CN219981116U - Coaxial type capacitive coupling plasma device for powder spheroidization - Google Patents
Coaxial type capacitive coupling plasma device for powder spheroidization Download PDFInfo
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- CN219981116U CN219981116U CN202321663955.6U CN202321663955U CN219981116U CN 219981116 U CN219981116 U CN 219981116U CN 202321663955 U CN202321663955 U CN 202321663955U CN 219981116 U CN219981116 U CN 219981116U
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- 230000008878 coupling Effects 0.000 title claims abstract description 22
- 238000010168 coupling process Methods 0.000 title claims abstract description 22
- 238000005859 coupling reaction Methods 0.000 title claims abstract description 22
- 229910052751 metal Inorganic materials 0.000 claims abstract description 108
- 239000002184 metal Substances 0.000 claims abstract description 108
- 238000001816 cooling Methods 0.000 claims abstract description 34
- 239000000919 ceramic Substances 0.000 claims abstract description 18
- 239000000463 material Substances 0.000 claims description 17
- 229910052771 Terbium Inorganic materials 0.000 claims description 9
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 claims description 9
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 claims description 9
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 claims description 8
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- 210000002381 plasma Anatomy 0.000 abstract description 77
- 238000009826 distribution Methods 0.000 abstract description 7
- 238000009616 inductively coupled plasma Methods 0.000 abstract description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 12
- 230000001788 irregular Effects 0.000 description 8
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- 229910052692 Dysprosium Inorganic materials 0.000 description 6
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- 229910052790 beryllium Inorganic materials 0.000 description 5
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Abstract
The utility model discloses a coaxial type capacitive coupling plasma device for powder spheroidization, which belongs to the technical field of plasma application and comprises a radio frequency power supply system, a coaxial type capacitive coupling plasma chamber and a cooling chamber which are connected in sequence, wherein the coaxial type capacitive coupling plasma chamber consists of a metal electrode rod and a metal electrode cavity which are coaxial and insulated from each other; the upper end of the metal electrode rod is connected with the positive electrode of the radio frequency power supply system through a ceramic cable, and the negative electrode of the radio frequency power supply system is connected with the metal electrode cavity and grounded; the top of the metal electrode cavity is provided with powder feeding ports which are distributed at one third of the radius of the top of the metal electrode cavity, which is close to the center, in a circular array mode. The utility model improves the distribution of the plasmas, eliminates the condition of electron density concentration on the wall of the plasmas, solves the problem of powder wall sticking possibly generated by an inductively coupled plasma spheroidizing device, and greatly prolongs the service life of the plasmas.
Description
Technical Field
The utility model relates to the technical field of plasma application, in particular to a coaxial capacitive coupling plasma device for powder spheroidization.
Background
With the development of industry, powder technology, particularly particle spheroidization technology and equipment are increasingly paid attention to by industry, spherical powder is widely applied to industries such as lithium ion batteries, foods, medicines, chemical industry, building materials, mining industry, microelectronics and 3D printing due to the advantages of high specific surface area, high tap density, good fluidity and the like which are not possessed by general powder, and the preparation of high-quality spherical particles is always an important point and difficulty of the industry.
In order to obtain the metal spherical powder with uniform components, few defects, good fluidity and good sphericity, a radio frequency plasma method is often adopted for manufacturing. The radio frequency plasma method is to screen to obtain raw material powder with narrow particle size distribution, and to introduce argon with certain pressure into the plasma reactor to produce plasma. And then sending the powder into a plasma torch through gas, forming spherical metal liquid drops by the powder at high temperature, and solidifying to obtain the superfine spherical powder.
In the practice and production process, the inductively coupled plasma generating device mainly adopted at present causes magnetic field confusion due to the spiral structure of the coil and the mode of the inlet and outlet wires, and the powder forms turbulence in the device due to the introduction of gas, so that the powder is adhered to the wall, and meanwhile, the container wall can form annular fracture under the radial striking of particles, so that the service life of the device is low.
Disclosure of Invention
The utility model aims to solve the problems of the existing inductively coupled plasma generating device and provides a coaxial capacitively coupled plasma device for powder spheroidization.
The aim of the utility model is realized by the following technical scheme:
the coaxial capacitive coupling plasma device for powder spheroidization mainly comprises a radio frequency power supply system, a coaxial capacitive coupling plasma chamber and a cooling chamber which are connected in sequence, wherein the coaxial capacitive coupling plasma chamber consists of a coaxial metal electrode rod and a metal electrode cavity which are insulated from each other; the upper end of the metal electrode rod is connected with the positive electrode of the radio frequency power supply system through a ceramic cable, and the negative electrode of the radio frequency power supply system is connected with the metal electrode cavity and grounded;
the top of the metal electrode cavity is provided with powder feeding ports which are distributed at one third of the radius of the top of the metal electrode cavity, which is close to the center, in a circular array mode.
As a preferred option, the coaxial capacitive coupling plasma device for powder spheroidization is characterized in that the cooling chamber is arranged below the metal electrode cavity, the top of the cooling chamber is provided with a gas suction hole, and the side surface of the cooling chamber is provided with a gas inlet hole; the bottom of the cooling chamber is provided with a spheroidized powder collecting valve.
As a preferred option, a coaxial capacitively coupled plasma device for powder spheroidization, the metal electrode rod being a rod of the same material as the metal powder to be spheroidized.
As a preferred option, the metal electrode rod is a beryllium metal rod, a coaxial capacitively coupled plasma device for powder spheroidization.
As a preferred option, the metal electrode rod is a terbium or dysprosium metal rod, a coaxial capacitively coupled plasma device for powder spheroidization.
As a preferred option, a coaxial capacitively coupled plasma device for powder spheroidization, the surface of the metal electrode rod is provided with a coating of the same material as the metal powder to be spheroidized.
As a preferred option, a coaxial capacitively coupled plasma device for powder spheroidization, the inside of the metal electrode cavity is provided with a coating of the same material as the metal powder to be spheroidized.
As a preferred option, the coaxial capacitively coupled plasma device for powder spheroidization, the metal electrode cavity has a cylindrical structure, the cooling chamber has a metal shell structure with a truncated cone shape, and the size of the cooling chamber is larger than that of the metal electrode cavity.
As a preferred option, a coaxial capacitively coupled plasma device for powder spheroidization has 12 circular powder feed ports.
As a preferred option, the ceramic cable is composed of an electric conductor, a ceramic layer and a metal layer from inside to outside in order.
It should be further noted that the technical features corresponding to the above options may be combined with each other or replaced to form a new technical scheme without collision.
Compared with the prior art, the utility model has the beneficial effects that:
(1) According to the utility model, the powder feeding ports are distributed at one third of the radius of the top of the metal electrode cavity close to the center in a circular array manner, so that generated plasmas are annularly distributed close to the metal electrode rod, the distribution of plasmas is improved, the condition that the electron density possibly appearing on the wall of the plasmas is concentrated during the reaction of the inductively coupled plasma device is eliminated, the problem that powder possibly generated by the inductively coupled plasma spheroidizing device is stuck to the wall is solved, and the service life of the plasmas container is greatly prolonged.
(2) In one example, the coaxial capacitively coupled plasma technology can achieve all-metal of the chamber, ensure the air tightness and high vacuum of the chamber, and provide possibility for spheroidizing easily oxidized metal materials such as terbium, dysprosium and the like and chemically toxic beryllium and the like.
(3) In one example, the coaxial capacitive coupling plasma magnetic field and the gas path model are used simply and stably, internal vortex is not generated, and the service life of the plasma generating device and the sphericizing efficiency of the powder plasma are greatly improved.
(4) In one example, the coaxial capacitively coupled plasma chamber has a shielding effect on the internal ac high frequency radiation due to the metallic material of the chamber and the ground.
(5) In one example, the surface of the metal electrode rod is provided with a coating layer which is made of the same material as the metal powder to be spheroidized, and the inner side of the metal electrode cavity is provided with the coating layer which is made of the same material as the metal powder to be spheroidized, so that the purity of the metal after spheroidization can be ensured.
(6) In one example, the cooling chamber is a metal shell structure having a frustoconical shape, the dimensions of which should be much larger relative to the reaction vessel to provide sufficient space for adequate cooling of the powder.
Drawings
Fig. 1 is a schematic structural view of a coaxial capacitively coupled plasma device for powder spheroidization according to an embodiment of the present utility model;
fig. 2 is a three view of a coaxial plasma device according to an embodiment of the present utility model;
FIG. 3 is a schematic view of a ceramic cable of a coaxial plasma device according to an embodiment of the present utility model;
FIG. 4 is a graph showing simulation results of steady-state operation electron distribution of a coaxial plasma device according to an embodiment of the present utility model;
fig. 5 is a graph showing electron density distribution along a radial direction of the device for a coaxial plasma device according to an embodiment of the present utility model.
Reference numerals in the drawings: 1. a radio frequency power supply system; 2. a ceramic cable; 3. a powder feeding port; 4. a metal electrode rod; 5. a metal electrode cavity; 6. a cooling chamber; 7. and a spheroidized powder collecting valve.
