CN219972457U - High-efficiency deposition table for preparing diamond film - Google Patents
High-efficiency deposition table for preparing diamond film Download PDFInfo
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- CN219972457U CN219972457U CN202320913501.3U CN202320913501U CN219972457U CN 219972457 U CN219972457 U CN 219972457U CN 202320913501 U CN202320913501 U CN 202320913501U CN 219972457 U CN219972457 U CN 219972457U
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- substrate
- water
- diamond film
- substrate table
- cooling
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- 229910003460 diamond Inorganic materials 0.000 title claims abstract description 68
- 239000010432 diamond Substances 0.000 title claims abstract description 68
- 230000008021 deposition Effects 0.000 title claims abstract description 39
- 239000000758 substrate Substances 0.000 claims abstract description 124
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 54
- 238000001816 cooling Methods 0.000 claims abstract description 48
- 239000000498 cooling water Substances 0.000 claims abstract description 22
- 238000002360 preparation method Methods 0.000 claims abstract description 18
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 6
- 239000010408 film Substances 0.000 claims 5
- 238000004519 manufacturing process Methods 0.000 claims 2
- 239000010409 thin film Substances 0.000 claims 2
- 239000004020 conductor Substances 0.000 claims 1
- 239000011888 foil Substances 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 239000011733 molybdenum Substances 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 22
- 238000009826 distribution Methods 0.000 abstract description 5
- 238000000151 deposition Methods 0.000 description 32
- 238000000034 method Methods 0.000 description 11
- 238000010849 ion bombardment Methods 0.000 description 8
- 230000004048 modification Effects 0.000 description 7
- 238000012986 modification Methods 0.000 description 7
- 230000005855 radiation Effects 0.000 description 7
- 238000004140 cleaning Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 230000017525 heat dissipation Effects 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000012535 impurity Substances 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000005622 photoelectricity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
Abstract
The utility model relates to the technical field of diamond film preparation and discloses a high-efficiency deposition table for diamond film preparation, which comprises a substrate table, wherein a spiral disc-shaped water cooling pipe is arranged in the substrate table, a central port of the spiral disc-shaped water cooling pipe extends downwards to form a water inlet pipe and is communicated with an output end of water cooling circulation equipment, and a port of the outermost layer of the spiral disc-shaped water cooling pipe extends downwards to form a water outlet pipe and is communicated with an input end of the water cooling circulation equipment, so that the cooling sequence of cooling water on the substrate table is gradually cooled from the center to the periphery. According to the utility model, the spiral disc-shaped water cooling pipe is arranged in the substrate table, water is fed from the center of the substrate table, and water is discharged from the tail end of the edge of the substrate table, so that the cooling water firstly cools the center of the substrate and then gradually flows to the periphery along the spiral disc-shaped water cooling pipe, the effect of reducing the temperature difference of the surface of the substrate is achieved, the problem of poor uniformity of the prepared diamond film due to uneven temperature distribution of the substrate is avoided, and meanwhile, the preparation efficiency is improved.
Description
Technical Field
The utility model relates to the technical field of diamond film preparation, in particular to a high-efficiency deposition table for diamond film preparation.
Background
The diamond film has extremely high hardness and chemical stability, and is widely applied in the fields of electronics, photoelectricity, machinery and the like, the excellent physical and chemical properties enable the diamond film to be a novel material which is hot, while chemical vapor deposition diamond is widely focused in various research fields because the diamond film has similar excellent physical and chemical properties with natural diamond, and among a plurality of CVD deposition methods, the microwave plasma chemical vapor deposition method has the unique advantages of electrodeless discharge, concentrated plasma energy, pure plasma and the like, and becomes a preferred method for preparing the high-quality large-area diamond film.
However, in the process of preparing a large-area diamond film by using a microwave plasma chemical vapor deposition method, the plasma is positioned above the substrate, the energy of the central area of the substrate is larger than that of the edge area due to the characteristics of strong middle energy and weak edge energy of the plasma, the phenomenon that the temperature of the central area is high and the temperature of the edge area is low is shown on the substrate, the phenomenon is more obvious along with the increase of microwave power and long-time operation of the device, and finally the uniformity of the prepared diamond film is poor, so that the requirements of the diamond film in the high and new technical fields are difficult to meet, and the engineering application of the diamond film is limited to a certain extent.
In order to ensure the uniformity of the diamond film, the deposition air pressure has to be reduced at a certain microwave power, so that the large-size plasma ball covers the surface of the substrate more uniformly, and better uniformity is obtained, but the lower the deposition air pressure is, the lower the deposition rate is, so that the preparation efficiency of the diamond film is low, and the uniformity of the diamond film cannot be completely solved even if the deposition air pressure is simply reduced.
Disclosure of Invention
The utility model aims to solve the defects in the prior art and provides a high-efficiency deposition table for preparing a diamond film.
In order to achieve the above purpose, the present utility model adopts the following technical scheme: the utility model provides a high efficiency diamond film preparation is with deposit platform, includes the substrate platform, the substrate platform embeds spiral disk-shaped water-cooled tube, spiral disk-shaped water-cooled tube central port downwardly extending forms the inlet tube to communicate with the output of water-cooling circulation equipment, spiral disk-shaped water-cooled tube outermost port downwardly extending forms the outlet pipe, and communicates with the input of water-cooling circulation equipment, makes the cooling water cool off the order of substrate platform gradually from the center to cooling all around.
As a further description of the above technical solution:
the water inlet pipe and the water outlet pipe penetrate through the lower end of the substrate table.
As a further description of the above technical solution:
the deposition table further comprises a base, the groove at the upper end of the base is used for bearing the substrate, the base is sleeved outside the substrate table and connected with the substrate table in a rotating mode, the upper wall in the base is contacted with the upper wall of the substrate table, and the lower end of the base is fixedly connected with the output end of the electric rotating table.
As a further description of the above technical solution:
the lower end of the substrate table passes through the center through hole of the electric rotating table.
As a further description of the above technical solution:
the upper wall of the base and the upper part of the substrate table are both made of high heat conduction materials.
As a further description of the above technical solution:
the upper wall groove part of the base is of a thin-wall structure.
As a further description of the above technical solution:
the upper wall of the substrate table is provided with a molybdenum metal sheet.
Further, the utility model provides a method for using the deposition table for preparing the diamond film with high efficiency, which comprises the following steps:
when the diamond film is prepared, a water inlet pipe is communicated with the output end of the water cooling circulation equipment, a water outlet pipe is communicated with the input end of the water cooling circulation equipment, the water cooling circulation equipment is started, and cooling water reaches the center of the spiral disc-shaped water cooling pipe from the water inlet pipe, so that the center of the substrate is cooled, then gradually flows around the spiral disc-shaped water cooling pipe, the water temperature is continuously increased, the heat taken away by the cooling water is continuously reduced, the heat dissipation effect of the substrate from the center to the edge is continuously reduced, and the temperature difference of the substrate from the center to the edge is reduced;
and secondly, the electric rotating table rotates to drive the base to rotate, so that the substrate is driven to rotate continuously, the microwave radiation received by the surface of the substrate is more uniform, and the uniformity of the temperature of the substrate is further improved.
Preferably, before preparing the diamond film, an ion bombardment device is used for carrying out ion cleaning and surface modification on the molybdenum metal sheet on the surface of the substrate, so that the quality and the adhesive force of the diamond film are further improved.
The deposition temperature for preparing the diamond film is 800-1000 ℃, and the deposition pressure is 5-10kPa.
The utility model has the following beneficial effects:
according to the utility model, the spiral disc-shaped water cooling pipe is arranged in the substrate table, water is fed from the center of the substrate table, water is discharged from the tail end of the edge of the substrate table, cooling water firstly cools the center of the substrate, then gradually flows to the periphery along the spiral disc-shaped water cooling pipe, the water temperature is continuously increased, and then the heat taken away by the cooling water is continuously reduced, namely, the cooling effect of the cooling water is gradually reduced in the process of flowing from the center to the edge, the heat dissipation effect of the substrate is continuously reduced from the center to the edge, the temperature of the center of the substrate is high, the cooling effect is good, the temperature of the edge of the substrate is low, the cooling effect is also reduced, the effect of reducing the temperature difference of the surface of the substrate is further achieved, the problem that the uniformity of the prepared diamond film is poor due to uneven temperature distribution is avoided, and meanwhile, in the preparation process of the diamond film, the deposition pressure is improved, and the preparation efficiency is further improved.
According to the utility model, the electric rotary table drives the base to rotate, and further drives the substrate to rotate continuously, so that microwave radiation received by the surface of the substrate is more uniform, further the uniformity of the temperature of the substrate is further improved, and meanwhile, diamond crystals are uniformly deposited on the surface of the substrate, so that the situation that the crystals are accumulated and gathered on the surface of the substrate is avoided, and the uniformity and quality of the diamond film are ensured.
Drawings
FIG. 1 is a front perspective view of a deposition station for producing a diamond film with high efficiency according to the present utility model;
FIG. 2 is a front cross-sectional view of a deposition station for producing diamond films with high efficiency according to the present utility model;
FIG. 3 is a schematic view of a spiral disk-shaped water-cooled tube in a deposition station for preparing a high-efficiency diamond film according to the present utility model;
fig. 4 is a schematic cross-sectional view of a substrate stage in a deposition station for preparing a diamond film with high efficiency according to the present utility model.
Legend description:
1. a base; 2. a substrate; 3. an electric rotating table; 4. a substrate table; 5. a spiral disc-shaped water cooling pipe; 6. a water inlet pipe; 7. and a water outlet pipe.
Description of the embodiments
The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
Embodiment one:
referring to fig. 1-4, one embodiment provided by the present utility model is: the utility model provides a high efficiency diamond film preparation is with deposit platform, includes substrate platform 4, and substrate platform 4 upper portion embeds spiral disk-shaped water-cooled tube 5, and spiral disk-shaped water-cooled tube 5 central port downwardly extending forms inlet tube 6 to communicate with the output of water-cooling circulation equipment, spiral disk-shaped water-cooled tube 5 outermost port downwardly extending forms outlet pipe 7, and communicates with the input of water-cooling circulation equipment, makes the cooling water to the cooling sequence of substrate platform 4 be by the center gradually cooling all around.
At a given deposition pressure, the temperature of the substrate increases along with the increase of the microwave power, and at the same time, for the given microwave power, the temperature of the substrate also increases along with the increase of the deposition pressure, and the uniformity of the temperature of the substrate also decreases along with the increase of the deposition pressure and the microwave power; the larger the microwave power, the larger the plasma sphere when the deposition gas pressure is set.
The reason for the higher uniformity of the substrate temperature is that the lower the deposition pressure is, the more uniformly the large-sized plasma balls cover the substrate surface, but the higher the deposition pressure is, the higher the substrate temperature can be, thereby effectively increasing the deposition rate, when the microwave power is set.
Higher microwave power excites more radicals that are favorable to diamond film deposition, but the temperature difference across the substrate becomes more pronounced, so improvements to the deposition station are needed to improve substrate temperature uniformity at high power.
Through arranging the spiral disc-shaped water cooling pipe 5 in the substrate table 4, water flows in from the center to the tail end of the edge, cooling water cools the center of the substrate 2, then flows along the spiral disc-shaped water cooling pipe 5 gradually to the periphery, the water temperature is continuously increased, and then the heat quantity which can be taken away by the cooling water is continuously reduced, namely, the cooling effect of the cooling water is gradually reduced in the process of flowing from the center to the edge, the heat dissipation effect of the substrate 2 is continuously reduced from the center to the edge, the temperature of the center of the substrate 2 is high, the cooling effect is good, the edge temperature of the substrate 2 is low, the cooling effect is also reduced, the effect of reducing the temperature difference of the surface of the substrate 2 is further achieved, the problem that the uniformity of the prepared diamond film is poor due to uneven temperature distribution of the substrate 2 is avoided, and meanwhile, in the preparation process of the diamond film, the deposition air pressure can be improved, and the preparation efficiency is further improved.
Embodiment two:
on the basis of the above embodiment, the above embodiment of the present embodiment is further improved to achieve the purpose of further improving the temperature uniformity of the substrate 2, the deposition platform further includes a base 1, a groove at an upper end of the base 1 is used for holding the substrate 2, the base 1 is sleeved outside the substrate platform 4 and is connected with each other in a rotating manner, an upper wall in the base 1 is contacted with an upper wall of the substrate platform 4, and a lower end of the base 1 is fixedly connected with an output end of the electric rotating platform 3.
During the microwave chemical vapor deposition process, microwave radiation is continuously applied to the surface of the substrate 2, so that the temperature of the surface of the substrate 2 is continuously increased. However, due to the limited thermal conductivity of the substrate 2, the surface temperature of the substrate 2 is unevenly distributed, and the temperature is too high in some places and too low in some places.
Such unevenly distributed temperatures can have an impact on the quality and performance of the diamond film. If the temperature is too high, the crystallinity of the diamond film is reduced, and the grain boundary is increased, so that the mechanical property and the optical property of the film are affected. If the temperature is too low, the growth rate of the diamond film is slowed, thereby affecting the thickness and uniformity of the film.
Therefore, in the microwave chemical vapor deposition process, measures are required to reduce the uneven distribution of the surface temperature of the substrate so as to ensure the quality and performance of the diamond film. The microwave radiation is uniformly distributed by rotating the substrate to improve the heat conduction performance of the substrate surface.
The electric rotating table 3 drives the base 1 to rotate, and further drives the substrate 2 to rotate continuously, so that microwave radiation received by the surface of the substrate 2 is more uniform, further the uniformity of the temperature of the substrate 2 is further improved, and meanwhile, diamond crystals are uniformly deposited on the surface of the substrate 2, so that the situation that the crystals are accumulated and gathered on the surface of the substrate 2 is avoided, and the uniformity and quality of a diamond film are ensured.
The water inlet pipe 6 and the water outlet pipe 7 penetrate through the lower end of the substrate table 4.
The lower end of the substrate table 4 passes through the central through hole of the electric rotating table 3.
The water inlet pipe 6 and the water outlet pipe 7 are prevented from obstructing the rotation of the base.
The upper wall of the base 1 and the upper part of the substrate table 4 are made of high heat conduction materials.
The upper wall of the base 1 and the upper part of the substrate table 4 are made of high heat conduction materials, so that heat can be conducted better, cooling water can take away the heat more rapidly, heat conduction efficiency is improved, cooling effect of the cooling water is improved, and quality problems caused by overhigh temperature in the preparation process of the diamond film are avoided.
The upper wall groove part of the base 1 is of a thin-wall structure.
The upper wall recess of the susceptor 1 is a portion for placing the substrate 2, and its thickness affects the heat conduction distance between the substrate 2 and the susceptor 1. By reducing the thickness of the groove portion of the upper wall of the susceptor 1, the heat conduction distance can be reduced, so that the substrate 2 can radiate heat more rapidly, thereby improving the heat conduction efficiency. Meanwhile, the thickness of the groove part on the upper wall of the base 1 is reduced, so that the cooling effect of cooling water can be increased, and the cooling water can take away heat more rapidly, so that the problem of quality degradation of the diamond film caused by overhigh temperature is avoided.
In addition, the reduction of the thickness of the groove portion of the upper wall of the base 1 can also reduce the mass of the base 1, thereby reducing the thermal inertia of the whole system, enabling the system to respond to temperature changes more rapidly, and thus improving the preparation efficiency and quality of the diamond film.
Therefore, by reducing the thickness of the groove part on the upper wall of the base 1, the heat conduction efficiency can be improved in the preparation process of the diamond film, the cooling effect can be increased, and the occurrence of quality problems caused by overhigh temperature can be avoided.
Embodiment III:
on the basis of the above embodiments, the method for using the deposition table for preparing a diamond film with high efficiency according to this embodiment includes the following steps:
when the diamond film is prepared, a water inlet pipe 6 is communicated with the output end of the water cooling circulation equipment, a water outlet pipe 7 is communicated with the input end of the water cooling circulation equipment, the water cooling circulation equipment is started, cooling water reaches the center of a spiral disc-shaped water cooling pipe 5 from the water inlet pipe 6, so that the center of a substrate 2 is cooled, then gradually flows around the spiral disc-shaped water cooling pipe 5, the water temperature is continuously increased, heat taken away by the cooling water is continuously reduced, the heat dissipation effect of the substrate 2 from the center to the edge is continuously reduced, and the temperature difference of the substrate 2 from the center to the edge is reduced;
and step two, the electric rotating table 3 rotates to drive the base 1 to rotate, so that the substrate 2 is driven to rotate continuously, microwave radiation received by the surface of the substrate 2 is more uniform, and the uniformity of the temperature of the substrate 2 is further improved.
Before preparing the diamond film, the ion bombardment device is used for carrying out ion cleaning and surface modification on the molybdenum metal sheet on the surface of the substrate 2, so that the quality and the adhesive force of the diamond film are further improved.
An ion bombardment apparatus is a device for cleaning and modifying the surface of an object by using an ion beam. In the preparation process of the diamond film, the ion bombardment device is used for carrying out ion cleaning and surface modification on the molybdenum metal sheet on the surface of the substrate 2, so that the surface pollution and impurities can be removed, and meanwhile, the structure and the property of the surface are improved, so that the diamond film can be better attached to the substrate.
The ion beam of the ion bombardment device can form a tiny concave-convex structure on the surface of the substrate, and the surface roughness is increased, so that the adhesive force of the diamond film is improved. In addition, the ion bombardment can also change the chemical property of the surface of the substrate, so that the growth of the diamond film is more uniform and stable, and the quality and performance of the film are improved. Therefore, ion cleaning and surface modification of the substrate surface by using an ion bombardment device are very important steps in the preparation process of the diamond film.
In order to reduce pollution and impurities in the deposition process, an ion bombardment device can be used for carrying out ion cleaning and surface modification on the molybdenum metal sheet on the surface of the substrate 2, so that the quality and the adhesive force of the diamond film are further improved.
The deposition temperature for preparing the diamond film is 800-1000 ℃, and the deposition pressure is 5-10kPa.
Because the substrate is driven to continuously rotate by the mode of internally arranging the spiral disc-shaped water cooling pipe and the mode of driving the electric rotating table, the problem of uneven surface temperature of the substrate is solved, and therefore, the temperature and the deposition pressure can be increased as much as possible in the temperature and pressure range, and the effect of efficiently preparing the high-quality diamond film is achieved.
Working principle: the substrate table 4 is internally provided with the spiral disc-shaped water cooling pipe 5, water flows in from the center to the tail end of the substrate table, so that cooling water firstly cools the center of the substrate 2, then gradually flows around along the spiral disc-shaped water cooling pipe 5, the water temperature is continuously increased, and then the heat taken away by the cooling water is continuously reduced, namely the cooling effect of the cooling water is gradually reduced in the process of flowing from the center to the edge, the heat dissipation effect of the substrate 2 is continuously reduced from the center to the edge, the temperature of the center of the substrate 2 is high, the cooling effect is also good, the edge temperature of the substrate 2 is low, the cooling effect is also reduced, the effect of reducing the temperature difference of the surface of the substrate is further achieved, and the temperature distribution of the substrate 2 is uniform;
the electric rotating table 3 drives the base 1 to rotate and further drives the substrate 2 to continuously rotate, so that microwave radiation received by the surface of the substrate 2 is more uniform, and the temperature uniformity of the substrate 2 is further improved.
Finally, it should be noted that: the foregoing description is only illustrative of the preferred embodiments of the present utility model, and although the present utility model has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that modifications may be made to the embodiments described, or equivalents may be substituted for elements thereof, and any modifications, equivalents, improvements or changes may be made without departing from the spirit and principles of the present utility model.
Claims (7)
1. The utility model provides a high efficiency diamond film preparation is with deposit platform, includes substrate platform (4), its characterized in that, substrate platform (4) upper portion embeds spiral disk-shaped water-cooled tube (5), spiral disk-shaped water-cooled tube (5) central port downwardly extending forms inlet tube (6) to communicate with the output of water-cooling circulation equipment, spiral disk-shaped water-cooled tube (5) outermost layer port downwardly extending forms outlet pipe (7) to communicate with the input of water-cooling circulation equipment, make the cooling water cool off the order of substrate platform (4) by the center gradually to cooling all around.
2. A deposition station for producing diamond films with high efficiency according to claim 1, characterized in that the water inlet pipe (6) and the water outlet pipe (7) are penetrated from the lower end of the substrate table (4).
3. The deposition table for preparing the diamond film with high efficiency according to claim 2, further comprising a base (1), wherein a groove at the upper end of the base (1) is used for holding the substrate (2), the base (1) is sleeved outside the substrate table (4) and is connected with each other in a rotating way, the upper wall in the base (1) is in contact with the upper wall of the substrate table (4), and the lower end of the base (1) is fixedly connected with the output end of the electric rotating table (3).
4. A deposition station for producing diamond thin films with high efficiency according to claim 3, characterized in that the lower end of the substrate table (4) passes through the central through hole of the electric rotating table (3).
5. A deposition station for the efficient production of diamond thin films according to claim 3, characterized in that the upper wall of the base (1) and the upper part of the substrate table (4) are both made of a highly heat conductive material.
6. A deposition station for producing a diamond film with high efficiency according to claim 5, wherein the upper wall groove portion of the susceptor (1) has a thin wall structure.
7. A deposition station for the efficient production of diamond films according to claim 3, characterized in that the upper wall of the substrate station (4) is provided with a molybdenum foil.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320913501.3U CN219972457U (en) | 2023-04-21 | 2023-04-21 | High-efficiency deposition table for preparing diamond film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320913501.3U CN219972457U (en) | 2023-04-21 | 2023-04-21 | High-efficiency deposition table for preparing diamond film |
Publications (1)
| Publication Number | Publication Date |
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| CN219972457U true CN219972457U (en) | 2023-11-07 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202320913501.3U Active CN219972457U (en) | 2023-04-21 | 2023-04-21 | High-efficiency deposition table for preparing diamond film |
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| Country | Link |
|---|---|
| CN (1) | CN219972457U (en) |
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- 2023-04-21 CN CN202320913501.3U patent/CN219972457U/en active Active
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