CN220867517U - Ferric trichloride etching solution continuous on-line regeneration and utilization device - Google Patents
Ferric trichloride etching solution continuous on-line regeneration and utilization device Download PDFInfo
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- CN220867517U CN220867517U CN202322260878.6U CN202322260878U CN220867517U CN 220867517 U CN220867517 U CN 220867517U CN 202322260878 U CN202322260878 U CN 202322260878U CN 220867517 U CN220867517 U CN 220867517U
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- 238000005530 etching Methods 0.000 title claims abstract description 125
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 title claims abstract description 46
- 238000011069 regeneration method Methods 0.000 title claims description 18
- 230000008929 regeneration Effects 0.000 title claims description 17
- 239000007788 liquid Substances 0.000 claims abstract description 139
- 238000006243 chemical reaction Methods 0.000 claims abstract description 77
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims abstract description 54
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 33
- 238000003825 pressing Methods 0.000 claims abstract description 30
- 239000003054 catalyst Substances 0.000 claims abstract description 28
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 25
- 239000001301 oxygen Substances 0.000 claims abstract description 25
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 25
- 238000004064 recycling Methods 0.000 claims abstract description 24
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 23
- 229910052802 copper Inorganic materials 0.000 claims abstract description 20
- 239000010949 copper Substances 0.000 claims abstract description 20
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 claims abstract description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000000178 monomer Substances 0.000 claims description 33
- 238000001816 cooling Methods 0.000 claims description 30
- 239000007789 gas Substances 0.000 claims description 14
- 238000010438 heat treatment Methods 0.000 claims description 12
- 230000001590 oxidative effect Effects 0.000 claims description 7
- 229910052742 iron Inorganic materials 0.000 claims description 5
- 238000006073 displacement reaction Methods 0.000 claims description 4
- 239000012071 phase Substances 0.000 claims description 4
- 239000000498 cooling water Substances 0.000 claims description 3
- 238000005485 electric heating Methods 0.000 claims description 3
- 230000005484 gravity Effects 0.000 claims description 3
- 239000007791 liquid phase Substances 0.000 claims description 3
- 230000033116 oxidation-reduction process Effects 0.000 abstract description 3
- 239000002699 waste material Substances 0.000 description 22
- 238000000034 method Methods 0.000 description 15
- 238000004519 manufacturing process Methods 0.000 description 10
- 230000003647 oxidation Effects 0.000 description 10
- 238000007254 oxidation reaction Methods 0.000 description 10
- 230000008569 process Effects 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 6
- 239000000460 chlorine Substances 0.000 description 6
- 229910052801 chlorine Inorganic materials 0.000 description 6
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 6
- 230000001276 controlling effect Effects 0.000 description 4
- 238000007599 discharging Methods 0.000 description 4
- 238000000605 extraction Methods 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 239000007800 oxidant agent Substances 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
- 230000001105 regulatory effect Effects 0.000 description 3
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 2
- QALQXPDXOWOWLD-UHFFFAOYSA-N [N][N+]([O-])=O Chemical compound [N][N+]([O-])=O QALQXPDXOWOWLD-UHFFFAOYSA-N 0.000 description 2
- 229910001431 copper ion Inorganic materials 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 231100001261 hazardous Toxicity 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- BZSXEZOLBIJVQK-UHFFFAOYSA-N 2-methylsulfonylbenzoic acid Chemical compound CS(=O)(=O)C1=CC=CC=C1C(O)=O BZSXEZOLBIJVQK-UHFFFAOYSA-N 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 229940045803 cuprous chloride Drugs 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000002848 electrochemical method Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- -1 hetero ions Chemical class 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 238000010019 resist printing Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
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- ing And Chemical Polishing (AREA)
Abstract
The utility model provides a continuous online recycling device of ferric trichloride etching solution, which comprises the following components: etching the groove; a replacement tank; a conveying assembly for adding iron powder into the replacement tank; the filter pressing assembly is communicated with the output port of the replacement groove; the sub-liquid barrel is communicated with the filter pressing assembly; the reaction kettle is used for preparing ferric trichloride etching solution by oxidation reduction of ferrous water and is provided with an oxygen inlet, an exhaust outlet, a sub-solution inlet, a hydrochloric acid inlet, a catalyst inlet and a liquid discharge outlet, wherein the liquid discharge outlet is communicated with an etching tank, and the etching tank is communicated with the reaction kettle through a pipeline with a liquid supply pump. Adding hydrochloric acid, a catalyst, oxygen and sub-liquid into a reaction kettle for mixed reaction, delivering ferric trichloride etching liquid produced by the reaction to an etching tank through a liquid discharge outlet, overflowing liquid in the etching tank and delivering the liquid to a replacement tank, replacing the liquid in the replacement tank by adding iron powder, replacing copper and ferrous water in the replacement tank, and carrying out filter pressing of a filter pressing assembly, wherein the filter pressing liquid flows back to a sub-liquid barrel to be continuously recycled to an etching line.
