CN2206298Y - Water driven rotating magnetic field type sputtering target and multiarc source in vacuum coating film - Google Patents
Water driven rotating magnetic field type sputtering target and multiarc source in vacuum coating film Download PDFInfo
- Publication number
- CN2206298Y CN2206298Y CN 94214661 CN94214661U CN2206298Y CN 2206298 Y CN2206298 Y CN 2206298Y CN 94214661 CN94214661 CN 94214661 CN 94214661 U CN94214661 U CN 94214661U CN 2206298 Y CN2206298 Y CN 2206298Y
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- China
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- sputtering target
- magnetic field
- magnet steel
- source
- rotating magnetic
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Abstract
A water driven rotating magnetic field type sputtering target and multi-arc source in vacuum coating film belongs to the technical field of vacuum coating, and the utility model relates to a novel sputtering target or multi-arc source, which is provided with a rotating magnetic field. As the utility model uses cooling water as power, an angularly polarized magnetic field and a compounded magnetic field with unequal field intensity are successfully applied to the sputtering target and the multi-arc source by the utility model, and then the water driven rotating magnetic field type sputtering target and multi-arc source are formed, and the ionization quality of coating material is improved.
Description
The utility model belongs to technical field of vacuum plating, is a kind of novel sputtering target and multi sphere source.
Do not see as yet in vacuum coating film equipment, adopt flow water rotatingfield sputtering target described in the utility model and multi sphere source.
In common vacuum coating film equipment, employed sputtering target or multi sphere source all adopt standing field to quicken the ionization in sputtering target or multi sphere source.Though this method is effective for sputter ionization target, target or ionization source surface are often become cucurbit shape, the shape of a saddle by the sputter ionization, have a strong impact on the work-ing life and the sputter ionization quality of target source material.For improving above-mentioned shortcoming, the utility model proposes the compound magnet that drives with water coolant and in sputtering target or multi sphere source, form rotatingfield, reach and improve sputter ionization quality, increase the target arc source purpose in work-ing life.
The purpose of this utility model is the embodiment of the rotatingfield formed of a kind of compound magnet steel that is driven by water coolant of providing sputtering target or multi sphere source, improve sputter ionization quality and use the fairing of plating material ionization surface smoothing, both be beneficial to the rate of utilization that improves the plating material, improved coating quality again.
In vacuum coating film equipment, no matter be that sputtering target or multi sphere source adopt direct water-cooling method to reduce the surface temperature of plating material more, at present to improve coating quality.The ionization that the standing field that also often adopts permanent magnet to form quickens sputtering target or multi sphere source improves the ionization quality.The utility model adopts to set up fixedly loads onto the rotatable magnet steel frame that permanent magnet steel is formed, and by the rotation of water coolant impulsion pivoted frame, forms a rotatingfield on plating material surface, in order to improve the ionization quality in sputtering target or multi sphere source.
Further specify below in conjunction with accompanying drawing.Fig. 1 shows the hydrodynamic(al) magnetic field structure synoptic diagram of sputtering target, Fig. 2 illustrates the hydrodynamic(al) magnetic field structure synoptic diagram in multi sphere source, in Fig. 1 and Fig. 2, the 1st, inhalent siphon, the 2nd, rolling bearing, the 3rd, magnet steel frame, the 4th, leaf gas group, the 5th, magnet steel group, the 6th, plating material, the 7th, rising pipe, the 8th, weep hole.In addition, in Fig. 1,9 are rotational support.Its principle of work is as follows:
In Fig. 1, with its sand steel group 5 of common magnetron sputtering target, be fixed on the outer wall of the magnet steel frame of setting up 3, vane group 4 is housed on the inwall of magnet steel frame 3.Magnet steel 3 is realized rotating and being tightly connected through rolling bearing 2 and inhalent siphon 1.Obviously, after water coolant entered from inhalent siphon 1, subpunch rotor blade group 4 was through weep hole 8, and then passage to the rising pipe 7 that passes through between plating material 6 and the magnet steel frame 3 refluxes.As seen, water coolant is to the impact of leaf gas group 4, owing to the be equipped with rotation angle of vane group 4 with magnet steel frame 3, so can make magnet steel frame 3 and inhalent siphon 1 produce rotation through rolling bearing 2, thereby drive magnet steel group 5 and the 6 relative rotations of plating material, can avoid plating material 6 surfaces behind the common magnetron sputtering target sputter so effectively and be roughness (being the sugarcoated haws on a stick shapes).Need explanation, the length of sputtering target is longer usually, in the structural representation of Fig. 1, for making spin stabilization, does not have rotational support 9 at the other end usually, in order to rotation.In the hydrodynamic(al) magnetic field structure in multi sphere source, identical shown in figure 2 with Fig. 1 structural principle, but the general axial length in multi sphere source is very short only several centimetres, so can omit rotational support 9.In addition, resultant field is in Fig. 1, and magnet steel group 5 can be arranged in axially end to end by polylith long strip shape magnet steel, radially is many group angle polarized types.Magnet steel group 5 can be arranged in radially compound not equifield intensity magnetic field by the polylith magnet steel among Fig. 2, avoids plating the material 6 ablated one-tenth shapes of a saddle effectively.
But in fact the utility model has proposed a kind of magnetic field of slow rotation newly, come the fixedly improvement of permanent-magnetic field in the prior art, through using at my company's product, compared with prior art, greatly improved the ionization quality of plating material, coating process is attained a yet higher goal, good application prospect is arranged.
Claims (1)
1, hydrodynamic(al) rotating field type sputtering target and multi sphere source in a kind of vacuum plating is characterized in that:
A, its hydrodynamic(al) rotatingfield are to drive magnet steel group [5] by the vane group [4] on the water coolant impulsion magnet steel frame [3] to form magnet steel group [5] through rolling bearing [2] and rotate with plating material [6],
B, its magnet steel group [5] of resultant field can be arranged in axially end to end in sputtering target by the polylith magnet steel, radially are many group angle polarized types; In the multi sphere source, can be arranged in radially compound not equifield intensity magnetic field by the polylith magnet steel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 94214661 CN2206298Y (en) | 1994-06-20 | 1994-06-20 | Water driven rotating magnetic field type sputtering target and multiarc source in vacuum coating film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 94214661 CN2206298Y (en) | 1994-06-20 | 1994-06-20 | Water driven rotating magnetic field type sputtering target and multiarc source in vacuum coating film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2206298Y true CN2206298Y (en) | 1995-08-30 |
Family
ID=33830871
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 94214661 Expired - Fee Related CN2206298Y (en) | 1994-06-20 | 1994-06-20 | Water driven rotating magnetic field type sputtering target and multiarc source in vacuum coating film |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN2206298Y (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115074678A (en) * | 2022-06-20 | 2022-09-20 | 肇庆市科润真空设备有限公司 | Multi-arc target mechanism for continuous coating of stainless steel sheet and PVD coating device |
-
1994
- 1994-06-20 CN CN 94214661 patent/CN2206298Y/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115074678A (en) * | 2022-06-20 | 2022-09-20 | 肇庆市科润真空设备有限公司 | Multi-arc target mechanism for continuous coating of stainless steel sheet and PVD coating device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |