CN219979495U - Split-type formed plasma source cavity structure - Google Patents
Split-type formed plasma source cavity structure Download PDFInfo
- Publication number
- CN219979495U CN219979495U CN202223581909.XU CN202223581909U CN219979495U CN 219979495 U CN219979495 U CN 219979495U CN 202223581909 U CN202223581909 U CN 202223581909U CN 219979495 U CN219979495 U CN 219979495U
- Authority
- CN
- China
- Prior art keywords
- molecular pump
- split
- cavity
- chamber
- ion source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000001788 irregular Effects 0.000 claims abstract description 4
- 230000000694 effects Effects 0.000 claims description 4
- 238000000605 extraction Methods 0.000 claims description 4
- 238000010884 ion-beam technique Methods 0.000 claims description 4
- 238000005728 strengthening Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 230000003014 reinforcing effect Effects 0.000 abstract 1
- 239000003344 environmental pollutant Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 231100000719 pollutant Toxicity 0.000 description 4
- 238000003466 welding Methods 0.000 description 4
- 238000007789 sealing Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 2
- 102000004310 Ion Channels Human genes 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Abstract
The utility model provides a split-formed plasma source cavity structure, which comprises four split structures, wherein the four split structures are a molecular pump vacuum cavity, an ion source main cavity, a molecular pump flange and an inner baffle plate, and the four split structures are mutually matched and combined into an integrated plasma source cavity structure; the main body inner surface of the vacuum cavity of the molecular pump is of a right cylinder structure, the outer surface of the main body is of a polyhedron structure, the side lengths of all the faces of the main body are equal, the outer surface of the polyhedron structure plays a role in reinforcing and fixing, a conical boss is arranged on the plane of the upper end of a cylindrical body of the outer surface of the main body, a cuboid hollow groove is formed in one side of the cylindrical body, the inner surface of the cuboid hollow groove is a cuboid, two grooves are formed in the plane of the lower end of the cylindrical body, the grooves are of irregular shapes, and the outline of the grooves coincides with the outline of the lower surfaces of the cylindrical body and the cuboid hollow groove. According to the utility model, the ion source cavity with a complex structure is divided into four split bodies with simple structures, so that the difficulty of the manufacturing process is greatly reduced.
Description
Technical Field
The utility model belongs to the technical field of semiconductor equipment, and particularly relates to a plasma source cavity structure formed in a split mode.
Background
The ion source cavity is an important component of the ion implanter, and the ion source, the extraction electrode, the magnetic field coil, the molecular pump and other components are required to be arranged on the ion source cavity, so that the ion source cavity has a complex structure.
Chinese patent application No. CN202221024061.8 discloses an ion source cavity, which comprises a cavity body, the bottom of cavity body is equipped with the bottom hole, the top is equipped with the top hole, the overflow area of bottom hole is greater than or equal to the overflow area of top hole. An ion source upper cavity is arranged above an ion source lower cavity, and meanwhile, the ion source lower cavity is arranged on a top cover of a vacuum chamber, and leakage risks are still existing although sealing structures are arranged between the ion source lower cavity and the ion source upper cavity and between the ion source lower cavity and the top cover; meanwhile, an assembly error exists between the lower cavity of the ion source and the upper cavity of the ion source, so that the assembly error exists in the ion channel.
In order to overcome the defects in the prior art, the inventor provides an integrated casting ion source cavity, which can effectively solve the problem of assembly errors in the prior art. However, after the ion source cavity is cast and molded, the inner surface and the outer surface are required to be machined, but the machining process is difficult and complicated due to the complex structure.
The process of manufacturing the ion source chamber needs to be improved.
Disclosure of Invention
Based on the problems existing in the prior art, the utility model provides a split-type formed plasma source cavity structure, wherein the ion source cavity is a split-type formed ion source cavity, an original cavity is divided into four split bodies to be manufactured and processed respectively, and then the four split bodies are connected through a welding process mode.
According to the technical scheme, the utility model provides a split-formed plasma source cavity structure, which comprises four split structures, wherein the four split structures are a molecular pump vacuum cavity, an ion source main cavity, a molecular pump flange and an inner baffle plate, and the four split structures are mutually matched and combined into an integrated plasma source cavity structure; the utility model provides a molecular pump vacuum chamber body internal surface is right cylinder structure, and the main part surface is the polyhedral structure, and the side length of each face body of main part surface is equal, and polyhedral structure's surface plays the fixed effect of strengthening, is provided with conical boss on the cylindricality upper end plane of main part surface, and cylinder one side is equipped with the cuboid hollow tank, and cuboid hollow tank internal surface is the cuboid with, is provided with two recesses on the cylinder lower extreme plane, and the recess is irregular shape, and the contour of recess coincides with the contour of cylinder, cuboid hollow tank lower surface, sets up a screw hole on every recess respectively.