Description
Technical Field
The utility model relates to the technical field of displacement oxidation and redox preparation, in particular to a continuous online recycling device for ferric trichloride etching solution.
Background
The ferric trichloride etching solution is suitable for etching printed boards with screen printing resist printing materials, liquid photoresist, dry films, gold and other resist layers. The ferric trichloride etching solution has the advantages of stable process, convenient operation, low price and high etching speed, is particularly suitable for manufacturing large-area corrosion and anti-corrosion, and is widely applied to etching of PCB (printed circuit board).
The etching of copper foil on a PCB board by ferric trichloride etching solution is an oxidation-reduction process. Fe 3+ oxidizes copper to cuprous chloride at the copper surface while Fe 3+ is reduced to Fe 2+. In the etching process, fe 3+ in the ferric trichloride etching solution gradually becomes Fe 2+ to lose etching capability, and when etching is performed to a certain extent, ferric trichloride etching waste liquid is generated, wherein the ferric trichloride etching waste liquid contains a certain amount of copper ions, and the ferric trichloride etching waste liquid needs to be recovered.
In the prior art, the ferric trichloride etching waste liquid is recycled by adopting the following methods:
1. And (3) regenerating by a precipitation method, concentrating or roasting the waste liquid to obtain FeCl 3 for crystallization recovery, and re-dissolving to realize recovery and regeneration of ferric trichloride. The treatment mode has high energy consumption in the concentrating or roasting process and limited recovery rate.
2. The chemical oxidation regeneration method adopts oxidant such as chlorine, hydrogen peroxide, sodium chlorate and the like and auxiliary reagent such as hydrochloric acid and the like to regenerate ferric trichloride. The treatment mode has the problems of toxic oxidant, limited oxidation effect or addition of extra hetero ions to the oxidant, and the like, and has the advantages of increasing waste liquid in the regeneration process, limiting regeneration cycle times, increasing the discharge amount of the waste liquid and limiting practical production application.
3. The extraction method is to obtain iron, copper and other separation by organic solvent extraction, and then to obtain FeCl 3 for reuse by back extraction. The treatment mode has the problems of complex process, high cost, further treatment of the extractant and the like, and is not suitable for large-scale industrial application.
4. In the electrochemical method, the anode and the cathode of the electrolytic tank are separated by a diaphragm, and the etching waste liquid is directly electrolyzed, so that the regeneration and the recycling of part of the waste liquid are realized. During electrolysis, fe 2+ in the waste liquid in the anode region is oxidized into Fe 3+, and the waste liquid in the cathode region is oxidized and inverted to Fe 2+ due to reduction of Fe 3+, so that the waste liquid in the cathode chamber can be reused after anode secondary oxidation treatment or is discarded after subsequent treatment (such as replacement or extraction of precipitated iron powder). The treatment mode has the problems of high regeneration cost and low overall recycling rate of waste liquid, and meanwhile, dangerous gas chlorine is generated in the electrolysis process.
Disclosure of utility model
In order to overcome the problems in the related art, the utility model provides the continuous online recycling device for the ferric trichloride etching solution, which can carry out online treatment on the waste etching solution, realize continuous online recycling production of the etching solution while feeding and discharging the etching line, realize recycling of the etching solution, carry out oxidation reduction through oxygen, and generate no hazardous gas chlorine in the recycling process.
The utility model aims to provide a continuous online recycling device for ferric trichloride etching solution, which comprises the following components:
An etching tank filled with an etching solution for etching the PCB;
the replacement groove is communicated with the overflow port of the etching groove and is used for replacing the copper-containing ferric trichloride etching overflow liquid;
a conveying assembly for adding iron powder into the replacement tank;
The filter pressing assembly is communicated with the output port of the replacement groove and is used for carrying out filter pressing on the replaced liquid to obtain elemental copper and ferrous water;
the sub-liquid barrel is communicated with the filter pressing assembly and is used for storing sub-molten iron;
the reaction kettle is used for preparing ferric trichloride etching solution by oxidizing ferrous water, and is provided with an oxygen inlet, an exhaust outlet, a sub-solution inlet, a hydrochloric acid inlet, a catalyst inlet and a liquid discharge outlet, wherein the liquid discharge outlet is communicated with an etching tank, and the etching tank is communicated with the reaction kettle through a pipeline with a liquid supply pump.
In a preferred technical scheme of the utility model, the conveying assembly is a screw conveyor, and a feed opening of the conveyor is positioned above the replacement groove.
In a preferred technical scheme of the utility model, a heating component and a cooling component are arranged in the etching tank.
In the preferred technical scheme of the utility model, the cooling component is a coil pipe, the etching tank is provided with a cooling inlet and a cooling outlet, two ends of the coil pipe are respectively communicated with the cooling inlet and the cooling outlet, and the cooling inlet and the cooling outlet are respectively connected with the output end and the input end of the cooling water supply device through pipelines.
In a preferred technical scheme of the utility model, the heating component is an electric heating pipe.
In the preferred technical scheme of the utility model, the etching device further comprises an overflow barrel, wherein an input port of the overflow barrel is connected with an overflow port of the etching groove through a pipeline, and an output port of the overflow barrel is communicated with the replacement groove through a pipeline with an overflow pump.
In a preferred technical scheme of the utility model, the method further comprises the following steps:
The hydrochloric acid barrel is communicated with a hydrochloric acid inlet through a pipeline with a metering pump;
the catalyst barrel is communicated with the catalyst inlet through a pipeline with a metering pump;
the sub-liquid barrel is communicated with the sub-liquid inlet through a pipeline with a metering pump.
In a preferred technical scheme of the utility model, the reaction kettle comprises at least one reaction kettle monomer which is sequentially arranged;
the lower parts of the adjacent reaction kettle monomers are communicated through a liquid phase communicating pipe, and the upper parts are communicated through a gas phase communicating pipe;
The sub-liquid inlet, the hydrochloric acid inlet and the catalyst inlet are all arranged on the reaction kettle monomer at the first position, the liquid discharge outlet is arranged at the lower part of the reaction kettle monomer at the last position, and the oxygen inlet is arranged at the upper part of the reaction kettle monomer at the last position;
the bottom of the etching tank is communicated with the top of the first reaction kettle monomer through a pipeline with a liquid supply pump;
An exhaust outlet is arranged at the top of at least one reaction kettle monomer, and the exhaust outlet is externally connected with an exhaust gas treatment system through a pipeline.
In the preferred technical scheme of the utility model, a circulation inlet is arranged at the top of the reaction kettle monomer, and a circulation outlet is arranged at the bottom of the reaction kettle monomer;
The circulating inlet and the circulating outlet are communicated through a pipeline with a circulating pump.
In the preferred technical scheme of the utility model, the filter pressing component is a filter press, an inlet of the filter press is communicated with the bottom of the replacement tank through a pipeline with a filter pressing pump, and a liquid outlet of the filter press is communicated with the sub-liquid barrel through the pipeline.
In practical application, the filter pressing component and the sub-liquid barrel have height difference, the filter pressing component is positioned at a high position, and ferrous water automatically flows to the sub-liquid barrel through the height difference.
In the preferred technical scheme of the utility model, a valve and a flowmeter are arranged on a pipeline for communicating the etching tank with the reaction kettle;
a valve is arranged at the oxygen inlet;
a flowmeter is arranged on a pipeline communicated with the overflow barrel and the replacement groove;
the etching tank is provided with a hydrometer, an ORP meter and a thermometer;
The hydrochloric acid barrel, the catalyst barrel, the sub-liquid barrel and the replacement tank are all provided with liquid level meters;
A liquid level meter, a thermometer and a pressure gauge are arranged on the reaction kettle monomer at the tail position;
The displacement tank is provided with a liquid level meter and an ORP meter;
The automatic water supply device is characterized by further comprising a controller, wherein the controller is a PLC controller, and each valve, each flowmeter, each liquid level meter, each thermometer, each metering pump, each ORP meter, a specific gravity meter, a pressure meter, a liquid supply pump, a filter pressing pump, an overflow pump, a heating component and a cooling component are all electrically connected with the controller.
The beneficial effects of the utility model are as follows:
The device can perform on-line treatment on the waste etching liquid, and the regeneration treatment of the ferric trichloride etching liquid is linked with the etching production line of the etching line, so that continuous on-line regeneration production of the etching line while feeding and discharging is realized, the recycling of the etching liquid is realized, the enterprise cost can be effectively saved, and the income is enlarged; the device is oxidized by oxygen, does not generate dangerous gas chlorine in the regeneration process, realizes clean production, and is environment-friendly;
The device controls the adding amount of the secondary liquid through the controller matched with the densimeter and the metering pump, avoids quality problems and liquid medicine waste caused by fluctuation of copper content of the online etching liquid, controls the adding amount of the catalyst through the controller matched with the ORP meter and the metering pump of the etching tank, and avoids adding excessive nitronitrogen, thereby generating nitrogen oxides to pollute the environment; the controller is matched with the ORP meter of the replacement tank and the conveying component to control the iron powder adding amount, so that excessive iron powder adding to generate overhigh temperature and iron powder waste are avoided, and the taste of the replaced sponge copper is influenced.
Drawings
FIG. 1 is a schematic diagram of a continuous online recycling device for ferric trichloride etching solution.
Reference numerals:
1. Etching the groove; 2. a replacement tank; 3. a filter pressing assembly; 4. a sub-liquid barrel; 5. a reaction kettle; 510. a first-stage reaction kettle; 520. a second-stage reaction kettle; 530. a third-stage reaction kettle; 501. a sub-liquid inlet; 502. a hydrochloric acid inlet; 503. a catalyst inlet; 504. an exhaust outlet; 505. an oxygen inlet; 506. a liquid discharge outlet; 6. a tail gas treatment system; 7. an oxygen supply device; 8. an overflow barrel; 9. an overflow pump; 10. a transport assembly; 11. a filter pressing pump; 12. a cooling assembly; 13. a heating assembly; 14. a liquid supply pump; 15. a hydrochloric acid barrel; 16. a catalyst barrel; 17. metering pump of sub-liquid barrel; 18. metering pump of hydrochloric acid barrel; 19. a catalyst barrel metering pump; 20. and a circulation pump.
Detailed Description
Preferred embodiments of the present utility model will be described in more detail below with reference to the accompanying drawings. While the preferred embodiments of the present utility model are shown in the drawings, it should be understood that the present utility model may be embodied in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the utility model to those skilled in the art.
The embodiment provides a ferric trichloride etching solution continuous online regeneration device, which can carry out online treatment on waste etching solution, realizes continuous online regeneration production of etching line while feeding and discharging, achieves recycling of etching solution, and carries out oxidation by oxygen, and hazardous gas chlorine is not generated in the regeneration process.
As shown in fig. 1, a continuous online recycling device for ferric trichloride etching solution comprises:
An etching tank 1 filled with an etching solution for etching the PCB;
A displacement tank 2 which is communicated with the overflow port of the etching tank 1 and is used for displacing the copper-containing ferric trichloride etching overflow liquid,
The replacement principle of the replacement tank 2 is that copper-containing ferric trichloride etching solution reacts with iron powder to reduce the ferric trichloride into ferric dichloride entirely, and the iron is used for replacing copper ions into elemental copper;
A transfer unit 10 for adding iron powder into the replacement tank 2;
The filter pressing component 3 is communicated with the output port of the replacement tank 2 and is used for carrying out filter pressing on the replaced liquid to obtain elemental copper and ferrous water, the working principle of the filter pressing component 3 is that solid-liquid separation is carried out, the elemental copper and ferrous water containing ferric dichloride are separated, and the separated ferrous water is taken as sub-liquid and enters the subsequent reaction kettle 5 through a pipeline to carry out oxygen oxidation treatment;
the sub-liquid barrel 4 is communicated with the filter pressing assembly 3 and is used for storing sub-molten iron;
The reaction kettle 5 is used for preparing ferric trichloride etching solution by oxidizing ferrous water, the reaction kettle 5 is provided with an oxygen inlet 505, an exhaust outlet 504, a sub-liquid inlet 501, a hydrochloric acid inlet 502, a catalyst inlet 503 and a liquid discharge outlet 506, the liquid discharge outlet 506 is communicated with the etching tank 1, and the etching tank 1 is communicated with the reaction kettle 5 through a pipeline with a liquid supply pump 14; the reaction vessel 5 is used for oxidizing ferric chloride to ferric trichloride and supplying the ferric chloride as an etching solution to the etching bath 1.