Detailed Description
The following description of the embodiments of the present utility model will be made apparent and fully understood from the accompanying drawings, in which some, but not all embodiments of the utility model are shown. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
In the description of the present utility model, it should be noted that directions or positional relationships indicated as being "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. are directions or positional relationships described based on the drawings are merely for convenience of describing the present utility model and simplifying the description, and do not indicate or imply that the apparatus or elements to be referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as limiting the present utility model.
In the description of the present utility model, it should be noted that, unless explicitly specified and limited otherwise, terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements. The specific meaning of the above terms in the present utility model will be understood in specific cases by those of ordinary skill in the art.
In addition, the technical features of the different embodiments of the present utility model described below may be combined with each other as long as they do not collide with each other.
Referring to fig. 1, in an exemplary embodiment, there is provided a coaxial type capacitively coupled plasma apparatus for powder spheroidization, comprising a radio frequency power supply system 1, a coaxial type capacitively coupled plasma chamber, and a cooling chamber 6, which are sequentially connected, the coaxial type capacitively coupled plasma chamber being composed of a metal electrode rod 4 and a metal electrode cavity 5 which are coaxial and insulated from each other; the upper end of the metal electrode rod 4 is connected with the positive electrode of the radio frequency power supply system 1 through a ceramic cable 2, and the negative electrode of the radio frequency power supply system 1 is connected with the metal electrode cavity 5 and grounded;
the top of the metal electrode cavity 5 is provided with powder feeding ports 3, and the powder feeding ports 3 are distributed at one third of the radius of the top of the metal electrode cavity 5, which is close to the center, in a circular array mode.
Specifically, the radio frequency power supply system 1 provides alternating voltage with certain frequency and certain voltage between the coaxial metal electrode rod 4 and the metal electrode cavity 5 to generate plasma, and in practice, the alternating voltage with the frequency of 50Hz to 100MHz can be provided, and the output power is between 10W and 200 kW. Argon gas in the vicinity of the metal electrode rod 4 will be ionized to generate plasma. The powder is connected with an external powder feeder through a powder feeding port 3 at the top of the plasma chamber 5 to feed the irregular powder into the plasma chamber 5, and the high-temperature plasma can melt the surface of the powder to realize the surface sphericization of the irregular powder under the action of surface tension. After gradually falling through the plasma region, the powder is cooled in the cooling chamber 6 and the spheroidized powder is collected in the cooling chamber.
The powder feeding ports 3 are distributed at one third of the radius of the top of the metal electrode cavity 5, which is close to the center, in a circular array manner, so that generated plasmas are annularly distributed close to the metal electrode rod 4, the distribution of the plasmas is improved, the condition that the electron density possibly appearing on the wall of the plasmas is concentrated during the reaction of the inductively coupled plasma device is eliminated, the problem that the inductively coupled plasma spheroidizing device possibly generates powder to adhere to the wall is solved, and the service life of the plasmas container is greatly prolonged.
Furthermore, the generation of plasma of the induction type plasma torch depends on the change rate of current along with time, radio frequency is needed, the higher the frequency is, the better the frequency is, but the technical difficulty of a high-power radio frequency power supply is high, the cost is high, the coaxial capacitive coupling of the device has low requirement on alternating frequency, and the system cost of the spheroidizing device can be reduced. Meanwhile, the induction type radio frequency plasma torch has strong electromagnetic radiation, and the coaxial type capacitive coupling plasma chamber has a shielding effect on internal alternating current high-frequency radiation because the chamber is made of metal and is grounded.
In one example, referring to fig. 1-2, the cooling chamber 6 is disposed below the metal electrode cavity 5, two air extraction holes are formed at the top of the cooling chamber 6, and two air inlet holes are formed at the side surface of the cooling chamber 6; the bottom of the cooling chamber 6 is provided with a spheroidized powder collecting valve 7 which can be opened and closed. Specifically, when the plasma is activated and powder spheroidization is performed, the spheroidized powder collecting valve 7 is in a closed state, and when all powder spheroidization is completed and the radio frequency power supply system 1 is closed, the spheroidized powder collecting valve 7 is opened to perform powder collecting operation.
Further, the device, when in use, is carried out according to the following steps:
step 1: closing a spheroidized powder collecting valve 7 at the bottom of the cooling chamber 6, and checking the air tightness of the device;
step 2: vacuumizing the device through the air suction hole and introducing argon, so that the interior of the device is in an inert gas protection state, then simultaneously starting the circulating air pump, extracting the argon from the air suction hole, and then returning the extracted argon into the device through the air suction hole, so that the inert gas protection environment is maintained in the device, and meanwhile, the powder is fully cooled under the blowing of air flow;
step 3: starting a radio frequency power supply system 1 to apply a high-frequency or radio frequency alternating current signal on a metal electrode rod 4 so as to excite argon in the device to form plasma;
step 4: powder to be spheroidized is sent into the device through a powder feeding port 3 at the top of the metal electrode cavity 5 by using a powder feeder, and the powder is spheroidized by using plasma;
step 5: after the powder is spheroidized, the radio frequency power supply system 1 is turned off, the circulating air pump is turned off, and finally, the spheroidized powder collection valve 7 at the bottom of the cooling chamber 6 is turned on to collect the spheroidized powder.
In one example, the irregular spherical powders for which the present device is suitable include various metal powders and ceramic powders, with particle sizes between 1 micron and 2 millimeters. In order to ensure the purity of the metal after spheroidization, the metal electrode rod 4 of the coaxial type capacitive coupling plasma chamber can be replaced by a material which is the same as the irregular metal powder to be spheroidized, or a coating which is the same as the irregular metal powder to be spheroidized is formed on the surface of the metal electrode rod 4, and a metal foil or a metal coating which is the same as the irregular metal powder to be spheroidized can be attached to the inner side of the metal electrode cavity 5 of the coaxial type capacitive coupling plasma chamber.
In one example, referring to fig. 3, the ceramic cable 2 is configured from inside to outside as a conductor-ceramic layer-metal layer, the conductor is used to supply power, the ceramic layer provides insulation, and the metal layer may function as electromagnetic shielding; the ceramic cable 2 and the metal electrode rod 4 are connected in a threaded connection mode, the ceramic cable 2 is connected with the powder feeder in a threaded flange mode, and the ceramic cable 2 is also connected with the metal shell of the metal electrode cavity 5 in a threaded mode.
In one example, the chamber of the induction type plasma torch can only use nonmetallic materials to avoid induced current on the chamber wall, the air tightness of the nonmetallic materials cannot be guaranteed, and the induction type plasma torch is not applicable to easily oxidized materials, materials with special toxicity such as beryllium, heavy rare earth terbium, dysprosium and the like, while coaxial type capacitive coupling plasma technology can realize all metals of the chamber, ensure the air tightness and high vacuum degree of the chamber, and provides possibility for spheroidizing easily oxidized metallic materials such as terbium, dysprosium and the like and materials with chemical toxicity such as beryllium and the like. Specifically, a coaxial capacitively coupled plasma device for powder spheroidization is provided, wherein a terbium or dysprosium metal rod or a surface terbium and dysprosium treated metal rod can be adopted as the metal electrode rod 4 in the device; in other examples, the metal electrode rod 4 is a beryllium metal rod.
Further, the maximum power point of the plasma generated by the induction type plasma torch is close to the wall of the cavity, the magnetic field and the airflow field near the wall are very chaotic, the problems of wall breakage and powder sticking easily occur, and although the ceramic cylinder protection measure is adopted, the service life is limited, frequent replacement is needed, the spheroidizing powder forming efficiency is reduced, and the spheroidizing cost is improved. The coaxial capacitive coupling plasma chamber of the device uses all metal, the plasma magnetic field and the gas path model are simple and stable, internal vortex cannot be generated, and the service life of the plasma generating device and the powder plasma sphericizing efficiency are greatly improved.
Further, the surface of the metal electrode rod 4 is provided with a coating layer made of the same material as the metal powder to be spheroidized, and the inner side of the metal electrode cavity 5 is provided with a coating layer made of the same material as the metal powder to be spheroidized, so that the purity of the metal after spheroidization can be ensured.
In one example, the metal electrode cavity 5 has a cylindrical structure, the cooling chamber 6 has a metal shell structure with a truncated cone shape, and the size of the cooling chamber 6 is larger than that of the metal electrode cavity. In particular, the cooling chamber 6 is much larger in size than the metal electrode cavity 5 to provide sufficient space for the powder to cool sufficiently.
In one example, an in-line capacitively coupled plasma spheroidizing apparatus is provided for irregular micro-powder of heavy rare earth elements such as terbium, dysprosium, and the like. The powder feeding port 3 at the top of the metal shell of the metal electrode cavity 5 is circular, has a radius of 5mm, and is distributed at one third of the radius of the top of the metal shell, which is close to the center, in a circular array manner, and is provided with 12 openings in total. The thickness of the metal shell is ensured to be not damaged when the pressure difference between the inside and the outside is high, and the radius of the shell is 100mm. The radius of the metal electrode cavity 5 is 30mm, the radius of the top of the cooling chamber 6 is 350mm, the height of the metal electrode cavity 5 is only 100mm, and the total height of the cooling chamber 6 exceeds 500mm.
Referring to fig. 4 and 5, simulations were performed using a scheme with a housing radius of 100mm, the air pressure in the device was set to 20mtorr, the power supply power was 1kW, and the frequency was 13.56MHz. The simulation result shows that the electron density is annularly distributed and is close to the metal electrode, and the graph of the electron density distribution shows that the electron density is higher at the position 20mm to 40mm away from the electrode and is basically positioned at the position one third of the radius away from the center under the condition that the radius of the shell is 100mm, and the electron density reaches 1.7x10 15 Individual/m 3 When powder is fed into the device in this region, the powder can be melted by high-density electrons, and the melted powder forms liquid drops under the action of gravity.
In one example, a coaxial capacitively coupled plasma spheroidizing apparatus for fusion neutron multiplication material beryllium pellets is provided. The device structure is basically the same as that of the coaxial type capacitive coupling plasma spheroidizing device aiming at the irregular micro powder of heavy rare earth elements such as terbium, dysprosium and the like, and the difference is that the radius of the top of the cooling chamber 6 is 1000mm, and the diameter of the beryllium pellets is close to the millimeter level, so that the height of the coaxial type capacitive coupling plasma chamber is 500-1000mm, and the total height of the cooling chamber 6 exceeds 2000mm.
The foregoing detailed description of the utility model is provided for illustration, and it is not to be construed that the detailed description of the utility model is limited to only those illustration, but that several simple deductions and substitutions can be made by those skilled in the art without departing from the spirit of the utility model, and are to be considered as falling within the scope of the utility model.
Claims (10)
1. The coaxial type capacitive coupling plasma device for powder spheroidization is characterized by comprising a radio frequency power supply system, a coaxial type capacitive coupling plasma chamber and a cooling chamber which are connected in sequence, wherein the coaxial type capacitive coupling plasma chamber consists of a coaxial metal electrode rod and a metal electrode cavity which are insulated from each other; the upper end of the metal electrode rod is connected with the positive electrode of the radio frequency power supply system through a ceramic cable, and the negative electrode of the radio frequency power supply system is connected with the metal electrode cavity and grounded;
the top of the metal electrode cavity is provided with powder feeding ports which are distributed at one third of the radius of the top of the metal electrode cavity, which is close to the center, in a circular array mode.
2. The coaxial capacitively coupled plasma device for powder spheroidization of claim 1, wherein said cooling chamber is disposed below said metal electrode cavity, an air extraction hole is formed at the top of said cooling chamber, and an air intake hole is formed at the side of said cooling chamber; the bottom of the cooling chamber is provided with a spheroidized powder collecting valve.
3. A coaxial capacitively coupled plasma device for powder spheroidization of claim 1, wherein said metal electrode rod is a rod of the same material as the metal powder to be spheroidized.
4. A coaxial capacitively coupled plasma device for powder spheroidization of claim 3, wherein said metal electrode rod is a beryllium metal rod.
5. A coaxial capacitively coupled plasma device for powder spheroidization of claim 3, wherein said metal electrode rod is a terbium or dysprosium metal rod.
6. A coaxial capacitively coupled plasma device for powder spheroidization as claimed in claim 1, wherein a surface of said metal electrode rod is provided with a coating of the same material as the metal powder to be spheroidized.
7. A coaxial capacitively coupled plasma device for powder spheroidization as claimed in claim 1, wherein the inner side of said metal electrode cavity is provided with a coating of the same material as the metal powder to be spheroidized.
8. The coaxial capacitively coupled plasma device of claim 1, wherein said metal electrode cavity has a cylindrical configuration and said cooling chamber has a metal shell configuration with a circular truncated cone shape, said cooling chamber being larger in size than said metal electrode cavity.
9. A coaxial capacitively coupled plasma device for powder spheroidization of claim 1, wherein there are 12 circular powder feed ports.
10. The coaxial capacitively coupled plasma device for powder spheroidization of claim 1, wherein said ceramic cable is composed of an electrical conductor, a ceramic layer, and a metal layer in this order from the inside to the outside.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202321663955.6U CN219981116U (en) | 2023-06-28 | 2023-06-28 | Coaxial type capacitive coupling plasma device for powder spheroidization |
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| CN202321663955.6U CN219981116U (en) | 2023-06-28 | 2023-06-28 | Coaxial type capacitive coupling plasma device for powder spheroidization |
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