CN219831253U - Resistance measuring structure - Google Patents
Resistance measuring structure Download PDFInfo
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- CN219831253U CN219831253U CN202321046861.4U CN202321046861U CN219831253U CN 219831253 U CN219831253 U CN 219831253U CN 202321046861 U CN202321046861 U CN 202321046861U CN 219831253 U CN219831253 U CN 219831253U
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- 239000000523 sample Substances 0.000 claims abstract description 131
- 238000005259 measurement Methods 0.000 claims abstract description 66
- 239000011810 insulating material Substances 0.000 claims description 4
- 238000010586 diagram Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 7
- 230000005540 biological transmission Effects 0.000 description 5
- 238000012545 processing Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 239000002131 composite material Substances 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
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Abstract
The utility model discloses a resistance measuring structure which is applied to a circuit element with resistance characteristics, wherein the circuit element comprises a resistance part and electrode connecting parts, and the electrode connecting parts are provided with an even number and are connected with the resistance part; the electrode connecting parts are used for connecting one side of a measuring probe of the measuring equipment, and are respectively provided with a probe alignment layer, wherein the probe alignment layers comprise a probe effective area and a probe ineffective area; wherein the probe effective area is for contacting the measurement probe with the electrode connection portion; the probe inactive area is used for isolating contact between the measuring probe and the electrode connecting part. The utility model can ensure the accuracy of resistance measurement, thereby ensuring the performance of the integrated circuit.
Description
Technical Field
The utility model relates to the technical field of resistance detection, in particular to a resistance measuring structure.
Background
To ensure performance of an integrated circuit, parameters of various devices in the integrated circuit need to be tested. A circuit element having a resistance characteristic such as a resistance element or a shunt needs to have its resistance value measured accurately. A typical circuit element with a resistive characteristic is shown in fig. 1 (the left drawing includes two electrode connection portions, the right drawing includes four electrode connection portions), and includes an electrode connection portion 1 and a resistive portion 2, wherein the electrode connection portion 1 is provided with an even number and is connected to the resistive portion 2, and typically two or four electrode connection portions 1. The resistance part 2 is used as a conductive structure layer, the specific resistance of the circuit element is directly related to the size and the composition materials of the resistance part 2, and the composition materials of the resistance part 2 have certain resistivity, so that the circuit element presents resistivity. The electrode connection portion 1 mainly serves as a connection medium between the circuit element and the integrated circuit.
In the related art, the resistance measurement mode is to contact two measurement probes of a measurement device with two electrode connection parts respectively, apply a voltage or a current, measure a corresponding current or voltage by the measurement device, and calculate the resistance by using ohm's law. However, experiments show that small deviation often exists between measurement results obtained by multiple measurements of the same circuit element with the resistance characteristics, so that the resistance value of the circuit element cannot be accurately determined. In order to further ensure the performance of the integrated circuit, it is particularly important to ensure the accuracy of the resistance measurement.
Disclosure of Invention
The utility model mainly aims to provide a resistance measuring structure which aims to ensure the accuracy of resistance measurement and further ensure the performance of an integrated circuit.
In order to achieve the above object, the present utility model provides a resistance measuring structure applied to a circuit element having a resistance characteristic, wherein the circuit element includes a resistance portion and an electrode connection portion, and the electrode connection portion is provided in an even number and is connected to the resistance portion; one side of each of the at least two electrode connecting parts, which is used for connecting with a measuring probe of the measuring equipment, is provided with a probe alignment layer, and the probe alignment layer comprises a probe effective area and a probe ineffective area; wherein the probe effective area is for contacting the measurement probe with the electrode connection portion; the probe inactive area is used for isolating contact between the measuring probe and the electrode connecting part.
Optionally, the area of the probe effective area is 1-1.2 times of the end area of the measurement probe.
Optionally, the contour shape of the probe active area corresponds to the end shape of the measurement probe.
Optionally, the probe effective region is formed by surrounding a plurality of the probe ineffective regions.
Optionally, the probe null region is formed using an insulating material.
Optionally, the probe effective regions are located at a central region of the electrode connection parts, and the probe effective regions on each electrode connection part are symmetrically disposed about a middle of the resistor.
Optionally, the thickness of the probe ineffective area is 0.1 um-100 um.
Compared with the prior art, the utility model has the beneficial effects that:
for the reason that in the related art, small deviation often exists between measurement results obtained by carrying out multiple measurements on the same circuit element with resistance characteristics, the inventor finds that the deviation exists between the positions of contact points on the connection part of the measurement probe and the electrode in each measurement process. For easy understanding, referring to fig. 2, when the electrode connection portion is large enough and the end of the measurement probe is small enough, reference is made to fig. 2, in which the black dots in the a and b diagrams represent the contact points between the electrode connection portion and the measurement probe, and when the contact points between the measurement probes on the two electrode connection portions in the a diagram are closer, the transmission path x of the current on the resistance portion is correspondingly shorter; when the distance between the contact points of the measuring probes on the two electrode connecting parts in the diagram b is longer, the transmission path y of the current on the resistance part is correspondingly longer; since the resistance is related to the dimension and length of the resistance portion, there is a slight deviation in the resistance measurement results in the two diagrams a and b.
Based on the research, the utility model discloses a resistance measuring method, specifically, a probe alignment layer is formed on at least two electrode connecting parts through various processing technologies, wherein the probe alignment layer comprises a probe effective area and a probe ineffective area; and then the measuring probe is used for contacting the electrode connecting part through the probe effective area, and the resistance value of the circuit element is measured through the measuring equipment. Because the probe invalid region isolates the contact between the measuring probe and the electrode connecting part, the contact point of the measuring probe must be positioned in the probe valid region when the resistance value measurement is carried out, and if the measuring probe is deviated, the resistance value result cannot be obtained. Therefore, the measurement results of the resistance measurement can be kept consistent no matter how many times of the resistance measurement are carried out, the error in the resistance measurement is reduced to the maximum extent, the accuracy of the resistance measurement is ensured, and the performance of the integrated circuit is ensured.
Drawings
In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the drawings that are required in the embodiments or the description of the prior art will be briefly described, it being obvious that the drawings in the following description are only some embodiments of the utility model and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic diagram of a resistor structure;
FIG. 2 is a schematic diagram of resistance measurement;
FIG. 3 is a schematic diagram of a structure of an embodiment of a resistance measurement method according to the present utility model (top view, bottom view);
FIG. 4 is a schematic diagram of a resistance measurement method according to an embodiment of the utility model.
The names of the components marked in the figures are as follows:
1. an electrode connection part; 2. a resistance part; 3. a probe alignment layer; 301. a probe active region; 302. a probe null region; 4. a measurement probe;
the achievement of the objects, functional features and advantages of the present utility model will be further described with reference to the accompanying drawings, in conjunction with the embodiments.
Detailed Description
The following description of the present utility model will be made more fully hereinafter with reference to the accompanying drawings, in which it is shown, however, some, but not all embodiments of the utility model are shown. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
For the reason that in the related art, there is often a small deviation between measurement results obtained by performing multiple measurements on the same circuit element having a resistance characteristic, the present inventors found in long-term experimental studies that the deviation is mainly caused by the position of the contact point between the measurement probe 4 and the electrode connection portion 1 during each measurement. For easy understanding, referring to fig. 2, when the electrode connection portion 1 is large enough and the end portion of the measurement probe 4 is small enough, reference is made to fig. 2 for two cases a and b, wherein the black dots in the figures a and b represent the contact points between the electrode connection portion 1 and the measurement probe 4, and when the contact points between the measurement probes 4 on the two electrode connection portions 1 in the figure a are closer, the transmission path x of the current on the resistance portion 2 is correspondingly shorter; when the distance between the contact points of the measuring probes 4 on the two electrode connecting parts 1 in the diagram b is longer, the transmission path y of the current on the resistance part 2 is correspondingly longer; since the resistance value is related to the dimension length of the resistance value portion 2, there is caused a slight deviation in the resistance value measurement results in the two figures a and b.
