CN220253192U

CN220253192U - Pressure regulating device and film growth equipment

Info

Publication number: CN220253192U
Application number: CN202321852312.6U
Authority: CN
Inventors: 代家航; 赵放
Original assignee: SiEn Qingdao Integrated Circuits Co Ltd
Current assignee: SiEn Qingdao Integrated Circuits Co Ltd
Priority date: 2023-07-14
Filing date: 2023-07-14
Publication date: 2023-12-26
Anticipated expiration: 2033-07-14

Abstract

The utility model provides a pressure regulating device and film growth equipment. Wherein the pressure regulating device comprises; the device comprises an input/output unit, a monitoring unit and an adjusting unit; the input/output unit comprises an air inlet pipeline and an air outlet pipeline; the air inlet pipeline and the air outlet pipeline are respectively communicated with the inner cavity of the lamp chamber, so that gas flows into the lamp chamber through the air inlet pipeline and flows out of the lamp chamber through the air outlet pipeline; the monitoring unit is at least used for measuring the pressure in the lamp chamber; the adjusting unit comprises a pressure adjusting valve which is arranged on the air inlet pipeline or the air outlet pipeline so as to adjust the flow of the gas flowing through the lamp chamber according to the pressure in the lamp chamber. Therefore, the pressure regulating valve finely regulates the gas flow in the gas inlet pipeline and the gas outlet pipeline according to the real-time pressure in the lamp chamber, avoids overlarge heat loss caused by large-flow air flow flowing in the lamp chamber, also avoids large-scale change of the output power of the lamp chamber, effectively relieves fluctuation of the output power of the lamp chamber, and is beneficial to accurately controlling the thickness of the film growth.

Description

Pressure regulating device and film growth equipment

Technical Field

The utility model relates to the technical field of semiconductor manufacturing, in particular to a pressure regulating device and film growth equipment.

Background

The wet oxidation growth process (In-Situ Steam Generation, ISSG) is mainly used for preparing ultrathin oxide layers, sacrificial oxide layers, nitrogen oxide films and the like In a low-pressure environment. Wherein, the ISSG equipment mainly comprises a lamp room and a reaction chamber. The lamp chamber is used for providing illumination for the reaction chamber so as to enable the reaction chamber to reach a preset reaction temperature. The reaction chamber is used for accommodating the semiconductor structure, providing reaction gas, low-pressure reaction environment and the like, so that film growth is realized. In general, the pressure in the reaction chamber is maintained at about 7Torr, and the pressure in the lamp chamber is typically about 10Torr in order to avoid an excessive difference between the pressure in the reaction chamber and the pressure in the lamp chamber. However, during film growth, the temperature in the reaction chamber gradually increases, and the pressure in the lamp chamber increases. As only one layer of quartz plate is arranged between the lamp chamber and the reaction chamber, when the pressure in the lamp chamber is increased and the pressure difference between the pressure in the lamp chamber and the pressure in the reaction chamber is large, the quartz plate is easy to crack, the normal growth of a film is influenced, and even downtime is caused. In this regard, the prior art has been to provide a circulation purge mechanism within the lamp chamber. That is, when the pressure in the lamp chamber rises to a preset value, the circulation purge mechanism is started to flow the gas in the lamp chamber, and the pressure in the lamp chamber is reduced.

However, the cyclical purge mechanism may carry away a portion of the heat within the lamp chamber during the purge. In order to compensate the heat, the bulb in the lamp room can increase the output power, so that the power output of the lamp room is unstable, and fluctuation of a certain amplitude exists, thereby leading to fluctuation of the thickness of the film growth along with fluctuation of the output power of the lamp room, seriously impeding the accurate control of the thickness of the film and affecting the growth quality of the film.

Accordingly, a new ISSG apparatus is needed to solve the above technical problems.

Disclosure of Invention

The utility model aims to provide a pressure regulating device and film growth equipment, which are used for solving at least one problem of how to regulate the pressure in a lamp chamber, how to relieve the fluctuation of the power output of the lamp chamber and how to accurately control the thickness of film growth.

In order to solve the above technical problems, the present utility model provides a pressure adjusting device for adjusting a pressure in a lamp chamber, the pressure adjusting device comprising; the device comprises an input/output unit, a monitoring unit and an adjusting unit;

the input and output unit comprises an air inlet pipeline and an air outlet pipeline; the air inlet pipeline and the air outlet pipeline are respectively communicated with the inner cavity of the lamp chamber, so that gas flows into the lamp chamber through the air inlet pipeline and flows out of the lamp chamber through the air outlet pipeline;

the monitoring unit is at least used for measuring the pressure in the lamp chamber;

the regulating unit comprises a pressure regulating valve which is arranged on the air inlet pipeline and/or the air outlet pipeline so as to regulate the flow of the gas flowing through the lamp chamber according to the pressure in the lamp chamber.

Optionally, in the pressure regulating device, the pressure regulating valve has a pressurized state and a depressurized state; and in the pressurized state, the pressure regulating valve regulates the opening degree to increase the pressure in the lamp chamber; in the depressurized state, the pressure regulating valve regulates an opening degree to reduce a pressure in the lamp chamber.

Optionally, in the pressure adjusting device, when the pressure in the lamp chamber is lower than a preset range, the pressure adjusting valve is in the pressurized state; and when the pressure in the lamp chamber is higher than the preset range, the pressure regulating valve is in the pressure reducing state.

Optionally, in the pressure regulating device, the regulating unit further includes an air inlet valve and an air outlet valve; the air inlet valve is connected with the air inlet pipeline, and the air outlet valve is connected with the air outlet pipeline.

Optionally, in the pressure regulating device, the air inlet valve and the air outlet valve are normally closed valves, and when the lamp chamber is in a working state, the air inlet valve and the air outlet valve are opened.

Optionally, in the pressure regulating device, the air inlet valve is a pneumatic valve; the air outlet valve is a pneumatic valve or an isolation valve.

Optionally, in the pressure adjusting device, the adjusting unit further includes a pressure switch; the pressure switch is arranged in the lamp chamber and is electrically connected with the air inlet valve and the air outlet valve.

Optionally, in the pressure regulating device, the regulating unit further includes a check valve and an air pump; the check valve and the air pump are respectively connected with the air outlet pipeline, and the check valve is a normally open valve.

Optionally, in the pressure regulating device, the monitoring unit includes a first pressure gauge and a second pressure gauge; the first pressure gauge is arranged in the lamp chamber and is used for measuring the pressure in the lamp chamber; the second pressure gauge is connected with the air outlet pipeline and is used for measuring the air pressure in the air outlet pipeline; the first pressure gauge and the second pressure gauge are respectively and electrically connected with the pressure regulating valve.

Based on the same conception, the utility model also provides film growth equipment which is characterized by comprising the pressure regulating device.

In summary, the present utility model provides a pressure adjusting device and a thin film growth apparatus. The pressure regulating device is used for regulating the pressure in the lamp chamber and comprises; the device comprises an input/output unit, a monitoring unit and an adjusting unit; the input and output unit comprises an air inlet pipeline and an air outlet pipeline; the air inlet pipeline and the air outlet pipeline are respectively communicated with the inner cavity of the lamp chamber, so that gas flows into the lamp chamber through the air inlet pipeline and flows out of the lamp chamber through the air outlet pipeline; the monitoring unit is at least used for measuring the pressure in the lamp chamber; the adjusting unit comprises a pressure adjusting valve which is arranged on the air inlet pipeline or the air outlet pipeline so as to adjust the flow of the gas flowing through the lamp chamber according to the pressure in the lamp chamber. Compared with the prior art, the pressure regulating valve provided by the utility model can finely regulate the gas flow in the gas inlet pipeline and the gas outlet pipeline according to the real-time pressure in the lamp chamber, so that overlarge heat loss caused by large-flow air flow flowing in the lamp chamber is avoided, meanwhile, the large-amplitude change of the output power of the lamp chamber is avoided, the fluctuation of the output power of the lamp chamber is effectively relieved, the thickness of the film growth is favorably and accurately controlled, and the film quality is improved.

Drawings

Those of ordinary skill in the art will appreciate that the figures are provided for a better understanding of the present utility model and do not constitute any limitation on the scope of the present utility model.

