CN220485344U - Silica flour collection tank and silica flour collecting system - Google Patents
Silica flour collection tank and silica flour collecting system Download PDFInfo
- Publication number
- CN220485344U CN220485344U CN202321851210.2U CN202321851210U CN220485344U CN 220485344 U CN220485344 U CN 220485344U CN 202321851210 U CN202321851210 U CN 202321851210U CN 220485344 U CN220485344 U CN 220485344U
- Authority
- CN
- China
- Prior art keywords
- tank
- silicon powder
- discharge port
- jacket
- powder collection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 30
- 239000000377 silicon dioxide Substances 0.000 title claims description 15
- 235000013312 flour Nutrition 0.000 title description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 62
- 239000011863 silicon-based powder Substances 0.000 claims abstract description 61
- 238000007599 discharging Methods 0.000 claims abstract description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 52
- 229910052757 nitrogen Inorganic materials 0.000 claims description 24
- 238000010926 purge Methods 0.000 claims description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- 239000000843 powder Substances 0.000 claims description 5
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract description 11
- 229920005591 polysilicon Polymers 0.000 abstract description 8
- 238000010438 heat treatment Methods 0.000 abstract description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 238000005265 energy consumption Methods 0.000 abstract description 3
- 239000007789 gas Substances 0.000 description 32
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 29
- 239000005046 Chlorosilane Substances 0.000 description 28
- 239000012071 phase Substances 0.000 description 17
- 238000000034 method Methods 0.000 description 13
- 230000008569 process Effects 0.000 description 9
- 238000006722 reduction reaction Methods 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 230000009467 reduction Effects 0.000 description 8
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 7
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 7
- 239000007791 liquid phase Substances 0.000 description 7
- 238000011084 recovery Methods 0.000 description 7
- 239000000203 mixture Substances 0.000 description 5
- 229910001873 dinitrogen Inorganic materials 0.000 description 4
- 239000007792 gaseous phase Substances 0.000 description 4
- 239000002912 waste gas Substances 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000004880 explosion Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000010310 metallurgical process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
Abstract
The application provides a silicon powder collecting tank and a silicon powder collecting system, and relates to the field of polysilicon production; the silicon powder collecting tank comprises a tank body and a jacket; the tank body is respectively provided with a feeding hole, a first discharging hole and a second discharging hole which are communicated with each other; the second discharge port and the first discharge port are respectively positioned at two ends of the tank body, the feed inlet is positioned between the second discharge port and the first discharge port, and a filter is arranged between the feed inlet and the second discharge port; the jacket is sleeved on the tank body and provided with a steam inlet and a condensate outlet; this application avoids electric energy consumption through steam heating's mode, reduces and collects the cost.
Description
Technical Field
The application relates to the field of polysilicon production, in particular to a silicon powder collecting tank and a silicon powder collecting system.
Background
The tail gas is generated in the production process of the polycrystalline silicon, the tail gas is collected into a silicon powder collecting tank through a silicon powder filter, the tail gas comprises a mixture of silicon powder and chlorosilane in the early stage of entering the silicon powder collecting tank, wherein the silicon powder is in a dust state, the chlorosilane is in a gas phase, and the temperature of the chlorosilane is gradually reduced along with the prolongation of time in the later stage of entering the silicon powder collecting tank, so that the chlorosilane is gradually liquefied by the gas phase, the liquefied chlorosilane and the silicon powder form the mixture, at the moment, a production enterprise needs to heat the chlorosilane in waste materials, so that the chlorosilane is separated from the mixture, the purity of the silicon powder is improved, the silicon powder is collected, the existing silicon powder collecting tank is generally in an electric tracing mode, the tank body is electrically heated, and the cost for collecting the silicon powder is greatly increased due to the high electric energy consumed by heating.
Disclosure of Invention
The utility model aims at providing a silica flour collection tank and silica flour collecting system can realize the high purity collection of silica flour, and effectively reduces the cost of collection.
In a first aspect, the utility model provides a silicon powder collection tank, comprising a tank body and a jacket;
the tank body is respectively provided with a feeding hole, a first discharging hole and a second discharging hole which are communicated with each other; the second discharge port and the first discharge port are respectively positioned at two ends of the tank body, the feed inlet is positioned between the second discharge port and the first discharge port, and a filter is arranged between the feed inlet and the second discharge port;
the jacket is sleeved on the tank body, and the jacket is provided with a steam inlet and a condensate outlet.