The molecular pump vacuum cavity is used for connecting the ion source main cavity and the molecular pump flange, and is used for installing a molecular pump to provide a vacuum environment for the ion source main cavity. Further, the inner surface of the molecular pump vacuum cavity is of a cavity structure with a cylindrical design.
Additionally, the ion source main cavity is a generation cavity of the ion beam, and the ion source, the extraction electrode and the magnetic field coil are all arranged on the ion source main cavity. Further, the charging valve and the pressure release valve are arranged on the main cavity of the ion source.
Preferably, the molecular pump flange is used for connecting the molecular pump, and the molecular pump flange structure is designed for adapting the interface form of the molecular pump. More preferably, the surface of the molecular pump flange to which the molecular pump is attached is used to mount a seal ring.
Preferably, the inner baffle is arranged at the joint of the vacuum cavity of the molecular pump and the main cavity of the ion source and is close to one side of the circular opening of the vacuum cavity of the molecular pump. The rectangular opening surface of the molecular pump vacuum cavity is connected with the rectangular opening surface at one side of the ion source main cavity, and the inner edge and the outer edge are overlapped.
In addition, the molecular pump flange is connected with the circular opening surface of the molecular pump vacuum cavity, and the molecular pump flange is coaxial with the circle center of the circular opening surface of the molecular pump vacuum cavity.
Compared with the prior art, the split-type plasma source cavity structure has the following beneficial technical effects: according to the utility model, the ion source cavity with a complex structure is divided into four split bodies with simple structures, so that the difficulty of the manufacturing process is greatly reduced.
Drawings
FIG. 1 is a schematic structural view of a plasma source chamber structure of the present utility model formed in a split manner.
Fig. 2 is a schematic structural view of a main chamber of an ion source of the present utility model formed separately.
Reference numerals in the drawings illustrate: a molecular pump vacuum chamber 1; an ion source main chamber 2; a molecular pump flange 3; an inner baffle 4.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the present utility model more apparent, the technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings, and it is apparent that the described embodiments are some embodiments of the present utility model, not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
It should be noted that, for convenience of description, only the portions related to the present utility model are shown in the drawings. Embodiments of the utility model and features of the embodiments may be combined with each other without conflict.
It should be noted that the terms "first," "second," and the like herein are merely used for distinguishing between different devices, modules, or units and not for limiting the order or interdependence of the functions performed by such devices, modules, or units.
It should be noted that references to "one", "a plurality" and "a plurality" in this disclosure are intended to be illustrative rather than limiting, and those skilled in the art will appreciate that "one or more" is intended to be construed as "one or more" unless the context clearly indicates otherwise.
The utility model provides a split-type formed plasma source cavity structure, which comprises four split structures, in particular a molecular pump vacuum cavity 1, an ion source main cavity 2, a molecular pump flange 3 and an inner baffle 4, wherein the four split structures are mutually matched and combined to form an integrated plasma source cavity structure shown in figure 1.
Further, as shown in fig. 2, the molecular pump vacuum chamber 1 is used for connecting the main chamber 2 of the ion source and the molecular pump flange 3, and is mainly used for installing the molecular pump, providing a vacuum environment for the main chamber of the ion source, and the cylindrical design of the inner surface of the chamber structure ensures that the air flow is stable, and the pollutant particles generated in the main chamber 2 of the ion source are deposited at the position, so that the pollutant particles are prevented from entering the molecular pump, the damage of the molecular pump is caused, and the service life of the molecular pump is influenced;
the ion source main cavity 2 is a generation cavity of the ion beam, the ion source, the extraction electrode and the magnetic field coil are all arranged on the ion source main cavity 2, and in addition, auxiliary components such as an inflation valve, a pressure release valve and the like are also arranged on the cavity, so that necessary space structure and stable conditions are provided for the generation and the emission of the ion beam;
the molecular pump flange 3 is used for connecting a molecular pump, the structural design of the molecular pump flange is used for adapting to the interface form of the molecular pump, and the surface connected with the molecular pump is used for installing a sealing ring to play a role in sealing;
the inner baffle 4 is arranged at the joint of the molecular pump vacuum cavity 1 and the ion source main cavity 2 and is close to one side of the circular opening of the molecular pump vacuum cavity 1 and used for blocking pollutant particles generated in the ion source main cavity 2 and preventing the pollutant particles from entering the molecular pump, so that the damage of the molecular pump is caused and the service life of the molecular pump is influenced;
the rectangular opening surface of the molecular pump vacuum chamber 1 is connected with the rectangular opening surface of one side of the ion source main chamber 2, and the inner edge and the outer edge are overlapped; the molecular pump flange 3 is connected with the circular opening surface of the molecular pump vacuum cavity 1, and the molecular pump flange 3 is coaxial with the circle center of the circular opening surface of the molecular pump vacuum cavity 1; the inner baffle 4 is connected with the upper part of the inner wall of one side of the molecular pump vacuum cavity 1, which is close to the main cavity 2 of the ion source.
The molecular pump vacuum cavity 1, its main part internal surface is right cylinder structure, and the main part surface is the polyhedral structure, and the length of the side of each face body is equal, and polyhedral structure's surface plays the fixed effect of strengthening, is provided with conical boss on its cylinder upper end plane, and cylinder one side is equipped with the cuboid hollow tank, and cuboid hollow tank internal surface is the cuboid with, is provided with two recesses on the cylinder lower extreme plane, and the recess is irregular shape, and its profile coincides with the profile of cylinder, cuboid hollow tank lower surface, sets up a screw hole on every recess respectively.
The ion source main body cavity 2 has a cuboid structure on the inner surface and the outer surface, the thickness of the cavity is consistent everywhere, as shown in fig. 2, 4 through holes are distributed on the main body cavity surface 1, 6 threaded holes are uniformly distributed on the outer circumferential position of each through hole, two round through holes are arranged on the opposite side surface of the surface 1, the diameters of the two through holes are different, eight threaded holes are uniformly distributed on the outer circumferential position of the through hole with large diameter, the threaded holes do not penetrate, six threaded holes are uniformly arranged on the outer circumferential position of the through hole with small diameter, the threaded holes do not penetrate, a rectangular groove is respectively arranged on the two side planes of the round through holes, the long side of each rectangular groove is respectively overlapped with the two long sides of the opposite side surface 1, and two threaded holes are distributed on each rectangular groove; a rectangular through hole is formed in the middle position on the main cavity surface 2, a rectangular groove is formed in the outer side of the rectangular through hole, ten threaded holes are uniformly formed in the outer side of the rectangular groove, and two positioning pin holes are formed in the outer side of the rectangular groove; a circular through hole is formed in the middle position of the main cavity surface 3, a circular boss is arranged on the outer side of the circular through hole, a circular groove is formed in the boss and close to the side of the circular through hole, two positioning pin holes are uniformly formed in the circumference of the outer side of the groove, eight threaded holes are not penetrated, and the structure of the side surface 3 is consistent with that of the side surface 3;
the molecular pump flange 3 is of a circular ring structure, and 12 threaded through holes are evenly distributed on the circular center circle;
the inner baffle 4 is of an arc-shaped sheet structure, the inner cambered surface and the outer cambered surface of the sheet pass through the same circle center and are five eighteen circles, the thicknesses of the positions of the sheet are consistent, and the difference between the radii of the inner cambered surface and the outer cambered surface is the difference.
As shown in fig. 1 and 2, the molecular pump vacuum chamber 1 is connected with the ion source main chamber 2 by a friction stir welding process, and the molecular pump flange 3 is connected with the molecular pump vacuum chamber 1 by a friction stir welding process. The inner baffle 4 is connected with the molecular pump vacuum chamber 1 by manual welding.
Finally, it should be noted that: the above embodiments are only for illustrating the technical solution of the present utility model, and are not limiting; although the utility model has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present utility model.
Claims (10)
1. The plasma source cavity structure is characterized by comprising four split structures, wherein the four split structures are a molecular pump vacuum cavity, an ion source main cavity, a molecular pump flange and an inner baffle plate, and the four split structures are mutually matched and combined into an integrated plasma source cavity structure;
the utility model provides a molecular pump vacuum chamber body internal surface is right cylinder structure, and the main part surface is the polyhedral structure, and the side length of each face body of main part surface is equal, and polyhedral structure's surface plays the fixed effect of strengthening, is provided with conical boss on the cylindricality upper end plane of main part surface, and cylinder one side is equipped with the cuboid hollow tank, and cuboid hollow tank internal surface is the cuboid with, is provided with two recesses on the cylinder lower extreme plane, and the recess is irregular shape, and the contour of recess coincides with the contour of cylinder, cuboid hollow tank lower surface, sets up a screw hole on every recess respectively.