When the copper powder automatic packaging and warehousing device is used, hydrochloric acid, a catalyst and ferrous water in the sub-liquid barrel 4 are added into the reaction kettle 5 to carry out mixed reaction, oxygen is continuously introduced at constant pressure, ferric trichloride etching solution produced by the reaction in the reaction kettle 5 is sent to the etching tank 1 through the liquid discharge outlet 506, excessive liquid in the etching tank 1 overflows through the overflow port and is sent to the replacement tank 2, copper in the liquid is replaced by adding iron powder in the replacement tank 2, ferrous water is obtained, the replaced copper and ferrous water in the replacement tank 2 are subjected to press filtration by the press filtration component 3, the press filtration solution is returned to the sub-liquid barrel 4 to be continuously recycled to an etching line, and copper powder is automatically packaged and warehoused.
The device can carry out on-line treatment on the waste etching liquid, and the regeneration treatment of the ferric trichloride etching liquid is linked with the etching of the etching line, so that the continuous on-line regeneration production of the etching line which is fed and discharged simultaneously is realized, the recycling of the etching liquid is realized, the enterprise cost can be effectively saved, and the income is enlarged; the device is oxidized by oxygen, does not generate dangerous gas chlorine in the regeneration process, realizes clean production, and is environment-friendly.
In this embodiment, the oxygen inlet 505 is connected to the oxygen supply 7 via a pipe.
In this embodiment, the conveying assembly 10 is a screw conveyor, and a feed opening of the conveyor is located above the replacement tank 2.
In this embodiment, the heating unit 13 and the cooling unit 12 are provided in the etching chamber 1, and when in use, the temperature in the etching chamber 1 is controlled by the heating unit 13 and the cooling unit 12.
In this embodiment, the cooling component 12 is a coil, the etching bath 1 has a cooling inlet and a cooling outlet, two ends of the coil are respectively connected to the cooling inlet and the cooling outlet, and the cooling inlet and the cooling outlet are respectively connected to the output end and the input end of the cooling water supply device through pipelines.
In this embodiment, the heating component 13 is an electric heating tube.
In the embodiment, the device also comprises an overflow barrel 8, wherein the input port of the overflow barrel 8 is connected with the overflow port of the etching tank 1 through a pipeline, and the output port of the overflow barrel 8 is communicated with the replacement tank 2 through a pipeline with an overflow pump 9.
In this embodiment, further comprising:
the hydrochloric acid barrel 15 is communicated with the hydrochloric acid inlet 502 through a pipeline with a metering pump 18 and a valve so as to realize quantitative addition of hydrochloric acid;
the catalyst barrel 16 is communicated with the catalyst inlet 503 through a pipeline with a metering pump 19 and a valve to realize quantitative addition of the catalyst;
the sub liquid barrel 4 is communicated with the sub liquid inlet 501 through a pipeline with a metering pump 17 and a valve so as to realize quantitative addition of sub liquid.
In this embodiment, the reaction kettle 5 includes at least two reaction kettle monomers sequentially arranged;
the lower parts of the adjacent reaction kettle monomers are communicated through a liquid phase communicating pipe, and the upper parts are communicated through a gas phase communicating pipe;
The sub-liquid inlet 501, the hydrochloric acid inlet 502 and the catalyst inlet 503 are all arranged on the first reaction kettle monomer, the liquid discharge outlet 506 is arranged on the lower part of the last reaction kettle monomer, and the oxygen inlet 505 is arranged on the upper part of the last reaction kettle monomer;
The bottom of the etching tank 1 is communicated with the top of the first reaction kettle monomer through a pipeline with a liquid supply pump 14;
At least one reaction kettle monomer top is provided with the exhaust outlet 504, and the exhaust outlet 504 is used for discharging the tail gas pressure release of reation kettle 5, the exhaust outlet 504 is through pipeline external connection tail gas treatment system 6, the exhaust outlet 504 is provided with the valve, and oxygen inlet 505 department liquid is provided with the valve, and the effect of these two valves is the pressure in the control reation kettle 5.
In the embodiment, a circulation inlet is formed in the top of the reaction kettle monomer, and a circulation outlet is formed in the bottom of the reaction kettle monomer;
The circulating inlet and the circulating outlet are communicated through a pipeline with a circulating pump 20;
When the reaction kettle is used, the self-circulation of the materials in the reaction kettle monomers is realized through the circulating pump 20, so that the oxidation-reduction reaction is more fully carried out between the materials and oxygen in the gas phase.
In this embodiment, the filter pressing assembly 3 is a filter press, an inlet of the filter press is communicated with the bottom of the replacement tank 2 through a pipeline with a filter pressing pump 11, and a liquid outlet of the filter press is communicated with the sub-liquid barrel 4 through a pipeline.
