CN220543832U - Ion source equipment and coating system - Google Patents

Abstract

The application relates to an ion source device and a coating system, wherein the ion source device comprises a cooling pipe, a filament and an electrode. The first shell is provided with a first top plate, a first bottom plate and a first side wall, wherein the first top plate and the first bottom plate are oppositely arranged and are connected with the first side wall, and a first cavity is defined by the first top plate, the first bottom plate and the first side wall; the first bottom plate and the first side wall are provided with a first channel communicated with each other. The cooling pipe is fixedly connected with the first shell and communicated with the first channel, and the cooling pipe is used for supplying cooling liquid into the first channel. The filament is positioned in the first cavity and fixedly connected with the first shell. The electrode is electrically connected with the filament. The application provides an ion source equipment, be connected through electrode and external power and produce electron and heat for the filament heating, then let in the coolant liquid through the casing wall of cooling tube to first casing, realize the effect of cooling first casing to ion source equipment's casing temperature has been reduced, is favorable to prolonging equipment's life.

Description

Ion source equipment and coating system

Technical Field

The application relates to the technical field of vacuum coating, in particular to ion source equipment and a coating system.

Background

The coating system comprises a coating machine and ion source equipment. The film plating machine is a device for plating film on a piece to be plated, mainly lays ions on a substrate according to certain requirements, and the ion source device is a main device for providing ions.

In the prior art, the ion source device mainly adopts a heating filament form to release heat, then reacts with inert gas to convert atoms of the gas into ions, and then releases the ions into a chamber of a coating machine, and the coating machine drives the ions to be paved on a substrate.

The existing ion source equipment has the defects that the filament is heated for a long time, the resistance of the filament is large, so that electrons are released, a large amount of heat is released, the temperature of the interior of the ion source equipment and the temperature of a shell rise too quickly, the temperature of the shell is too high, and soft materials in the ion source equipment, such as a sealing rubber ring or a plastic shell, are easy to deform, so that the failure is caused. Too high a temperature in the chamber is detrimental to normal movement of ions and thermal expansion is likely to occur. Thereby affecting the lifetime of the ion source apparatus.

Disclosure of Invention

Based on this, there is a need to provide an ion source apparatus, which includes:

the first shell is provided with a first top plate, a first bottom plate and a first side wall, wherein the first top plate and the first bottom plate are oppositely arranged and are connected with the first side wall, and a first cavity is defined by the first top plate, the first bottom plate and the first side wall; the first bottom plate and the first side wall are provided with a first channel communicated with each other;

the cooling pipe is fixedly connected with the first shell, communicated with the first channel and used for supplying cooling liquid into the first channel;

the filament is positioned in the first cavity and fixedly connected with the first shell;

and the electrode is electrically connected with the filament.

In one embodiment, the device further comprises a second shell, wherein the second shell is provided with a second top plate, a second bottom plate and a second side wall, the second top plate and the second bottom plate are oppositely arranged and are connected with the second side wall, a second cavity is formed by surrounding the second top plate, the second bottom plate and the first top plate, and the second bottom plate and the first top plate are fixedly connected along the thickness direction of the second top plate and the second side wall;

the first top plate is provided with a first through hole, the second bottom plate is provided with a second through hole, and the first through hole is communicated with the second through hole so that the second chamber is communicated with the first chamber;

wherein, be equipped with the second passageway in the second roof, second passageway and first passageway UNICOM.

The second chamber has a magnetic field configured to provide motive force for ions entering the coating machine.

In one embodiment, the second side wall is circumferentially wound with an electromagnetic coil that forms a magnetic field by conduction.

In one embodiment, at least a portion of the electrode is located in the first chamber and fixedly connected to the inner wall of the first chamber; the electrode comprises at least three energizable terminals, and the terminals are connected with the filament in a conductive manner.

In one embodiment, the filaments have a plurality of filaments, which are electrically connected in turn.

In one embodiment, the lamp further comprises a support column, one end of the support column is fixedly connected with the inner wall of the first cavity, and the other end of the support column is fixedly connected with the lamp filament.

In one embodiment, the first bottom plate is detachably connected with the first side wall, and the filament and the electrode are fixedly connected with the bottom plate.

The application provides a coating system, comprising a coating machine and the ion source equipment provided in any embodiment, wherein the ion source equipment is arranged outside the coating machine and is fixedly connected with a chamber bottom plate of the coating machine;

the chamber bottom plate is provided with a third through hole which is communicated with the first chamber and the inner part of the coating machine so that ions enter the coating machine.

In one embodiment, the ion source device further comprises an anode part, wherein the anode part is positioned inside the coating machine and is opposite to the ion source device.

The application provides an ion source equipment, be connected through electrode and external power and produce electron and heat for the filament heating, then let in the coolant liquid through the casing wall of cooling tube to first casing, realize the effect of the first roof of cooling first casing, first bottom plate and first lateral wall to reduce ion source equipment's casing temperature, be favorable to preventing the deformation inefficacy of rubber materials such as inside sealing washer and inside high temperature influence adverse consequences such as atmospheric pressure.

Drawings

Fig. 1 is a schematic structural view of an ion source apparatus.

Fig. 2 is a spatial structural view of the first chamber.

Fig. 3 is a half-sectional view of an ion source apparatus.

Fig. 4 is a front view of an ion source apparatus.

Reference numerals: an ion source apparatus 100; a first housing 110; a first top plate 111; a first base plate 112; a first sidewall 113; a first chamber 114; a first channel 115; a gas supply pipe 116; a cooling tube 120; a filament 130; support columns 131; an electrode 140; a terminal 141; a second housing 150; a second top plate 151; a second bottom plate 152; a second sidewall 153; a second chamber 154; a solenoid 155.

Detailed Description

In order to make the above objects, features and advantages of the present application more comprehensible, embodiments accompanied with figures are described in detail below. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present application. This application is, however, susceptible of embodiment in many other forms than those described herein and similar modifications can be made by those skilled in the art without departing from the spirit of the application, and therefore the application is not to be limited to the specific embodiments disclosed below.

In the description of the present application, it should be understood that, if there are terms such as "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., these terms refer to the orientation or positional relationship based on the drawings, which are merely for convenience of description and simplification of description, and do not indicate or imply that the apparatus or element referred to must have a specific orientation, be configured and operated in a specific orientation, and therefore should not be construed as limiting the present application.

Furthermore, the terms "first," "second," and the like, if any, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include at least one such feature. In the description of the present application, the terms "plurality" and "a plurality" if any, mean at least two, such as two, three, etc., unless specifically defined otherwise.

In this application, unless explicitly stated and limited otherwise, the terms "mounted," "connected," "secured," and the like are to be construed broadly. For example, the two parts can be fixedly connected, detachably connected or integrated; can be mechanically or electrically connected; either directly or indirectly, through intermediaries, or both, may be in communication with each other or in interaction with each other, unless expressly defined otherwise. The specific meaning of the terms in this application will be understood by those of ordinary skill in the art as the case may be.

In this application, unless expressly stated or limited otherwise, the meaning of a first feature being "on" or "off" a second feature, and the like, is that the first and second features are either in direct contact or in indirect contact through an intervening medium. Moreover, a first feature being "above," "over" and "on" a second feature may be a first feature being directly above or obliquely above the second feature, or simply indicating that the first feature is level higher than the second feature. The first feature being "under", "below" and "beneath" the second feature may be the first feature being directly under or obliquely below the second feature, or simply indicating that the first feature is less level than the second feature.

It will be understood that if an element is referred to as being "fixed" or "disposed" on another element, it can be directly on the other element or intervening elements may also be present. If an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and the like as used herein, if any, are for descriptive purposes only and do not represent a unique embodiment.

The ion source apparatus 100 is an apparatus that generates electrons to ionize a gas to form ions, and drives the ions into the interior of a coating machine, and finally covers the surface of a substrate to be coated. Currently, a common practice for generating electrons by the ion source apparatus 100 is to energize and heat a filament 130 in the ion source apparatus 100, so that the filament 130 generates hot electrons, the hot electrons react with inert gas in a chamber to generate ions, the ions move into a vacuum chamber of a coating machine, and the ions are covered on a workpiece to be coated by driving of the coating machine. Since the filament 130 releases a large amount of heat during the power-on process, the internal temperature of the ion source apparatus 100 may be increased sharply, thereby adversely affecting the housing of the ion source apparatus 100 and the internal temperature distribution, for example, the housing may have a rubber sealing ring therein and may be melted and fail, and ions may thermally expand the ion source apparatus 100 in a high-temperature environment, thereby affecting the service life of the apparatus.

The present application provides a new ion source apparatus 100, referring to fig. 1-4, specifically comprising a first housing 110, a cooling tube 120, a filament 130, and an electrode 140. The first housing 110 includes a first top plate 111, a first bottom plate 112, and a first side wall 113, where the first top plate 111 and the first bottom plate 112 are opposite to each other and are connected to the first side wall 113, and define a first chamber 114. The first floor 112 and the first side wall 113 are provided with a first channel 115 communicating. The cooling pipe 120 is fixedly connected with the first housing 110 and communicates with the first passage 115, and the cooling pipe 120 is used for supplying cooling liquid into the first passage 115; the filament 130 is positioned in the first chamber 114 and fixedly connected to the first housing 110. The electrode 140 is electrically connected to the filament 130.

Referring specifically to fig. 2 and 3, the first bottom plate 112 is a plate-shaped object having a certain thickness, and may be a flange or a stainless steel plate. The first bottom plate 112 is provided with a pipeline according to a certain line, the first bottom plate 112 can be formed by combining two plate-shaped objects, the two plate-shaped objects are provided with symmetrical pipe grooves, the two pipe grooves are spliced face to face, and then the two pipe grooves are combined to form one pipeline. Or the first bottom plate 112 is provided with a pipeline, and whether the pipeline is straight or curved is determined according to the level of the processing machine tool. The first opening of the duct is located on the outer circumferential surface or the lower bottom surface of the first bottom plate 112 to facilitate the connection of the external water supply, and the second opening is opened into the duct of the first side wall 113.

The first side wall 113 is also provided with channels, and the channels in the wall body of the first side wall 113 may be hollow interlayers instead of strictly cylindrical channels, so long as the cooling liquid can flow through the surface of the first side wall 113. Referring to fig. 2, the first sidewall 113 may also be comprised of two concentric, but different radius, sub-sidewalls, including two sub-sidewalls and a hollow interlayer therebetween.

As can be seen from fig. 1, both openings of the pipe in the first bottom plate 111 are on the outer peripheral surface of the first bottom plate 111, one of which is connected to the external cooling pipe 116; the other is communicated with the pipeline in the first side wall 113 through a soft pipeline such as a plastic water pipe.

The first side wall 113 may also be provided with a conduit of normal shape, such as a circular or square cross-section. For ease of machining, the openings in the linear object may be provided with a rectangular or other polygonal shape at a lower cost than the starting operation on the curved object. If the first sidewall 113 is cylindrical, it may be formed by splicing a plurality of curved plate-shaped objects by welding, etc., and it is difficult to drill a complete 360 ° cylindrical hole by referencing a calculus, but it is simple to divide it into a plurality of blocks and then drill the blocks respectively, and finally it is only necessary to splice the plurality of blocks so that the respective drilled holes are joined together to form a communicating pipe.

Similarly, the conduit on the first side wall 113 has two openings, the first opening communicating with the conduit on the first floor 112 and the second opening may lead to a drain or may be used to cool the second floor 152 and the second side wall 153 of the second housing 150.

The cooling pipe 120 may be filled with cooling water or cooling liquid with solute, the solute may be glycol or other substances with rapid heat absorption, the concentration may be 15-40%, and the temperature may be 10-35 ℃. The adaptation can be made according to different needs.

The ion source equipment 100 provided by the application is connected with an external power supply through the electrode 140 to generate electrons and heat for the lamp filament 130, and then the cooling liquid is introduced into the shell wall of the first shell 110 through the cooling pipe 120, so that the effect of cooling the first top plate 111, the first bottom plate 112 and the first side wall 113 of the first shell 110 is realized, the shell temperature of the ion source equipment 100 is reduced, and adverse effects such as deformation failure of rubber materials such as an internal sealing ring and influence of the internal temperature on air pressure are avoided.

Of course, the ion source apparatus 100 further includes a gas supply tube 116 for supplying an inert gas, such as argon, into the first chamber 114, and is not further described herein since it is well established in the art.

Referring to fig. 1, in one embodiment, the second housing 150 further includes a second housing 150, the second housing 150 includes a second top plate 151, a second bottom plate 152, and a second side wall 153, the second top plate 151 and the second bottom plate 152 are disposed opposite to each other and are connected to the second side wall 153, a second chamber 154 is defined by the three, and the second bottom plate 152 and the first top plate 111 are fixedly connected along the thickness direction of the two. The first top plate 111 is provided with a first through hole, and the second top plate 151 is provided with a second through hole, and the first through hole communicates with the second through hole so that the second chamber 154 communicates with the first chamber 114. Wherein the second bottom plate 152 is provided with a second channel in communication with the first channel 115.

Since the structure of the second bottom plate 152 is similar to that of the first bottom plate 111, the arrangement method of the pipes is also convergent, and will not be described here again. As can be seen in fig. 1, the first channels 115 in the first side wall 113 communicate with the second bottom plate 152 via cooling tubes 120 to facilitate cooling of the second bottom plate 152.

In one embodiment, the second chamber 154 has a magnetic field configured to provide the motive force for ions into the coater.

There are two methods of arranging the magnetic field, a permanent magnet is provided or an energizing coil is adopted, and the second side wall 153 in the ion source apparatus 100 provided in the present application is wound with an electromagnetic coil 155 along the circumferential direction, and the electromagnetic coil 155 forms the magnetic field by electric conduction. The magnitude and direction of the magnetic field can be varied by varying the magnitude of the current, and the use of energized coils relative to the permanent magnets is more advantageous in controlling the number and speed of ions passing through the second chamber 154 during heating of the ion source.

Referring to fig. 2, in one embodiment, at least a partial region of the electrode 140 is located in the first chamber 114 and is fixedly connected to the inner wall of the first chamber 114; wherein the electrode 140 comprises at least three energizable terminals 141, the terminals 141 being in electrically conductive connection with the filament 130.

Preferably, in one embodiment, the filaments 130 have a plurality of filaments 130, and the plurality of filaments 130 are electrically connected in turn, so that the plurality of filaments 140 can provide larger electrons, and the filaments are cheaper and use a plurality of filaments at lower cost, but do not need frequent disassembly and replacement, which is beneficial to maintaining the tightness of the whole device.

In one embodiment, the lamp further comprises a support column 131, one end of the support column 131 is fixedly connected with the inner wall of the first chamber 114, and the other end of the support column is fixedly connected with the filament 130.

Specifically, the electrode 140 provided in the present application has four terminals 141 to increase fault tolerance, a hole is formed in the first bottom plate 112 of the ion source apparatus 100 to enable four feeding pins of the electrode 140 to be inserted, then a ceramic ring is sleeved on a portion of the exposed feeding pins outside from the inside for insulation protection, the top is connected with two-position ceramic connecting terminals 141, four support columns 131 for installing and supporting the filaments 130 are formed in the bottom, the four support columns 131 are used for supporting the filaments 130, and three filaments 130 are fixed on the support columns 131 in a screw thread fastening manner and the connection portions are conductive. When the external power supply is a direct current source in actual power-on use, three terminals 141 and any two support columns 131 can be connected at will by wires according to the requirements, and the filaments 130 are connected in series; when the external power supply is an alternating current source, the filaments 130 are connected in a triangle mode, and then the three terminals 141 are connected with any three positions of the two filaments 130 respectively by using wires to form a classical triangle connection method of alternating current. Of course, if two of them are connected to the two outermost ends of the filament 130, the filament may be completely located in the circuit.

Referring to fig. 2, in the above embodiment, the projection of the four support columns 131 on the first bottom plate 112 is regarded as 4 points, and the 4 points are sequentially connected to form a trapezoid, so as to facilitate the spatial distribution of the three filaments 130 in the first chamber 114, and the reason why the three filaments 130 are not sequentially connected end to end is that when connected in series, the filaments 130 may be caused to be connected in parallel, so that the total resistance is reduced, and the yield of electrons is reduced.

Three filaments 130 are provided, but are essentially indistinguishable from one filament 130, except that three filaments 130 are more resistive in a series configuration, releasing more thermions and heat. As can be seen from fig. 2, the three filaments 130 are similar in shape to a triangle, but are practically independent of the angle of the triangle, so long as two conductive tracks are formed at the three junctions. The three terminals 141 are connected to any three positions of one filament 130, and the filament 130 is also formed into a triangle shape essentially with three positions as three apexes, and no three sides are formed at 180 °.

In one embodiment, the first bottom plate 112 is detachably connected to the first side wall 113, and the filament 130 and the electrode 140 are fixedly connected to the first bottom plate 112.

Specifically, the first bottom plate 112 is a flange, and is connected with the first side wall 113 through bolts and is provided with a sealing ring to prevent water leakage, and the filament 130 and the electrode 140 are fixedly connected with the first bottom plate 112 to realize integral disassembly, so that the filament 130 is convenient to change the connection mode and maintain and replace subsequently.

The present application provides a coating system comprising a coating machine (not shown in the drawings) and an ion source apparatus 100, the ion source apparatus 100 being configured to be mounted externally of the coating machine and fixedly connected to a chamber floor of the coating machine.

In the prior art, since the ion source apparatus 100 is inside the vacuum chamber of the coating machine, the space occupied by the ion source apparatus 100 inevitably has a large influence on the structural layout in the vacuum chamber, which is not beneficial to the design of the vacuum chamber of the vacuum coating machine and can significantly increase the volume of the vacuum chamber. In addition, since the vacuum electrode 140 is separated from the main body of the ion source apparatus 100, holes are required to be formed in the bottom plate of the vacuum chamber for installation of the vacuum electrode 140, which greatly increases the complexity of the design of the bottom plate of the vacuum chamber, and the cables and air pipes connected in the chamber greatly increase the cost of the ion source apparatus 100 due to the requirement of high vacuum, clean and high temperature working conditions, and the connections occupy the internal space of the vacuum chamber. The scheme of installing ion source equipment 100 in the coating machine outside that this application proposed can effectively reduce the design complexity of coating machine vacuum chamber's size and vacuum chamber bottom plate, if not prepare to change vacuum chamber's size, also can prevent to wait to coat the piece in original ion source equipment 100 in the inside position department of coating machine to guarantee to wait to coat the piece and the distance between ion source equipment 100 does not take place too big change, thereby make things convenient for the motion of ion.

The vacuum chamber floor of the coater is provided with a third through hole which communicates the first chamber 114 with the interior of the coater to allow ions to enter the interior of the coater. As will be readily appreciated, below the bottom plate is a second chamber 154, and below the second chamber 154 is in communication with the first chamber 114 through the through holes of the second bottom plate 152 and the first top plate 111. Thereby realizing that ions can smoothly enter the vacuum chamber of the coating machine.

In one embodiment, an anode portion (not shown) is also included, the anode portion being located inside the coater and opposite the ion source apparatus 100.

Specifically, taking the vertical direction as an example, the first cavity of the ion source device 100 is the first cavity, the second cavity is the second cavity upwards respectively, the bottom plate of the vacuum cavity of the film plating machine is arranged above the bottom plate, and the anode part is positioned above the bottom plate.

The size of the ion source apparatus 100 provided in the application is as follows, the ion source apparatus 100 is mounted at the lower part of the outer side of the vacuum chamber, and is vertically mounted with the bottom plate of the vacuum chamber, the outer side of the bottom plate is at a vertical distance of 244mm from the first bottom plate 112 (not including the vacuum electrode and the joint thereof) of the ion source apparatus 100, at a vertical distance of 310mm (not including the cable joint) from the bottom of the electrode 140, at a vertical distance of 358mm from the joint bottom of the electrode 140, the ion source apparatus 100 is free of the gas supply pipe 116, the joint part of the cooling pipe 120, and at the widest part of 165mm.

The technical features of the above-described embodiments may be arbitrarily combined, and all possible combinations of the technical features in the above-described embodiments are not described for brevity of description, however, as long as there is no contradiction between the combinations of the technical features, they should be considered as the scope of the description.

The above examples only represent a few embodiments of the present application, which are described in more detail and are not to be construed as limiting the scope of the claims. It should be noted that it would be apparent to those skilled in the art that various modifications and improvements could be made without departing from the spirit of the present application, which would be within the scope of the present application. Accordingly, the scope of protection of the present application is to be determined by the claims appended hereto.

Claims (10)

1. An ion source apparatus, comprising:

the first shell (110) is provided with a first top plate (111), a first bottom plate (112) and a first side wall (113), wherein the first top plate (111) and the first bottom plate (112) are oppositely arranged and are connected with the first side wall (113), and a first chamber (114) is defined by the first top plate, the first bottom plate (112) and the first side wall (113); a first channel (115) communicating is provided in the wall of the first bottom plate (112) and in the wall of the first side wall (113);

a cooling tube (120), the cooling tube (120) being fixedly connected to the first housing (110) and being in communication with the first channel (115), the cooling tube (120) being adapted to supply a cooling liquid into the first channel (115);

a filament (130) located in the first chamber (114) and fixedly connected to the first housing (110);

and an electrode (140) electrically connected to the filament (130).

2. The ion source apparatus according to claim 1, further comprising a second housing (150), wherein the second housing (150) has a second top plate (151), a second bottom plate (152) and a second side wall (153), the second top plate (151) and the second bottom plate (152) are disposed opposite to each other and are connected to the second side wall (153), a second chamber (154) is defined by the three, and the second bottom plate (152) and the first top plate (111) are fixedly connected in a thickness direction of the two;

the first top plate (111) is provided with a first through hole, the second bottom plate (152) is provided with a second through hole, and the first through hole is communicated with the second through hole so that the second chamber (154) is communicated with the first chamber (114);

wherein, be equipped with the second passageway in second roof (151), second passageway with first passageway (115) UNICOM.

3. The ion source apparatus of claim 2, wherein the second chamber (154) has a magnetic field configured to provide power for ions to enter the coater.

4. An ion source apparatus according to claim 3, wherein said second sidewall (153) is circumferentially wound with an electromagnetic coil (155), said electromagnetic coil (155) forming said magnetic field by electrical conduction.

5. The ion source apparatus of claim 1, wherein at least a partial region of the electrode (140) is located in the first chamber (114) and is fixedly connected to an inner wall of the first chamber (114); wherein the electrode (140) comprises at least three energizable terminals (141), said terminals (141) being in electrically conductive connection with the filament (130).

6. The ion source apparatus of claim 1, wherein said filament (130) has a plurality of said filaments (130) electrically connected in sequence.

7. The ion source apparatus of claim 1, further comprising a support post (131), wherein one end of the support post (131) is fixedly connected to an inner wall of the first chamber (114), and the other end is fixedly connected to the filament (130).

8. The ion source apparatus of claim 1, wherein the first base plate (112) is detachably connected to the first side wall (113), and the filament (130) and the electrode (140) are both fixedly connected to the base plate.

9. A coating system comprising a coating machine and the ion source apparatus of any one of claims 1-8, the ion source apparatus configured to be mounted externally of the coating machine and fixedly connected to a chamber floor of the coating machine;

the chamber bottom plate is provided with a third through hole, and the third through hole is communicated with the first chamber (114) and the inner part of the coating machine so that ions enter the coating machine.

10. The plating system of claim 9, further comprising an anode portion positioned within the plating machine and disposed opposite the ion source apparatus.