CN220933226U - Micro-nano grating - Google Patents
Micro-nano grating Download PDFInfo
- Publication number
- CN220933226U CN220933226U CN202322501113.7U CN202322501113U CN220933226U CN 220933226 U CN220933226 U CN 220933226U CN 202322501113 U CN202322501113 U CN 202322501113U CN 220933226 U CN220933226 U CN 220933226U
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- China
- Prior art keywords
- layer
- micro
- photocatalytic
- silicon carbide
- nano grating
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- 239000010410 layer Substances 0.000 claims abstract description 68
- 230000001699 photocatalysis Effects 0.000 claims abstract description 52
- 229910010271 silicon carbide Inorganic materials 0.000 claims abstract description 30
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims abstract description 29
- 239000000758 substrate Substances 0.000 claims abstract description 28
- 239000011241 protective layer Substances 0.000 claims abstract description 24
- 239000012790 adhesive layer Substances 0.000 claims description 19
- 230000001681 protective effect Effects 0.000 claims description 18
- 238000005530 etching Methods 0.000 claims description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 9
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- 238000011049 filling Methods 0.000 claims description 3
- 239000003292 glue Substances 0.000 claims description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical group O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 3
- 239000000463 material Substances 0.000 abstract description 4
- 238000005516 engineering process Methods 0.000 description 9
- 239000000047 product Substances 0.000 description 9
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 238000000231 atomic layer deposition Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 229910052735 hafnium Inorganic materials 0.000 description 4
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- 238000000137 annealing Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 238000004026 adhesive bonding Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 238000007688 edging Methods 0.000 description 2
- 238000005554 pickling Methods 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- Catalysts (AREA)
Abstract
The utility model discloses a micro-nano grating which comprises a silicon carbide substrate, a photocatalytic layer and a protective layer. One side of the silicon carbide substrate has an etched structure. The photocatalytic layer is deposited on the silicon carbide substrate and fills the etched structure. The protective layer is deposited on the photocatalytic layer and used for protecting the photocatalytic layer. Compared with the prior art, the micro-nano grating structure and the material are reasonably selected, so that the rejection rate of the micro-nano grating is reduced, and the cost is saved.
Description
Technical Field
The utility model relates to the technical field of optical products, in particular to a micro-nano grating.
Background
The micro-nano grating is a nano-scale optical product and has great application value in the fields of laser processing, laser medical treatment, laser radar and the like. With the development and progress of semiconductor technology, the characteristic size of micro-nano gratings has gradually reached the nanometer level.
Because the optical product has strict requirements on appearance, the micro-nano grating is easy to discard due to various physical and chemical damages. Therefore, how to reduce the rejection rate of the micro-nano grating is a technical problem to be solved by the skilled person.
Disclosure of utility model
The utility model aims to provide a micro-nano grating, which reduces the rejection rate of the micro-nano grating, thereby saving the cost.
In order to achieve the above object, the present utility model provides the following solutions:
The utility model discloses a micro-nano grating, which comprises the following components:
a silicon carbide substrate, one side of which is provided with an etching structure;
A photocatalytic layer deposited on the silicon carbide substrate, the photocatalytic layer filling the etched structure;
And the protective layer is deposited on the photocatalytic layer and is used for protecting the photocatalytic layer.
Preferably, the micro-nano grating further comprises a front protective adhesive layer and a back protective adhesive layer; the front protection adhesive layer covers one side of the protection layer, which is away from the photocatalytic layer; the back protection adhesive layer covers one side of the silicon carbide substrate, which is away from the photocatalytic layer.
Preferably, the photocatalytic layer includes at least one element of zinc, titanium, hafnium to enhance the photocatalytic effect.
Preferably, the protective layer is an aluminum oxide layer or a silicon oxide layer.
Preferably, the protective layer is a multilayer.
The utility model also discloses a preparation method of the micro-nano grating, which comprises the following steps:
S1, performing gluing, exposure and development operations on a cleaned silicon carbide substrate to show patterns on a photoresist;
S2, etching one side of the silicon carbide base coated with the photoresist by using a plasma dry etching technology to form an etching structure on the silicon carbide base, wherein the etching structure is consistent with the pattern shape shown on the photoresist;
S3, depositing a photocatalytic layer on the silicon carbide substrate by using an atomic layer deposition technology, wherein the photocatalytic layer fills the etching structure;
s4, polishing the photocatalytic layer, and carrying out annealing treatment on the photocatalytic layer;
S5, plating a protective layer on the photocatalytic layer by using an atomic layer deposition technology and a plasma enhanced chemical vapor deposition technology.
Preferably, after step S5, further comprising:
S6, coating a front protective adhesive layer on one side of the protective layer, which is away from the photocatalytic layer, and coating a back protective adhesive layer on one side of the silicon carbide substrate, which is away from the photocatalytic layer.
Preferably, after step S6, further comprising:
S7, cutting and edging the product obtained in the step S6 according to the size requirement.
Preferably, in step S1 to step S5, wet pickling is performed between any two adjacent steps.
Preferably, the photocatalytic layer includes at least one element of zinc, titanium, hafnium to improve photocatalytic effect; the protective layer is an aluminum oxide layer or a silicon oxide layer.
Compared with the prior art, the utility model has the following technical effects:
according to the utility model, the structure and the material of the micro-nano grating are reasonably selected, so that the rejection rate of the micro-nano grating is reduced, and the cost is saved.
Drawings
In order to more clearly illustrate the embodiments of the present utility model or the technical solutions in the prior art, the drawings that are needed in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present utility model, and other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a partial schematic view of a cross-section of a silicon carbide substrate;
fig. 2 is a schematic cross-sectional view of a micro-nano grating according to an embodiment of the present utility model.
Reference numerals illustrate: a 1-silicon carbide substrate; 2-a photocatalytic layer; 3-a protective layer; 31-an alumina layer; a 32-silicon oxide layer; 4-a front protective adhesive layer; 5-a back protective adhesive layer.
Detailed Description
The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
The utility model aims to provide a micro-nano grating, which reduces the rejection rate of the micro-nano grating, thereby saving the cost.
In order that the above-recited objects, features and advantages of the present utility model will become more readily apparent, a more particular description of the utility model will be rendered by reference to specific embodiments thereof which are illustrated in the appended drawings.
Referring to fig. 1 and 2, the present embodiment provides a micro-nano grating, which includes a silicon carbide substrate 1, a photocatalytic layer 2, and a protective layer 3.
The silicon carbide is used as a substrate, so that the high-temperature and high-pressure grinding resistance is realized, and the light transmittance of the product can be enhanced. One side of the silicon carbide substrate 1 is provided with an etching structure, and the hole depths of the etching structure are consistent. The purpose of etching is to enable the silicon carbide substrate 1 to transmit light waves of different colors, avoiding light singleness. The photocatalytic layer 2 is deposited on the silicon carbide substrate 1, and the photocatalytic layer 2 fills the etched structure. A protective layer 3 is deposited on the photocatalytic layer 2, the protective layer 3 being used to protect the photocatalytic layer 2. The protective layer 3 can prevent the photocatalytic layer 2 from being scratched, prevent water vapor from entering the photocatalytic layer 2, and also can resist wet corrosion to reduce surface defects.
As a possible example, in this embodiment, the micro-nano grating further includes a front protective adhesive layer 4 and a back protective adhesive layer 5. The front protective adhesive layer 4 covers the side of the protective layer 3 facing away from the photocatalytic layer 2. The backside protection glue layer 5 covers the side of the silicon carbide substrate 1 facing away from the photocatalytic layer 2. The front protective adhesive layer 4 and the back protective adhesive layer 5 are used as temporary protective structures to prevent the micro-nano grating from being damaged in the transportation process. The user can tear off the front protective adhesive layer 4 and the back protective adhesive layer 5 when the micro-nano grating is needed.
As a possible example, in the present embodiment, the photocatalytic layer 2 includes at least one element of zinc, titanium, and hafnium to improve the photocatalytic effect, and avoid affecting the optical performance of the micro-nano grating due to poor catalytic effect.
As a possible example, in the present embodiment, the protective layer 3 includes two layers, that is, an alumina layer 31 and a silica layer 32, respectively, with the alumina layer 31 being located between the silica layer 32 and the photocatalytic layer 2. According to the actual needs, the person skilled in the art may also choose to set the protective layer 3 to one or more than three layers, or choose the protective layer 3 of other materials.
Referring to fig. 1, a silicon carbide substrate 1 in the present embodiment is a silicon carbide substrate 1 after polishing treatment, an upper portion in fig. 1 is a polished region, a lower portion is an unpolished region, and the polished region is located on a side of the silicon carbide substrate 1 close to a photocatalytic layer 2.
The embodiment also provides a preparation method of the micro-nano grating, which comprises the following steps:
S1, performing gluing, exposure and development operation on the cleaned silicon carbide substrate 1 to show patterns on the photoresist.
S2, etching the surface of the silicon carbide substrate 1 coated with the photoresist by using a plasma dry etching technology to form an etching structure on the silicon carbide substrate 1, wherein the etching structure is consistent with the pattern shape appearing on the photoresist.
And S3, depositing a photocatalytic layer 2 on the silicon carbide substrate 1 by using an atomic layer deposition technology, and filling the photocatalytic layer 2 in the etching structure. The photocatalytic layer 2 preferably includes at least one element of zinc, titanium, hafnium to enhance the photocatalytic effect.
And S4, polishing the photocatalytic layer 2, and annealing the photocatalytic layer 2. Polishing can make the surface of the photocatalytic layer 2 flatter and reduce diffuse scattering. Annealing may cause the crystal structure to become more ordered, allowing for more uniform transmission through the photocatalytic layer 2.
S5, plating a protective layer 3 on the photocatalytic layer 2 by using an atomic layer deposition technology and a plasma enhanced chemical vapor deposition technology. The protective layer 3 may be one or more layers, and for one of the protective layers 3, the material may be alumina or silica.
In order to avoid damage to the micro-nano grating during transportation, in this embodiment, after step S5, the method further includes:
s6, coating a front protective adhesive layer 4 on one side of the protective layer 3, which faces away from the photocatalytic layer 2, and coating a back protective adhesive layer 5 on one side of the silicon carbide substrate 1, which faces away from the photocatalytic layer 2.
In order to process the product into a suitable size, in this embodiment, after step S6, the method further includes:
S7, cutting and edging the product obtained in the step S6 according to the size requirement.
In order to remove particle points on the surface of the product and improve the reliability of the product, in the embodiment, wet pickling operation is performed between any two adjacent steps in the steps S1 to S5.
The micro-nano grating of this embodiment is the final product of the preparation method of the micro-nano grating.
The principles and embodiments of the present utility model have been described in this specification with reference to specific examples, the description of which is only for the purpose of aiding in understanding the method of the present utility model and its core ideas; also, it is within the scope of the present utility model to be modified by those of ordinary skill in the art in light of the present teachings. In view of the foregoing, this description should not be construed as limiting the utility model.
Claims (4)
1. A micro-nano grating, comprising:
a silicon carbide substrate, one side of which is provided with an etching structure;
A photocatalytic layer deposited on the silicon carbide substrate, the photocatalytic layer filling the etched structure;
And the protective layer is deposited on the photocatalytic layer and is used for protecting the photocatalytic layer.
2. The micro-nano grating of claim 1, further comprising a front side protective glue layer and a back side protective glue layer; the front protection adhesive layer covers one side of the protection layer, which is away from the photocatalytic layer; the back protection adhesive layer covers one side of the silicon carbide substrate, which is away from the photocatalytic layer.
3. The micro-nano grating of claim 1, wherein the protective layer is an aluminum oxide layer or a silicon oxide layer.
4. The micro-nano grating of claim 1, wherein the protective layer is a multilayer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322501113.7U CN220933226U (en) | 2023-09-14 | 2023-09-14 | Micro-nano grating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322501113.7U CN220933226U (en) | 2023-09-14 | 2023-09-14 | Micro-nano grating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN220933226U true CN220933226U (en) | 2024-05-10 |
Family
ID=90932965
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202322501113.7U Active CN220933226U (en) | 2023-09-14 | 2023-09-14 | Micro-nano grating |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN220933226U (en) |
-
2023
- 2023-09-14 CN CN202322501113.7U patent/CN220933226U/en active Active
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