In practical application, the filter pressing component 3 and the sub-liquid barrel 4 have height differences, the filter pressing component 3 is positioned at a high position, and the ferrous water flows to the sub-liquid barrel 4 from the height differences.
In the embodiment, a valve and a flowmeter are arranged on a pipeline for communicating the etching tank 1 with the reaction kettle 5;
A valve is arranged at the oxygen inlet 505;
A flowmeter is arranged on a pipeline communicated with the overflow barrel and the replacement tank 2, and the flowmeter is used for acquiring the flow of the material entering the replacement tank 2;
The etching tank 1 is provided with a gravimeter, an ORP meter and a thermometer, wherein the gravimeter is used for regulating and controlling the flow of a metering pump at the position of the sub-liquid barrel 4 so as to further control the flow of a metering pump at the position of the catalyst and the flow of a metering pump at the position of the hydrochloric acid barrel 15, the ORP meter is used for monitoring the concentration of ferrous iron in the material, and the thermometer is used for regulating and controlling the temperature of the material by matching with the heating component 13 and the cooling component 12;
The hydrochloric acid barrel 15, the catalyst barrel 16, the sub-liquid barrel 4 and the replacement tank 2 are all provided with liquid level meters, and the liquid level meters are used for measuring the liquid level of materials in each barrel so as to ensure the running stability of equipment;
the reaction kettle monomer at the last position is provided with a liquid level meter, a thermometer and a pressure meter, and the function of the reaction kettle monomer is to monitor the operation of the reaction kettle 5 and control the liquid level, the pressure and the temperature of the reaction kettle;
The liquid level meter and the ORP meter are arranged on the replacement tank 2, the liquid level meter is used for controlling the liquid level of the replacement tank 2 to prevent the tank from overflowing, and the ORP meter is used for controlling the iron powder adding amount by the linkage conveying assembly 10, so that the iron powder waste is avoided, and the quality of the replaced sponge copper is improved;
The device also comprises a controller, wherein the controller adopts a PLC controller, and each valve, each flowmeter, each liquid level meter, each thermometer, each metering pump, each ORP meter, a specific gravity meter, a pressure meter, a liquid supply pump 14, a filter pressing pump 11, an overflow pump 9, a heating component 13 and a cooling component 12 are electrically connected with the controller so as to ensure continuous and stable production operation of the ferric trichloride etching liquid on-line recycling device;
When the etching tank is used, the controller is matched with the densimeter and the metering pump to control the adding amount of the liquid, so that quality problems and liquid medicine waste caused by fluctuation of copper content of the online etching liquid are avoided, and the controller is matched with the ORP meter and the metering pump of the etching tank 1 to control the adding amount of the catalyst, so that excessive nitronitrogen is prevented from being added, and the nitrogen oxide is generated to pollute the environment; the controller is matched with the ORP meter of the replacement tank 2 and the conveying assembly 10 to control the iron powder adding amount, so that excessive iron powder adding and excessive temperature generation and iron powder waste are avoided, and the taste of the replaced sponge copper is influenced.
The control principle of the controller is that the adding amount of the materials is reduced when the detection value exceeds the preset value, and the adding amount of the materials is increased when the detection value is lower than the preset value, so that dynamic adjustment is realized. The controller ensures the stable operation of the device through the stability of ORP of each part in the device, and realizes the continuous automation of the whole flow.
Taking the reaction kettle 5 with 3 reaction kettle monomers as an example, a three-stage reaction kettle 5 is formed:
In the embodiment, a first-stage reaction kettle 510, a second-stage reaction kettle 520 and a third-stage reaction kettle 530 are sequentially communicated, oxygen is introduced into the third-stage reaction kettle 530 at constant pressure, valve controls are arranged between the first-stage reaction kettle 510 and a metering pump 17 of a sub-liquid barrel 4, a metering pump 18 of a hydrochloric acid barrel 15 and a metering pump 19 of a catalyst barrel 16, a flow meter and a valve are arranged between the first-stage oxidation kettle 510 and a liquid supply pump 14 of an etching tank 1, a valve control and a pressure reducing valve are sequentially arranged at an oxygen inlet 505 of the third-stage oxidation kettle 530, a valve is arranged between a liquid discharge outlet 506 of the third-stage oxidation kettle 530 and the etching tank 1 to control the liquid level of the third-stage oxidation kettle 530 to be constant, and the flow of the third-stage reaction kettle 530 is regulated by the pressure of the reaction kettle through the valve between the liquid discharge outlet 506 and the etching tank 1, and the reacted solution is injected into the etching tank 1; liquid level meters are arranged on the replacement tank 2, the sub-liquid barrel 4, the hydrochloric acid barrel 15, the catalyst barrel 16, the overflow barrel 8 and the three-stage reaction kettle 5; the valve, the flowmeter, each pump, the liquid level meter and the thermometer are all electrically connected with the PLC.
Specifically, the etching bath 1 is provided with a thermometer, a densitometer and an ORP meter electrically connected to the PLC controller.
Specifically, the first-stage reaction kettle 5 is internally provided with spray pipes respectively communicated with an exhaust outlet 504, a sub-liquid inlet 501, a hydrochloric acid inlet 502 and a catalyst inlet 503, so as to realize mixed spray reaction and improve reaction efficiency.
Specifically, the replacement barrel is provided with a stirring device so as to improve the replacement efficiency.
The relative arrangement of the components and steps, numerical expressions and numerical values set forth in these embodiments do not limit the scope of the present application unless it is specifically stated otherwise. Meanwhile, it should be understood that the sizes of the respective parts shown in the drawings are not drawn in actual scale for convenience of description. Techniques, methods, and apparatus known to one of ordinary skill in the relevant art may not be discussed in detail, but should be considered part of the specification where appropriate. In all examples shown and discussed herein, any specific values should be construed as merely illustrative, and not a limitation. Thus, other examples of the exemplary embodiments may have different values. It should be noted that: like reference numerals and letters denote like items in the following figures, and thus once an item is defined in one figure, no further discussion thereof is necessary in subsequent figures.
In the description of the present application, it should be understood that the azimuth or positional relationships indicated by the azimuth terms such as "front, rear, upper, lower, left, right", "horizontal direction, vertical, horizontal", and "top, bottom", etc., are generally based on the azimuth or positional relationships shown in the drawings, merely to facilitate description of the present application and simplify the description, and these azimuth terms do not indicate and imply that the apparatus or elements referred to must have a specific azimuth or be constructed and operated in a specific azimuth, and thus should not be construed as limiting the scope of protection of the present application; the orientation word "inner and outer" refers to inner and outer relative to the contour of the respective component itself.
The above description is only of the preferred embodiments of the present utility model and is not intended to limit the present utility model, but various modifications and variations can be made to the present utility model by those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present utility model should be included in the protection scope of the present utility model.
Claims (10)
1. The utility model provides a ferric trichloride etching solution continuous online regeneration utilizes device which characterized in that: comprising the following steps:
An etching tank filled with an etching solution for etching the PCB;
the replacement groove is communicated with the overflow port of the etching groove and is used for replacing the copper-containing ferric trichloride etching overflow liquid;
a conveying assembly for adding iron powder into the replacement tank;
The filter pressing assembly is communicated with the output port of the replacement groove and is used for carrying out filter pressing on the replaced liquid to obtain elemental copper and ferrous water;
the sub-liquid barrel is communicated with the filter pressing assembly and is used for storing sub-molten iron;
the reaction kettle is used for preparing ferric trichloride etching solution by oxidizing ferrous water, and is provided with an oxygen inlet, an exhaust outlet, a sub-solution inlet, a hydrochloric acid inlet, a catalyst inlet and a liquid discharge outlet, wherein the liquid discharge outlet is communicated with an etching tank, and the etching tank is communicated with the reaction kettle through a pipeline with a liquid supply pump.
2. The continuous on-line recycling device for ferric trichloride etching liquid according to claim 1, wherein:
and a heating component and a cooling component are arranged in the etching tank.
3. The continuous on-line recycling device for ferric trichloride etching liquid according to claim 2, wherein:
The cooling assembly is a coil pipe, the etching tank is provided with a cooling inlet and a cooling outlet, two ends of the coil pipe are respectively communicated with the cooling inlet and the cooling outlet, and the cooling inlet and the cooling outlet are respectively connected with the output end and the input end of the cooling water supply device through pipelines.
4. The continuous on-line recycling device for ferric trichloride etching liquid according to claim 2, wherein:
The heating component is an electric heating pipe.
5. The continuous on-line recycling device for ferric trichloride etching liquid according to claim 2, wherein:
The device also comprises an overflow barrel, wherein an input port of the overflow barrel is connected with an overflow port of the etching tank through a pipeline, and an output port of the overflow barrel is communicated with the replacement tank through a pipeline with an overflow pump.
6. The continuous on-line recycling device for ferric trichloride etching liquid according to claim 5, wherein:
Further comprises:
The hydrochloric acid barrel is communicated with a hydrochloric acid inlet through a pipeline with a metering pump;
the catalyst barrel is communicated with the catalyst inlet through a pipeline with a metering pump;
the sub-liquid barrel is communicated with the sub-liquid inlet through a pipeline with a metering pump.
7. The continuous on-line recycling device for ferric trichloride etching liquid according to claim 1, wherein:
The reaction kettle comprises at least one reaction kettle monomer which is sequentially arranged;
the lower parts of the adjacent reaction kettle monomers are communicated through a liquid phase communicating pipe, and the upper parts are communicated through a gas phase communicating pipe;
The sub-liquid inlet, the hydrochloric acid inlet and the catalyst inlet are all arranged on the reaction kettle monomer at the first position, the liquid discharge outlet is arranged at the lower part of the reaction kettle monomer at the last position, and the oxygen inlet is arranged at the upper part of the reaction kettle monomer at the last position;
the bottom of the etching tank is communicated with the top of the first reaction kettle monomer through a pipeline with a liquid supply pump;
An exhaust outlet is arranged at the top of at least one reaction kettle monomer, and the exhaust outlet is externally connected with an exhaust gas treatment system through a pipeline.
8. The continuous on-line recycling device for ferric trichloride etching liquid according to claim 5, wherein:
The top of the reaction kettle monomer is provided with a circulating inlet, and the bottom of the reaction kettle monomer is provided with a circulating outlet;
The circulating inlet and the circulating outlet are communicated through a pipeline with a circulating pump.
9. The continuous on-line recycling device for ferric trichloride etching liquid according to claim 6, wherein:
The filter-pressing assembly is a filter press, an inlet of the filter press is communicated with the bottom of the replacement groove through a pipeline with a filter-pressing pump, and a liquid outlet of the filter press is communicated with the sub-liquid barrel through a pipeline.
10. The continuous on-line recycling device for ferric trichloride etching liquid according to claim 9, wherein:
a valve and a flowmeter are arranged on a pipeline for communicating the etching tank with the reaction kettle;
a valve is arranged at the oxygen inlet;
a flowmeter is arranged on a pipeline communicated with the overflow barrel and the replacement groove;
the etching tank is provided with a hydrometer, an ORP meter and a thermometer;
The hydrochloric acid barrel, the catalyst barrel, the sub-liquid barrel and the replacement tank are all provided with liquid level meters;
A liquid level meter, a thermometer and a pressure gauge are arranged on the reaction kettle monomer at the tail position;
The displacement tank is provided with a liquid level meter and an ORP meter;
The system also comprises a controller, wherein each valve, each flowmeter, each liquid level meter, each thermometer, each metering pump, each ORP meter, a specific gravity meter, a pressure gauge, a liquid supply pump, a filter pressing pump, an overflow pump, a heating component and a cooling component are all electrically connected with the controller.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322260878.6U CN220867517U (en) | 2023-08-22 | 2023-08-22 | Ferric trichloride etching solution continuous on-line regeneration and utilization device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322260878.6U CN220867517U (en) | 2023-08-22 | 2023-08-22 | Ferric trichloride etching solution continuous on-line regeneration and utilization device |
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| CN220867517U true CN220867517U (en) | 2024-04-30 |
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| CN202322260878.6U Active CN220867517U (en) | 2023-08-22 | 2023-08-22 | Ferric trichloride etching solution continuous on-line regeneration and utilization device |
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| CN (1) | CN220867517U (en) |
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- 2023-08-22 CN CN202322260878.6U patent/CN220867517U/en active Active
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Effective date of registration: 20240607 Address after: 516000 laoweixia village, Yonghu Town, Huiyang District, Huizhou City, Guangdong Province Patentee after: SRIEL ENVIRONMENTAL SCIENCE AND TECHNOLOGY Co.,Ltd. Country or region after: China Patentee after: Guangdong Siriel Equipment Manufacturing Co.,Ltd. Patentee after: Ronghui Technology (Huizhou) Co.,Ltd. Address before: 516267 Laowuixia Village, Yonghu Town, Huiyang District, Huizhou City, Guangdong Province Patentee before: SRIEL ENVIRONMENTAL SCIENCE AND TECHNOLOGY Co.,Ltd. Country or region before: China Patentee before: Guangdong Siriel Equipment Manufacturing Co.,Ltd. |