CN220788799U - Copper etching solution regeneration circulation device - Google Patents
Copper etching solution regeneration circulation device Download PDFInfo
- Publication number
- CN220788799U CN220788799U CN202322461043.7U CN202322461043U CN220788799U CN 220788799 U CN220788799 U CN 220788799U CN 202322461043 U CN202322461043 U CN 202322461043U CN 220788799 U CN220788799 U CN 220788799U
- Authority
- CN
- China
- Prior art keywords
- fixedly connected
- material receiving
- plate
- etching solution
- rod
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 230000008929 regeneration Effects 0.000 title claims abstract description 44
- 238000011069 regeneration method Methods 0.000 title claims abstract description 44
- 238000005530 etching Methods 0.000 title claims abstract description 38
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 37
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 36
- 239000010949 copper Substances 0.000 title claims abstract description 36
- 239000000463 material Substances 0.000 claims abstract description 46
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 33
- 238000004064 recycling Methods 0.000 claims 4
- 229910052751 metal Inorganic materials 0.000 abstract description 16
- 239000002184 metal Substances 0.000 abstract description 16
- 239000007788 liquid Substances 0.000 abstract description 14
- 238000004140 cleaning Methods 0.000 abstract description 13
- 238000002156 mixing Methods 0.000 description 11
- 239000002699 waste material Substances 0.000 description 8
- 239000002253 acid Substances 0.000 description 5
- 239000007800 oxidant agent Substances 0.000 description 5
- 230000001590 oxidative effect Effects 0.000 description 5
- 230000002378 acidificating effect Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000000284 extract Substances 0.000 description 2
- 229910001385 heavy metal Inorganic materials 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- VMQMZMRVKUZKQL-UHFFFAOYSA-N Cu+ Chemical compound [Cu+] VMQMZMRVKUZKQL-UHFFFAOYSA-N 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Landscapes
- Electrolytic Production Of Metals (AREA)
Abstract
The utility model discloses a copper etching solution regeneration and circulation device, which belongs to the field of etching solution treatment, and comprises a regeneration tank, wherein the top of the regeneration tank is fixedly connected with a fixing frame, the top of the fixing frame is fixedly connected with a lifting cylinder, the output end of the lifting cylinder penetrates through the fixing frame and is fixedly connected with a lifting rod, the bottom of the lifting rod is fixedly connected with a movable plate, the two sides of the bottom of the movable plate are fixedly connected with connecting rods, the bottom of each connecting rod is connected with a material receiving plate, one end of each material receiving plate is rotationally connected with one group of connecting rods, and the other end of each material receiving plate is connected with the other group of connecting rods through an elastic rope; the movable plate is driven to move upwards through the lifting cylinder, the movable plate drives the material receiving plate to move out of the regeneration tank through the connecting rod, then the ejector rod is propped against one end upper portion of the material receiving plate, the material receiving plate is pushed to incline towards one end, metal copper on the material receiving plate falls into the collecting box to be collected and cleaned, and convenience in cleaning the metal copper in etching liquid is improved.
Description
Technical Field
The utility model relates to the technical field of etching solution treatment, in particular to a copper etching solution regeneration and circulation device.
Background
In industrial processes (e.g., PCB industry, etc.), acid etching is a common etching method. When the copper concentration or the cuprous ion concentration in the acidic etching solution increases to a certain value during etching, the etching solution cannot stably and rapidly etch the copper foil, and the etching solution becomes etching waste liquid. The acidic etching waste liquid is a strong acid solution containing a large amount of heavy metals polluted, and belongs to dangerous waste polluted by strong acid and high-concentration heavy metals, and the regeneration treatment of the acidic etching waste liquid is an economic method.
The etching solution regeneration is divided into alkaline etching waste liquid regeneration, acid etching waste liquid regeneration and microetching waste liquid regeneration, and the acid etching regeneration adopts an ionic membrane copper electrolysis process.
Disclosure of Invention
In order to overcome the technical problems, the utility model aims to provide a copper etching solution regeneration circulating device, so as to solve the problems that in the prior art, the inside of a metal copper regeneration tank after copper etching solution regeneration is deposited and piled up, and the cleaning is needed to be manually carried out, so that the trouble of cleaning is increased.
The aim of the utility model can be achieved by the following technical scheme:
the utility model provides a copper etching solution regeneration circulation device, includes the regeneration pond, regeneration pond top fixedly connected with mount, mount top fixedly connected with lift cylinder, lift cylinder output runs through mount and fixedly connected with lifter, lifter bottom fixedly connected with movable plate, movable plate bottom both sides fixedly connected with connecting rod, the connecting rod bottom is connected with the material receiving plate, the one end and the a set of connecting rod rotation of material receiving plate link to each other, the material receiving plate other end passes through elastic rope and another set of connecting rod.
As a further scheme of the utility model: the bottom of the movable plate is fixedly connected with an anode rod, a cathode rod and a diaphragm plate, the diaphragm plate is positioned in the middle of the bottom of the movable plate, and the anode rod and the cathode rod are respectively positioned at two sides of the diaphragm plate.
As a further scheme of the utility model: the bottom of the diaphragm plate is propped against the top of the material receiving plate.
As a further scheme of the utility model: the inner wall of the top of the fixed frame is fixedly connected with a push rod, and the movable plate is provided with a through groove corresponding to the push rod.
As a further scheme of the utility model: the top side of the regeneration tank is fixedly connected with a collecting box, and one side of the top of the collecting box is fixedly connected with an elastic plate.
As a further scheme of the utility model: the water inlet end and the water outlet end of the pump body are respectively communicated with the water tank and the water outlet pipe, and a plurality of groups of water outlet holes are formed in one side of the water outlet pipe.
The utility model has the beneficial effects that:
according to the utility model, the lifting cylinder drives the movable plate to move upwards, the movable plate drives the material receiving plate to move out of the regeneration tank through the connecting rod, then the ejector rod is propped against the upper part of one end of the material receiving plate, the material receiving plate is pushed to incline towards one end, so that the metal copper on the material receiving plate falls into the collecting tank to be collected and cleaned, then the pump body extracts the cleaning liquid from the water tank to be sprayed out of the water outlet pipe, and the material receiving plate is cleaned, so that the convenience of cleaning the metal copper in etching liquid is improved.
Drawings
The utility model is further described below with reference to the accompanying drawings.
FIG. 1 is a schematic diagram of the front view of the present utility model;
FIG. 2 is a schematic diagram of the structure of the utility model in a front view in operation;
FIG. 3 is a schematic view of the structure of a water outlet pipe in the utility model;
FIG. 4 is a schematic view of the internal structure of the mixing drum according to the present utility model.
In the figure: 1. a regeneration tank; 2. a fixing frame; 3. a lifting cylinder; 301. a lifting rod; 4. a moving plate; 401. an anode rod; 402. a cathode rod; 403. a membrane plate; 404. a connecting rod; 5. a receiving plate; 501. an elastic rope; 6. a push rod; 7. a collection box; 701. an elastic plate; 8. a pump body; 801. a water tank; 802. a water outlet pipe; 9. a mixing drum; 901. a rotating lever; 902. a cavity; 903. a spray hole; 904. and driving the motor.
Detailed Description
The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
As shown in fig. 1-4, a copper etching solution regeneration circulation device comprises a regeneration tank 1 for regenerating copper etching solution, a fixing frame 2 is fixedly connected to the top of the regeneration tank 1, a lifting cylinder 3 is fixedly connected to the top of the fixing frame 2, the output end of the lifting cylinder 3 penetrates through the fixing frame 2 and is fixedly connected with a lifting rod 301, a movable plate 4 is fixedly connected to the bottom of the lifting rod 301, connecting rods 404 are fixedly connected to two sides of the bottom of the movable plate 4, a material receiving plate 5 is connected to the bottom of the connecting rods 404, the material receiving plates 5 are attached to the bottom of the regeneration tank 1, copper metal precipitated in the regeneration tank 1 is received and placed, one end of each material receiving plate 5 is rotationally connected with one group of connecting rods 404, the other end of each material receiving plate 5 is connected with the other group of connecting rods 404 through an elastic rope 501, the material receiving plate 5 is moved out of the regeneration tank 1, the material receiving plates 5 are inclined by downwards pressing the material receiving plates 5 at one end of the elastic rope 501, and copper metal on the material receiving plates 5 slides down to be cleaned.
