CN220614418U

CN220614418U - Duplex position cleaning machine

Info

Publication number: CN220614418U
Application number: CN202322209405.3U
Authority: CN
Inventors: 彭德嘉
Original assignee: Jiangsu Humo Intelligent Equipment Manufacturing Co ltd
Current assignee: Jiangsu Humo Intelligent Equipment Manufacturing Co ltd
Priority date: 2023-08-17
Filing date: 2023-08-17
Publication date: 2024-03-19
Anticipated expiration: 2033-08-17

Abstract

The utility model relates to a double-station cleaning machine, which comprises: a support frame; the lifting window is arranged on one side of the support frame in a lifting manner so as to open and close the support frame; the carrying component is fixed at the top of the supporting frame and used for carrying the ceramic wafer to be cleaned; the rotating assembly is arranged on the inner side of the supporting frame and comprises a rotating frame, a rotating plate rotatably arranged on the top of the rotating frame and a sucker arranged on the top of the rotating plate; the double-station cleaning machine is simple in structure, the lifting assembly is used for placing the ceramic plate to be cleaned on the rotating plate of the rotating assembly, the cleaning assembly is used for completing the cleaning work of the surface of the ceramic plate in the process that the rotating plate drives the ceramic plate to rotate, the cleaned ceramic plate is ejected out by the lifting assembly, and operators only need to take and place the ceramic plate in the whole process, so that the cleaning efficiency and the cleaning effect of the ceramic plate are improved to a great extent, and the surface of the ceramic plate is not damaged in the cleaning process.

Description

Duplex position cleaning machine

Technical Field

The utility model belongs to the technical field of ceramic wafer cleaning, and particularly relates to a double-station cleaning machine.

Background

The ceramic is a material prepared by taking clay as a main raw material and various natural minerals through crushing, mixing, forming and calcining, and various products, and the ceramic is a ceramic which is manufactured by clay and is a ceramic product fired at high temperature in a special kiln.

In the production process of the existing ceramic plate, more dust and impurities can be deposited on the outer surface and the inner surface of the ceramic plate, so that the attractiveness of the ceramic plate is affected, and the ceramic plate needs to be cleaned so as to remove the dust and impurities on the ceramic plate.

The existing cleaning mode is quite single, a large amount of manpower is needed for cleaning, a large amount of time and energy are consumed, the traditional manual cleaning method cannot avoid damage to the ceramic wafer during cleaning, and the cleaning effect cannot be guaranteed.

Disclosure of Invention

The utility model aims to overcome the defects that the existing ceramic wafer cleaning is low in efficiency and cannot ensure the cleaning effect, and provides a double-station cleaning machine.

In order to achieve the above purpose, the utility model adopts the following technical scheme: a dual station washer, comprising:

a support frame;

the lifting window is arranged on one side of the support frame in a lifting manner so as to open and close the support frame;

the carrying component is fixed at the top of the supporting frame and used for carrying the ceramic wafer to be cleaned;

the rotating assembly is arranged on the inner side of the supporting frame and comprises a rotating frame, a rotating plate rotatably arranged on the top of the rotating frame and a sucker arranged on the top of the rotating plate, and the sucker is used for sucking ceramic plates to be cleaned;

the lifting assemblies are arranged on two sides of the rotating assembly and are used for bearing the ceramic plates at the object carrying assembly and placing the ceramic plates on the sucking disc;

the cleaning assembly comprises a cleaning frame movably arranged on one side of the rotating assembly, a brush plate arranged on the cleaning frame in a lifting manner and a brush integrally arranged at the bottom of the brush plate, and the brush is used for cleaning ceramic plates on the sucking disc.

Optimally, the lifting device further comprises an air cylinder fixing plate fixed on the supporting frame, a first lifting air cylinder fixed on the air cylinder fixing plate and a lifting plate connected with the first lifting air cylinder, wherein the lifting plate is connected with the lifting window.

Optimally, the carrying component comprises a carrying frame fixed at the top of the supporting frame, a fixing strip fixed on the carrying frame, an extending plate integrally connected to the inner side of the fixing strip, a carrying plate fixed between the extending plates and limiting blocks fixed on two sides of the carrying plate, wherein the carrying plate is used for carrying ceramic plates to be detected, and the limiting blocks are used for limiting the ceramic plates on the carrying plate.

Optimally, the rotating assembly further comprises a servo motor, a rotating arm, a cushion block and a limiting column, wherein the servo motor is fixed on the rotating frame and connected with the rotating plate, the rotating arm is circumferentially fixed at the top of the rotating plate, the cushion block is fixed at the top of the rotating arm, the limiting column is fixed at one side, far away from the rotating plate, of the rotating arm, and the cushion block is flush with the upper surface of the sucker.

Optimally, the lifting assembly comprises a lifting bottom plate, a lifting vertical plate fixed at the top of the lifting bottom plate, a lifting plate arranged at the inner side of the lifting vertical plate in a lifting manner, a positioning plate fixed at the top of the lifting plate and a positioning groove arranged at the inner side of the positioning plate.

Optimally, the cleaning assembly further comprises a connecting plate fixed at the top of the cleaning frame, a second lifting cylinder fixed on the connecting plate, a positioning outer cylinder fixed at the bottom of the connecting plate, a lifting inner cylinder penetrating in the positioning outer cylinder and connected with the second lifting cylinder, and water spraying pipes arranged at two sides of the rotating assembly, and the hairbrush plate is fixed at the bottom of the lifting inner cylinder.

Due to the application of the technical scheme, compared with the prior art, the utility model has the following advantages:

the double-station cleaning machine is simple in structure, the lifting assembly is used for placing the ceramic plate to be cleaned on the rotating plate of the rotating assembly, the cleaning assembly is used for completing the cleaning work of the surface of the ceramic plate in the process that the rotating plate drives the ceramic plate to rotate, the cleaned ceramic plate is ejected out by the lifting assembly, and operators only need to take and place the ceramic plate in the whole process, so that the cleaning efficiency and the cleaning effect of the ceramic plate are improved to a great extent, and the surface of the ceramic plate is not damaged in the cleaning process.

Drawings

FIG. 1 is a schematic diagram of the structure of the present utility model;

FIG. 2 is an enlarged view of the utility model at A in FIG. 1;

FIG. 3 is a schematic view of a carrier assembly according to the present utility model;

FIG. 4 is a schematic view of the structure of the present utility model;

FIG. 5 is a schematic view of a rotary assembly according to the present utility model;

FIG. 6 is a schematic view of the construction of the lift assembly of the present utility model;

FIG. 7 is a schematic view of a cleaning assembly according to the present utility model;

FIG. 8 is a cross-sectional view of a cleaning assembly of the present utility model;

reference numerals illustrate:

1. a support frame;

2. a cylinder fixing plate;

3. a first lifting cylinder;

4. a lifting plate;

5. a lifting window;

6. a carrier assembly; 601. a carrier rack; 602. a fixing strip; 603. an extension plate; 604. a carrying plate; 605. a limiting block;

7. a rotating assembly; 701. a rotating frame; 702. a servo motor; 703. a rotating plate; 704. a suction cup; 705. a rotating arm; 706. a cushion block; 707. a limit column;

8. a lifting assembly; 801. lifting the bottom plate; 802. lifting the vertical plate; 803. lifting a cylinder; 804. a lifting plate; 805. a protective sleeve; 806. a positioning plate; 807. a positioning groove;

9. cleaning the assembly; 901. a cleaning frame; 902. a connecting plate; 903. a second lifting cylinder; 904. positioning an outer cylinder; 905. lifting the inner cylinder; 906. a brush plate; 907. a brush; 908. and a water spraying pipe.

Detailed Description

The utility model will be further described with reference to examples of embodiments shown in the drawings.

As shown in fig. 1, the dual-station cleaning machine of the present utility model is a schematic structure for cleaning the surface of a ceramic wafer, which can improve cleaning efficiency and cleaning effect compared with manual cleaning, and does not damage the surface of the ceramic wafer, and comprises a support frame 1, a cylinder fixing plate 2, a first lifting cylinder 3, a lifting plate 4, a lifting window 5, a carrying assembly 6, a rotating assembly 7, a lifting assembly 8 and a cleaning assembly 9.

The support frame 1 is formed by aluminium alloy welding, and the bottom of support frame 1 is provided with supporting pad and universal castor, and the setting of universal castor conveniently promotes this support frame 1, promotes to suitable position after, can lock universal castor, then supports this support frame 1 by the supporting pad. The top of support frame 1 is provided with the backup pad of "V" shape, and the top of "V" shape backup pad is used for fixed year thing subassembly 6, and the bottom of "V" shape backup pad is provided with liftable lift window 5, opens or closes the crane ("the design of" V "shape backup pad), and one operator can realize the washing of duplex position, when improving cleaning efficiency, also can save the cost input of labor.

As shown in fig. 2, the cylinder fixing plate 2 is fixed on top of the V-shaped support plate and extends to one side of the V-shaped support plate, and the cylinder fixing plate 2 is in a zigzag shape. The cylinder body of the first lifting cylinder 3 is fixed on the cylinder fixing plate 2, and a piston rod of the first lifting cylinder 3 is connected with the lifting plate 4 and used for driving the lifting plate 4 to do lifting motion. The lifting plate 4 is connected with the lifting window 5, and the lifting window 5 is driven to lift under the driving of the first lifting cylinder 3, so that the supporting frame 1 is opened or closed, the lifting window 5 is opened during actual cleaning, the ceramic plate is placed at the lifting component 8, and then the lifting window 5 is closed, so that the mechanical movement inside is closed, and the safety coefficient is improved.

As shown in fig. 3, the carrier assembly 6 is shown in a schematic structure, and the carrier assembly 6 has two groups, which are fixed on the top of the V-shaped support plate for carrying the ceramic wafer to be detected, and the carrier assembly 6 includes a carrier 601, a fixing strip 602, an extension plate 603, a carrier plate 604 and a limiting block 605. The carrier 601 is welded from aluminum profiles and is secured to the top of the "V" shaped support plate. The fixing bars 602 are vertically fixed at the inner side of the carrier 601, the extension plates 603 are integrally connected at the inner side of the fixing bars 602, and a plurality of groups are arranged at intervals along the direction of the fixing bars 602.

The carrying plates 604 are fixed on the extending plates 603 corresponding to each layer, and a gap is reserved between two adjacent groups of carrying plates 604, so that an operator can conveniently take and put the ceramic plates. The stopper 605 is fixed in the both sides at year thing board 604 top, and the potsherd of waiting to wash is placed on year thing board 604, and the stopper 605 supports at the outer peripheral face of potsherd for carry out the spacing to the potsherd, avoid dropping of potsherd when getting to put the potsherd.

As shown in fig. 6, two sets of lifting assemblies 8 are provided on the inner side of the supporting frame 1 for carrying the ceramic wafer to be cleaned and placing the ceramic wafer on the rotating assembly 7, and the lifting assemblies 8 include a lifting bottom plate 801, a lifting vertical plate 802, a lifting cylinder 803, a lifting plate 804, a protective sleeve 805, a positioning plate 806 and a positioning groove 807. The lifting bottom plate 801 is fixed in the inboard of support frame 1, and lifting riser 802 is fixed at the top of lifting bottom plate 801, and vertical setting is fixed with the support rib between lifting bottom plate 801 and the lifting riser 802 to improve the structural strength between the two.

The lifting cylinder 803 is fixed on the inner side of the lifting vertical plate 802, the lifting plate 804 is fixed on a piston rod of the lifting cylinder 803, and the lifting plate 804 is driven by the lifting cylinder 803 to lift. The positioning plate 806 is fixed on top of the lifting plate 804, and a positioning groove 807 is provided on the inner side of the positioning plate 806 for positioning the ceramic sheet placed therein (the positioning groove 807 is arc-shaped or V-shaped for positioning the ceramic sheet placed on the positioning plate 806). The protective sleeve 805 is sleeved on the lifting air cylinder 803, the bottom of the protective sleeve 805 is fixed on the lifting bottom plate 801, the top of the protective sleeve 805 is connected with the lifting plate 804, and the protective sleeve 805 is elastically foldable, so that the protective sleeve 805 can elastically stretch under the action of the lifting air cylinder 803.

In actual cleaning, the lifting window 5 is opened, the ceramic wafer on the carrier assembly 6 is removed by an operator, placed on the lifting plate 804, and limited by the positioning plate 806. The lifting cylinder 803 is lowered to place the ceramic wafer on the rotating assembly 7 for subsequent cleaning operations.

As shown in fig. 5, the rotating assembly 7 is schematically shown in the structure of the rotating assembly 7, and the rotating assembly 7 is disposed in the supporting frame 1 and between two sets of lifting assemblies 8, and is used for bearing the ceramic wafer placed therein by the lifting assemblies 8 and driving the ceramic wafer to rotate, so as to facilitate the subsequent cleaning work, and the rotating assembly 7 includes a rotating frame 701, a servo motor 702, a rotating plate 703, a suction cup 704, a rotating arm 705, a cushion block 706 and a limiting column 707. The rotating frame 701 is fixed on the inner side of the supporting frame 1, and the rotating plate 703 is rotatably installed on the top of the rotating frame 701 under the driving of the external servo motor 702 and the speed reducer.

The sucking disc 704 is circumferentially fixed on the top of the rotating plate 703, and when the lifting assembly 8 descends, a ceramic sheet is placed on the sucking disc 704 of the rotating plate 703, and the sucking disc 704 sucks the ceramic sheet, so that the ceramic sheet is prevented from splashing during subsequent rotation. The circumference of the rotating arm 705 is fixed at the top of the rotating plate 703 and extends outwards, the cushion block 706 is fixed at the top of the rotating arm 705 and is flush with the upper surface of the sucker 704, and after the sucker 704 absorbs the ceramic wafer, the cushion block 706 supports the ceramic wafer, so that the ceramic wafer is prevented from being broken due to lack of support on the outer peripheral surface of the ceramic wafer. The spacing post 707 is fixed in the side that the swinging boom 705 kept away from the swivel plate 703 for carry out further spacing to the outer peripheral face of ceramic wafer, avoid the ceramic wafer to take place the vibration and influence abluent effect.

As shown in fig. 7 and 8, for the structural schematic diagram of the cleaning assembly 9, the cleaning assembly 9 cooperates with the rotating assembly 7 to complete the cleaning work of the ceramic wafer, and the cleaning assembly 9 includes a cleaning frame 901, a connecting plate 902, a second lifting cylinder 903, a positioning outer cylinder 904, a lifting inner cylinder 905, a brush plate 906, a brush 907 and a water spraying pipe 908. The cleaning frame 901 is connected to the inner side of the supporting frame 1 through a linear sliding table in a sliding manner, and under the action of the linear sliding table, the cleaning frame 901 can be close to or far away from the rotating assembly 7, so that the cleaning work of the ceramic wafer is completed.

The connecting plate 902 is fixed at the inboard of wash rack 901, and the positioning outer tube 904 is fixed in the bottom of connecting plate 902, and lift inner tube 905 is under the drive of second lift cylinder 903, and liftable setting is inboard at the positioning outer tube 904, and the lift of lift inner tube 905 is fixed a position by positioning outer tube 904, avoids lift inner tube 905 to take place the skew of position when going up and down, and positioning outer tube 904 also can isolate outside wash water, avoids eroding the junction of second lift cylinder 903 and lift inner tube 905.

The brush plate 906 is fixed to the bottom of the lifting inner cylinder 905, and the brush 907 is provided to the bottom of the brush plate 906 for cleaning the ceramic plate on the rotating plate 703. The shower pipes 908 are provided at both sides of the spin pack 7 for spraying the cleaning water onto the ceramic plate to enhance the cleaning effect.

The cleaning flow of the double-station cleaning machine is as follows:

in actual cleaning, the lifting window 5 is opened, the ceramic wafer on the carrier assembly 6 is removed by an operator, placed on the lifting plate 804, and limited by the positioning plate 806. The lifting cylinder 803 descends to place the ceramic wafer on the rotating assembly 7, the sucking disc 704 sucks the ceramic wafer, then the cleaning frame 901 drives the hairbrush 907 to move to the upper surface of the ceramic wafer, the water spraying pipe 908 sprays cleaning water to the ceramic wafer, when the rotating plate 703 drives the ceramic wafer to rotate, the cleaning work is completed by the hairbrush 907, after the cleaning is completed, the cleaned ceramic wafer is lifted by the lifting assembly 8, an operator takes the cleaned ceramic wafer off and places the cleaned ceramic wafer on the carrying assembly 6, and after the single-sided cleaning is completed, the other surface of the ceramic wafer is cleaned in a reverse way.

The above embodiments are provided to illustrate the technical concept and features of the present utility model and are intended to enable those skilled in the art to understand the content of the present utility model and implement the same, and are not intended to limit the scope of the present utility model. All equivalent changes or modifications made in accordance with the spirit of the present utility model should be construed to be included in the scope of the present utility model.

Claims

1. A duplex washer, comprising:

a support (1);

the lifting window (5) is arranged on one side of the support frame (1) in a lifting manner so as to open and close the support frame (1);

the carrying assembly (6) is fixed at the top of the supporting frame (1) and is used for carrying the ceramic wafer to be cleaned;

the rotary assembly (7), the rotary assembly (7) is arranged on the inner side of the supporting frame (1), the rotary assembly (7) comprises a rotary frame (701), a rotary plate (703) rotatably arranged on the top of the rotary frame (701) and a sucker (704) arranged on the top of the rotary plate (703), and the sucker (704) is used for sucking ceramic plates to be cleaned;

the lifting assemblies (8) are arranged at two sides of the rotating assembly (7) and are used for bearing ceramic plates at the carrying assembly (6) and placing the ceramic plates on the sucking discs (704);

the cleaning assembly (9), the cleaning assembly (9) comprises a cleaning frame (901) movably arranged on one side of the rotating assembly (7), a brush plate (906) arranged on the cleaning frame (901) in a lifting mode and a brush (907) integrally arranged at the bottom of the brush plate (906), and the brush (907) is used for cleaning ceramic plates on the sucker (704).

2. A duplex washer according to claim 1, wherein: the lifting device is characterized by further comprising an air cylinder fixing plate (2) fixed on the supporting frame (1), a first lifting air cylinder (3) fixed on the air cylinder fixing plate (2) and a lifting plate (4) connected with the first lifting air cylinder (3), wherein the lifting plate (4) is connected with the lifting window (5).

3. A duplex washer according to claim 1, wherein: the object carrying assembly (6) comprises an object carrying frame (601) fixed at the top of the supporting frame (1), a fixing strip (602) fixed on the object carrying frame (601), an extending plate (603) integrally connected with the inner side of the fixing strip (602), object carrying plates (604) fixed between the extending plates (603) and limiting blocks (605) fixed on two sides of the object carrying plates (604), the object carrying plates (604) are used for carrying ceramic plates to be detected, and the limiting blocks (605) are used for limiting the ceramic plates on the object carrying plates (604).

4. A duplex washer according to claim 1, wherein: the rotating assembly (7) further comprises a servo motor (702) fixed on the rotating frame (701) and connected with the rotating plate (703), a rotating arm (705) circumferentially fixed at the top of the rotating plate (703), a cushion block (706) fixed at the top of the rotating arm (705) and a limiting column (707) fixed at one side, far away from the rotating plate (703), of the rotating arm (705), wherein the cushion block (706) is flush with the upper surface of the sucker (704).

5. A duplex washer according to claim 1, wherein: the lifting assembly (8) comprises a lifting bottom plate (801), a lifting vertical plate (802) fixed at the top of the lifting bottom plate (801), a lifting plate (804) arranged on the inner side of the lifting vertical plate (802) in a lifting mode, a positioning plate (806) fixed at the top of the lifting plate (804) and a positioning groove (807) formed on the inner side of the positioning plate (806).

6. A duplex washer according to claim 1, wherein: the cleaning assembly (9) further comprises a connecting plate (902) fixed at the top of the cleaning frame (901), a second lifting cylinder (903) fixed on the connecting plate (902), a positioning outer cylinder (904) fixed at the bottom of the connecting plate (902), a lifting inner cylinder (905) penetrating the positioning outer cylinder (904) and connected with the second lifting cylinder (903), and water spraying pipes (908) arranged at two sides of the rotating assembly (7), wherein the hairbrush plate (906) is fixed at the bottom of the lifting inner cylinder (905).