2. The split-type plasma source cavity structure of claim 1, wherein the molecular pump vacuum chamber is used for connecting the ion source main cavity and the molecular pump flange, and the molecular pump vacuum chamber is used for installing a molecular pump to provide a vacuum environment for the ion source main cavity.
3. The split plasma source chamber structure of claim 2, wherein the interior surface of the molecular pump vacuum chamber is a cylindrically configured chamber structure.
4. A split-type plasma source chamber structure as claimed in claim 3, wherein the ion source main chamber is an ion beam generating chamber, and the ion source, the extraction electrode, and the magnetic field coil are all mounted on the ion source main chamber.
5. The split plasma source chamber structure of claim 4, wherein the gas-filling valve and the pressure relief valve are mounted on the main chamber of the ion source.
6. The split plasma source chamber structure of claim 5, wherein the molecular pump flange is configured to couple to a molecular pump, the molecular pump flange structure configured to adapt to an interface form of the molecular pump.
7. The split plasma source chamber structure of claim 6, wherein a surface of the molecular pump flange to which the molecular pump is coupled is configured to mount a seal ring.
8. The split-type plasma source chamber structure of claim 6, wherein the inner baffle is installed at the junction of the molecular pump vacuum chamber and the ion source main chamber, near one side of the circular opening of the molecular pump vacuum chamber.
9. The split-type plasma source cavity structure according to claim 6, wherein the rectangular opening surface of the molecular pump vacuum cavity is connected with the rectangular opening surface on one side of the ion source main cavity, and the inner edge and the outer edge are coincident.
10. The split plasma source chamber structure of claim 6, wherein the molecular pump flange is connected to a circular opening surface of the molecular pump vacuum chamber, and the molecular pump flange is coaxial with a center of the circular opening surface of the molecular pump vacuum chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202223581909.XU CN219979495U (en) | 2022-12-31 | 2022-12-31 | Split-type formed plasma source cavity structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202223581909.XU CN219979495U (en) | 2022-12-31 | 2022-12-31 | Split-type formed plasma source cavity structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN219979495U true CN219979495U (en) | 2023-11-07 |
Family
ID=88596303
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202223581909.XU Active CN219979495U (en) | 2022-12-31 | 2022-12-31 | Split-type formed plasma source cavity structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN219979495U (en) |
-
2022
- 2022-12-31 CN CN202223581909.XU patent/CN219979495U/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN111702532B (en) | Thin-wall part clamping method and clamp | |
| WO2019041959A1 (en) | Electric oil pump | |
| CN219979495U (en) | Split-type formed plasma source cavity structure | |
| CN106438671A (en) | Rapid connection flexible joint | |
| CN116013752A (en) | Split-type formed plasma source cavity structure | |
| CN115547854A (en) | Array die applied to small-size ceramic shell packaging patch | |
| CN108502400B (en) | Inspection hole structure of condensate water tank | |
| CN213016956U (en) | Seriation single-stage centrifugal pump volute | |
| CN211924306U (en) | Plug-in type exhaust device | |
| CN211370888U (en) | Stainless steel sealing pressure plate | |
| CN220302809U (en) | Valve PCV ball core | |
| CN110821889A (en) | Split type centrifugal compressor volute structure | |
| CN217813707U (en) | Connecting structure of solid rocket engine shell | |
| CN201129453Y (en) | Sealing device for plastic pipe material overpressure resistant and explosion bulge test | |
| CN214533312U (en) | Air cleaner and vehicle | |
| CN215486230U (en) | Engine exhaust pipe connecting structure | |
| CN220960497U (en) | Test fixture for air tightness outside aircraft fuel filter | |
| CN110230558B (en) | Valve seat structure of double-valve-core hot-end EGR valve | |
| CN212584499U (en) | Multi-positioning inner flange forging | |
| CN113871283B (en) | Semiconductor process equipment and process chamber thereof | |
| CN220415629U (en) | Be applied to semiconductor cryopump helium end fixing device | |
| CN217683212U (en) | Aircraft generator oil circuit fabrication hole shutoff end cap | |
| CN220268089U (en) | Cylinder sealing structure | |
| CN220248524U (en) | Pneumatic actuator cylinder body with sealing ring groove | |
| CN204591554U (en) | A kind of high pressure oil pump flange arrangement |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |