CN220711697U

CN220711697U - Plasma generating device and wafer processing equipment

Info

Publication number: CN220711697U
Application number: CN202322343201.9U
Authority: CN
Inventors: 郭振
Original assignee: Hefei Qizhong Technology Co ltd; Chipmore Technology Corp Ltd
Current assignee: Hefei Qizhong Technology Co ltd; Chipmore Technology Corp Ltd
Priority date: 2023-08-30
Filing date: 2023-08-30
Publication date: 2024-04-02
Anticipated expiration: 2033-08-30

Abstract

The utility model relates to the field of semiconductor manufacturing, and particularly discloses a plasma generating device and wafer processing equipment, wherein the plasma generating device comprises a tank body, a vent pipe penetrating through the tank body and an excitation element arranged on one side of the vent pipe, the tank body comprises an inner shell with a cavity, an outer shell positioned on the outer side of the inner shell, and an interlayer formed between the inner shell and the outer shell, the vent pipe penetrates through the cavity of the inner shell, and a water inlet and a water outlet which are communicated with the interlayer are formed in the outer shell. According to the utility model, the temperature in the cavity of the inner shell of the tank body can be reduced by injecting cooling water into the interlayer of the tank body, so that the temperature in the vent pipe is reduced, and the sealing performance of the vent pipe is prevented from being influenced by high temperature.

Description

Plasma generating device and wafer processing equipment

Technical Field

The utility model relates to the field of semiconductor manufacturing, in particular to a plasma generating device and wafer processing equipment.

Background

In the process of processing wafers for semiconductors, a plasma is required to process the wafers, and one method of generating plasma is as follows: and introducing a reaction gas such as helium or nitrogen into the vent pipe, and then emitting ultraviolet rays or microwaves into the vent pipe to release plasma from the reaction gas. When the plasma is generated, the reaction gas in the vent pipe is in a high-temperature and high-pressure state, and the sealing performance of the vent pipe can be affected.

Disclosure of Invention

The utility model aims to provide a plasma generating device and wafer processing equipment capable of cooling a vent pipe.

In order to achieve the above purpose, the utility model provides a storage tool, which comprises a tank body, a vent pipe penetrating through the tank body and an excitation element arranged on one side of the vent pipe, wherein the tank body comprises an inner shell with a cavity, an outer shell positioned on the outer side of the inner shell, and an interlayer formed between the inner shell and the outer shell, the vent pipe penetrates through the cavity of the inner shell, and a water inlet and a water outlet which are communicated with the interlayer are formed in the outer shell.

As a further improvement of the utility model, the inner shell comprises a first side wall and a second side wall which are oppositely arranged, a first connecting wall for connecting the first side wall and the second side wall, and an air inlet and an air outlet which are respectively arranged on the first side wall and the second side wall.

As a further improvement of the utility model, the shell comprises a third side wall, a fourth side wall and a second connecting wall, wherein the third side wall and the fourth side wall are respectively positioned outside the first side wall and the second side wall, the second connecting wall is used for connecting the third side wall and the fourth side wall, a first opening corresponding to the air inlet is formed in the third side wall, a second opening corresponding to the air outlet is formed in the fourth side wall, and the tank body further comprises a communicating part for communicating the air inlet with the first opening, the air outlet and the second opening.

As a further improvement of the utility model, the plasma generating device further comprises a temperature sensor connected to the tank and extending partially into the chamber of the inner housing.

As a further development of the utility model, the excitation element is connected to the tank and comprises at least one of an ultraviolet emitter and a microwave emitter.

As a further improvement of the utility model, the water inlet and the water outlet are respectively positioned on two opposite sides of the shell and are staggered in the height direction of the shell.

As a further improvement of the utility model, the air inlets and the air outlets are all provided with a plurality of air inlets and the air outlets, the plasma generating device further comprises an air exhaust cover, the air exhaust cover is arranged on the outer side of the fourth side wall and is surrounded with the fourth side wall to form an air exhaust cavity communicated with the second openings, and the air exhaust cover is provided with an air exhaust opening communicated with the air exhaust cavity and used for communicating with an air exhaust opening of the air exhauster.

As a further improvement of the utility model, the vent pipe is arranged to penetrate through the first side wall and the second side wall along the height direction of the tank body, and comprises a penetrating part positioned in the cavity of the inner shell, an air inlet end and an air outlet end which are exposed outside the outer shell, wherein the air inlet end is used for communicating with the air supply element to introduce reaction gas into the vent pipe, and one end of the penetrating part, which is close to the second side wall, is arranged close to the air inlet end in the extending direction of the vent pipe.

As a further development of the utility model, both the outer shell and the inner shell are cylindrically arranged.

The utility model also provides wafer processing equipment which comprises the plasma generating device and a wafer processing chamber communicated with the vent pipe.

The utility model has the beneficial effects that:

according to the plasma generating device and the wafer processing equipment, the tank body is arranged on the periphery of the vent pipe, and cooling water is injected into the interlayer of the tank body, so that the temperature in the cavity of the inner shell of the tank body can be reduced, the temperature in the vent pipe is reduced, and the sealing performance of the vent pipe is prevented from being influenced by high temperature.

Drawings

FIG. 1 is a schematic diagram of a plasma generator according to an embodiment of the present utility model;

FIG. 2 is a schematic cross-sectional view of a plasma generator according to an embodiment of the present utility model;

FIG. 3 is a schematic cross-sectional view of the tank of FIG. 1;

FIG. 4 is a schematic diagram of an exploded structure of a plasma generator according to an embodiment of the present utility model;

fig. 5 is a schematic view of a semi-sectional structure of the can body of fig. 1.

In the figure:

10. a plasma generating device;

1. a tank body; 11. a chamber; 12. an inner case; 121. a first sidewall; 122. a second sidewall; 123. a first connecting wall; 124. an air inlet; 125. an air outlet; 13. a housing; 131. a water inlet; 132. a water outlet; 133. a third sidewall; 134. a fourth sidewall; 135. a second connecting wall; 136. a first opening; 137. a second opening; 14. an interlayer; 15. a communication section; 16. a first isolation channel; 17. a second isolation channel; 18. a third isolation channel;

2. a vent pipe; 21. a penetration portion; 22. an air inlet end; 23. an air outlet end;

3. an excitation element; 31. an ultraviolet emitter; 32. a microwave emitter;

4. a temperature sensor;

5. an air-extracting cover; 51. an air pumping cavity; 52. and an extraction opening.

Detailed Description

The present utility model will be described in detail below with reference to embodiments shown in the drawings. The embodiments are not intended to limit the utility model, but all mechanical, method, or functional modifications of the utility model based on the embodiments are within the scope of the utility model.

Terms such as "upper," "lower," "left," "right," "front," "rear," and the like as used herein to refer to a spatial relative position are used for ease of description to describe one feature's relationship to another feature as illustrated in the figures. It will be appreciated that the term spatially relative position is intended to encompass different orientations than those depicted in the figures, depending on the product placement location, and should not be construed as limiting the claims. In addition, the term "horizontal" as used herein is not entirely equivalent to being oriented perpendicular to gravity, allowing for some degree of tilt.

As shown in fig. 1-4, an embodiment of the present utility model provides a plasma generating device 10, including a tank 1, a vent pipe 2 penetrating through the tank 1, and an excitation element 3 disposed at one side of the tank 1, when in operation, reactant gas (such as helium and nitrogen) is introduced into the vent pipe 2, under the action of the excitation element 3, the reactant gas can release plasma, and when the plasma is generated, the interior of the vent pipe 2 is in a high temperature state, in order to reduce the temperature in the vent pipe 2, the tank 1 includes an inner shell 12 having a cavity 11, an outer shell 13 disposed outside the inner shell 12, and a sandwich 14 formed between the outer shell 13 and the inner shell 12, the vent pipe 2 is disposed through the cavity 11 of the inner shell 12, and a water inlet 131 and a water outlet 132 communicating with the sandwich 14 are formed on the outer shell 13. Cooling water can be injected into the interlayer 14 through the water inlet 131 and then flows out from the water outlet 132, and in the process, the cooling water is contacted with the inner shell 12, so that the temperature in the cavity 11 can be reduced, and the temperature in the ventilation pipe 2 can be reduced.

Further, the inner shell 12 includes a first side wall 121 and a second side wall 122 disposed opposite to each other, a first connecting wall 123 connecting the first side wall 121 and the second side wall 122, and an air inlet 124 and an air outlet 125 respectively provided on the first side wall 121 and the second side wall 122, wherein when the air outlet 125 is communicated with an air pump or the air inlet 124 is communicated with a blower, external air can enter the chamber 11 of the inner shell 12 from the air inlet 124 and then flow out from the air outlet 125, and the temperature in the chamber 11 is further reduced in the process.

The housing 13 may be disposed outside the first connecting wall 123, and the interlayer 14 is formed between the housing and the first connecting wall 123. Or, the outer shell 13 surrounds the whole inner shell 12, and comprises a third side wall 133, a fourth side wall 134, a second connecting wall 135 and a first opening 136, wherein the third side wall 133 and the fourth side wall 134 are respectively positioned outside the first side wall 121 and the second side wall 122, the second connecting wall 135 is connected with the third side wall 133, the third side wall 133 is provided with a first opening 136 corresponding to the air inlet 124, the fourth side wall 134 is provided with a second opening 137 corresponding to the air outlet 125, the tank 1 further comprises a communicating part 15 which is communicated with the air inlet 124 and the first opening 136, the air outlet 125 and the second opening 137, the air inlet 124 is communicated with the outside air through the first opening 136, the air outlet 125 is communicated with the outside air through the second opening 137, the communicating part 15 plays a role of isolating, and the interlayer 14 for preventing the circulating cooling water is communicated with the air inlet 124, the air outlet 125, the first opening 136 and the second opening 137.

In this embodiment, the plasma generating apparatus further includes a temperature sensor 4, where the temperature sensor 4 is connected to the tank 1 and partially extends into the chamber 11 of the inner shell 12, so as to detect the temperature in the chamber 11, and the flow of the cooling water injected into the interlayer 14 and the flow of the external air entering the chamber 11 by the air pump or the air blower can be adjusted according to the temperature measured by the temperature sensor 4, so as to ensure that the temperature in the chamber 11 is in a proper range.

The exciting element 3 is connected to the tank 1 and comprises at least one of an ultraviolet emitter 31 and a microwave emitter 32, the ultraviolet emitter 31 being capable of emitting ultraviolet rays toward the reaction gas in the ventilation pipe 2, the microwave emitter 32 being capable of emitting microwaves toward the reaction gas in the ventilation pipe 2, both being capable of acting on the reaction gas to generate plasma in the reaction gas, and the exciting element 3 comprises the ultraviolet emitter 31 and the microwave emitter 32 in this embodiment.

The water inlet 131 and the water outlet 132 are respectively located at two opposite sides of the outer shell 13 and are staggered in the height direction of the outer shell 13, so that cooling water can be guaranteed to fully flow through the interlayer 14 and uniformly cool the cavity 11 of the inner shell 12, specifically, the water inlet 131 and the water outlet 132 are arranged at two opposite sides of the second connecting wall 135, and the water inlet 131 is arranged above the water outlet 132, so that the cooling water can flow out from the water outlet 132 under the action of gravity.

The air inlets 124 and the air outlets 125 are provided in plural, the first openings 136 and the second openings 137 may be correspondingly provided in plural, the air inlets 124 are uniformly formed on the first side wall 121, and the air outlets 125 are uniformly formed on the second side wall 122, so that the external air can rapidly and uniformly enter the cavity 11 of the inner shell 12 to cool the same. The plasma generating device further comprises an air extraction cover 5, the air extraction cover 5 is arranged outside the fourth side wall 134 and is surrounded with the fourth side wall 134 to form an air extraction cavity 51, an air extraction opening 52 communicated with the air extraction cavity 51 is formed in the air extraction cover 5, the air extraction opening 52 is used for communicating with an air extractor, and the air extractor can extract air in the cavity 11 from the air outlets 125.

The breather pipe 2 passes through the first side wall 121 and the second side wall 122 along the height direction of the tank body 1, and comprises a penetrating part 21 positioned in the cavity 11 of the inner shell 12, an air inlet end 22 and an air outlet end 23 exposed outside the outer shell 13, wherein the air inlet end 22 is used for communicating an air supply element to introduce reaction gas into the breather pipe 2, and in the extending direction of the breather pipe 2, one end of the penetrating part 21, which is close to the second side wall 122, is close to the air inlet end 22, so that the flow direction of the reaction gas in the penetrating part 21 is opposite to the flow direction of air in the cavity 11 during air suction of the air suction machine, and heat generated by the reaction gas in the breather pipe 2 can be better taken away during air suction.

In this embodiment, the ventilation pipe 2 passes through the first side wall 121 and the second side wall 122, and also passes through the third side wall 133 and the fourth side wall 134. As shown in fig. 5, the tank 1 further includes a first isolation channel 16 disposed between the first side wall 121 and the third side wall 133, and a second isolation channel 17 disposed between the second side wall 122 and the fourth side wall 134, two ends of the first isolation channel 16 respectively penetrate through an inner wall surface of the first side wall 121 and an outer wall surface of the third side wall 133, two ends of the second isolation channel 17 respectively penetrate through an inner wall surface of the second side wall 122 and an outer wall surface of the fourth side wall 134, the ventilation pipe 2 penetrates through the first isolation channel 16 and the second isolation channel 17, the first isolation channel 16 and the second isolation channel 17 play an isolation role, so that the ventilation pipe 2 penetrates through the tank 1 and is isolated from the interlayer 14, and the tightness of the interlayer 14 is ensured.

Similarly, in this embodiment, the tank 1 further includes a plurality of third isolation channels 18 disposed between the first connection wall 123 and the second connection wall 135, and two ends of the third isolation channels 18 respectively penetrate through the inner wall surface of the first connection wall 123 and the outer wall surface of the second connection wall 135, and in this embodiment, the ultraviolet emitter 31, the microwave emitter 32 and the temperature sensor 4 all penetrate through one third isolation channel 18 into the chamber 11.

In this embodiment, the outer shell 13 and the inner shell 12 are both cylindrical to match the shape of the ventilation pipe 2, and in other embodiments, the outer shell 13 and the inner shell 12 may be square, hexagonal, etc.

The utility model also provides wafer processing equipment, which comprises the plasma generating device 10 and the wafer processing chamber 11 communicated with the vent pipe 2, wherein the plasma released by the reaction gas in the vent pipe 2 under the action of the exciting element 3 can be used for performing operations such as etching, cleaning and the like on the wafer placed in the wafer processing chamber 11.

It should be understood that although the present disclosure describes embodiments in terms of examples, not every embodiment is provided with a single embodiment, and that this description is for clarity only, and that the skilled artisan should recognize that the embodiments may be combined appropriately to form other embodiments that will be understood by those skilled in the art.

The above embodiments are only for illustrating the technical solution of the present application and not for limiting, and although the present application has been described in detail with reference to the preferred embodiments, it should be understood by those skilled in the art that the technical solution of the present application may be modified or substituted equally without departing from the spirit and scope of the technical solution of the present application.

Claims

1. The utility model provides a plasma generating device, its characterized in that includes the jar body, passes the breather pipe of jar body, locate the excitation component of breather pipe one side, the jar body is including the inner shell that has the cavity, be located the shell outside the inner shell, form the intermediate layer between inner shell and shell, the breather pipe passes the cavity setting of inner shell, set up on the shell with water inlet and the delivery port of intermediate layer intercommunication.

2. The plasma generator of claim 1, wherein the inner housing comprises a first sidewall and a second sidewall disposed opposite each other, a first connecting wall connecting the first sidewall and the second sidewall, and an air inlet and an air outlet respectively disposed on the first sidewall and the second sidewall.

3. The plasma generator according to claim 2, wherein the housing includes a third side wall and a fourth side wall located outside the first side wall and the second side wall, respectively, and a second connecting wall connecting the third side wall and the fourth side wall, a first opening corresponding to the air inlet is formed in the third side wall, a second opening corresponding to the air outlet is formed in the fourth side wall, and the tank further includes a communicating portion that communicates the air inlet with the first opening, the air outlet with the second opening.

4. The plasma generator of claim 1, further comprising a temperature sensor coupled to the canister and extending partially into the chamber of the inner housing.

5. The plasma generator of claim 1, wherein the excitation element is coupled to the canister and comprises at least one of an ultraviolet emitter and a microwave emitter.

6. The plasma generator according to claim 1, wherein the water inlet and the water outlet are respectively located on opposite sides of the housing and are staggered in a height direction of the housing.

7. The plasma generating device according to claim 3, wherein the air inlet and the air outlet are provided with a plurality of air inlets, the plasma generating device further comprises an air exhaust cover, the air exhaust cover is arranged on the outer side of the fourth side wall and surrounds the fourth side wall to form an air exhaust cavity communicated with the second openings, and the air exhaust cover is provided with an air exhaust opening communicated with the air exhaust cavity and used for being communicated with an air exhaust hole of the air exhaust.

8. The plasma generator according to claim 7, wherein the vent pipe is provided through the first side wall and the second side wall in the height direction of the tank body, and includes a penetration portion provided in the cavity of the inner case, an air inlet end exposed to the outside of the outer case, and an air outlet end for communicating with the air supply element to introduce the reaction gas into the vent pipe, and an end of the penetration portion near the second side wall is provided near the air inlet end in the extending direction of the vent pipe.

9. The plasma generator according to claim 3, wherein the outer housing and the inner housing are each provided in a cylindrical shape.

10. A wafer processing apparatus comprising a plasma generating device according to any one of claims 1-9, a wafer processing chamber in communication with the vent tube.