CN220776130U - Plasma jet generating device and contact lens nursing device - Google Patents

Abstract

The utility model provides a plasma jet generating device and a contact lens nursing device, wherein the plasma jet generating device comprises a plasma jet array, and the plasma jet array comprises a plurality of plasma jet sources which are arranged in an array mode. The plurality of plasma jet sources includes a first plasma jet source and a plurality of second plasma jet sources disposed about the first plasma jet source. The first plasma jet source is of a single DBD structure, and the second plasma jet source is of a double DBD structure. The plasma jet source with a single-DBD structure in the center and the plasma jet sources with a plurality of double-DBD structures in the periphery are adopted, so that uniform plasmas can be generated, and the treatment effect is improved; the discharge plasma jet is in a soft glow discharge mode, and the wire arc discharge is avoided.

Description

Plasma jet generating device and contact lens nursing device

Technical Field

The present utility model relates to a plasma jet generating device and a contact lens care device.

Background

In recent years, plasma technology has been widely used in a variety of fields including material surface modification. Compared with other material surface modification technologies, the plasma technology has the advantages of simple operation, high treatment speed, good modification effect, small environmental pollution, low energy consumption and the like, and has great application prospect and practical value in the aspect of material surface modification. Research at home and abroad shows that the dielectric barrier discharge plasma is rich in high-energy active ingredients, and the high-energy active ingredients interact with the surface of the material to generate a series of physicochemical reactions so as to change the chemical ingredients and physical morphology of the material, such as improving the properties of hydrophilicity, adhesiveness, biocompatibility, electrical property and the like of the material.

In the conventional plasma material surface modifying apparatus, plasma is mostly generated in the form of Dielectric Barrier Discharge (DBD), and when a sufficiently high voltage is applied, a filament-like discharge channel is formed between both electrodes to generate plasma.

However, there is room for improvement in the uniformity of the generated plasma in the existing plasma jet generating apparatus.

Disclosure of Invention

In view of the above-described problems in the prior art, an object of the present utility model is to provide a plasma jet generating device capable of improving plasma uniformity.

To achieve the above object, the present utility model provides a plasma jet generating device, which includes a plasma jet array including a plurality of plasma jet sources arranged in an array. The plurality of plasma jet sources includes a first plasma jet source and a plurality of second plasma jet sources disposed about the first plasma jet source. The first plasma jet source is of a single DBD structure, and the second plasma jet source is of a double DBD structure.

The plasma jet array comprising a plurality of plasma jet sources arranged in an array manner can be used for carrying out large-area treatment, and the nursing efficiency is improved.

The plasma jet source with a single-DBD structure in the center and the plasma jet sources with a plurality of double-DBD structures in the periphery are adopted, so that uniform plasmas can be generated, and the treatment effect is improved; the discharge plasma jet is in a soft glow discharge mode, and the wire arc discharge is avoided.

As one possible implementation, the plasma jet source includes a cannula, a tube, and a needle electrode inserted into the cannula, the cannula being inserted into the tube with a first gap therebetween.

With the above configuration, a good discharge can be generated.

As one possible implementation, the cannula of the first plasma jet source is open at both ends, and the cannula of the second plasma jet source is open at one end and closed at the other end.

By adopting the structure, the plasma jet source with a single DBD structure in the center and the plasma jet sources with a plurality of double DBD structures in the periphery can be formed, so that uniform plasmas can be generated, and the nursing effect is improved; the discharge plasma jet is in a soft glow discharge mode, and the wire arc discharge is avoided.

As one possible implementation manner, the plurality of second plasma jet sources are arranged in a regular polygon, the second plasma jet sources are located at the vertices of the regular polygon, and the first plasma jet sources are located at the center of the regular polygon.

With the above structure, the plurality of plasma jet sources are in regular polygon parts, and under such design, when jet plasmas with larger areas are needed, gaps can be basically not left in the middle when a plurality of subarrays are arranged together. Therefore, the regular polygon structure is very beneficial to flexibly adjusting the arrangement structure in practical application.

As one possible implementation, the regular polygon is a square, a regular pentagon, a regular hexagon, or a regular octagon.

As one possible implementation, the plurality of second plasma jet sources are arranged in one or more turns.

As one possible implementation, the cannula and the tube are quartz tubes and the needle electrode is of copper or aluminum material.

As one possible implementation, the discharger includes a chamber, the plasma jet source is mounted in the chamber, and an air inlet channel for supplying the working gas to the plasma jet source is provided in the chamber, and the air inlet channel is configured to make the working gas flow upwards and flow back downwards into the plasma jet source.

By adopting the structure, the working gas flows upwards, turns back and flows downwards into the plasma jet source, so that backfire condition in the discharge process can be prevented, on one hand, the discharge mode is stabilized, and the discharge is prevented from being converted into arc discharge due to thermal instability, so that the surface of a treatment material is uneven; on the other hand, the corrosion-proof discharge electrode improves the service life of the device.

As one possible implementation, the plasma jet source includes a cannula, a tube, and a needle electrode, the needle electrode is inserted into the cannula from above, the cannula is inserted into the tube from above with a first gap therebetween, and the gas inlet channel is configured to flow the working gas back up and down into an upper port of the tube.

As one possible implementation, at least a portion of the gas inlet channel is formed by an outer wall of the plasma jet source, along which the working gas flows back up and down into the plasma jet source.

As one possible implementation manner, the plasma jet source has a through pipe with an inner cavity for flowing the working gas, at least a part of the gas inlet channel is formed by an outer wall of the through pipe, and the working gas flows back up along the outer wall and flows down into an upper port of the through pipe.

With the structure, the processing can be facilitated.

As a possible implementation manner, a first hole and a second hole are provided on the cavity, the first hole is used for accommodating the through pipes of the plasma jet sources, the second hole forms at least one part of the air inlet channel, and the side of the second hole is communicated with the side of the first hole.

With the structure, the processing can be facilitated.

As a possible implementation, a second gap is provided between the through pipe and the bottom wall of the first hole, and the working gas flows downward into the through pipe through the second gap.

As one possible implementation manner, the peripheral wall of the first hole has a fitting portion, and the shape of the fitting portion is matched with the outer wall of the through pipe, so that the outer wall of the through pipe is fitted to the fitting portion to seal a part of the communication position between the first hole and the second hole.

As one possible implementation, a plurality of third holes are provided on the cavity, which communicate with the bottom wall of the second holes for receiving the cannulas of the plasma jet source.

As one possible implementation, a fourth hole is provided in the chamber, the fourth hole is in cross communication with the second hole to form at least a part of the intake passage, the working gas flows into the second hole from the fourth hole in an upward turn, and the second hole is opened on an upper surface or a lower surface of the chamber.

With the structure, the processing can be facilitated.

As a possible implementation, the arrester has a virtual ground potential guided directional plasma jet structure.

The virtual ground potential is adopted to guide the directional plasma jet structure, so that uniform one-dimensional discharge can be generated, the randomness and the dispersity of the discharge in space distribution are reduced, and the material performance is effectively improved.

In addition, the consistency of the treatment effect of the large-area material can be ensured, so that the problem of inconsistent modification effect in the process of treating the material in a large area can be solved.

As a possible implementation manner, the virtual ground potential guiding directional plasma jet structure means that a grounding ring is sleeved outside a through pipe of a plurality of plasma jet sources arranged in an array, the grounding ring is connected with an output end of a high-voltage power supply through a first capacitor, and the output end of the high-voltage power supply is connected with the ground of a commercial power through a second capacitor.

As a possible implementation, the capacity of the second capacitor is smaller than the capacity of the first capacitor.

As one possible implementation, the cross-sectional size of the plasma jet array is larger than the size of a single contact lens.

As one possible implementation manner, a grounding ring is sleeved on the periphery of the plasma jet array, the grounding ring is connected with a grounding wire, and the distance from the grounding ring to the lower end of the plasma jet array is 4-7mm.

In this way, good discharge characteristics can be obtained.

In another aspect, the present application also provides a contact lens care device comprising a plasma jet generating device of any one of the above structures.

Drawings

FIG. 1 is a schematic view of a contact lens care device according to an embodiment of the present utility model;

FIG. 2 is a schematic diagram of a contact lens care device in accordance with an embodiment of the present utility model;

fig. 3 (a) -3 (d) are schematic diagrams of low-temperature plasma jet arrays of the plasma jet generating device according to the embodiment of the utility model, wherein fig. 3 (a) and 3 (b) are perspective views of different representations, fig. 3 (c) is a top view, and fig. 3 (d) is a schematic diagram of a single plasma jet source;

fig. 4 (a) -4 (f) are schematic structural views of a chamber of a plasma jet generating apparatus according to an embodiment of the present utility model, in which fig. 4 (a) is a perspective view, fig. 4 (b) is a top view, fig. 4 (c) is a cross-sectional view taken along line A-A in (b), fig. 4 (d) is a bottom view, fig. 4 (e) is a partial enlarged view in fig. 4 (b), and fig. 4 (f) shows a flow path of a working gas by an arrow line on the basis of fig. 4 (c), and a plasma jet array 100 is schematically shown by a dotted line;

Fig. 5 (a) is a schematic perspective view of a front case of a plasma jet generating device according to an embodiment of the present utility model, fig. 5 (b) is a schematic rear view thereof, and fig. 5 (c) is a schematic top view thereof;

FIG. 6 is a schematic perspective view of a rear housing of a plasma jet generating device according to an embodiment of the present utility model;

FIG. 7 is a schematic perspective view of a fixture of a plasma jet generating device according to an embodiment of the present utility model;

FIG. 8 is a perspective view of the front and rear shells assembled together;

fig. 9 (a), 9 (b), 9 (c), 9 (d) show several other embodiments based on fig. 4 (d).

Fig. 10 (a) is a photograph of a cornea shaping lens before treatment by the apparatus according to the embodiment of the present utility model, and fig. 10 (b) is a photograph after treatment.

Reference numerals illustrate:

wherein 1 is an operating mechanism, 2 is a discharger, 3 is a flow measuring mechanism, 4 is a station table, 5 is a moving mechanism, 6 is a control mechanism, 7 is a motor controller, 8 is a power supply, 9 is a switching valve, 10 is a flow regulating valve, 11 is a radio frequency inversion driver, 12 is a pulse power amplifier, 13 is a radio frequency pulse transformer, 14 is a gas storage mechanism, 15 is a pressure reducing valve, 16 is a box body, 17 is a fan, 18 is a motor, 21 is a gas supply unit, 22 is a plasma generating unit, and 23 is a moving unit; 100 plasma jet arrays, 101-106 are plasma jet sources with double DBD electrode structures; 107 is a plasma jet source of a single DBD electrode structure; 107-1 is a needle electrode; 107-2 is a cannula; 107-3 is a through pipe; 200 is a cavity: 201 is a cannula hole; 202 is an upper air inlet; 203 is an air inlet hole; 204 are through holes; 205 is a threaded hole; 3 is a front shell: 301 is a through-pipe hole; 302 is a flat cable hole; 303 is an air inlet hole; 304 is a threaded hole; 305 is a threaded hole; 306 is a threaded hole; 400 is the backshell: 401 is a high voltage wiring hole; 402 is a ground wire hole; 403 is a threaded hole; 404 is a threaded hole; 405 is a threaded hole; 5 is a fixing piece: 501 is a threaded hole; 502 is a threaded bore.

Detailed Description

Hereinafter, embodiments of the present utility model will be described in detail with reference to the accompanying drawings.