Fig. 1 is a schematic structural view of a pressure adjusting device according to an embodiment of the present utility model.

Fig. 2 is a schematic structural diagram of an input-output unit according to an embodiment of the utility model.

Fig. 3 is a schematic structural diagram of a monitoring unit according to an embodiment of the present utility model.

Fig. 4 is a schematic structural view of an adjusting unit according to an embodiment of the present utility model.

Fig. 5 is a schematic structural view of another adjusting unit in an embodiment of the present utility model.

FIG. 6 is a schematic diagram of the positions of two pressure regulating valves in an embodiment of the utility model.

FIG. 7 is a schematic view showing the structure of a thin film growth apparatus according to an embodiment of the present utility model.

And, in the drawings:

10-lamp room; 101-quartz plates;

20-pressure regulating means; 201-an input-output unit; 2011-an air inlet pipeline; 2012-an outlet pipe; 202-a monitoring unit; 2021-a first manometer; 2022-second manometer; 203-an adjustment unit; 2031-pressure regulating valve; 2032-intake valve; 2033-gas outlet valve; 2034-negative voltage switch; 2035-check valve; 2036-air pump;

30-reaction chamber.

Detailed Description

The utility model will be described in further detail with reference to the drawings and the specific embodiments thereof in order to make the objects, advantages and features of the utility model more apparent. It should be noted that the drawings are in a very simplified form and are not drawn to scale, merely for convenience and clarity in aiding in the description of embodiments of the utility model. Furthermore, the structures shown in the drawings are often part of actual structures. In particular, the drawings are shown with different emphasis instead being placed upon illustrating the various embodiments. It should be further understood that the terms "first," "second," "third," and the like in this specification are used merely for distinguishing between various components, elements, steps, etc. in the specification and not for indicating a logical or sequential relationship between the various components, elements, steps, etc., unless otherwise indicated.

Referring to fig. 1, in order to adjust the pressure in the lamp chamber 10, the present embodiment provides a pressure adjusting device 20, including; an input-output unit 201, a monitoring unit 202, and an adjusting unit 203; the input/output unit 201 includes an inlet pipe 2011 and an outlet pipe 2012; the gas inlet pipe 2011 and the gas outlet pipe 2012 are respectively communicated with the inner cavity of the lamp chamber 10, so that gas flows into the lamp chamber 10 through the gas inlet pipe 2011 and flows out of the lamp chamber 10 through the gas outlet pipe 2012; the monitoring unit 202 is at least for measuring the pressure in the lamp chamber 10; the regulating unit 203 includes a pressure regulating valve 2031, and the pressure regulating valve 2031 is provided on the gas inlet pipe 2011 or the gas outlet pipe 2012 to regulate the flow rate of the gas flowing through the lamp chamber 10 according to the pressure inside the lamp chamber 10.

It can be seen that, according to the pressure adjusting device 20 provided in this embodiment, the gas flow in the gas inlet pipe 2011 and the gas outlet pipe 2012 can be finely adjusted according to the real-time pressure in the lamp room 10, so as to avoid excessive heat loss caused by the large flow of gas flowing in the lamp room 10, and further avoid the large variation of the output power of the lamp room 10, effectively alleviate the fluctuation of the output power of the lamp room 10, and facilitate the accurate control of the thickness of the film growth and improve the film quality.

The pressure adjusting device 20 provided in this embodiment is specifically described below with reference to fig. 1 to 7.

With continued reference to fig. 1, the pressure adjusting device 20 provided in the present embodiment is configured to adjust the pressure environment in the lamp chamber 10, and perform a certain flow of gas purge on the lamp chamber 10to reduce the pressure in the lamp chamber 10 when the pressure in the lamp chamber 10 is greater than a preset range; when the pressure in the lamp chamber 10 is less than the preset range, a certain amount of gas is filled into the lamp chamber 10to increase the pressure in the lamp chamber 10, thereby effectively controlling the pressure in the lamp chamber 10to be within a stable range. Based on this, the pressure regulating device 20 includes the input-output unit 201, the monitoring unit 202, and the regulating unit 203. Wherein the input/output unit 201 is used for inputting gas into the lamp chamber 10 and outputting gas, thereby changing the pressure environment in the lamp chamber 10. The monitoring unit 202 is used for measuring the pressure in the lamp chamber 10 in real time and the pressure of the gas flowing out of the lamp chamber 10 in real time. The adjusting unit 203 is configured to accurately adjust the flow of the gas flowing into and out of the lamp chamber 10 according to a specific pressure environment in the lamp chamber 10, so as to realize accurate adjustment and control of the pressure in the lamp chamber 10, and avoid a large change in the pressure in the lamp chamber 10, so as to avoid serious heat loss caused by the large flow of the gas flowing into the lamp chamber 10, effectively relieve a large fluctuation of the output power of the lamp chamber 10, facilitate accurate control of the thickness of the film growth, and improve the film quality.

Referring to fig. 1 and 2, the input/output unit 201 includes the inlet pipe 2011 and the outlet pipe 2012. The air inlet pipe 2011 and the air outlet pipe 2012 are through pipes and are respectively communicated with the lamp chamber 10. Further, the specific aperture sizes of the air inlet pipe 2011 and the air outlet pipe 2012 are not limited in this embodiment, and may be determined according to the pressure environment in the lamp chamber 10, the adjustment time, and other factors. And, the specific shapes of the air inlet pipe 2011 and the air outlet pipe 2012 are not limited in this embodiment, and may be determined according to the working condition environment of the installation of the apparatus. Illustratively, the inlet pipe 2011 and the outlet pipe 2012 are linear, bent, curved, or the like. The gas flowing in the input/output unit 201 may be connected to the plant pipeline, or a gas supply tank (not shown) may be separately provided. Preferably, the gas is a non-toxic, harmless, non-corrosive gas with low heat conduction influence, such as helium or other inert gas.

Referring to fig. 1 and 3, the monitoring unit 202 includes a first pressure gauge 2021 and a second pressure gauge 2022. The first pressure gauge 2021 is disposed in the lamp chamber 10, and is configured to measure a pressure environment in the lamp chamber 10 in real time. The second pressure gauge 2022 is connected to the outlet pipe 2012 for measuring the pressure of the gas in the outlet pipe 2012. Wherein the first pressure gauge 2021 and the second pressure gauge 2022 are electrically connected to the pressure regulating valve 2031, respectively. It can be appreciated that the first pressure gauge 2021 may be transmitted to the pressure regulating valve 2031 in real time after acquiring the pressure in the lamp chamber 10, and the pressure regulating valve 2031 may regulate the gas flow in the gas inlet pipe 2011 and/or the gas outlet pipe 2012 according to the pressure in the lamp chamber 10, so as to achieve accurate control of the pressure in the lamp chamber 10. The second pressure 2022 is used as a feedback end to timely feed back the acquired gas pressure condition in the gas outlet pipe 2012 to the pressure regulating valve 2031, so that the pressure regulating valve 2031 can perform flow regulation with higher accuracy by combining the pressure information in the lamp room 10 provided by the first pressure gauge 2021 and the pressure information in the gas outlet pipe 2012 provided by the second pressure gauge 2022. Further, the present embodiment is not limited to the specific type and accuracy of the first pressure gauge 2021 and the second pressure gauge 2022, and may be determined according to the type of the introduced gas, the pressure control range, and other factors.

Referring to fig. 1 and 4, the adjusting unit 203 includes a pressure adjusting valve 2031, an intake valve 2032, an outlet valve 2033, a pressure switch 2034, a check valve 2035, and an air pump 2036. Wherein the pressure regulating valve 2031 is used for regulating the flow of gas flowing through the lamp chamber 10 according to the pressure in the lamp chamber 10. The intake valve 2032 is for restricting inflow of gas. The air outlet valve 2033 is used for restricting the outflow of air. The pressure switch 2034 is configured to provide a signal to open or close at least the air inlet valve 2032 and the air outlet valve 2033 according to the pressure conditions within the lamp chamber 10. The check valve 2035 is for preventing backflow of gas. And, the air pump 2036 is for driving the flow of air.

As shown in fig. 4to 6, the pressure regulating valve 2031 is provided on the air outlet pipe 2012 to regulate the amount of air flowing through the lamp chamber 10 by regulating the amount of air flowing through the air outlet pipe 2012. Alternatively, the pressure regulating valve 2031 is provided on the air intake pipe 2011 to regulate the amount of air flowing through the lamp chamber 10 by regulating the amount of air flowing through the air intake pipe 2011. Alternatively, the adjusting unit 203 is provided with two pressure adjusting valves 2031, and the air inlet pipe 2011 and the air outlet pipe 2012 are respectively provided with one pressure adjusting valve 2031, so as to adjust the air flow in the air inlet pipe 2011 and the air outlet pipe 2012 at the same time, thereby improving the adjusting efficiency. In other embodiments, the regulating unit 203 may further be provided with a plurality of the pressure regulating valves 2031 to collectively regulate the flow of gas flowing through the lamp chamber 10.

Further, the pressure regulating valve 2031 has a pressurized state and a depressurized state. In the pressurized state, the pressure regulating valve 2031 regulates the opening degree to increase the pressure inside the lamp chamber 10. In the depressurized state, the pressure regulating valve 2031 regulates the opening degree to reduce the pressure inside the lamp chamber 10. Wherein the pressure regulating valve 2031 assumes the pressurized state when the pressure in the lamp chamber 10 is below a preset range; when the pressure in the lamp chamber 10 is higher than the preset range, the pressure regulating valve 2031 assumes the depressurized state.

Illustratively, the predetermined range is [4Torr,20Torr ]. As shown in fig. 4, when the pressure in the lamp chamber 10 is greater than 20Torr, the pressure in the lamp chamber 10 needs to be reduced, and the pressure regulating valve 2031 is in a depressurized state. Since the pressure regulating valve 2031 is disposed on the outlet pipe 2012, on the premise that the intake air amount in the intake pipe 2011 is not changed, the opening of the pressure regulating valve 2031 is increased to increase the amount of the gas outlet in the outlet pipe 2012, so that the total gas in the lamp chamber 10 is in an outflow state, and the pressure in the lamp chamber 10 is reduced. Conversely, when the pressure in the lamp chamber 10 is less than 4Torr, the pressure regulating valve 2031 is pressurized, and the opening degree needs to be reduced to reduce the amount of gas discharged from the gas outlet pipe 2012, so that the total gas in the lamp chamber 10 is in an inflow state, thereby increasing the pressure in the lamp chamber 10.

As shown in fig. 5, when the pressure in the lamp chamber 10 is greater than 20Torr, the pressure in the lamp chamber 10 needs to be reduced, and the pressure regulating valve 2031 is in a depressurized state. Since the pressure regulating valve 2031 is disposed on the air intake pipe 2011, on the premise that the amount of air output in the air output pipe 2012 is not changed, the opening of the pressure regulating valve 2031 is reduced to reduce the amount of air intake in the air intake pipe 2011, so that the total gas in the lamp chamber 10 is in an outflow state, and the pressure in the lamp chamber 10 is reduced. On the contrary, when the pressure in the lamp chamber 10 is less than 4Torr, the pressure regulating valve 2031 is pressurized, and the opening degree is increased to increase the intake air amount in the intake pipe 2011, so that the total gas in the lamp chamber 10 is flowed in, thereby increasing the pressure in the lamp chamber 10.

As shown in fig. 6, when the pressure in the lamp chamber 10 is greater than 20Torr, the pressure in the lamp chamber 10 needs to be reduced, and the pressure regulating valve 2031 is in a depressurized state. Since the pressure regulating valves 2031 are provided in both the inlet pipe 2011 and the outlet pipe 2012, only one of the pressure regulating valves 2031 may be regulated with reference to the regulation methods shown in fig. 4 and 5, or the opening of the pressure regulating valve 3021 in the inlet pipe 2011 may be reduced, and the opening of the pressure regulating valve 3021 in the outlet pipe 2012 may be increased, so that the total gas in the lamp chamber 10 is in an outflow state, thereby reducing the pressure in the lamp chamber 10. Conversely, when the pressure in the lamp chamber 10 is less than 4Torr, the pressure regulating valve 2031 is in a pressurized state. It is also possible to refer to the adjustment modes described above with respect to fig. 4 and 5, and to adjust only one of the pressure adjustment valves 2031, or to increase the opening of the pressure adjustment valve 3021 in the intake pipe 2011 and decrease the opening of the pressure adjustment valve 3021 in the outlet pipe 2012, so that the total gas in the lamp chamber 10 is in an inflow state, and the pressure in the lamp chamber 10 is increased.

