CN220005173U - Device for automatically cleaning porous component in semiconductor equipment by using positive and negative pressure - Google Patents
Device for automatically cleaning porous component in semiconductor equipment by using positive and negative pressure Download PDFInfo
- Publication number
- CN220005173U CN220005173U CN202321418391.XU CN202321418391U CN220005173U CN 220005173 U CN220005173 U CN 220005173U CN 202321418391 U CN202321418391 U CN 202321418391U CN 220005173 U CN220005173 U CN 220005173U
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- Prior art keywords
- cover plate
- cleaning
- positive
- ring
- negative pressure
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- 238000004140 cleaning Methods 0.000 title claims abstract description 48
- 239000004065 semiconductor Substances 0.000 title claims abstract description 21
- 239000007788 liquid Substances 0.000 claims abstract description 32
- 239000003814 drug Substances 0.000 claims abstract description 14
- 230000006835 compression Effects 0.000 claims abstract description 5
- 238000007906 compression Methods 0.000 claims abstract description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 22
- 229920001973 fluoroelastomer Polymers 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 2
- 230000001105 regulatory effect Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000009418 renovation Methods 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The utility model discloses a device for automatically cleaning a porous part in semiconductor equipment by using positive and negative pressure, which comprises a fixed cover plate and a cleaning and fixing jig which are positioned in a liquid medicine storage tank, wherein the porous part to be cleaned is arranged between the fixed cover plate and the cleaning and fixing jig; the fixed cover plate comprises a cover plate body and a limiting ring, the limiting ring is positioned at the bottom of the cover plate body, an elbow is arranged at the upper part of the cover plate body, and the elbow is respectively connected with the vacuum pump and the air compression station; the cleaning fixing jig comprises a fixing ring and a supporting ring, wherein the fixing ring is positioned on the supporting ring, and a plurality of liquid inlet notches are formed in the bottom of the supporting ring. The porous part to be cleaned is clamped and fixed through the fixed cover plate and the cleaning and fixing jig, so that the device is convenient to use, high in positioning accuracy, capable of being repeatedly utilized, labor-saving and capable of improving working efficiency.
Description
Technical Field
The utility model relates to the technical field of cleaning of semiconductor equipment, in particular to a device for automatically cleaning porous parts in semiconductor equipment by using positive and negative pressure.
Background
The porous member is located in a chamber of the vapor deposition semiconductor apparatus, which contains a large amount of a specific gas, and the gas acts on the chip surface through the porous member. The porous component can be reused, and when the service cycle is reached, gas is deposited in the component holes, the interior of the component holes is cleaned by the renovation treatment, and the component holes are continuously used on the machine.
Currently, the component Kong Nafan is newly cleaned by soaking with a hydrofluoric acid chemical, which reacts with the deposits in the aperture. The problem is that the semiconductor equipment is mostly aluminum, titanium, quartz, ceramic and the like, and hydrofluoric acid is corrosive, so that the conventional soaking can remove sediment in holes and has larger loss on a body.
Disclosure of Invention
The utility model aims to provide a device for automatically cleaning a porous part in semiconductor equipment by using positive and negative pressure, which can automatically clean the porous part without manual operation, has good cleaning effect and improves the working efficiency.
In order to achieve the above-mentioned purpose, the present utility model proposes a device for automatically cleaning porous components in semiconductor equipment by using positive and negative pressure, comprising a fixed cover plate positioned in a liquid medicine storage tank and a cleaning and fixing jig, wherein the porous components to be cleaned are arranged between the fixed cover plate and the cleaning and fixing jig; the fixed cover plate comprises a cover plate body and a limiting ring, the limiting ring is positioned at the bottom of the cover plate body, an elbow is arranged at the upper part of the cover plate body, and the elbow is respectively connected with the vacuum pump and the air compression station; the cleaning fixing jig comprises a fixing ring and a supporting ring, wherein the fixing ring is positioned on the supporting ring, and a plurality of liquid inlet notches are formed in the bottom of the supporting ring.
Further, the elbow is connected with the vacuum pump and the air compression station through the air pressure display regulating valve respectively.
Further, the periphery of the cover plate body is connected with a plurality of clamping blocks, each clamping block is provided with a locking hole, and a locking bolt penetrates through the fixing ring and stretches into the locking hole.
Further, when the hydrofluoric acid chemical liquid is filled in the cavity formed by the fixed cover plate and the cleaning and fixing jig, the liquid level in the liquid medicine storage tank is higher than the liquid inlet notch.
Further, the upper part of the cover plate body is connected with an elbow through a flange, and a fluororubber O-shaped ring is arranged between the flange and the cover plate body.
Furthermore, lifting handles are symmetrically arranged on the cover plate body.
Furthermore, a fluororubber O-shaped ring is arranged between the limiting ring and the inner wall of the upper part of the porous part to be cleaned.
Furthermore, a fluororubber O-shaped ring is arranged between the fixing ring and the outer wall of the lower part of the porous part to be cleaned.
Further, the fixing cover plate and the cleaning fixing jig are made of PP materials.
Further, the top of the fixing ring is provided with an avoidance hole.
Compared with the prior art, the technical scheme adopted by the utility model has the advantages that: the porous part to be cleaned is clamped and fixed through the fixed cover plate and the cleaning and fixing jig, so that the device is convenient to use, high in positioning accuracy, capable of being repeatedly utilized, labor-saving and capable of improving working efficiency. The sealed cavity formed by the fixed cover plate and the cleaning and fixing jig is controlled by the air pressure display regulating valve to control the compressed air quantity and the vacuum degree of the sealed cavity, and the hydrofluoric acid chemical liquid enters the sealed cavity in the liquid medicine storage tank under the action of positive and negative pressure and flows out from the bottom of the porous part through the part holes, so that the cleaning purpose is achieved.
Drawings
FIG. 1 is a schematic diagram of an apparatus for automatically cleaning porous parts in a semiconductor device using positive and negative pressure;
FIG. 2 is an assembly view of a stationary cover plate, a cleaning fixture and a porous part to be cleaned;
FIG. 3 is a cross-sectional view of a stationary cover plate;
FIG. 4 is a schematic diagram of a cleaning fixture;
FIG. 5 is a side view of the cleaning fixture;
fig. 6 is a schematic view of the structure of a porous member to be cleaned.
Wherein: 1. the air pressure display regulating valve 2, a fixed cover plate 21, a cover plate body 22, a limiting ring 3, a cleaning and fixing jig 4 and an elbow, 5, clamping blocks, 6, lifting handles, 7, locking bolts, 8, porous parts to be cleaned, 9, a liquid medicine storage tank, 10 and a flange.
Detailed Description
The present utility model will be described in further detail with reference to the drawings and examples, in order to make the objects, technical solutions and advantages of the present utility model more apparent. It should be understood that the particular embodiments described herein are illustrative only and are not intended to limit the utility model, i.e., the embodiments described are merely some, but not all, of the embodiments of the utility model. The components of the embodiments of the present utility model generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations.
Thus, the following detailed description of the embodiments of the utility model, as presented in the figures, is not intended to limit the scope of the utility model, as claimed, but is merely representative of selected embodiments of the utility model. All other embodiments, which can be made by a person skilled in the art without making any inventive effort, are intended to be within the scope of the present utility model.
Example 1
As shown in fig. 1-5, the present embodiment provides an apparatus for automatically cleaning a porous member in a semiconductor device by using positive and negative pressure, which includes a fixed cover plate and a cleaning fixture in a liquid medicine storage tank, wherein the porous member to be cleaned is disposed between the fixed cover plate and the cleaning fixture; the fixed cover plate comprises a cover plate body and a limiting ring, the limiting ring is positioned at the bottom of the cover plate body, the upper part of the cover plate body is connected with an elbow through a flange, and the elbow is respectively connected with the vacuum pump and the air compression station through an air pressure display regulating valve; the cleaning fixing jig comprises a fixing ring and a supporting ring, wherein the fixing ring is positioned on the supporting ring, and a plurality of liquid inlet notches are formed in the bottom of the supporting ring; when the hydrofluoric acid chemical liquid is filled in the cavity formed by the fixed cover plate and the cleaning and fixing jig, the liquid level in the liquid medicine storage tank is higher than the liquid inlet notch.
Preferably, the periphery of the cover plate body is connected with a plurality of clamping blocks, each clamping block is provided with a locking hole, and a locking bolt penetrates through the fixing ring and stretches into the locking hole.
Preferably, in order to form a closed cavity, a fluororubber O-shaped ring is arranged between the flange and the cover plate body; a fluororubber O-shaped ring is arranged between the limiting ring and the inner wall of the upper part of the porous part to be cleaned; and a fluororubber O-shaped ring is arranged between the fixing ring and the outer wall of the lower part of the porous part to be cleaned.
The device is used in the following manner: pouring hydrofluoric acid chemical liquid into a liquid medicine storage tank, opening a switch of a vacuum pump and a pneumatic station, controlling the compressed air quantity and the vacuum degree of a closed cavity through an air pressure display regulating valve, reciprocating flowing the hydrofluoric acid chemical liquid in the liquid medicine storage tank and the closed cavity under the action of positive and negative pressure, pressing the hydrofluoric acid in the storage tank to the bottom of a porous part due to the fact that the external atmospheric pressure is unchanged in the cavity under the negative pressure, and flowing out of the porous part through a part hole, namely, vacuumizing the closed cavity through a vacuum pump, so that the hydrofluoric acid chemical liquid medicine enters the closed cavity to react with the porous part; then compressed air is introduced to break the vacuum, the liquid level is lowered, and the process is repeated for a plurality of times to achieve the aim of cleaning. In the hydrofluoric acid flow process, as the liquid medicine is used repeatedly, and the connecting position is possibly damaged due to overlarge pressure and the liquid medicine column passing through the aperture position is too high to achieve the aim of cleaning, the height of the liquid medicine column is controlled by adjusting the compressed air quantity and the vacuum degree through the air pressure display adjusting valve according to the actual use condition, and the aim of cleaning is achieved accurately.
The foregoing descriptions of specific exemplary embodiments of the present utility model are presented for purposes of illustration and description. It is not intended to limit the utility model to the precise form disclosed, and obviously many modifications and variations are possible in light of the above teaching. The exemplary embodiments were chosen and described in order to explain the specific principles of the utility model and its practical application to thereby enable one skilled in the art to make and utilize the utility model in various exemplary embodiments and with various modifications as are suited to the particular use contemplated. It is intended that the scope of the utility model be defined by the claims and their equivalents.
Claims (10)
1. The device for automatically cleaning the porous component in the semiconductor equipment by using positive and negative pressure is characterized by comprising a fixed cover plate and a cleaning and fixing jig which are positioned in a liquid medicine storage tank, wherein the porous component to be cleaned is arranged between the fixed cover plate and the cleaning and fixing jig; the fixed cover plate comprises a cover plate body and a limiting ring, the limiting ring is positioned at the bottom of the cover plate body, an elbow is arranged at the upper part of the cover plate body, and the elbow is respectively connected with the vacuum pump and the air compression station; the cleaning fixing jig comprises a fixing ring and a supporting ring, wherein the fixing ring is positioned on the supporting ring, and a plurality of liquid inlet notches are formed in the bottom of the supporting ring.
2. The apparatus for automatically cleaning porous members in a semiconductor device using positive and negative pressures according to claim 1, wherein said elbow is connected to a vacuum pump and a pneumatic station, respectively, through a pneumatic display control valve.
3. The apparatus for automatically cleaning porous members in a semiconductor device using positive and negative pressure according to claim 1, wherein a plurality of clamping blocks are connected to the outer periphery of the cover plate body, each clamping block is provided with a locking hole, and locking bolts extend into the locking holes through the fixing rings.
4. The apparatus for automatically cleaning porous members in a semiconductor device using positive and negative pressure according to claim 1, wherein when the hydrofluoric acid chemical liquid is filled in the cavity formed by the fixed cover plate and the cleaning fixture, the liquid level in the liquid storage tank is higher than the liquid inlet notch.
5. The apparatus for automatically cleaning porous members in a semiconductor device using positive and negative pressure according to claim 1, wherein the upper portion of the cover plate body is connected to an elbow via a flange, and a fluororubber O-ring is provided between the flange and the cover plate body.
6. The apparatus for automatically cleaning porous members in a semiconductor device using positive and negative pressure according to claim 1, wherein the cover plate body is symmetrically provided with lifting handles.
7. The apparatus for automatically cleaning a porous member in a semiconductor device using positive and negative pressure according to claim 1, wherein a fluororubber O-ring is provided between the stopper and an inner wall of an upper portion of the porous member to be cleaned.
8. The apparatus for automatically cleaning a porous member in a semiconductor device using positive and negative pressure according to claim 1, wherein a fluororubber O-ring is provided between the fixing ring and the outer wall of the lower portion of the porous member to be cleaned.
9. The apparatus for automatically cleaning porous members in a semiconductor device using positive and negative pressure according to claim 1, wherein said fixed cover plate and said cleaning fixture are PP materials.
10. The apparatus for automatically cleaning a porous member in a semiconductor device using positive and negative pressure according to claim 1, wherein the top of the fixing ring is provided with a relief hole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321418391.XU CN220005173U (en) | 2023-06-06 | 2023-06-06 | Device for automatically cleaning porous component in semiconductor equipment by using positive and negative pressure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321418391.XU CN220005173U (en) | 2023-06-06 | 2023-06-06 | Device for automatically cleaning porous component in semiconductor equipment by using positive and negative pressure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN220005173U true CN220005173U (en) | 2023-11-14 |
Family
ID=88694230
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202321418391.XU Active CN220005173U (en) | 2023-06-06 | 2023-06-06 | Device for automatically cleaning porous component in semiconductor equipment by using positive and negative pressure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN220005173U (en) |
-
2023
- 2023-06-06 CN CN202321418391.XU patent/CN220005173U/en active Active
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