As shown in fig. 1 and 2, the bottom of the moving plate 4 is fixedly connected with an anode rod 401, a cathode rod 402 and a diaphragm plate 403, the diaphragm plate 403 is positioned in the middle of the bottom of the moving plate 4, the anode rod 401 and the cathode rod 402 are respectively positioned at two sides of the diaphragm plate 403, and the bottom of the diaphragm plate 403 abuts against the top of the material receiving plate 5 to separate the regeneration tank 1.
As shown in fig. 1 and fig. 2, in order to clean copper metal more conveniently, the inner wall of the top of the fixing frame 2 is fixedly connected with the ejector rod 6, the moving plate 4 is provided with a through groove corresponding to the ejector rod 6, one side of the top of the regeneration tank 1 is fixedly connected with the collecting tank 7, one side of the top of the collecting tank 7 is fixedly connected with the elastic plate 701, when the material receiving plate 5 moves upwards, the ejector rod 6 passes through the through groove on the moving plate 4 and then abuts against one end top of the material receiving plate 5, one end which pushes the material receiving plate 5 to be rotationally connected with a group of connecting rods 404 rotates, the other end is rotationally inclined downwards through the pulling of the elastic rope 501, so that metal copper on the material receiving plate 5 slides downwards into the collecting tank 7, when the moving plate 4 moves upwards and abuts against the elastic plate 701, the elastic plate 701 of the side wall of the collecting tank 7 drives the elastic plate 701 to reset and incline when the moving plate 701 is separated from the elastic plate 701, and the copper metal is convenient to be received and prevented from falling into the regeneration tank 1.
As shown in fig. 1 and 3, one side of the fixing frame 2 is fixedly connected with a pump body 8, a water tank 801 and a water outlet pipe 802, a water inlet end and a water outlet end of the pump body 8 are respectively communicated with the water tank 801 and the water outlet pipe 802, a plurality of groups of water outlet holes are formed in one side of the water outlet pipe 802, and the pump body 8 is fed into the water outlet pipe 802 from the cleaning liquid in the water tank 801 and then sprayed onto the receiving plate 5 through the water outlet holes for cleaning.
As shown in fig. 1 and fig. 4, a mixing drum 9 for mixing etching solution and oxidant is fixedly connected to one side of the regeneration tank 1, a rotating rod 901 is rotatably connected to the inside of the mixing drum 9, impellers are fixedly connected to the outer wall of the rotating rod 901 for stirring and mixing, a cavity 902 is formed in the rotating rod 901, a plurality of groups of spray holes 903 penetrating through the rotating rod 901 are formed in the inner wall of the cavity 902 for spraying the oxidant into the mixing drum 9, one end of the rotating rod 901 penetrates through the mixing drum 9 and is fixedly connected with a rotary joint for carrying out oxidant liquid inlet connection, a driving motor 904 is fixedly connected to the upper side of the mixing drum 9, the output end of the driving motor 904 is connected with the outer wall of the rotating rod 901 through a transmission belt for driving, oxidant is added from the inside for mixing and stirring, the effect of mixing and stirring is improved, and the oxidant and the etching solution are fully mixed.
The working principle of the utility model is as follows: when the copper etching solution is used by a user, the used copper etching solution is added into the regeneration tank 1, then the anode rod 401 and the cathode rod 402 are started to carry out electrolytic reaction on the copper etching solution, copper ions in the etching waste solution are converted into metal copper to be extracted, the metal copper is sunk on the material receiving plate 5 at the bottom of the regeneration tank 1 after being extracted, the metal copper in the regeneration tank 1 is required to be cleaned, the lifting cylinder 3 is started, the lifting cylinder 3 drives the movable plate 4 to move upwards through the lifting rod 301, the movable plate 4 drives the material receiving plate 5 to move upwards from the regeneration tank 1 through the connecting rod 404, when the material receiving plate 5 is moved out from the regeneration tank 1, the ejector rod 6 passes through a through groove on the movable plate 4 to prop against the top of one end of the material receiving plate 5, then the material receiving plate 5 is pushed to rotate downwards to incline, one end of the material receiving plate 5 which inclines downwards is tensioned through the elastic rope 501, after the material receiving plate 5 is inclined to a certain angle, the lifting cylinder 3 is stopped, copper metal on the material receiving plate 5 slides downwards to be collected in the collecting box 7 through the inclined angle, meanwhile, the pump body 8 is started, the pump body 8 extracts cleaning liquid from the water tank 801, the cleaning liquid is sent into the water outlet pipe 802 and sprayed out of the water outlet hole to one end of the top of the material receiving plate 5, the cleaning liquid is used for cleaning the copper metal on the material receiving plate 5, the copper metal is prevented from remaining on the material receiving plate 5, the cleaning efficiency is improved, after the cleaning is finished, the lifting cylinder 3 is started to drive the lifting rod 301 to move downwards, the lifting rod 301 drives the material receiving plate 5 at the bottom of the movable plate 4 to move downwards, the material receiving plate 5 is separated from the ejector rod 6 at the moment, the material receiving plate 5 is pulled to be propped against the diaphragm plate 403 through the pulling force of the elastic rope 501, the material receiving plate 5 is parallel to the bottom of the regeneration tank 1, the receiving plate 5 is then moved to the bottom of the regeneration tank 1 for continued use.
The foregoing describes one embodiment of the present utility model in detail, but the description is only a preferred embodiment of the present utility model and should not be construed as limiting the scope of the utility model. All equivalent changes and modifications within the scope of the present utility model are intended to be covered by the present utility model.
Claims (6)
1. The utility model provides a copper etching solution regeneration circulation device, includes regeneration tank (1), its characterized in that, regeneration tank (1) top fixedly connected with mount (2), mount (2) top fixedly connected with lift cylinder (3), lift cylinder (3) output runs through mount (2) and fixedly connected with lifter (301), lifter (301) bottom fixedly connected with movable plate (4), movable plate (4) bottom both sides fixedly connected with connecting rod (404), connecting rod (404) bottom is connected with and connects flitch (5), the one end and a set of connecting rod (404) rotation of material board (5) are connected, the material board (5) other end is through elastic cord (501) and another set of connecting rod (404).
2. The copper etching solution recycling device according to claim 1, wherein the bottom of the movable plate (4) is fixedly connected with an anode rod (401), a cathode rod (402) and a diaphragm plate (403), the diaphragm plate (403) is positioned in the middle of the bottom of the movable plate (4), and the anode rod (401) and the cathode rod (402) are respectively positioned at two sides of the diaphragm plate (403).
3. A copper etching solution recycling apparatus according to claim 2, characterized in that the bottom of the diaphragm plate (403) is against the top of the receiving plate (5).
4. The copper etching solution regeneration and circulation device according to claim 1, wherein the ejector rod (6) is fixedly connected to the inner wall of the top of the fixing frame (2), and the moving plate (4) is provided with a through groove corresponding to the ejector rod (6).
5. The copper etching solution recycling device according to claim 4, wherein a collecting box (7) is fixedly connected to one side of the top of the recycling tank (1), and an elastic plate (701) is fixedly connected to one side of the top of the collecting box (7).
6. The copper etching solution regeneration and circulation device according to claim 1, wherein one side of the fixing frame (2) is fixedly connected with a pump body (8), a water tank (801) and a water outlet pipe (802), a water inlet end and a water outlet end of the pump body (8) are respectively communicated with the water tank (801) and the water outlet pipe (802), and a plurality of groups of water outlet holes are formed in one side of the water outlet pipe (802).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322461043.7U CN220788799U (en) | 2023-09-11 | 2023-09-11 | Copper etching solution regeneration circulation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322461043.7U CN220788799U (en) | 2023-09-11 | 2023-09-11 | Copper etching solution regeneration circulation device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN220788799U true CN220788799U (en) | 2024-04-16 |
Family
ID=90652986
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202322461043.7U Active CN220788799U (en) | 2023-09-11 | 2023-09-11 | Copper etching solution regeneration circulation device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN220788799U (en) |
-
2023
- 2023-09-11 CN CN202322461043.7U patent/CN220788799U/en active Active
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