As can be seen from the above, compared with the equal flow gas purging, the pressure regulating valve 2031 provided in this embodiment not only can satisfy the regulation of the pressure in the lamp chamber 10, but also can finely regulate the air flow in real time according to the specific pressure in the lamp chamber 10, thereby avoiding the condition of flowing large flow gas, further avoiding the fluctuation of the output power of the lamp chamber 10 caused by the large quantity of heat taken away by the large flow gas, improving the stability of the output power of the lamp chamber 10, being beneficial to precisely controlling the thickness of the film growth, and improving the film quality.

With continued reference to fig. 1 and 4-6, the intake valve 2032 is connected to the intake pipe 2011, and the outlet valve 2033 is connected to the outlet pipe 2012. Wherein, the air inlet valve 2032 and the air outlet valve 2033 are normally closed switches, and when the lamp chamber 10 is in a working state, the air inlet valve 2032 and the air outlet valve 2033 are in an open state. Based on this, the adjusting unit 203 is provided with the pressure switch 2034 inside the lamp room 10. The pressure switch 2034 is electrically connected to the air inlet valve 2032 and the air outlet valve 2033, so that when the lamp chamber 10 is in a working state, the pressure switch 2034 provides opening signals to the air inlet valve 2032 and the air outlet valve 2033. Illustratively, the air inlet valve 2032 and the air outlet valve 2033 are pneumatic valves, and each pneumatic valve is correspondingly connected with a solenoid valve for controlling the opening and closing of the pneumatic valve. When the pressure switch 2034 provides an opening signal to the solenoid valves of the intake valve 2032 and the exhaust valve 2033, respectively, the solenoid valves provide gas to the corresponding pneumatic valves, and the intake valve 2032 and the exhaust valve 2033 may be opened. In other embodiments, the solenoid valve may be provided with an on/off signal by other components within the lamp housing 10. Further, the pressure switch 2034 may be further connected to an alarm, a display, etc. to display the pressure in the lamp room 10 in real time, and send an alarm to prompt the staff when the pressure in the lamp room 10 exceeds a preset range. Optionally, the air outlet valve 2033 may also be an isolation valve.

Further, the regulating unit 203 is further provided with the check valve 2035 and the air pump 2036. The check valve 2035 and the air pump 2036 are connected to the outlet pipe 2012, respectively. Preferably, the check valve 2035 is disposed close to the lamp chamber 10, that is, the check valve 2035 is located at the air inlet end of the air outlet pipe 2012, and blocks the back flow of the air in time, so as to accurately regulate the pressure in the lamp chamber 10. The air pump 2036 is disposed at the air outlet end of the air outlet pipe 2012 to continuously pump the air in the lamp chamber 10 during the adjustment of the pressure in the lamp chamber 10. Preferably, the air pump 2036 is electrically connected to the pressure regulating valve 2031, and timely feeds back the air output of the air pump 2036, so that the pressure regulating valve 2031 can regulate the air flow in real time according to feedback information, and the accuracy of pressure regulation in the lamp chamber 10 is improved. Further, the pressure adjusting device 20 further includes a housing (not shown) for accommodating the input/output unit 201, the monitoring unit 202, and the adjusting unit 203.