The present embodiment provides a contact lens care apparatus, in which a contact lens care apparatus 1000 shown in fig. 1 and 2 is a dual-frequency pulse low-temperature plasma jet contact lens care apparatus, and in this embodiment, plasma care for a cornea shaping lens is described as an example. As shown in fig. 1 and 2, the contact lens care apparatus 1000 includes a gas supply unit 21, a plasma generation unit 22, and a movement unit 23 (fig. 2), wherein the gas supply unit 21 is configured to supply a working gas to the plasma generation unit 22; the plasma generation unit 22 is used for generating plasma so that the contact lens can be treated by the plasma; the movement unit 23 is used to displace the contact lens to move to the care station for plasma care.

In the present embodiment, the air supply unit 21 includes the air storage mechanism 14, the pressure reducing valve 15, the on-off valve 9, the flow regulating valve 10, the flow measuring mechanism 3; the plasma generating unit 22 includes a power supply 8, a control mechanism 6, a radio frequency inversion driver 11, a radio frequency pulse transformer 13, a discharger 2 (plasma jet generating device), and an operating mechanism 1; the movement unit 23 comprises a motor controller 7, a motor 18, a movement mechanism 5 and a station table 4.

Each mechanism in the gas supply unit is connected by a gas pipeline; the gas storage mechanism 14 is used for storing working gas at a certain pressure, and the pressure reducing valve 15 is arranged on the gas storage mechanism 14 and is used for reducing the pressure and discharging the working gas in the gas storage mechanism 14; one end of the switch valve 9 is connected with the pressure reducing valve 15, the other end is connected with the flow regulating valve 10, the input end of the flow measuring mechanism 3 is connected with the flow regulating valve 10, and the output end is connected with the discharger 2. At the time of gas supply, the working gas is released from the gas storage mechanism 14 through the pressure reducing valve 15, and then supplied to the discharger 2 of the plasma generating unit 22 through the on-off valve 9, the flow regulating valve 10, and the flow measuring mechanism 3.

The contact lens care apparatus 1000 further includes a housing 16, and the housing 16 is formed in a rectangular parallelepiped shape, and these mechanisms (except the gas storage mechanism) included in the gas supply unit 21, the plasma generation unit 22, and the movement unit 23 are provided substantially on the housing 16, thereby being integrally assembled.

Further, referring to fig. 1, a fan 17 is provided on the rear surface of the case 16, and the fan 17 has an upper and a lower fan, one of which can be used to blow air into the case 16 and the other of which can be used to exhaust air out of the case 16, so that the inside of the case 16 can be cooled by air circulation, and each mechanism in the case 16 can work well, and on the other hand, ozone generated in the case 16 can be discharged. In addition, since the fan 17 is provided on the rear surface of the case 16, the discharged ozone can be prevented from causing discomfort to the operator.

The structures of the gas supply unit 21, the plasma generation unit 22, and the movement unit 23 will be described in more detail.

< air supply Unit >

In the present embodiment, the working gas is, for example, argon gas, in which case the gas storage mechanism 14 is, for example, an argon gas cylinder, the argon gas in the argon gas cylinder may be, for example, 99.999% high purity gas, and the pressure reducing valve 15 may be a dedicated gas valve for argon gas.

The switch valve 9 can adopt an electromagnetic valve, so that the long-time standby is convenient, and the gas is saved. In addition, for example, when the plasma temperature is abnormal, the control means 6 may close the on-off valve 9, that is, may stop the discharge simultaneously.

The flow rate control valve 10 is used to control the flow rate of the working gas according to the instruction of the control mechanism 6.

The flow measuring mechanism 3 can adopt a mass flowmeter, can be powered by a 24V direct current power supply and is used for detecting the flow of working gas. The flow rate measuring means 3 is electrically connected to the control means 6, and the control means 6 stops the discharge when the flow rate of the gas detected by the flow rate measuring means 3 is too low or too high.

< plasma generating Unit >

The plasma generating unit is electrically connected with each mechanism, wherein the input end of the radio frequency inversion driver 11 is connected with the pulse power amplifier 12, and the output end of the radio frequency inversion driver is connected with the control mechanism 6; the input end of the radio frequency pulse transformer 13 is connected with the pulse power amplifier 12, and the output end is connected with the discharger 2.

The radio frequency inversion driver 11 and the pulse power amplifier 12 are electrically connected with the control mechanism 6.

The power supply 8 may be a 24V dc power supply. The control mechanism 6 may employ a PLC program controller.

The radio frequency inversion driver 11 is placed in a shielding metal shell, a 24V-15 VDC module is arranged in the shielding metal shell, the shielding metal shell is provided with an STM32 singlechip, a double-frequency pulse envelope driving signal with pulse width and pulse frequency capable of being modulated is generated by the STM32 singlechip, the singlechip and the control mechanism 6 can be connected through a serial port line, and an output port double-line is connected with the pulse power amplifier 12.

The pulse power amplifier 12 is arranged in the shielding metal shell and is powered by a 24V direct current power supply; adopting a floating grid inversion direct-drive technology to generate 24V double-frequency pulse envelope; the signal input port is connected with the radio frequency inversion driver; the power output port drives the rf pulse amplifier.

In addition, the pulse power amplifier 12 has a temperature detection mechanism 12a built in for analyzing the power consumed by the discharger 2 for generating the plasma jet. The temperature of the plasma jet is calibrated in advance according to the power value, so that the plasma temperature can be obtained according to the power (current or voltage), and the technical problem that the plasma temperature is difficult to accurately detect can be solved. Under the control of the control means 6, this temperature can be displayed on the display screen of the operating means 1. The function of obtaining the plasma temperature from the power may be provided on the pulse power amplifier 12 side or on the control means 6 side.

The rf pulse transformer 13 is driven by the pulse power amplifier 12, and may be fabricated using an amorphous nano-magnetic core with a turn ratio of 200 times, to generate rf pulse high voltage (e.g., about 8000V) to drive the discharger 2, so that the discharger 2 discharges in a working gas environment to generate plasma. The virtual floating grounding terminal, the ground wire high-voltage capacitor and the high-voltage insulating sleeve inside the radio frequency pulse transformer 13 are integrated, and reconfiguration is not needed.

< sports Unit >

The operating mechanism 1 and the motor controller 7 of the movement unit 23 are electrically connected with the control mechanism 6. The moving mechanism 5 is driven by a motor 18; the motor controller 7 is electrically connected to the motor 18, which motor controller 7 may be integrated on the motor 18. The station 4 is mounted on a moving mechanism 5, and is driven by the moving mechanism 5 to move.

When plasma nursing is performed on the contact lenses, the control mechanism 6 sends an instruction to the motor controller 7, the motor controller 7 drives the motor 18 to enable the moving mechanism 5 to act, further enables the station table 4 to move the contact lenses on which plasma nursing is required to be performed to a nursing position (specifically, right below the discharger 2 in the embodiment), and enables the contact lenses to be bombarded by plasma jet generated by the discharger 2 in sequence to perform plasma nursing so as to remove pollutants, oxide layers and the like on the surfaces of the lenses, thereby realizing surface activation of the lenses.

In this embodiment, the station 4 has a plurality of stations for placing contact lenses thereon, so that the station 4 can place a plurality of contact lenses at the same time. As a specific example, the station table 4 has 8 stations, and the 8 stations are arranged in such a manner as to be "2 rows of 4 stations" each, so that the station table 4 can simultaneously place at most 8 contact lenses.

In the present embodiment, when performing plasma nursing, the moving mechanism 5 moves the station table 4, and sequentially moves the plurality of contact lenses placed thereon to the nursing position at regular time intervals, thereby performing plasma nursing.

In the present embodiment, the motor 18 includes a motor 18A and a motor 18B for causing the movement mechanism 5 to generate a forward-backward movement and a leftward-rightward movement (i.e., two-dimensional movement in the horizontal plane), respectively, and the corresponding motor controller 7 includes a motor controller 7A and a motor controller 7B for controlling the motor 18A and the motor 18B, respectively. When no distinction is made, the motor 18 and the motor controller 7 are collectively referred to.

In addition, as shown in fig. 1 and 2, the operating mechanism 1 is disposed on the front surface of the case 16, and is electrically connected to the control mechanism 6, and an operator can set a plurality of microwave pulse discharge parameters, such as the frequency and pulse width time of the driving signal, the pulse duty ratio, the nursing time, etc., on the operating mechanism 1. In the present embodiment, the operation mechanism 1 is a touch panel.

< action >

In this embodiment, when the contact lens care apparatus 1000 is turned on, a main switch (not shown) is turned on first, after a certain start time, an operator can click an "eject" key on the operation mechanism 1, the station table 4 slowly moves out of the case under the control of the control mechanism 6, the operator sequentially places lenses to be treated into a plurality of stations in the station table 4, then selects a station to be treated on the operation mechanism 1, and performs, for example, the following parameter settings: the pulse switching frequency is initially set to 4kHz (stable and unchanged), the pulse duty ratio is initially set to 50% (adjustable), the microwave driving pulse frequency is initially set to 42kHz (adjustable), and the microwave pulse width time is initially set to 8kns (adjustable).

After the setting is finished, an operator clicks a start key on the operating mechanism 1, the motor 7 drives the moving mechanism 5 to slowly move the contact lens to be processed to the position below the discharger 2, the distance between the contact lens and the discharger is 25mm, and the discharge is started; the nursing time of each lens can be set to be 20s, and after 20s, the motor 7 makes the station table 4 move to switch the next contact lens to carry out nursing. When all the contact lenses on the station 4 have been finished with one care for 20 seconds (called primary care), the motor 7 moves the station 4 so that each lens performs one care again (called secondary care), and the time for this care can be set to 1 second. Thus, the total care time per lens is 21 seconds.

The distance of the contact lens from the arrester 2 can be set freely according to circumstances, for example in the range of 15mm-30mm, or in the range of 25±2 mm. The primary care time and the secondary care time of each contact lens can be freely set, and for example, the primary care time can be set in a range of 10 seconds to 30 seconds, and the secondary care time can be set to 1 to 2 seconds. In addition, secondary care may be omitted when there is only one contact lens on the station 4.

In addition, when the flow measuring means 3 detects that the gas flow is lower than, for example, 1L/min (first flow threshold) or higher than, for example, 1.8L/min (second flow threshold), the discharge is stopped, and at the same time, a prompt is made on the display screen of the operating means 1, for example, a red font is displayed, "gas flow is too low/high, plasma has been automatically turned off-! Please increase/decrease the opening of the gas cylinder valve and the flow valve ", the operator clicks the" reset "button on the touch screen, the control mechanism 6 controls the motor to return the station table 4 to the initial position before the start of the treatment, then the operator can adjust the gas flow, and after the waiting flow is normal and the discharge is restored, the contact lens can be reprocessed.

When the gas flow is too low (e.g. below 1L/min), the contact lens is prone to burn due to too high a temperature, and when the gas flow is too high (e.g. above 1.8L/mi) n, the contact lens is prone to blow up due to the strong gas flow and deviate from the desired position on the stage table 4 and even drop. Therefore, in the present embodiment, when it is detected that the gas flow rate is lower than 1L/min (first flow rate threshold value) or higher than 1.8L/min (second flow rate threshold value), the discharge is stopped, and plasma generation is stopped, so that safe and reliable plasma care can be performed. The flow rate threshold value is set by the skilled person in accordance with parameters of the discharger 2 and the like.

The temperature detection means is controlled by the control means 6 to calibrate the temperature of the plasma jet in advance on the basis of the power value, so that the temperature of the plasma can be obtained on the basis of the power value. When the temperature is detected to be within 10-30 ℃ and normally works, a temperature lower than 10 ℃ (a first temperature threshold) indicates that the discharger 2 is not discharged, no processing is executed, the motor 7 and the like are not operated, and idle running is prevented; when the temperature is greater than 30 degrees (second temperature threshold), the discharge is stopped, and the contact lens is prevented from being deformed at high temperature.

After the lens care is finished, discharging is stopped at the same time, the lens is taken out, the reset is clicked, the station table 4 returns to the initial position, the switch of the power supply 8 is turned off, and the whole care process is finished.

With the contact lens care device 1000 of the present embodiment, tear proteins on contact lenses can be removed more thoroughly. The RF inversion driver 11 (STM 32 single chip microcomputer) generates a double-frequency pulse envelope driving signal with low-frequency pulse of 4kHz and high-frequency pulse of 40-50MHz (or 30-50MHz, which can be modulated), and the double-frequency pulse envelope driving signal is inverted and directly driven by the pulse power amplifier 12 to generate a 24V double-frequency pulse envelope signal, and the 24V double-frequency pulse envelope signal acts on the RF pulse transformer 13 to generate high voltage of the RF pulse, and then drives the discharger 2 to generate a large amount of uniform plasmas to act on the surface of an object, so that the purposes of removing protein, sterilizing and disinfecting are achieved.

Here, the high frequency is a high frequency fundamental wave signal of 40-50MHz, which is a driving high voltage radio frequency wave for generating discharge, the specific frequency value depends on the specific discharger structure, and the frequency value can be determined in combination with discharger debugging; the pulse width of the high-frequency signal can adjust the intensity (shape, density and temperature) of the discharge plasma; the low-frequency pulse frequency is fixed at a specified value (for example, 4 kHz) so as to achieve 4000 sparks per second during ignition, thereby avoiding the defect of single continuous wave ignition failure; the duty ratio of the low-frequency pulse is based on the fact that pulse discharge is adopted when the temperature of the plasma is detected to be too high, and the temperature of the plasma jet is reduced to a proper working temperature.

Further, with the contact lens care device 1000 of the present embodiment, the contact lens water contact angle can be reduced, and the wettability of the lens can be increased. The radio frequency pulse high-voltage driver discharger 2 generates uniform plasmas, and charged particles are accelerated by bias voltage to bombard the surface of the lens, so that pollutants and oxide layers on the surface of the lens can be effectively removed, and the surface activation of the lens is realized; the water drops on the surface of the lens subjected to plasma treatment can collapse on the mirror surface, so that the water contact angle of the surface of the lens is smaller, the lens has good wettability, and meanwhile, the low adhesion of the polluted lipid is indicated, and the wearing safety and comfort can be improved.

In the above description, the movement unit moves the station table 4 to sequentially perform the care of each contact lens, however, the discharger 2 may be moved to sequentially perform the care of each contact lens, that is, the care of each contact lens may be performed as long as the station table 4 and the discharger 2 are moved relatively.

Embodiment of the plasma jet generating device

In a specific embodiment of the present utility model, there is also provided a plasma jet generating device, the structure of which can be incorporated in the discharger in the above embodiment.

The ion beam jet generating device will be described below.

In recent years, low temperature plasma technology has been widely used in a variety of fields including material surface modification. Compared with other material surface modification technologies, the low-temperature plasma technology has the advantages of simple operation, high treatment speed, good modification effect, small environmental pollution, low energy consumption and the like, and has great application prospect and practical value in the aspect of material surface modification. Research at home and abroad shows that the dielectric barrier discharge plasma is rich in high-energy active ingredients, and the high-energy active ingredients interact with the surface of the material to generate a series of physicochemical reactions so as to change the chemical ingredients and physical morphology of the material, such as improving the properties of hydrophilicity, adhesiveness, biocompatibility, electrical property and the like of the material.

In the conventional plasma material surface modifying devices, plasma is mostly generated in the form of Dielectric Barrier Discharge (DBD), and when a voltage is sufficiently high, a filament-like discharge channel is formed between the two electrodes to generate low-temperature plasma. The low-temperature plasma has lower temperature, does not damage the surface of the material when the surface of the material is modified, and the plasma treatment only acts on the outermost few layers of molecules on the surface of the material, so that the bulk performance of the material is not affected. For example, chinese patent publication No. CN101925246a discloses a method for generating low-temperature plasma capable of being touched directly by human body, which uses a low-temperature plasma generating device to generate low-temperature plasma capable of being touched directly by human body. However, the treatment area of a single plasma jet is usually only a few square millimeters, and the application of the plasma jet in surface treatment is severely limited by the too small treatment range. Based on this, in order to expand the plasma scale, it is considered to design a plasma jet array expanded in one-dimensional and two-dimensional dimensions. Such as by exciting a plasma torch array device with microsecond pulses to produce a plasma plume; the plasma torch apparatus is energized with an ac power supply to produce an array of plasma plumes. However, certain defects and defects exist in application, such as high jet gas temperature, short jet length, randomness and dispersibility of discharge distribution, and poor discharge tempering stability, which cannot ensure uniformity and consistency of material treatment effect. In addition, the device has limited processing range and processing uniformity, and continuous and large-area processing of materials cannot be guaranteed.

Aiming at the technical problems of the device, the specific embodiment of the utility model provides a plasma jet generating device to solve the problems of small processing area, low efficiency, single function, limited application range, poor processing effect and the like in the field of material surface modification.

Referring to fig. 3 (a) -8, the present embodiment provides a plasma jet generating device 2A, which is a DBD (Dielectric Barrier Discharge ) structured low-temperature plasma jet generating device, including a plasma jet array 100, a cavity 200, a front case 300, a rear case 400, and a fixture 500. Wherein the front and rear cases 300 and 400 are assembled together to form a complete housing (fig. 8), the fixing member 500 is used to fix the front and rear cases 300 and 400 to an object structure (e.g., a case in the above embodiment), the chamber 200 is installed in the front and rear cases 300 and 400, and the plasma jet array 100 is installed in the chamber 200.

The plasma jet array 100 includes a plurality of array-arranged plasma jet sources of DBD structures, including a single DBD electrode structure plasma jet source 107 and dual DBD electrode structure plasma jet sources 101-106.

The plasma jet source 107 of the single-DBD electrode structure consists of a cannula 107-2, a through pipe 107-3 and a needle electrode 107-1, wherein the through pipe 107-3 is provided with a hollow inner cavity and is open at two ends, the hollow cannula 107-2 with two open ends is inserted into the through pipe 107-3 with two open ends, a gap is reserved between the two (namely, the outer wall of the cannula and the inner wall of the through pipe) for the working gas to flow, the needle electrode in the cannula 107-2 is connected with a power supply, and the working gas is input from the upper port of the through pipe 107-3. The cannula 107-2 may be a capillary tube, smaller in diameter, so as to facilitate the deployment of the needle electrode 107-1 and the action of the working gas.

In the structure of the plasma jet sources 101 to 106 of the dual DBD electrode structure, one end of the cannula (the end where the electrode is inserted) is opened and the other end is closed, compared to the plasma jet source 107 of the single DBD electrode structure. Other structures are the same.

The needle electrodes of the plasma jet sources in the plasma jet array 100 are connected and then connected with a high-voltage power supply (high-voltage radio frequency power supply), meanwhile, working gas is connected with a through pipe, when the working gas is introduced, the voltage is gradually increased, the tip of the cannula starts to ignite to generate corona, and along with the increase of the voltage, the plasma starts to spread downwards along the through pipe until being sprayed out of the lower port of the through pipe 107-3, so that uniform plasma is formed. In addition, in the present embodiment, the cross-sectional size of the plasma jet array 100 is approximately equivalent to the size of a single contact lens, and in order to ensure that the plasma jet array 100 completely covers a single contact lens when the lens is being treated, the cross-sectional size of the plasma jet array 100 is preferably larger than the size of a single contact lens.

Because the plasma jet source 107 with a single DBD electrode structure is adopted, and the periphery of the plasma jet source 106 with a plurality of double DBD electrode structures is wound, the discharge of the plasma jet sources can be ensured, and the discharge non-uniformity is avoided; the discharge plasma jet is in a soft glow discharge mode, and the wire arc discharge is avoided. The plasma jet array 100 of the present embodiment has a dual DBD electrode structure, and is uniform and efficient in discharge.

In the present embodiment, the plurality of plasma jet sources in the plasma jet array 100 includes 1 plasma jet source 107 with a single DBD electrode structure and 6 plasma jet sources 101-106,6 plasma jet sources 101-106 with double DBD electrode structures, which are arranged in a regular hexagon, and the 1 plasma jet source 107 with a single DBD electrode structure is located at the center of the regular hexagon.

Referring to fig. 3 (a) -3 (d), a ground ring 108 is provided around the entire periphery of the plurality of plasma jet sources 101 to 107, and the ground ring 108 is connected to a ground line (not shown). The position of the ground ring 108 is set appropriately, and in this embodiment, for example, the distance from the ground ring 108 to the lower end of the tube may be 4 to 7mm, so that good discharge characteristics can be obtained.

By adopting the embodiment, the discharge modes of the plurality of peripheral plasma jet sources 101-106 are double-DBD discharge, the discharge mode of the central 1 plasma jet source 107 is single-DBD discharge, and a virtual ground potential guiding directional plasma jet structure is adopted, so that uniform one-dimensional discharge can be generated, the randomness and the dispersity of the discharge in space distribution are reduced, the material performance is effectively improved, the consistency of the large-area material treatment effect is ensured, and the problem of inconsistent modification effect in the process of large-area material treatment can be solved.

The virtual ground potential refers to the virtual circuit, referring to fig. 3 (a) -3 (d), connected to an insulated conductor ring (grounding ring), which is sleeved on the lower end of the periphery of the quartz tube body assembly formed by the plasma jet sources 101-107, and is connected to an output end of the high-voltage power supply through a high-voltage capacitor of 20pF, and the output end of the high-voltage power supply is connected to the ground of the mains supply through a capacitor of 1 nF.

The plasma jet generating device of the embodiment continuously bombards the surface of the material based on the high-ionization degree and high-activity particles generated by the double-frequency pulse high-voltage excitation gas discharge, can destroy the original chemical bonds, and introduces new polar groups, so that the polarity of the surface of the material is improved, and the hydrophilicity of the surface of the material is improved.

Here, the "double frequency pulse" has been explained in the description of the plasma generating unit of the above embodiment, and will not be described here. In the present embodiment, the frequency of the high-frequency fundamental wave signal is adjustable between 30 and 50MHz, and the frequency of the low-frequency pulse signal is fixed at, for example, 4kHz. In addition, the high voltage range of the radio frequency pulse can be 2 kilovolts to 10 kilovolts.

Referring to fig. 4 (a) -4 (f), the cavity 200 is a cuboid with a length and a width of 50mm, a width of 20mm and a height of 50mm, 7 holes 201 (6 holes are arranged on the periphery and 1 hole is arranged on the center) in a regular hexagon are formed in the upper surface of the cavity 200, a regular hexagon hole 204 is formed in the lower surface of the cavity, the holes 201 are communicated with the holes 201 up and down, and positions of the holes 201 correspond to vertexes of the regular hexagon of the holes 204. Each aperture 201 may embed a cannula of the plasma jet array 100, and correspondingly, a tube of the plasma jet sources 101-106 of the dual DBD electrode structure is arranged at the vertex of a regular hexagon of the aperture 204. The apexes of the regular hexagons of the holes 204 are not sharp corners, but are chamfered to form bonding portions 204a, so that the bonding portions can be matched and bonded to the outer wall shape of the cylindrical tube of the plasma jet sources 101 to 106. In addition, the ducts of the plasma jet sources 101 to 106 do not contact the bottom surface of the hole 204 (it will be appreciated that the bottom surface is located at the upper end because the lower end of the hole 204 is open), and are kept at a distance from the bottom surface. In addition, the lower ends of the tubes of the plasma jet sources 101-107 extend beyond the aperture 204.

By adopting the regular hexagon layout mode of the embodiment, a plurality of dielectric barrier discharge structures can be connected in series according to the width of the material to be processed. The use of such a regular hexagonal structure is considered to be that if the regular hexagonal jet array is used as a sub-array, when a larger area of jet plasma is required, a plurality of such sub-arrays may be arranged together with substantially no gaps therebetween. Therefore, the regular hexagon structure is very beneficial to flexibly adjusting the arrangement structure in practical application. In addition, as other embodiments, other regular polygon layouts, such as square, regular pentagon, regular octagon, etc., may also be employed.

Fig. 9 (a) -9 (d) show several other embodiments based on fig. 4 (d), in fig. 9 (a), there are a central one plasma jet source and 4 peripheral plasma jet sources arranged in a square, correspondingly, the cavity 200 is provided with a square hole 204A and 5 holes 201A, 1 being located in the center and 4 being located at the apex of the square; in fig. 9 (B), there are a central one plasma jet source and 8 peripheral plasma jet sources arranged in a regular octagon, and correspondingly, there are regular octagon holes 204B and 9 holes 201B in the chamber 200, 1 being located at the center and 8 being located at the vertices of the regular octagon, 9 holes 201B.

In fig. 9 (C), the same as the above embodiment, there are a central one plasma jet source and peripheral 6 plasma jet sources arranged in a regular hexagonal shape, except that a circular hole 204C is formed in the chamber 200 to accommodate the through-pipes of the plurality of plasma jet sources.

In fig. 9 (d), unlike the above embodiment, there are a central one plasma jet source and 18 peripheral plasma jet sources, and the 18 plasma jet sources are arranged in two circles inside and outside, the 6 plasma jet sources of the inner ring are arranged in a regular hexagon, and the 12 plasma jet sources of the outer ring are arranged in a regular dodecagon. Accordingly, a circular hole (as shown in fig. 9 (d)) or a regular dodecagon hole as described above is formed in the chamber 200 to accommodate the plurality of the through pipes of the plasma jet sources.

Referring to fig. 4 (a) -4 (f), an upper air intake hole 202 having an outer diameter of 3mm and a depth of 26mm is opened downward from the upper surface of the chamber 200, and the upper end of the upper air intake hole 202 is closed (sealed) with an insulating adhesive or the like; an air inlet hole 203 with an outer diameter of 3mm and a depth of 25mm is formed on one side surface of the cavity 200, an upper air inlet hole 202 and the air inlet hole 203 are intersected and communicated to form an air inlet channel, and working air enters the cavity from the air inlet hole 203 and flows upwards into the upper air inlet hole 202 from the air inlet hole 203 in a turning way. The side of the upper inlet hole 202 communicates with one vertex of the regular hexagon of the hole 204 (a part of the material located at the upper portion of the fitting portion 204a is removed and opened), however, when the through-pipes of the plasma jet sources 101 to 106 are arranged in the hole 204, the working gas needs to flow upward along the outer wall of the through-pipe to the gap between the through-pipe and the bottom wall of the hole 204 due to the blocking of the outer wall of the through-pipe to enter the hole 204 therefrom. The working gas then flows down all of the plasma jet sources 101-107, i.e. into the upper ports of the ducts.

Here, it is understood that the outer wall of the tube may be considered as the outer wall of the plasma jet sources 101-106, and the outer wall of the tube of one of the peripheral plasma jet sources 101-106 forms part of the gas inlet channel guiding the flow of the working gas.

By adopting the structure, as the air inlet hole is arranged at a position lower than the air inlet at the upper end of the through pipe by a prescribed distance (about 5mm in the embodiment), working gas firstly ascends to the top end of the quartz through pipe through the air inlet channel and then uniformly disperses and turns back to enter the through pipe downwards, thereby preventing backfire condition in the discharging process, stabilizing the discharging mode on one hand and preventing the discharge from being converted into arc discharge due to heat instability and causing uneven surface of the processed material; on the other hand, the corrosion-proof discharge electrode improves the service life of the device. In addition, the cavity 200 is connected to the housing by a threaded hole 205.

In the above description, the upper air intake hole 202 is formed on the upper surface of the cavity 200, which is in cross communication with the air intake hole 203 to form the air intake passage, however, as other embodiments, the upper air intake hole 202 may be omitted, and the lower air intake hole is formed on the lower surface of the cavity 200, which is laterally communicated with the hole 204 and extends further upward from the lower side to the upper side to the lower side to be communicated with the air intake hole 203. When in use, the lower port of the lower air inlet hole is closed. In this way, the intake passage can also be formed. In addition, in the case of forming such a lower intake hole, it is also possible to omit the intake hole 203 without closing the lower port of the lower intake hole, and attach an air pipe to the lower port of the lower intake hole.

Referring to fig. 5 (a) -5 (c), the front case 300 is provided with a hole 301 of a regular hexagon to embed the plasma jet array 100; the front shell 300 is provided with a wiring hole 302 for leading out a grounding wire; the right side of the front case 300 is provided with an air inlet 303 which is communicated with the air inlet 203; the front shell 300 is symmetrically provided with two threaded holes 304 communicated with the threaded holes 205; the front housing 300 is symmetrically provided with two screw holes 305 connected to the rear housing.

Referring to fig. 6, the rear case 400 is provided with a high voltage wiring hole 401, a ground wire hole 402 and screw holes 403-405. The outgoing lines of the plurality of needle electrodes are led out from the high-voltage wiring holes 401 to be connected with a high-voltage power supply; the grounding wire led out from the wiring hole 302 of the front shell 300 is led out from the grounding wire hole 402 to be grounded; the high-voltage wiring hole 401 is separated from the grounding wire hole 402 by a prescribed distance (for example, more than 35 mm), so that high-voltage breakdown can be effectively avoided; the rear shell 400 is provided with threaded holes 403, 405 which are connected with the threaded holes 305, 306 of the front shell of fig. 3 (a) -3 (d); the rear housing 400 is provided with a threaded hole 404 for connection to a fixture.

Referring to fig. 7, the fixture 500 is provided with embedded screw holes 501, 502, wherein the screw hole 501 is connected with the screw hole 405 of the rear case 400, and the screw hole 502 is connected with the object structure.

Referring to fig. 10 (a) and 10 (b), a comparison of the images before and after treatment of the cornea shaping lens by the apparatus according to the embodiment of the present utility model is shown, wherein fig. 10 (a) is before treatment and fig. 10 (b) is after treatment, and the treatment time is 20s, and it can be seen that the hydrophilicity of the cornea shaping lens is significantly improved after treatment (i.e., plasma treatment).

In addition, in the present embodiment, the cavity 200, the front case 300, the rear case 400, and the fixing member 500 are made of plastic, for example, polytetrafluoroethylene material. The screws used for the threaded holes are all plastic screws.

In addition, the intubation tube and the through tube of the plasma jet source 101-107 can be quartz tubes, the length of the intubation tube can be 65-75mm, the outer diameter can be 1.8-2.2mm, and the wall thickness can be 0.3-0.6mm; the length of the through pipe can be 45-55mm, the outer diameter can be 2.8-4.2mm, and the wall thickness can be 0.3-0.8mm; a part of the cannula is leaked above the through pipe, and the size of the exposed part can be 9-19mm; the length of the single needle electrode can be 75-85mm, and a plurality of needle electrodes are connected through welding spots; the needle electrode is a high voltage electrode, and the material can be copper, aluminum and other conductive materials. Good characteristics can be obtained by setting parameters such as the dimensions of these components, the dimensional relationships, etc., including the exposed length of the cannula.

The working gas may be an elemental gas or a mixture thereof, or may be air, a gaseous compound, or a gaseous organic substance.

The plasma jet array generating device has the characteristics of high efficiency, universality, stability, uniformity and the like, and has high application value for material surface modification. In addition, the dual-DBD low-temperature plasma jet array generating device has the advantages of simple structure, good stability, low cost, safety and environmental protection.

In addition, the present embodiment has a simple structure, and the apparatus is installed in an open atmosphere environment without relying on an expensive vacuum chamber.

In the above description, regarding the arrangement of the plurality of plasma jet sources, the plasma jet sources 101 to 106 of the peripheral dual DBD electrode structure are arranged in a regular polygon, so that flexible adjustment of the arrangement structure can be facilitated. However, the present utility model is not limited thereto, and the plurality of plasma jet sources of the dual DBD electrode structure may be arranged in other manners at the periphery of the plasma jet source of the single DBD electrode structure, for example, in a circular shape. In addition, in the above description, the peripheral plasma jet sources 101 to 106 of the dual DBD electrode structure enclose one turn, however, the present utility model is not limited thereto, and the plasma jet sources of the "multi-turn" dual DBD electrode structure may be provided at the periphery of the plasma jet source of the single DBD electrode structure.

In addition, in the above description, the single plasma jet source has the tube, the cannula, and the electrode, however, the present utility model is not limited thereto from the viewpoint of being able to generate plasma, and other structures may be employed.

In addition, in the above description, the chamber 200 is a single member of a unitary structure, however, the present utility model is not limited thereto and a separate structure may be employed.

In addition, it is understood that the content described in the present embodiment may be incorporated into the contact lens care apparatus of the above embodiment without contradiction.

The devices described in this specification are not limited to nursing cornea shaping lenses, but may also be used to nursing other cornea contact lenses, scleral contact lenses, such as conventional contact lenses (known as soft contact lenses), hard cornea contact lenses, and the like.

Claims (13)

1. A plasma jet generating device is characterized by comprising a plasma jet array, wherein the plasma jet array comprises a plurality of plasma jet sources which are arranged in an array,

the plurality of plasma jet sources including a first plasma jet source and a plurality of second plasma jet sources, the plurality of second plasma jet sources being disposed about the first plasma jet source,

the first plasma jet source is of a single DBD structure, and the second plasma jet source is of a double DBD structure.

2. The plasma jet generating device of claim 1, wherein the plasma jet source comprises a cannula, a tube, and a needle electrode, the needle electrode being inserted into the cannula, the cannula being inserted into the tube with a first gap therebetween.

3. The plasma jet generating device according to claim 2, wherein the cannula of the first plasma jet source is open at both ends,

the cannula of the second plasma jet source is open at one end and closed at the other end.

4. The plasma jet generating device according to claim 1, wherein the plurality of second plasma jet sources are arranged in a regular polygon, the second plasma jet sources being located at vertices of the regular polygon,

the first plasma jet source is positioned at the center of the regular polygon.

5. The plasma jet generating device according to claim 4, wherein the regular polygon is a square, a regular pentagon, a regular hexagon, or a regular octagon.

6. The plasma jet generating device of any of claims 1 to 5, wherein the plurality of second plasma jet sources are arranged in one or more turns.

7. The plasma jet generating device according to claim 2, wherein the cannula and the tube are quartz tubes and the needle electrode is of copper or aluminum material.

8. The plasma jet generating device according to any one of claims 1 to 5, characterized by having a virtual ground potential directed directional plasma jet structure.

9. The plasma jet generating device according to claim 8, wherein the virtual ground potential guiding directional plasma jet structure is that a grounding ring is sleeved outside a through pipe of a plurality of plasma jet sources arranged in an array, the grounding ring is connected with an output end of a high-voltage power supply through a first capacitor, and the output end of the high-voltage power supply is connected with the ground of a mains supply through a second capacitor.

10. The plasma jet generating device according to claim 9, wherein a capacity of the second capacitor is smaller than a capacity of the first capacitor.

11. The plasma jet generating device of any of claims 1 to 5, wherein the cross-sectional size of the plasma jet array is larger than the size of a single contact lens.

12. The plasma jet generating apparatus as claimed in any of claims 1 to 5, wherein a ground ring is sleeved on the periphery of the plasma jet array, the ground ring being connected to a ground line,

the distance from the grounding ring to the lower end of the plasma jet array is 4-7mm.

13. A contact lens care device comprising a plasma jet generating device according to any one of claims 1 to 12.