CN220195868U - Sapphire wafer surface cleaning device - Google Patents

Abstract

The utility model provides a sapphire wafer surface cleaning device, which comprises a soaking box, wherein four support columns are fixed on the outer surface of the soaking box, a discharge pipe is arranged on one side of the bottom of the soaking box, a storage component is arranged in the soaking box, a top plate is arranged at the top of the soaking box, a cylinder drives a center column and the storage component to move up and down, so that sapphire in the storage component is cleaned firstly and then washed, a screw rod is rotated to push a connecting plate and a squeezing plate in each storage frame to move, the sapphire in the storage component is squeezed and fixed, the stability of the sapphire in cleaning and washing is kept, and compared with the prior art, the sapphire cleaning device can simultaneously hold more sapphires for cleaning by clamping and fixing the sapphires through the squeezing plate, can maintain the fixing effect on the sapphires, is convenient to adjust, and effectively improves the sapphire cleaning efficiency.

Description

Sapphire wafer surface cleaning device

Technical Field

The utility model relates to the technical field of sapphire wafer processing, in particular to a sapphire wafer surface cleaning device.

Background

In the processing and manufacturing process of the sapphire wafer, particularly in the baking process after silk screen printing, the surface of the wafer is extremely easy to adsorb various dust, impurities and pollutants in the environment due to static electricity and better adsorptivity, the wafer is solidified on the surface of the wafer under the high-temperature baking condition, meanwhile, when the laser is used for cutting and punching, the processed parts, the alumina and the printing ink on the surface layer are instantaneously melted or gasified at high temperature, a large amount of melted impurities remain in the hole, and a large amount of dust adheres to the periphery of the hole; when cleaning the surface of sapphire, at present mainly rely on manual cleaning and the cleaning stability is poor.

Patent CN215613602U proposes a sapphire wafer cleaning machine, through setting up the washing tank at the upper surface of placing the board, the inner wall of washing tank is provided with the standing groove, has realized the effect that standing groove centre gripping sapphire wafer edge made the relative vertical placement of sapphire wafer, through being provided with the wash port in the bottom of washing tank, can effectively in time discharge the washing liquid that has the foreign matter, has effectively avoided the washing liquid that has the foreign matter to remain on the sapphire wafer to influence the cleaning performance of sapphire wafer.

According to the technical scheme disclosed in the patent document, the sapphire is inserted into the mounting groove to be vertically washed, all the sapphire is manually inserted into the mounting groove one by one, a great amount of time is required, the cleaning quantity is effective, and efficient cleaning cannot be achieved.

Disclosure of Invention

Aiming at the defects existing in the prior art, the utility model aims to provide the sapphire wafer surface cleaning device to solve the problems in the prior art, and the sapphire wafer surface cleaning device is novel in structure, can accommodate more sapphire to clean simultaneously by placing the sapphire into the first placing frame, the second placing frame and the third placing frame and clamping and fixing the sapphire through the extrusion plates, can maintain the fixing effect on the sapphire, is convenient to adjust and effectively improves the sapphire cleaning efficiency.

In order to achieve the above object, the present utility model is realized by the following technical scheme: the utility model provides a sapphire wafer surface cleaning device, includes the soaking box, soaking box surface fixation has four support columns, and has seted up the discharge pipe in soaking box bottom one side, the inside subassembly that deposits that is equipped with of soaking box, soaking box top is equipped with the roof, and the roof is fixed with the support column.

Further, the storage component comprises a center column, five groups of first placement frames are symmetrically fixed on the center of the center column, the second placement frames are fixed on the outer surfaces of the first placement frames, and the third placement frames are fixed on the outer surfaces of the second placement frames.

Further, the top of the first placing frame, the second placing frame and the third placing frame are hollowed out, and the bottoms of the first placing frame, the second placing frame and the third placing frame are fixed with filter plates.

Further, the first frame of placing, the second frame of placing and the inside all sliding connection of frame are placed to the third have the stripper plate, and the stripper plate top is fixed with even board, the center post top corresponds the position of even board and has pegged graft through the bearing frame meshing has the screw rod, screw rod one end is connected with even board rotation through the bearing.

Further, the first placement frame, the second placement frame and the third placement frame are sequentially increased in size.

Further, a cylinder is fixed at the bottom of the soaking box, and the extension end of the cylinder is fixed with the bottom of the central column.

Further, the roof top is fixed with the water tank, and the roof bottom corresponds first frame, second and places the frame and the third place the frame the position and install the shower nozzle, the shower nozzle passes through water piping connection with the water tank.

The utility model has the beneficial effects that: the utility model relates to a sapphire wafer surface cleaning device, which comprises a soaking box; a discharge pipe; a support column; a top plate; a water tank; a spray head; a storage assembly; a center column; a first placement frame; a second placement frame; a third placement frame; a filter plate; an extrusion plate; a connecting plate; a screw; a cylinder;

this sapphire wafer surface cleaning device drives center post and deposits the subassembly lift through the cylinder and removes, and then realizes wasing earlier the washing to depositing the inside sapphire of subassembly and then washing.

This sapphire wafer surface cleaning device places under frame size increase in proper order through first placing frame, second and third placing frame, deposits the position whole and becomes a circular, can hold more sapphires simultaneously and wash, improves cleaning efficiency.

This sapphire wafer surface cleaning device is through rotating the screw rod, and the screw rod promotes the link plate and places the inside stripper plate of frame respectively and remove, extrudes fixedly to inside sapphire, keeps the stability of sapphire when wasing and washing.

This sapphire wafer surface cleaning device is inside placing frame, second through placing the sapphire in first place frame, third for prior art to through stripper plate centre gripping is fixed, can hold more sapphire simultaneously and wash, and can keep the fixed effect to the sapphire, it is convenient to adjust, improves sapphire abluent efficiency effectively.

Drawings

FIG. 1 is a schematic diagram of the overall structure of a sapphire wafer surface cleaning apparatus according to the present utility model;

FIG. 2 is a schematic diagram of a storage assembly of a cleaning device for a sapphire wafer surface according to the present utility model;

FIG. 3 is a schematic diagram showing a second storage assembly of the cleaning apparatus for sapphire wafer surface according to the present utility model;

FIG. 4 is a third schematic view of a storage assembly of a cleaning apparatus for cleaning a surface of a sapphire wafer according to the present utility model;

in the figure: 1. a soaking box; 11. a discharge pipe; 2. a support column; 3. a top plate; 4. a water tank; 41. a spray head; 5. a storage assembly; 51. a center column; 52. a first placement frame; 53. a second placement frame; 54. a third placement frame; 55. a filter plate; 56. an extrusion plate; 57. a connecting plate; 58. a screw; 6. and (3) a cylinder.

Detailed Description

The utility model is further described in connection with the following detailed description, in order to make the technical means, the creation characteristics, the achievement of the purpose and the effect of the utility model easy to understand.

Referring to fig. 1 to 4, the present utility model provides a technical solution: the utility model provides a sapphire wafer surface cleaning device, includes soaking case 1, soaking case 1 surface fixation has four support columns 2, and soaking case 1 bottom one side has seted up discharge pipe 11, soaking case 1 inside is equipped with deposits subassembly 5, soaking case 1 top is equipped with roof 3, and roof 3 is fixed with support column 2, during the device, evenly stacks up sapphire and stores up inside subassembly 5, sends into soaking case 1 inside later and washs through the washing liquid, washs after the washing finishes with its release washing liquid through the clear water.

In this embodiment, deposit subassembly 5 includes center post 51, center post 51 outside surface centre of a circle symmetry is fixed with five first frames 52 of placing of group, and the first external surface that places frame 52 is fixed with the second and place the frame 53, the second is placed the external surface that places frame 53 and is fixed with the third and place the frame 54, the first frame 52 of placing, the second is placed frame 53 and the third is placed frame 54 top fretwork, and the first frame 52 of placing, the second is placed frame 53 and the third is placed frame 54 bottom and is fixed with filter plate 55, and under the effect that is fixed with filter plate 55 through first frame 52 of placing, the second is placed frame 53 and the third is placed frame 54 top fretwork bottom, can improve the effect that the washing liquid washs the sapphire to and the effect that the clear water washed, make things convenient for impurity and washing liquid sewage's outflow.

In this embodiment, the extrusion plates 56 are slidably connected inside the first placing frame 52, the second placing frame 53 and the third placing frame 54, the connection plates 57 are fixed at the top of the extrusion plates 56, the screws 58 are engaged and inserted at positions, corresponding to the connection plates 57, of the tops of the center columns 51 through bearing seats, one ends of the screws 58 are rotatably connected with the connection plates 57 through bearings, and the screws 58 push the connection plates 57 and the extrusion plates 56 inside the respective placing frames to move through rotating the screws 58, so that the sapphires inside the sapphires are extruded and fixed, and the stability of the sapphires during cleaning and flushing is maintained.

In this embodiment, the sizes of the first placing frame 52, the second placing frame 53 and the third placing frame 54 are sequentially increased, and the storage part is integrally formed into a circle under the effect that the sizes of the first placing frame 52, the second placing frame 53 and the third placing frame 54 are sequentially increased, so that more sapphires can be simultaneously contained for cleaning, and the cleaning efficiency is improved.

In this embodiment, the bottom of the soaking box 1 is fixed with the cylinder 6, and the extension end of the cylinder 6 is fixed with the bottom of the central column 51, and the central column 51 is driven by the cylinder 6 to move up and down with the storage component 5, so that the sapphire inside the storage component 5 is cleaned first and then flushed.

In this embodiment, the top of the top plate 3 is fixed with the water tank 4, and the bottom of the top plate 3 is provided with the spray head 41 corresponding to the first placement frame 52, the second placement frame 53 and the third placement frame 54, and the spray head 41 is connected with the water tank 4 through a water pipe, and washes the cleaned sapphire through the water tank 4 and the spray head 41 corresponding to the first placement frame 52, the second placement frame 53 and the third placement frame 54, so as to avoid the residue of cleaning liquid.

When the device is used, the sapphires are uniformly stacked in the storage assembly 5, the screw rods 58 are rotated, the screw rods 58 push the connecting plates 57 and the extrusion plates 56 in the respective storage frames to move, the sapphires are extruded and fixed, then the sapphires are sent into the soaking box 1 to be cleaned through cleaning liquid, and the water tank 4 and the spray heads 41 corresponding to the first storage frame 52, the second storage frame 53 and the third storage frame 54 are used for flushing the cleaned sapphires, so that residues of the cleaning liquid are avoided.

While the fundamental and principal features of the utility model and advantages of the utility model have been shown and described, it will be apparent to those skilled in the art that the utility model is not limited to the details of the foregoing exemplary embodiments, but may be embodied in other specific forms without departing from the spirit or essential characteristics thereof. The present embodiments are, therefore, to be considered in all respects as illustrative and not restrictive, the scope of the utility model being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.

Furthermore, it should be understood that although the present disclosure describes embodiments, not every embodiment is provided with a separate embodiment, and that this description is provided for clarity only, and that the disclosure is not limited to the embodiments described in detail below, and that the embodiments described in the examples may be combined as appropriate to form other embodiments that will be apparent to those skilled in the art.

Claims (7)

1. The utility model provides a sapphire wafer surface cleaning device, includes soaking box (1), its characterized in that: the utility model discloses a soaking box, including soaking case (1), roof, support column (2), discharge pipe (11) have been seted up to soaking case (1) surface fixation, soaking case (1) inside is equipped with deposits subassembly (5), soaking case (1) top is equipped with roof (3), and roof (3) are fixed with support column (2).

2. The sapphire wafer surface cleaning apparatus of claim 1, wherein: the storage assembly (5) comprises a center column (51), five groups of first placement frames (52) are symmetrically fixed on the center of the outer surface of the center column (51), a second placement frame (53) is fixed on the outer surface of the first placement frame (52), and a third placement frame (54) is fixed on the outer surface of the second placement frame (53).

3. The sapphire wafer surface cleaning apparatus of claim 2, wherein: the first placing frame (52), the second placing frame (53) and the third placing frame (54) are hollow in top, and filter plates (55) are fixed at the bottoms of the first placing frame (52), the second placing frame (53) and the third placing frame (54).

4. A sapphire wafer surface cleaning apparatus according to claim 3, wherein: the first placing frame (52), the second placing frame (53) and the third placing frame (54) are both connected with the extrusion plate (56) in a sliding mode, the top of the extrusion plate (56) is fixedly provided with the connecting plate (57), a screw (58) is inserted into the position, corresponding to the connecting plate (57), of the top of the center column (51) through bearing seat meshing, and one end of the screw (58) is connected with the connecting plate (57) in a rotating mode through a bearing.

5. The sapphire wafer surface cleaning apparatus of claim 4, wherein: the first placing frame (52), the second placing frame (53) and the third placing frame (54) are sequentially increased in size.

6. The sapphire wafer surface cleaning apparatus of claim 2, wherein: the bottom of the soaking box (1) is fixedly provided with a cylinder (6), and the extension end of the cylinder (6) is fixed with the bottom of the center column (51).

7. The sapphire wafer surface cleaning apparatus of claim 2, wherein: the top of the top plate (3) is fixedly provided with a water tank (4), and the positions of the bottom of the top plate (3) corresponding to the first placing frame (52), the second placing frame (53) and the third placing frame (54) are provided with a spray head (41), and the spray head (41) is connected with the water tank (4) through a water pipe.