Based on the same conception, the embodiment also provides a thin film growth device. Referring to fig. 1 and 7, the thin film growth apparatus includes a lamp housing 10, the pressure regulating device 20, and the reaction chamber 30. The lamp chamber 10 is disposed on the top surface of the reaction chamber 30 to supply heat required for reaction into the reaction chamber 30. The pressure regulating device 20 is connected to the lamp chamber 10to regulate the pressure in the lamp chamber 10, so as to avoid an excessive pressure difference between the lamp chamber 10 and the reaction chamber 30. Wherein a quartz plate 101 is provided at a side of the lamp chamber 10 close to the reaction chamber 30. The quartz plate 101 isolates the lamp chamber 10 from the reaction chamber 30, and the quartz plate 101 has better light transmittance, so that the light transmission in the lamp chamber 10 is not affected. It can be understood that, under the precise adjustment of the pressure control valve 3031 in the pressure adjusting device 20, the pressure environment in the lamp chamber 10 is effectively controlled, so as to avoid the rupture of the quartz plate 101 caused by the overlarge pressure difference between the lamp chamber 10 and the reaction chamber 30; meanwhile, the condition that a large amount of gas flows out of the lamp room 10 can be avoided, and further the large fluctuation of the output power of the lamp room 10 caused by excessive heat carried away by the gas is avoided, so that the lamp room 10 is facilitated to provide stable power output, the thickness of the film growth is accurately controlled, and the film quality is improved. The film growth apparatus is further provided with a gas supply device, a waste gas treatment device, and other structures, which are not described in detail herein.

In summary, the pressure adjusting device 20 and the pressure adjusting valve 2031 in the thin film growth apparatus provided in this embodiment can finely adjust the gas flow in the gas inlet pipe 2011 and the gas outlet pipe 2012 according to the real-time pressure in the lamp chamber 10, so as to avoid excessive heat loss caused by the large flow of gas flowing in the lamp chamber 10, and meanwhile, avoid a large increase in the output power of the lamp chamber 10, effectively alleviate the fluctuation of the output power of the lamp chamber 10, and facilitate the accurate control of the thickness of the thin film growth, and improve the quality of the thin film.

It should also be appreciated that while the present utility model has been disclosed in the context of a preferred embodiment, the above embodiments are not intended to limit the utility model. Many possible variations and modifications of the disclosed technology can be made by anyone skilled in the art without departing from the scope of the technology, or the technology can be modified to be equivalent. Therefore, any simple modification, equivalent variation and modification of the above embodiments according to the technical substance of the present utility model still fall within the scope of the technical solution of the present utility model.

Claims

1. A pressure regulating device for regulating pressure in a lamp chamber, the pressure regulating device comprising; the device comprises an input/output unit, a monitoring unit and an adjusting unit;

2. The pressure regulating device of claim 1, wherein the pressure regulating valve has a pressurized state and a depressurized state; and in the pressurized state, the pressure regulating valve regulates the opening degree to increase the pressure in the lamp chamber; in the depressurized state, the pressure regulating valve regulates an opening degree to reduce a pressure in the lamp chamber.

3. The pressure regulating device of claim 2, wherein the pressure regulating valve assumes the pressurized state when the pressure within the lamp chamber is below a preset range; and when the pressure in the lamp chamber is higher than the preset range, the pressure regulating valve is in the pressure reducing state.

4. The pressure regulating device of claim 1, wherein the regulating unit further comprises an inlet valve and an outlet valve; the air inlet valve is connected with the air inlet pipeline, and the air outlet valve is connected with the air outlet pipeline.

5. The pressure regulating device of claim 4, wherein the inlet valve and the outlet valve are normally closed valves, and wherein the inlet valve and the outlet valve are open when the lamp chamber is in an operational state.

6. A pressure regulating device according to claim 4 or 5, wherein the inlet valve is a pneumatic valve; the air outlet valve is a pneumatic valve or an isolation valve.

7. The pressure regulating device of claim 4 or 5, wherein the regulating unit further comprises a pressure switch; the pressure switch is arranged in the lamp chamber and is electrically connected with the air inlet valve and the air outlet valve.

8. The pressure regulating device according to any one of claims 1 to 5, wherein the regulating unit further comprises a check valve and an air pump; the check valve and the air pump are respectively connected with the air outlet pipeline, and the check valve is a normally open valve.

9. The pressure regulating device according to any one of claims 1 to 5, wherein the monitoring unit comprises a first pressure gauge and a second pressure gauge; the first pressure gauge is arranged in the lamp chamber and is used for measuring the pressure in the lamp chamber; the second pressure gauge is connected with the air outlet pipeline and is used for measuring the air pressure in the air outlet pipeline; the first pressure gauge and the second pressure gauge are respectively and electrically connected with the pressure regulating valve.

10. A thin film growth apparatus comprising a pressure regulating device according to any one of claims 1 to 9.