

With the continuous development of the photovoltaic industry, the process route of the emitter back passivation battery (PASSIVATED EMITTER AND REAR CELL, PERC) which currently occupies the main market is subjected to great impact of the process route of the tunneling oxide passivation contact solar battery (Tunnel Oxide Passivated Contact solar cell, TOPcon) and the heterojunction battery (Hereto-junction WITH INTRINSIC THIN-layer). At present, quality improvement and efficiency enhancement become the key points for the reformation in the later period of the PERC process route. In the quality improvement and efficiency improvement method, reducing the maintenance time of equipment, reducing the downtime of the equipment and reducing the downtime frequency of the equipment become one of important means for improving the productivity of the equipment and reducing the production cost.

In the maintenance step of semiconductor diffusion equipment, replacement of the phosphorus oxychloride (POCl ₃) liquid source required for the diffusion process is one of the most labor intensive steps. Currently, once the liquid source of phosphorus oxychloride required for the process is exhausted, the process needs to be shut down for source bottle replacement, severely affecting the run time of the process. The phosphorus oxychloride is used as colorless transparent fuming liquid, has the characteristics of easy volatilization, easy hydrolysis into phosphoric acid and hydrochloric acid in humid air and the like, and has a certain danger when the process source is replaced.

Disclosure of utility model

The utility model aims to overcome the defects in the prior art, provides a source supplementing device and semiconductor process equipment, and solves the problems that a source bottle of a process source is frequently replaced and the process operation time is influenced in the prior art.

In order to achieve the above object, the present utility model provides a source replenishing device for replenishing a source liquid to a source container of a semiconductor processing apparatus, comprising:

The device comprises a first container and a second container, wherein the first container and the second container are used for containing source liquid, an inlet of the first container is connected with a first gas conveying pipeline, the first gas conveying pipeline is used for inputting gas into the first container, a first opening and closing component is arranged on the first gas conveying pipeline, an outlet of the first container is connected with an inlet of the second container through a first source supplementing pipeline, a second opening and closing component is arranged on the first source supplementing pipeline, an outlet of the second container is connected with a second source supplementing pipeline, the second source supplementing pipeline is used for being connected with a source supplementing port of the source container, and a third opening and closing component is arranged on the second source supplementing pipeline;

and the second gas conveying pipeline is used for conveying gas into the second container.

Optionally, the source supplementing device further includes a first purge pipe and a second purge pipe, one end of the first purge pipe is connected with a gas supply source, the other end of the first purge pipe is connected with the first source supplementing pipe and is used for purging at least part of the first source supplementing pipe, one end of the second purge pipe is connected with the gas supply source, and the other end of the second purge pipe is connected with the second source supplementing pipe and is used for purging at least part of the second source supplementing pipe.

Optionally, a first check valve is disposed on the first gas delivery pipeline, a second check valve and a third check valve are disposed on the first source supplementing pipeline, the second check valve is disposed at an upstream of a connection position of the first purge pipeline and the first source supplementing pipeline, the third check valve is disposed at a downstream of a connection position of the first purge pipeline and the first source supplementing pipeline, a fourth check valve is disposed on the second source supplementing pipeline, and the fourth check valve is disposed at an upstream of a connection position of the second purge pipeline and the second source supplementing pipeline.

Optionally, the first gas delivery pipeline is used for being connected with a gas supply source, and one end of the first gas delivery pipeline, which is close to the gas supply source, is sequentially provided with a fourth closing component and a pressure control component along the gas delivery direction.

Optionally, a fifth opening and closing component is disposed at one end of the first gas conveying pipeline, which is close to the first container, a sixth opening and closing component is disposed at one end of the first source supplementing pipeline, which is close to the first container, a seventh opening and closing component is disposed at one end of the first source supplementing pipeline, which is close to the second container, an eighth opening and closing component is disposed at one end of the second source supplementing pipeline, which is close to the second container, and a ninth opening and closing component is disposed at one end of the second source supplementing pipeline, which is close to the source container.

Optionally, the second gas delivery pipeline is connected with the first gas delivery pipeline, and a tenth opening and closing component is arranged on the second gas delivery pipeline.

Optionally, the first purging pipeline and the second purging pipeline are both connected with the first gas conveying pipeline, and an eleventh opening and closing component and a twelfth opening and closing component are respectively arranged on the first purging pipeline and the second purging pipeline.

Optionally, the first container and the second container are provided with a first liquid level measuring part and a second liquid level measuring part, respectively, and the first container and the second container are provided with a first pressure measuring part and a second pressure measuring part, respectively.

The utility model also provides a semiconductor process device comprising:

A process chamber;

A source container for storing a process source delivered to the process chamber;

in the source supplementing device, the second source supplementing pipeline of the source supplementing device is connected with the source supplementing port of the source container.

Optionally, a plurality of process chambers are provided, each process chamber is provided with at least one source container, and the second source supplementing pipeline is respectively connected with a plurality of source containers through a plurality of branch pipelines so as to supplement source liquid for a plurality of process chambers.

The utility model provides a source supplementing device and semiconductor process equipment, which have the beneficial effects that: the source supplementing device is provided with a first container and a second container, the first container and the second container can be used for containing source liquid, gas is conveyed into the second container through a second gas conveying pipeline, the gas can drive the source liquid in the second container to enter the source container so as to supplement the source liquid in the source container, the first container can supplement the source liquid into the second container under the drive action of the gas conveyed by the first gas conveying pipeline, and thus when the first container is detached to fill the source liquid or replace the first container, the second container can still realize source supplementing of the source container within a set period of time, the source liquid in the source container can continuously meet the requirement of the semiconductor diffusion process, the non-stop of semiconductor process equipment is realized, and the productivity is greatly improved.

Additional features and advantages of the utility model will be set forth in the detailed description which follows.

Drawings

The foregoing and other objects, features and advantages of the utility model will be apparent from the following more particular descriptions of exemplary embodiments of the utility model as illustrated in the accompanying drawings wherein like reference numbers generally represent like parts throughout the exemplary embodiments of the utility model.

Fig. 1 shows a schematic diagram of the working principle of a source container according to the prior art.

Fig. 2 shows a schematic structural diagram of a source supplementing device according to an embodiment of the present utility model.

Fig. 3 shows a schematic structural view of a semiconductor processing apparatus according to an embodiment of the present utility model.

Reference numerals illustrate:

1. A source container; 2. a first hand valve; 3. a second hand valve; 4. a first pneumatic valve; 5. a second pneumatic valve; 6. a plant air source; 7. a process chamber; 8. a first container; 9. a second container; 10. a first gas delivery line; 11. a first opening/closing member; 12. a first source supplementing pipeline; 13. a second opening/closing member; 14. a second source supplementing pipeline; 15. a third opening/closing member; 16. a second gas delivery line; 17. a first purge line; 18. a second purge line; 19. a first one-way valve; 20. a second one-way valve; 21. a third one-way valve; 22. a fourth one-way valve; 23. a fourth closing part; 24. a pressure control part; 25. a fifth opening/closing member; 26. a sixth opening/closing member; 27. a seventh opening/closing member; 28. an eighth opening/closing member; 29. a ninth opening/closing member; 30. a tenth opening/closing member; 31. an eleventh opening/closing member; 32. a twelfth opening/closing member; 33. a first liquid level measurement component; 34. a second liquid level measuring part; 35. a first pressure measurement component; 36. a second pressure measurement component.

Detailed Description

Preferred embodiments of the present utility model will be described in more detail below. While the preferred embodiments of the present utility model are described below, it should be understood that the present utility model may be embodied in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the utility model to those skilled in the art.

As shown in fig. 1, the conventional source container 1, i.e., a process source bottle, is made of quartz, and has a volume of only 5L, a service period of one bottle of source liquid is less than half a month, and frequent replacement of the process source bottle has a great influence on the productivity of semiconductor diffusion equipment. POCl ₃ liquid source among the prior art fills in the technology source bottle, and first hand valve 2 and second hand valve 3 are the open and close valve of technology source bottle for avoid first pneumatic valve 4 and second pneumatic valve 5 to cause source liquid leakage when inefficacy and avoid remaining source liquid leakage when changing the technology source bottle, first pneumatic valve 4 control the switching of the pipeline of letting in the technology source bottle in nitrogen gas, second pneumatic valve 5 control the break-make of letting in the pipeline of technology cavity 7, and the check valve plays the effect of forming the unidirectional passageway, allows nitrogen gas to get into in the technology source bottle, and the source liquid in the technology source bottle can't reverse get into in the factory's gas source 6. During operation, the first hand valve 2 and the second hand valve 3 are opened, the first pneumatic valve 4 and the second pneumatic valve 5 are opened, nitrogen is introduced into the process source bottle, the source liquid is swelled into small bubbles, and then the small bubbles are introduced into the process chamber 7 through the second pneumatic valve 5 for diffusion process. After the source liquid is used up, the second pneumatic valve 5 and the first pneumatic valve 4 are required to be closed in sequence, the second hand valve 3 and the first hand valve 2 above the process source bottle are manually closed, and then the process liquid bottle is replaced manually. In the process of replacing the process source bottle, the machine needs to be stopped, the running time of the equipment is seriously influenced, and the productivity of the equipment is reduced.

As shown in fig. 2, to solve the above-mentioned problems, the present utility model provides a source replenishing device for replenishing a source liquid to a source container 1 of a semiconductor processing apparatus, comprising:

The device comprises a first container 8 and a second container 9, wherein the first container 8 and the second container 9 are used for containing source liquid, the inlet of the first container 8 is connected with a first gas conveying pipeline 10, the first gas conveying pipeline 10 is used for inputting gas into the first container 8, a first opening and closing component 11 is arranged on the first gas conveying pipeline 10, the outlet of the first container 8 is connected with the inlet of the second container 9 through a first source supplementing pipeline 12, a second opening and closing component 13 is arranged on the first source supplementing pipeline 12, the outlet of the second container 9 is connected with a second source supplementing pipeline 14, the second source supplementing pipeline 14 is used for being connected with a source supplementing port of the source container 1, and a third opening and closing component 15 is arranged on the second source supplementing pipeline 14;

A second gas delivery line 16, the second gas delivery line 16 being for delivering gas into the second container 9.

Specifically, the source supplementing device is provided with a first container 8 and a second container 9, the first container 8 and the second container 9 can be used for containing source liquid, gas is conveyed into the second container 9 through a second gas conveying pipeline 16, the gas can replace the source liquid in the second container 9 to enter the source container 1, the source liquid in the source container 1 is supplemented, the first container 8 can supplement the source liquid into the second container 9 under the displacement action of the gas conveyed by the first gas conveying pipeline 10, and thus when the first container 8 is detached to fill the source liquid or replace the first container 8, the second container 9 can still be used for supplementing the source container 1 for a set period of time, the source liquid in the source container 1 can continuously meet the running of a semiconductor diffusion process, the production capacity of semiconductor process equipment is greatly improved.

Further, the first gas delivery pipeline 10 and the second gas delivery pipeline 16 can be connected to a gas supply source, or the second gas delivery pipeline 16 can be connected to the first gas delivery pipeline 10, so that gas transmission is realized; the gas supply source can supply a pressure gas, and the gas is introduced into the first container 8 and the second container 9 to displace the source liquid in the first container 8 and the second container 9.

In the present embodiment, the volume of the first container 8 is larger than the volume of the second container 9, and the volume of the second container 9 is larger than the volume of the source container 1; the second source supplementing pipeline 14 is connected with the source containers 1 through a plurality of branch pipelines to realize source supplementing of the source containers 1.

Specifically, taking the volume of each source container 1 as an example, the volume of the first container 8 is 100L, the volume of the second container 9 is 50L, and the second container 9 can satisfy 2 times of filling of 5 source containers 1; the source supplementing device is extremely high in compatibility in use, and under the working conditions of a plurality of process chambers 7, the use requirements can be met by increasing the number of branch pipelines.

In this embodiment, the first container 8 and the second container 9 are both metal containers, such as stainless steel cylinders or stainless steel cans.

Specifically, compared with the source container 1 made of quartz, the first container 8 and the second container 9 are higher in material strength, not easy to damage in the replacement process, and safer to replace; in addition, the arrangement of the first container 8 and the second container 9 ensures that the whole process system does not need to replace the source container 1 made of quartz material and only needs to replace the first container 8, thereby avoiding the risks of breakage and explosion caused by replacing the source container 1 made of quartz material, improving the safety of the whole process system and effectively prolonging the service life of the source container 1.

In the present embodiment, the first opening and closing member 11, the second opening and closing member 13, and the third opening and closing member 15 are all pneumatic valves.

Optionally, the source supplementing device further includes a first purge line 17 and a second purge line 18, one end of the first purge line 17 is connected to the gas supply source, the other end of the first purge line 17 is connected to the first source supplementing line 12 and is used for purging at least part of the first source supplementing line 12, one end of the second purge line 18 is connected to the gas supply source, and the other end of the second purge line 18 is connected to the second source supplementing line 14 and is used for purging at least part of the second source supplementing line 14.

Specifically, the first purging pipeline 17 and the second purging pipeline 18 are both connected with a gas supply source, and through gas input, the gas is utilized to purge the second source supplementing pipeline 14 downstream of the connection point of the first purging pipeline 17 and the connection point of the second purging pipeline 18 respectively, so that the source liquid in the first source supplementing pipeline 12 and the second source supplementing pipeline 14 can be effectively prevented from being remained, the blockage and crystallization risk of the residual source liquid on the pipeline are avoided, and the reliability of the whole process system is improved.

In this embodiment, the gas supply source is a factory gas source 6 for supplying high pressure nitrogen.

Optionally, a first check valve 19 is disposed on the first gas delivery pipeline 10, a second check valve 20 and a third check valve 21 are disposed on the first source supplementing pipeline 12, the second check valve 20 is disposed upstream of a connection position of the first purge pipeline 17 and the first source supplementing pipeline 12, the third check valve 21 is disposed downstream of a connection position of the first purge pipeline 17 and the first source supplementing pipeline 12, a fourth check valve 22 is disposed on the second source supplementing pipeline 14, and the fourth check valve 22 is disposed upstream of a connection position of the second purge pipeline 18 and the second source supplementing pipeline 14.

Specifically, the first check valve 19 and the second check valve 20 are respectively close to the inlet of the first container 8 and the outlet of the first container 8, and the third check valve 21 and the fourth check valve 22 are respectively close to the inlet of the second container 9 and the outlet of the second container 9, so that backflow of gas and source liquid can be effectively avoided; meanwhile, when purging is performed through the first purging pipeline 17, the second one-way valve 20 can effectively prevent purge gas from flowing into the first container 8, and when purging is performed through the second purging pipeline 18, the third one-way valve 21 can effectively prevent purge gas from flowing into the second container 9.

Alternatively, the first gas delivery pipe 10 is used for being connected with a gas supply source, and one end of the first gas delivery pipe 10 near the gas supply source is provided with a fourth closing part 23 and a pressure control part 24 in sequence along the gas delivery direction.

Specifically, the first gas delivery line 10 is used for delivering gas supplied from a gas supply source, the gas is controlled to be input into the source supplementing device by the fourth closing part 23, and the pressure control part 24 is used for controlling the input pressure of the gas.

In the present embodiment, the gas supply source supplies nitrogen gas, the pressure control part 24 is a pressure reducing valve, and the fourth closing part 23 is a total switch of nitrogen gas input control, and the pressure reducing valve is capable of controlling the pressure of the nitrogen gas entering the source supplementing device.

In the present embodiment, the fourth closing part 23 is a hand valve.

Optionally, a fifth opening and closing part 25 is arranged at one end of the first gas conveying pipeline 10 close to the first container 8, a sixth opening and closing part 26 is arranged at one end of the first supplementing source pipeline 12 close to the first container 8, a seventh opening and closing part 27 is arranged at one end of the first supplementing source pipeline 12 close to the second container 9, an eighth opening and closing part 28 is arranged at one end of the second supplementing source pipeline 14 close to the second container 9, and a ninth opening and closing part 29 is arranged at one end of the second supplementing source pipeline 14 close to the source container 1.

Specifically, the fifth opening and closing member 25 and the sixth opening and closing member 26 are respectively located at the inlet of the first container 8 and the outlet of the first container 8, the seventh opening and closing member 27 and the eighth opening and closing member 28 are respectively located at the inlet of the second container 9 and the outlet of the second container 9, and when the first container 8 needs to be replaced, the ends, close to the first gas conveying pipeline 10 and the first supplementing source pipeline 12, of the first container 8 can be conveniently closed, the first container 8 is conveniently replaced, and similarly, the arrangement of the seventh opening and closing member 27 and the eighth opening and closing member 28 can be conveniently replaced the second container 9; the ninth opening/closing member 29 is close to the source port of the source container 1, and when the ninth opening/closing member 29 is closed, the outflow of the gas or the source liquid can be prevented, and the leakage of the gas or the source liquid when the source container 1 is detached can be prevented.

In the present embodiment, the fifth opening and closing member 25, the sixth opening and closing member 26, the seventh opening and closing member 27, and the eighth opening and closing member 28 are all hand valves.

Optionally, the second gas delivery line 16 is connected to the first gas delivery line 10, and a tenth opening and closing member 30 is provided on the second gas delivery line 16.

Specifically, the second gas delivery pipe 16 is connected to the first gas delivery pipe 10, and the first gas delivery pipe 10 is used to uniformly take gas from the gas supply source, and the fourth switching element 23 is used to uniformly control the input of gas into the source supplementing device, and the tenth switching element 30 is used to control the on-off of the second gas delivery pipe 16.

In the present embodiment, the tenth opening and closing member 30 is a pneumatic valve.

Alternatively, the first purge line 17 and the second purge line 18 are connected to the first gas delivery line 10, and an eleventh opening and closing member 31 and a twelfth opening and closing member 32 are provided on the first purge line 17 and the second purge line 18, respectively.

Specifically, the first purge line 17 and the second purge line 18 are both connected to the first gas delivery line 10, and the first gas delivery line 10 is used to uniformly take gas from the gas supply source, and it is convenient to uniformly control the input of gas into the source supplementing device through a fourth opening and closing member 23, and the eleventh opening and closing member 31 and the twelfth opening and closing member 32 are respectively used to control the on-off of the first purge line 17 and the second purge line 18.

In the present embodiment, the eleventh opening-closing member 31 and the twelfth opening-closing member 32 are both pneumatic valves.

Optionally, the first and second containers 8, 9 are provided with a first and a second level measuring part 33, 34, respectively.

Specifically, the first liquid level measuring part 33 and the second liquid level measuring part 34 are respectively used for detecting the liquid level in the first container 8 and the second container 9, when the liquid level in the first container 8 is lower than the first set liquid level, the first container 8 can be replaced or the first container 8 can be disassembled to supplement the source liquid, when the liquid level in the second container 9 is lower than the second set liquid level, the source liquid can be supplemented into the second container 9 through the first container 8, and when the liquid level in the second container 9 reaches the third set liquid level, the supplement of the source liquid from the first container 8 to the second container 9 is stopped.

In the present embodiment, the first liquid level measuring part 33 and the second liquid level measuring part 34 are a first liquid level sensor and a second liquid level sensor, respectively, one of the first liquid level sensors is a low liquid level sensor, and two of the second liquid level sensors are a low liquid level sensor and a high liquid level sensor in sequence from bottom to top.

Specifically, the liquid level alarm value of the high liquid level sensor in the second container 9 is 50L; when the liquid level alarm value of the low liquid level sensor in the second container 9 is 10L and the low liquid level sensor in the second container 9 sends out an alarm signal, the situation that the source liquid in the second container 9 is insufficient can be judged, the source is needed to be supplemented, and the source can be supplemented to the second container 9 through the first container 8; when the source liquid is supplemented to 50L, a high liquid level sensor in the second container 9 alarms, and the source liquid in the second container 9 is judged to be sufficient at the moment, and the source liquid is stopped being filled into the second container 9; the alarm value of the low liquid level sensor of the second container 9 is set to 10L instead of 0L, which is because the source liquid filled in 2 source containers 1 is ensured to be stored in the second container 9 at any time, and the simultaneous source shortage in the second container 9 and the source containers 1 is avoided, so that the equipment is stopped.

Alternatively, the first and second containers 8 and 9 are provided with first and second pressure measuring parts 35 and 36, respectively.

Specifically, the second container 9 is provided with a second pressure measuring component 36, when the pressure in the second container 9 exceeds 80% of the allowable working pressure, an alarm is given, and at the moment, the second gas conveying pipeline 16 can be closed, so that the continuous introduction of gas is avoided, and the pressure protection effect is achieved; the first container 8 is provided with a first pressure sensor, and the pressure alarm value of the first pressure sensor is set to be 80% of the allowable working pressure of the first container 8, so that the condition that the pressure in the first container 8 is overlarge due to the gas introduced into the first container 8 is avoided.

In the present embodiment, the first pressure measuring part 35 and the second pressure measuring part 36 are a first pressure gauge and a second pressure gauge, respectively.

As shown in fig. 3, the present utility model further provides a semiconductor process apparatus, including:

A process chamber 7;

A source container 1, the source container 1 for storing a process source delivered to a process chamber 7;

in the source replenishing device, the second source replenishing pipe 14 of the source replenishing device is connected to the source replenishing port of the source container 1.

Specifically, taking a semiconductor process device as an example of a semiconductor diffusion device, when the diffusion process is performed, phosphorus oxychloride needs to be input into the process chamber 7 as a source liquid, nitrogen can be introduced into the source container 1, and the source liquid in the source container 1 is swelled into small bubbles and then is input into the process chamber 7. The source replenishing device described above can replenish the source liquid in the source container 1.

Optionally, a plurality of process chambers 7 are provided, each process chamber 7 is provided with at least one source container 1, and the second source supplementing pipeline 14 is respectively connected with the plurality of source containers 1 through a plurality of branch pipelines so as to supplement the source liquid for the plurality of process chambers 7.

In this embodiment, the source liquid in the second container 9 is 50L, and may be filled with 2 times of source liquid for 5 source containers 1, and when in operation, the pressure reducing valve is adjusted to control the input pressure of the gas, the first gas conveying pipeline 10 is connected with the plant gas source 6, and the plant gas source 6 is used as a gas supply source to supply nitrogen. When a source liquid is required to be replenished in a certain source container 1, the seventh opening and closing member 27, the eighth opening and closing member 28, and the ninth opening and closing member 29 are opened, and then the fourth opening and closing member 23 and the third opening and closing member 15 are opened, and at this time, the source liquid in the second container 9 is pressed into the corresponding source container 1 through the eighth opening and closing member 28, the third check valve 21, the third opening and closing member 15, and the ninth opening and closing member 29 under the action of high-pressure nitrogen. When the source liquid in the source container 1 is filled, the third opening and closing member 15 is closed, the twelfth opening and closing member 32 and the ninth opening and closing member 29 are continuously opened, and nitrogen gas is introduced into the source container 1, and at this time, the nitrogen gas is used for blowing the source liquid remained in the second source supplementing pipeline 14 into the source container 1, so that a purging function is achieved. When the second pressure measuring part 36 detects that the pressure in the second container 9 exceeds 80% of the allowable working pressure, the fourth closing part 23 is closed, and high-pressure nitrogen is prevented from being continuously introduced; when the low liquid level sensor in the second container 9 sends out an alarm signal, the first opening and closing part 11 and the second opening and closing part 13 are opened, nitrogen is introduced into the first container 8 from the first opening and closing part 11, under the action of high pressure, the first check valve 19, the second check valve 20 and the third check valve 21 are opened, source liquid is introduced into the second container 9 through the second opening and closing part 13, source liquid is replenished to the second container 9, when the second container 9 is replenished with the source liquid, the first opening and closing part 11 is closed, and the first container 8 is not filled with the source liquid into the second container 9 any more. Thereafter, the eleventh opening/closing member 31 is opened, and the high-pressure nitrogen gas is purged through the eleventh opening/closing member 31 and the second opening/closing member 13 to purge the first source line 12, thereby preventing the source liquid from remaining in the first source line 12. The source supplementing device can be provided with a control unit, and can realize automatic source supplementing by controlling the first opening and closing component 11, the second opening and closing component 13, the third opening and closing component 15, the tenth opening and closing component 30, the eleventh opening and closing component 31 and the twelfth opening and closing component 32 through the control unit, and can replace the first container 8 under the condition of no shutdown, and can meet the use requirement of 1 source container 1 or a plurality of source containers 1 for one replacement, and can further increase 5 branch pipelines after the third opening and closing component 15 for the currently commonly adopted equipment of 6 process chambers 7, and simultaneously increase 5 ninth opening and closing components 29 and the source containers 1, so as to meet the use requirement. Under the action of the source supplementing device, the single source replacement can meet the requirement of using the whole machine (calculated according to the configuration of 6 source containers 1 in the current mainstream) for 4 times, and the single use time can be as long as 2 months; meanwhile, the second container 9 can ensure that the source liquid used by at least 2 source containers 1 is always reserved in the second container 9 when the first container 8 is replaced, so that the source containers 1 are not deficient.

The foregoing description of embodiments of the utility model has been presented for purposes of illustration and description, and is not intended to be exhaustive or limited to the embodiments disclosed. Many modifications and variations will be apparent to those of ordinary skill in the art without departing from the scope and spirit of the various embodiments described.

Claims

1. A source replenishment device for replenishing a source container of a semiconductor processing apparatus with a source liquid, comprising:

2. The source-replenishment device according to claim 1, further comprising a first purge line and a second purge line, wherein one end of the first purge line is connected to a gas supply, the other end of the first purge line is connected to the first source-replenishment line and is used for purging at least part of the first source-replenishment line, one end of the second purge line is connected to the gas supply, and the other end of the second purge line is connected to the second source-replenishment line and is used for purging at least part of the second source-replenishment line.

3. The source-filling device according to claim 2, wherein a first check valve is provided on the first gas delivery line, a second check valve and a third check valve are provided on the first source-filling line, the second check valve is provided upstream of a connection position of the first purge line and the first source-filling line, the third check valve is provided downstream of a connection position of the first purge line and the first source-filling line, a fourth check valve is provided on the second source-filling line, and the fourth check valve is provided upstream of a connection position of the second purge line and the second source-filling line.

4. The source supplementing device according to claim 1, wherein the first gas delivery pipe is used for being connected with a gas supply source, and a fourth closing component and a pressure control component are sequentially arranged at one end, close to the gas supply source, of the first gas delivery pipe along a gas delivery direction.

5. The source supplementing device according to claim 1, wherein a fifth opening and closing member is provided at an end of the first gas delivery line close to the first container, a sixth opening and closing member is provided at an end of the first source supplementing line close to the first container, a seventh opening and closing member is provided at an end of the first source supplementing line close to the second container, an eighth opening and closing member is provided at an end of the second source supplementing line close to the second container, and a ninth opening and closing member is provided at an end of the second source supplementing line close to the source container.

6. The source supplementing device according to claim 1, wherein the second gas delivery pipe is connected to the first gas delivery pipe, and a tenth opening/closing member is provided on the second gas delivery pipe.

7. The source replenishment device according to claim 2, wherein the first purge line and the second purge line are both connected to the first gas delivery line, and an eleventh opening/closing member and a twelfth opening/closing member are provided on the first purge line and the second purge line, respectively.

8. A source-filling device according to claim 1, wherein the first and second containers are provided with a first and second level measuring means, respectively, and wherein the first and second containers are provided with a first and second pressure measuring means, respectively.

9. A semiconductor processing apparatus, comprising:

A process chamber;

The refill device of any one of claims 1-8, wherein the second refill line of the refill device is connected to a refill port of the source container.

10. The semiconductor processing apparatus of claim 9, wherein a plurality of said process chambers are provided, each of said process chambers being provided with at least one of said source containers, said second source replenishment line being connected to a plurality of said source containers through a plurality of branch lines, respectively, to replenish a source liquid for a plurality of said process chambers.