Based on the above study, the present embodiment discloses a resistance measuring structure, referring to fig. 3-4, applied to a circuit element having a resistance characteristic, wherein the circuit element includes a resistance portion 2 and an electrode connection portion 1, and the electrode connection portion 1 is provided in an even number and is connected to the resistance portion 2; one side of the at least two electrode connecting parts 1, which are used for connecting with a measuring probe 4 of the measuring equipment, is provided with a probe alignment layer 3, and the probe alignment layer 3 comprises a probe effective area 301 and a probe ineffective area 302; wherein the probe effective area 301 is for bringing the measurement probe 4 into contact with the electrode connection part 1; the probe inactive area 302 serves to isolate contact between the measurement probe 4 and the electrode connecting portion 1.
The embodiment discloses a resistance measuring structure, which is formed by processing a probe alignment layer 3 on at least two electrode connecting parts 1 through various processing technologies, wherein the probe alignment layer 3 comprises a probe effective area 301 and a probe ineffective area 302; the electrode connection part 1 is contacted by the measuring probe 4 through the probe effective area 301, and the resistance value of the circuit element is measured by the measuring device. Since the probe ineffective area 302 isolates the contact between the measurement probe 4 and the electrode connection portion 1, the contact point of the measurement probe 4 must be located in the probe effective area 301 when the resistance measurement is performed, and if the measurement probe is shifted, the resistance result cannot be obtained. Therefore, the measurement results of the resistance measurement can be kept consistent no matter how many times of the resistance measurement are carried out, the error in the resistance measurement is reduced to the maximum extent, the accuracy of the resistance measurement is ensured, and the performance of the integrated circuit is ensured.
After the resistance is measured, the probe alignment layer 3 is removed by a processing technology so that the electrode connection part 1 is completely exposed, and the current transmission effect of the circuit element is ensured in the process of installing the resistance element and the semiconductor integrated circuit.
It should be noted that the above problem cause discovery and solution thinking process belong to the intelligent crystallization of the present inventors, and are also one of the utility models of the present utility model. In evaluating the inventive process, the above problem cause discovery and solution thinking process should also be included in the evaluation scope.
Further, the area of the probe effective region 301 is 1 to 1.2 times the end area of the measurement probe 4. By the above technical scheme, the measurement probe 4 and the probe effective area 301 are set to be in clearance fit, so that the measurement probe 4 can smoothly pass through the probe effective area 301 and contact with each other at the electrode connection part 1, and thus resistance measurement work can be performed.
Further, the outline shape of the probe effective region 301 coincides with the end shape of the measurement probe 4. By the above technical scheme, the probe effective area 301 and the end shape of the measurement probe 4 are kept consistent, that is, if the end shape of the measurement probe 4 is round or square, the outline shape of the probe effective area 301 is correspondingly set to be round or square.
Further, the probe effective region 301 is composed of a plurality of probe ineffective regions 302 surrounded. Thus, as shown in fig. 4, the probe ineffective area 302 is composed of a plurality of L-shaped structures, wherein the middle area surrounded by the L-shaped structures is the probe effective area 301, and the positioning function of the measurement probe 4 is realized through the probe ineffective area 302 of the L-shaped structures, so that the usage amount of manufacturing materials of the probe ineffective area 302 is saved, and the enterprise cost is reduced.
Further, the probe inactive area 302 is formed using an insulating material. So set up, ensure through above-mentioned technical scheme that the contact between the invalid region 302 of probe can effectively keep apart measurement probe 4 and electrode connecting portion 1, it can be understood that when the invalid region 302 of probe is contacted to measurement probe 4, because the invalid region 302 of probe is insulating material, the electric current of measuring equipment can't transmit to electrode connecting portion 1 for resistance measurement work can't go on. Only when the measuring probe 4 passes through the probe active area 301 and contacts the electrode connection part 1, the current of the measuring device can be transmitted to the electrode connection part 1 for resistance measurement. The contact of the measuring probe 4 on a designated area is fundamentally ensured, so that the accuracy of resistance measurement is ensured.
Further, the probe effective regions 301 are located at the central region of the electrode connection parts 1, and the probe effective regions 301 on each electrode connection part 1 are symmetrically arranged about the middle of the resistor. So set up, in order to ensure the standardization of each resistance measurement to the resistance of multiple models, carry out the above-mentioned restriction to the specific position of probe effective area 301, avoid appearing the resistance the same condition because of the position of probe effective area 301 is different to the resistance of two kinds of different models. It should be noted that, during the specific operation, the specific position of the probe effective area 301 needs to be selected in combination with the actual situation. For example, when the circuit element is connected to the integrated circuit at the edge of the electrode connection portion, the probe effective area can be correspondingly disposed at the edge of the electrode connection portion, so that the measurement result is consistent with the actual resistance in the actual use process, and the resistance measurement has a practical value.
Further, the thickness of the probe inactive area 302 is 0.1um to 100um. So configured, by specifically limiting the thickness of the probe inactive area 302, the probe inactive area 302 is prevented from being too thin or too thick.
It should be noted that other contents of the resistance measurement structure disclosed in the present utility model are related art, and are not described herein.
In addition, it should be noted that, if there is a directional indication (such as up, down, left, right, front, and rear … …) in the embodiment of the present utility model, the directional indication is merely used to explain the relative positional relationship, movement condition, etc. between the components in a specific posture (as shown in the drawings), and if the specific posture is changed, the directional indication is correspondingly changed.
Furthermore, it should be noted that the description of "first," "second," etc. in this disclosure is for descriptive purposes only and is not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include at least one such feature. In addition, the technical solutions of the embodiments may be combined with each other, but it is necessary to base that the technical solutions can be realized by those skilled in the art, and when the technical solutions are contradictory or cannot be realized, the combination of the technical solutions should be considered to be absent and not within the scope of protection claimed in the present utility model.
The foregoing is merely an alternative embodiment of the present utility model, and is not intended to limit the scope of the present utility model, and all applications of the present utility model directly/indirectly in other related technical fields are included in the scope of the present utility model.
Claims (7)
1. The resistance measuring structure is applied to a circuit element with resistance characteristics, wherein the circuit element comprises a resistance part and electrode connecting parts, and the electrode connecting parts are provided with an even number and are connected with the resistance part;
the electrode connecting parts are used for connecting with one side of a measuring probe of measuring equipment, and are respectively provided with a probe alignment layer, wherein the probe alignment layers comprise a probe effective area and a probe ineffective area; wherein the probe effective area is for contacting the measurement probe with the electrode connection portion; the probe inactive area is used for isolating contact between the measuring probe and the electrode connecting part.
2. The resistance measuring structure according to claim 1, wherein: the area of the probe effective area is 1-1.2 times of the end area of the measuring probe.
3. The resistance measuring structure according to claim 1, wherein: the outline shape of the probe effective area is consistent with the end shape of the measuring probe.
4. The resistance measuring structure according to claim 1, wherein: the probe effective region is formed by surrounding a plurality of probe ineffective regions.
5. The resistance measuring structure according to claim 1, wherein: the probe ineffective area is formed by insulating materials.
6. The resistance measuring structure according to claim 1, wherein: the probe effective areas are located in the central area of the electrode connection parts, and the probe effective areas on each electrode connection part are symmetrically arranged about the middle of the resistor.
7. The resistance measuring structure according to claim 1, wherein: the thickness of the probe invalid region is 0.1-100 um.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321046861.4U CN219831253U (en) | 2023-05-05 | 2023-05-05 | Resistance measuring structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321046861.4U CN219831253U (en) | 2023-05-05 | 2023-05-05 | Resistance measuring structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN219831253U true CN219831253U (en) | 2023-10-13 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202321046861.4U Active CN219831253U (en) | 2023-05-05 | 2023-05-05 | Resistance measuring structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN219831253U (en) |
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2023
- 2023-05-05 CN CN202321046861.4U patent/CN219831253U/en active Active
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