In an alternative embodiment, the tank body comprises an upper tank body and a lower tank body communicated with the upper tank body, the first discharge port is located at one end of the lower tank body away from the upper tank body, and the second discharge port is located at one end of the upper tank body away from the lower tank body.
In an alternative embodiment, the feed inlet is located at the other end of the lower tank, and the filter is disposed in the upper tank.
In an alternative embodiment, the jacket is sleeved on the lower tank body, and the condensate outlet is arranged close to the first discharge port relative to the steam inlet.
In an alternative embodiment, the silicon powder collection tank further comprises a pressure gauge, wherein the pressure gauge is arranged on the tank body and is arranged at a distance from the jacket.
In an alternative embodiment, the silicon powder collection tank further comprises a feed conduit, one end of which communicates with the feed inlet.
In an alternative embodiment, the feed line is provided with a first nitrogen purge, which is arranged towards the feed opening.
In an alternative embodiment, the tank body is further provided with a second nitrogen purging device, and the second nitrogen purging device is arranged towards the first discharging port.
In an alternative embodiment, the filter comprises a filter element and a fixing bracket, wherein the fixing bracket is fixedly connected with the tank body, and the filter element is arranged on the fixing bracket.
In a second aspect, the present utility model provides a silicon powder collection system, comprising a reducing water apparatus and a silicon powder collection tank as described in the previous embodiments; the steam inlet of the silica powder collecting tank is communicated with the steam outlet of the reducing water equipment.
Compared with the prior art, the beneficial effects of this application are:
firstly, waste gas enters a tank body from a feed inlet, chlorosilane in the waste gas is gradually liquefied along with the extension of time, and a liquid phase chlorosilane and silicon powder form a mixture to be stored in the tank body; secondly, the chlorosilane in the liquid phase is heated by the tank body under the heat transfer effect of the jacket, so that the chlorosilane is converted into a gas phase from the liquid phase and is discharged through the second discharge port, and silicon powder is collected through the first discharge port. Finally, the steam heating mode is adopted, so that electric energy consumption is avoided, and the collection cost is reduced; finally, the steam is derived from surplus steam generated by the reduction water equipment in the production process of the polysilicon, and the steam is guided and utilized, so that the heat source problem of polysilicon collection is solved, and the steam cooling treatment problem of the reduction water equipment is solved, thereby achieving two purposes.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are needed in the embodiments will be briefly described below, it being understood that the following drawings only illustrate some embodiments of the present utility model and therefore should not be considered as limiting the scope, and that other related drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 shows a schematic perspective view of a silicon powder collection tank according to a first embodiment and a second embodiment;
FIG. 2 shows a schematic angular view of a silicon powder collection canister of embodiments one and two;
FIG. 3 shows a cross-sectional view A-A of FIG. 2;
FIG. 4 shows a schematic structural view of a silicon powder collection system of a third embodiment.
Description of main reference numerals:
100-a silicon powder collection tank; 110-a tank; 111-upper tank body; 112-lower tank; 113-a filter; 114-a second nitrogen purge; 101-a feed inlet; 102-a first discharge port; 103-a second discharge port; 120-jacket; 121-steam inlet; 122-a condensate outlet; 130-a first pressure gauge; 140-a second pressure gauge; 150-a feed line; 151-a first nitrogen purge; 200-reducing water equipment; 300-silicon powder filter; 400-silicon powder collecting bag; 500-a waste gas cryogenic recovery tank.
Detailed Description
Embodiments of the present application are described in detail below, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to like or similar elements or elements having like or similar functions throughout. The embodiments described below by referring to the drawings are exemplary only for the purpose of explaining the present application and are not to be construed as limiting the present application.
In the description of the present application, it should be understood that the terms "center," "longitudinal," "transverse," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," "circumferential," etc. indicate orientations or positional relationships based on the orientation or positional relationships shown in the drawings, are merely for convenience in describing the present application and simplifying the description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be configured and operated in a particular orientation, and therefore should not be construed as limiting the present application.
Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include one or more such feature. In the description of the present application, the meaning of "a plurality" is two or more, unless explicitly defined otherwise.
In this application, unless specifically stated and limited otherwise, the terms "mounted," "connected," "secured," and the like are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communicated with the inside of two elements or the interaction relationship of the two elements. The specific meaning of the terms in this application will be understood by those of ordinary skill in the art as the case may be.
In this application, unless expressly stated or limited otherwise, a first feature "up" or "down" a second feature may be the first and second features in direct contact, or the first and second features in indirect contact via an intervening medium. Moreover, a first feature being "above," "over" and "on" a second feature may be a first feature being directly above or obliquely above the second feature, or simply indicating that the first feature is level higher than the second feature. The first feature being "under", "below" and "beneath" the second feature may be the first feature being directly under or obliquely below the second feature, or simply indicating that the first feature is less level than the second feature.
Example 1
The present embodiment is used in a process for producing polycrystalline silicon, specifically, the process for producing polycrystalline silicon includes a modified siemens process, a silane process, a metallurgical process, a fluidized bed process, etc., and the present embodiment is particularly suitable for the modified siemens process.
The improved Siemens method is a chemical method, firstly, metallurgical silicon (purity is required to be more than 99.5%) and hydrogen chloride (HCl) are used for synthesizing and generating trichlorosilane gas (S) which is convenient for purification i HCl 3 TCS, hereinafter referred to as TCS), then rectifying and purifying the TCS, and finally converting the high-purity TCS into high-purity polysilicon by reduction reaction and Chemical Vapor Deposition (CVD), and recovering the tail gas generated after the reduction by a dry method, thereby realizing closed cycle utilization of hydrogen and chlorosilane.
In summary, the modified siemens process includes five major links: namely S i HCl 3 Synthesis, S i HCl 3 Rectifying and purifying S i HCl 3 Hydrogen reduction, tail gas recovery and S i Cl 4 Is a hydrogenation separation of (C).
Referring to fig. 1, the present embodiment provides a silicon powder collection tank 100, and the silicon powder collection tank 100 includes a tank body 110 and a jacket 120.
First, referring to fig. 2 and 3 together, the tank 110 is provided with a feed inlet 101, a first discharge outlet 102 and a second discharge outlet 103, which are communicated with each other; the second discharge port 103 and the first discharge port 102 are respectively positioned at two ends of the tank 110, the feed port 101 is positioned between the second discharge port 103 and the first discharge port 102, and a filter 113 is arranged between the feed port 101 and the second discharge port 103.
From vertical direction, second discharge gate 103 is located jar body 110 top, and first discharge gate 102 is located jar body 110 below, and according to the natural law that the gaseous phase risees and the solid phase descends (gravity acts on), the chlorosilane of gaseous phase rises to second discharge gate 103 and discharges, and the silica flour descends to first discharge gate 102 and collects, and this embodiment simple structure, convenient operation.
It will be appreciated that the inlet 101 is used for inputting tail gas, the first outlet 102 is used for collecting silicon powder, and the second outlet 103 is used as purge gas outlet for outputting gas phase chlorosilane.
The filter 113 comprises a filter element and a fixed support, the fixed support is fixedly connected with the tank body 110, and the filter element is arranged on the fixed support, so that tail gas rises after entering the tank body 110 and passes through a filtering surface of the filter element in the rising process, silicon powder in the tail gas is screened out, the substances output by the second discharge port 103 are ensured to be gas-phase chlorosilane, and the doping of the silicon powder is reduced.
During practical use, the fixing support is detachably connected with the tank body 110, after a certain period of use, an operator should detach the fixing support according to needs and replace the filter element, so as to ensure the filtering effect and improve the output efficiency of gas-phase chlorosilane.
For improving the collection speed of silica flour, jar body 110 still is equipped with second nitrogen gas and sweeps device 114, and second nitrogen gas sweeps device 114 towards first discharge gate 102 setting, prevents that the silica flour from piling up at first discharge gate 102, and in addition, nitrogen gas is inert gas, can not take place chemical reaction with the chlorosilane of the gaseous phase in jar body 110, consequently, adopts nitrogen gas to sweep the factor of safety that has improved this embodiment, simultaneously, can guarantee the purity of the chlorosilane of gaseous phase.
Specifically, compared with the design of horizontally placing the nitrogen purging device in the related art, the second nitrogen purging device 114 of this embodiment is inclined downward from outside to inside, so that silicon powder can be effectively prevented from moving toward the second nitrogen purging device 114, and blocking of the air outlet end of the second nitrogen purging device 114 is avoided.
Secondly, a jacket 120 is sleeved on the tank 110, and the jacket 120 is provided with a steam inlet 121 and a condensate outlet 122; in this embodiment, the condensate outlet 122 is disposed near the first outlet 102 relative to the steam inlet 121.
In practical use, the jacket 120 forms a closed package on the circumferential side of the tank 110, only the steam inlet 121 and the condensate outlet 122 are formed on the jacket 120, steam flows in a gap between the jacket 120 and the tank 110 from top to bottom, and heat is gradually transferred into the tank 110 at the upper end of the jacket 120, so that the heat of the steam from the upper end to the lower end of the jacket 120 is gradually decreased, liquefied into a liquid phase near the condensate outlet 122, and output from the condensate outlet 122.
Further, the present embodiment also includes a pressure gauge and feed line 150.
The pressure gauge is arranged on the tank body 110 and is arranged at intervals with the jacket 120; the pressure gauge is set as a remote pressure gauge, so that an operator can conveniently monitor the pressure gauge remotely, and the pressure gauge is used for detecting the pressure in the tank 110 in the embodiment.
When the inlet 101 is opened, if the value of the pressure gauge is close to the preset value, it indicates that the capacity of the tank 110 has reached the peak, and the inlet 101 should be closed.
When the jacket 120 is heated, if the value of the pressure gauge approaches the preset value, it indicates that the pressure in the tank 110 reaches the dangerous range, the pressure in the tank 110 should be reduced by the inlet to prevent the explosion of the tank 110, specifically, the vapor inlet 121 may be turned down or closed to reduce the generation of gas phase chlorosilane, or the second discharge outlet 103 may be turned up to accelerate the output of gas phase chlorosilane.
Therefore, in this embodiment, the first valve may be disposed at the inlet 101, the second valve may be disposed at the second outlet 103, the third valve may be disposed at the steam inlet 121, and the first valve, the second valve and the third valve may be set as manual valves or electric valves capable of adjusting flow, so that an operator may adjust pressure in time.
Further, in this embodiment, a fourth valve is further disposed at the first outlet 102 to control the opening or closing of the first outlet.
One end of the feeding pipeline 150 is communicated with the feeding port 101, the feeding pipeline 150 is provided with a first nitrogen purging device 151, the first nitrogen purging device 151 is arranged towards the feeding port 101, tail gas is prevented from being accumulated at the feeding port 101, the input smoothness of the tail gas is improved, and the safety of the embodiment is guaranteed due to the same principle as the inert physical property of nitrogen.
The feed pipe 150 inclines downwards, and the one end that is located the lower extreme communicates with feed inlet 101, and first nitrogen purging device 151 sets up in feed pipe 150 top, carries out nitrogen purging downwards, therefore, this design effectively prevents that tail gas from upwards moving to the end of giving vent to anger of first nitrogen purging device 151, causes first nitrogen purging device 151 to block up.
Further, the embodiment further includes a controller (not shown in the figure), the controller is electrically connected with the pressure gauge, the first valve, the second valve and the third valve respectively, the pressure gauge transmits pressure signals to the controller in real time, and the controller compares and judges the pressure value represented by the pressure signals with a preset value and performs corresponding control.
When the first valve is opened, the controller judges that the pressure value indicated by the numerical signal sent by the pressure gauge is close to a preset value, and the controller closes the first valve.
When the second valve and the third valve are opened, the controller judges that the pressure value represented by the numerical signal sent by the pressure gauge is close to a preset value, and the controller reduces or closes the third valve or increases the second valve.
Based on the foregoing, the principles of use of silicon powder collection canister 100 are further described herein as follows:
s100, opening a first valve and a first nitrogen purging device 151, and enabling tail gas to pass through a feeding pipeline
150, the chlorosilane in the tail gas is gradually liquefied from a gas phase and forms a mixture with silicon powder after entering the tank body 110 from the feeding hole 101;
s200, when the value displayed by the pressure gauge is close to a preset value, closing the first valve and the first nitrogen purging device 151, and transferring the position of the silicon powder collecting tank 100 according to the requirement;
s300, introducing steam from a steam inlet 121, liquefying the steam into a liquid phase after heat is gradually consumed, and outputting the liquid phase from a condensate outlet 122;
s400, opening a second valve, heating and converting the liquid-phase chlorosilane into a gas phase, and continuously rising the gas-phase chlorosilane and discharging the gas phase chlorosilane from a second discharge hole 103;
s500, when the value displayed by the pressure gauge is close to a preset value, adjusting the second valve and/or the third valve to reduce the pressure in the tank 110;
s600, when the air output of the second discharge hole 103 is smaller, closing the second valve and the third valve;
s700, opening the second nitrogen purging device 114 and the fourth valve, and discharging silicon powder from the first discharge port 102;
s800. close the second nitrogen purge 114 and the fourth valve.
Compared with the related art adopting an electric auxiliary heating mode, the embodiment carries out heating treatment on the tank body 110 by the mode that steam enters the jacket 120, has better heating effect and low energy consumption, and saves the cost of tail gas recovery.
Example two
Referring to fig. 1, 2 and 3, the present embodiment is modified based on the first embodiment, and therefore, the present embodiment is different from the first embodiment in the following parts:
the tank 110 comprises an upper tank 111 and a lower tank 112 communicated with the upper tank 111, the first discharge port 102 is positioned at one end of the lower tank 112 far away from the upper tank 111, the feed port 101 is positioned at the other end of the lower tank 112, the second discharge port 103 is positioned at one end of the upper tank 111 far away from the lower tank 112, and the filter 113 is arranged on the upper tank 111.
In actual use, the upper tank 111 and the lower tank 112 are of cylindrical structures, the diameter of the upper tank 111 is smaller than that of the lower tank 112, the structural design is favorable for the tank 110 to keep a stable vertical state, and the overflow surface of the upper tank 111 is smaller than that of the lower tank 112, so that gas-phase chlorosilane forms jet flow in the tank 110 along the output direction, and the gas output speed is accelerated.
The jacket 120 is sleeved on the lower tank 112, and the jacket 120 forms a closed package on the peripheral side of the lower tank 112.
In this embodiment, the number of pressure gauges is two, and two pressure gauges are remote transmission pressure gauges, wherein one pressure gauge is disposed on the upper tank 111, the other pressure gauge is disposed on the lower tank 112, for convenience of description and understanding, the pressure gauge disposed on the upper tank 111 is defined as the first pressure gauge 130, and the pressure gauge disposed on the lower tank 112 is defined as the second pressure gauge 140.
The first pressure gauge 130 is located between the filter 113 and the second discharge port 103 to monitor the pressure value of the upper tank 111, the second pressure gauge 140 is located between the filter 113 and the first discharge port 102, and the second pressure gauge 140 is located opposite to the feed port 101, i.e. the second pressure gauge 140 is also located at one end of the lower tank 112 near the upper tank 111 to monitor the pressure value of the lower tank 112.
The first pressure gauge 130 and the second pressure gauge 140 are arranged at intervals with the jacket 120, so that the temperature of the jacket 120 is prevented from affecting the detection accuracy of the first pressure gauge 130 and the second pressure gauge 140, and the service lives of the first pressure gauge 130 and the second pressure gauge 140 are prolonged.
Similarly, in order to prevent the silicon powder from blocking the first pressure gauge 130 and the second pressure gauge 140, the first pressure gauge 130 and the second pressure gauge 140 are also arranged in an inclined downward manner.
When the inlet 101 is opened for air intake, the first pressure gauge 130 displays a value close to the first preset value, and the second pressure gauge 140 displays a value close to the second preset value, which indicates that the capacity of the tank 110 has reached the peak, and the inlet 101 should be closed.
When the jacket 120 is heated, the value displayed by the first pressure gauge 130 is close to the first preset value, the value displayed by the second pressure gauge 140 is close to the second preset value, which indicates that the pressure in the tank 110 reaches the dangerous range, the pressure in the tank 110 should be reduced as soon as possible, the danger of explosion of the tank 110 is prevented, specifically, the generation of gas-phase chlorosilane can be reduced by adjusting the steam inlet 121 to be small or closing the steam inlet 121, or the output of gas-phase chlorosilane can be accelerated by adjusting the second discharge outlet 103 to be large.
Further, the controller is electrically connected with the first pressure gauge 130 and the second pressure gauge 140 respectively, the first pressure gauge 130 and the second pressure gauge 140 transmit pressure signals to the controller in real time, and the controller compares and judges the pressure value represented by the pressure signals with a preset value and performs corresponding control.
Illustratively, when the first valve is opened for air intake, the controller determines that the pressure value represented by the numerical signal sent by the first pressure gauge 130 is close to the first preset value, and the pressure value represented by the numerical signal sent by the second pressure gauge 140 is close to the second preset value, and the controller closes the first valve.
When the second valve and the third valve are opened, the controller determines that the pressure value represented by the numerical signal sent by the first pressure gauge 130 is close to the first preset value, the pressure value represented by the numerical signal sent by the second pressure gauge 140 is close to the second preset value, and the controller reduces or closes the third valve, or increases the second valve.
Example III
Referring to fig. 4, according to the first or second embodiment, the present embodiment provides a silicon powder collecting system, which includes a reducing water apparatus 200 and the silicon powder collecting tank 100 described above, wherein a steam inlet 121 of the silicon powder collecting tank 100 is communicated with a steam outlet of the reducing water apparatus 200.
In this embodiment, the tail gas is recovered and S i HCl 3 Is used in combination with the two processes of hydrogen reduction in which the recovery of the off-gas is achieved by the silicon powder collection tank 100 of the present embodiment, S i HCl 3 Is realized by the reduction water apparatus 200.
Wherein, the steam of the water reducing apparatus 200 is S i HCl 3 During the production of polysilicon, the vapor generated by the reduction water apparatus 200 should be liquefied to prevent the vapor from drifting and damaging the factory, and at the same time, to prevent the vapor from burning staff, thus, if the vapor generated by the reduction water apparatus 200 is treated alone, it takes a great cost.
Further, the present embodiment further includes a silicon powder filter 300, a silicon powder collection bag 400, and an exhaust gas cryogenic recovery tank 500.
The silica powder filter 300 is communicated with the feed inlet 101 and inputs tail gas to the feed inlet 101, the silica powder collecting bag 400 is arranged on the tank 110 and communicated with the first discharge port 102 to collect silica powder, and the waste gas cryogenic recovery tank 500 is communicated with the second discharge port 103 to treat gas-phase chlorosilane.
Based on the description of the principles of use of silicon powder collection tank 100 in the first embodiment, the principles of use of the silicon powder collection system are further described herein as follows:
s101, enabling tail gas to enter a feed inlet 101 through a silicon powder filter 300;
s401, discharging gas-phase chlorosilane from the second discharge hole 103 to an exhaust gas cryogenic recovery tank 500;
s601. the silicon powder is discharged from the first discharge port 102 to the silicon powder collection bag 400.
The embodiment introduces steam into the silicon powder collecting tank 100 as a heat source, so that the problem of heat source for collecting polysilicon is solved, the problem of steam cooling treatment of the reducing water equipment 200 is solved, and the method has two purposes and has positive effects on the production process of polysilicon.
In the description of the present specification, a description referring to terms "one embodiment," "some embodiments," "examples," "specific examples," or "some examples," etc., means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present application. In this specification, schematic representations of the above terms are not necessarily directed to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, the different embodiments or examples described in this specification and the features of the different embodiments or examples may be combined and combined by those skilled in the art without contradiction.
Although embodiments of the present application have been shown and described above, it will be understood that the above embodiments are illustrative and not to be construed as limiting the application, and that variations, modifications, alternatives, and variations may be made to the above embodiments by one of ordinary skill in the art within the scope of the application.
Claims (10)
1. The silicon powder collecting tank is characterized by comprising a tank body and a jacket;
the tank body is respectively provided with a feeding hole, a first discharging hole and a second discharging hole which are communicated with each other; the second discharge port and the first discharge port are respectively positioned at two ends of the tank body, the feed inlet is positioned between the second discharge port and the first discharge port, and a filter is arranged between the feed inlet and the second discharge port;
the jacket is sleeved on the tank body, and the jacket is provided with a steam inlet and a condensate outlet.
2. A silicon powder collection tank as set forth in claim 1 wherein said tank includes an upper tank and a lower tank in communication with said upper tank, said first discharge port being located at an end of said lower tank remote from said upper tank, said second discharge port being located at an end of said upper tank remote from said lower tank.
3. A silicon powder collection tank as set forth in claim 2 wherein said feed port is located at the other end of said lower tank and said filter is disposed in said upper tank.
4. A silicon powder collection tank as set forth in claim 2 wherein said jacket is disposed about said lower tank body and said condensate outlet is disposed adjacent said first discharge port relative to said steam inlet.
5. A silicon powder collection tank as set forth in any one of claims 1 to 4 further comprising a pressure gauge mounted to the tank and spaced from the jacket.
6. A silicon powder collection tank as claimed in any one of claims 1 to 4 further comprising a feed conduit having one end in communication with the feed inlet.
7. A silicon powder collection tank as set forth in claim 6 wherein said feed conduit is provided with a first nitrogen purge device, said first nitrogen purge device being disposed toward said feed inlet.
8. A silicon powder collection tank as claimed in any one of claims 1 to 4 wherein the tank is further provided with a second nitrogen purge means, the second nitrogen purge means being disposed towards the first outlet.
9. A silicon powder collection canister as claimed in any one of claims 1 to 4 wherein the filter includes a filter cartridge and a mounting bracket, the mounting bracket being fixedly connected to the canister, the filter cartridge being mounted to the mounting bracket.
10. A silicon powder collection system comprising a reducing water apparatus and a silicon powder collection tank as defined in any one of claims 1 to 9; the steam inlet of the silica powder collecting tank is communicated with the steam outlet of the reducing water equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321851210.2U CN220485344U (en) | 2023-07-13 | 2023-07-13 | Silica flour collection tank and silica flour collecting system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321851210.2U CN220485344U (en) | 2023-07-13 | 2023-07-13 | Silica flour collection tank and silica flour collecting system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN220485344U true CN220485344U (en) | 2024-02-13 |
Family
ID=89840660
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202321851210.2U Active CN220485344U (en) | 2023-07-13 | 2023-07-13 | Silica flour collection tank and silica flour collecting system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN220485344U (en) |
-
2023
- 2023-07-13 CN CN202321851210.2U patent/CN220485344U/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP2032746B1 (en) | Method for continual preparation of polycrystalline silicon using a fluidized bed reactor | |
| US4343772A (en) | Thermal reactor | |
| US20090155140A1 (en) | Apparatus for Producing Trichlorosilane | |
| KR100732623B1 (en) | Carbon nanotubes mass synthesizing system | |
| CN101421188B (en) | Trichlorosilane production apparatus | |
| CN220485344U (en) | Silica flour collection tank and silica flour collecting system | |
| CN112661114A (en) | Electronic grade hydrogen bromide rectifying and purifying method | |
| CN115650237A (en) | Method and device for preparing silicon carbide raw material by chemical vapor deposition method | |
| CN207294207U (en) | A kind of zirconium chloride purifier | |
| CN100457614C (en) | Device and process for the deposition of ultrafine particles from the gas phase | |
| WO2024027341A1 (en) | Method for cleaning deposited silicon on inner wall of fluidized bed | |
| CN204057976U (en) | A kind of device reducing silica flour content in polysilicon reducing furnace tail gas | |
| EP0070440A1 (en) | Method for synthesizing amorphous silicon nitride | |
| CN105060297B (en) | A kind of method and device for producing silicochloroform | |
| CN115747763A (en) | System and method for preparing secondary battery composite negative electrode material by CVD | |
| US20140112832A1 (en) | Threaded nozzle and closable nozzle valve assembly | |
| US20170073234A1 (en) | Device for manufacturing polysilicon using horizontal reactor and method for manufacturing same | |
| US20180051373A1 (en) | Mechanically vibrated based reactor systems and methods | |
| CN102557045A (en) | Method and device for producing white carbon black and carbon tetrachloride by adopting plasma process | |
| CN218981508U (en) | Reactor for producing silicon tetrachloride | |
| CN103172072B (en) | Realize reactor and the method for chlorosilane synthesis | |
| CN204824190U (en) | Gaseous metallic impurity's of desorption chlorosilane device and have its silicon production system | |
| US20200339427A1 (en) | Method for producing trichlorosilane and device for producing trichlorosilane | |
| CN220243703U (en) | Ash discharging device for cold hydrogenation waste contact tank | |
| CN220079179U (en) | High temperature and high pressure resistant sealed crucible assembly |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |