CN219824337U - Substrate carrier device of horizontal magnetron sputtering coating machine - Google Patents
Substrate carrier device of horizontal magnetron sputtering coating machine Download PDFInfo
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- CN219824337U CN219824337U CN202321327877.2U CN202321327877U CN219824337U CN 219824337 U CN219824337 U CN 219824337U CN 202321327877 U CN202321327877 U CN 202321327877U CN 219824337 U CN219824337 U CN 219824337U
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- adsorption
- coating machine
- magnetron sputtering
- sputtering coating
- substrate
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- 239000000758 substrate Substances 0.000 title claims abstract description 57
- 239000011248 coating agent Substances 0.000 title claims abstract description 34
- 238000000576 coating method Methods 0.000 title claims abstract description 34
- 238000001755 magnetron sputter deposition Methods 0.000 title claims abstract description 25
- 238000001179 sorption measurement Methods 0.000 claims abstract description 60
- 230000002457 bidirectional effect Effects 0.000 claims abstract description 20
- 230000007246 mechanism Effects 0.000 claims abstract description 20
- 238000007789 sealing Methods 0.000 claims description 9
- 238000000605 extraction Methods 0.000 claims description 7
- 238000003466 welding Methods 0.000 claims description 2
- 210000003437 trachea Anatomy 0.000 claims 2
- 239000011521 glass Substances 0.000 abstract description 32
- 230000007547 defect Effects 0.000 abstract description 3
- 238000007747 plating Methods 0.000 abstract 1
- 230000033001 locomotion Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000005086 pumping Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- -1 argon ions Chemical class 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
Classifications
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
The utility model discloses a substrate carrier device of a horizontal magnetron sputtering coating machine, and relates to the technical field of tool clamps. The utility model relates to a substrate carrier device of a horizontal magnetron sputtering coating machine, which comprises an adjusting mechanism and an adsorption mechanism. In order to solve the defects that a substrate carrier of a film plating machine is not stable enough and cannot be suitable for glass substrates with different widths, the utility model can adjust the distance between two adsorption frames through the adjusting mechanism, is suitable for fixing glass substrates with different lengths, and drives the bidirectional screw rod to rotate through rotating the second handle, the bidirectional screw rod drives the rod sleeve to move in opposite directions or back directions, the rod sleeve drives the adsorption disc to move in opposite directions or back directions, the adjustment of the distance between the adsorption discs is realized, the utility model is suitable for fixing glass substrates with different widths, and the air in the vacuum bin is completely extracted through the air pump, so that the vacuum in the suction disc is ensured, the adsorption force to the glass substrates is improved, and the stability for fixing the glass substrates is further improved.
Description
Technical Field
The utility model relates to the technical field of tool clamps, in particular to a substrate carrier device of a horizontal magnetron sputtering coating machine.
Background
The magnetron sputtering coating is a coating technology for forming a deposition layer by taking a coating material as a target cathode, bombarding the target material by utilizing argon ions to generate cathode sputtering, the horizontal magnetron sputtering coating machine is a horizontal coating machine utilizing the technology, and when the horizontal magnetron sputtering coating machine is used for coating a glass substrate, a carrier is a clamp which is used for clamping a glass sheet so as to position the glass sheet and the carrier into a sputtering coating bin for coating.
Application number: the chinese patent CN202220930884.0 proposes a high-efficiency clamp for glass coating, by adjusting the positions of the first suction cup and the second suction cup, the positions between them more conform to the size of glass, so that more glass with different sizes can be fixed by the clamp, however, the following defects exist in the coating machine:
1. the clamp can only adjust the distance between the first sucker and the second sucker, but can not adjust the distance between the first sucker or the second sucker, namely can not be suitable for glass substrates with different widths, and has certain limitation;
2. when the first sucker and the second sucker adsorb the glass substrate, if air exists in the sucker, the sucker loses suction, so that the glass substrate is not fixed stably enough.
Therefore, in order to solve the defects that the substrate carrier of the coating machine is not stable enough and cannot be applied to glass substrates with different widths, it is necessary to provide a horizontal magnetron sputtering coating machine substrate carrier device.
Disclosure of Invention
The utility model aims to provide a substrate carrier device of a horizontal magnetron sputtering coating machine, which can adjust the distance between two adsorption frames through an adjusting mechanism, is suitable for fixing glass substrates with different lengths, drives a bidirectional screw rod to rotate through rotating a second handle, drives a rod sleeve to move in opposite directions or back to move, realizes the adjustment of the distance between the adsorption plates, is suitable for fixing glass substrates with different widths, and ensures the vacuum in a sucking disc through pumping the air in a vacuum chamber to improve the adsorption force on the glass substrates, thereby improving the stability of the fixation of the glass substrates so as to solve the problems in the background technology.
In order to achieve the above purpose, the present utility model provides the following technical solutions:
the utility model provides a horizontal magnetron sputtering coating machine base plate carrier device, includes adjustment mechanism and adsorption mechanism, adjustment mechanism includes carrier base plate and first pivot, the carrier base plate is detachably connected to horizontal magnetron sputtering coating machine's positioner through the fixed stabilizer blade, first pivot and carrier base plate swing joint, first pivot is the upper and lower symmetry setting and the top of first pivot runs through carrier base plate and is fixed with the interlock gear, the side end meshing of interlock gear has first area interlock tooth slide bar and second area interlock tooth slide bar;
the adsorption mechanism comprises an adsorption frame and an adsorption disc, the two adsorption frames are respectively fixed at the side ends of the first slide bar with the occluding teeth and the second slide bar with the occluding teeth, the adsorption disc is movably arranged at the upper end of the adsorption frame and comprises a sucker and a vacuum bin, the sucker is arranged at the upper end of the vacuum bin and is communicated with the vacuum bin in a gas-keeping mode, and an extraction opening is formed in the hollow inside of the vacuum bin and in the bottom end of the vacuum bin.
Preferably, a guide groove is fixed on the upper surface of the carrier substrate, and a first sliding rod with engagement teeth and a second sliding rod with engagement teeth are arranged in the guide groove.
Preferably, the lower surface welding of carrier base plate has the mount, the bottom and the mount swing joint of first pivot, the side of first pivot rotates and is equipped with the second pivot, and the second pivot passes through the drive belt and links to each other with first pivot, and the top of second pivot runs through the carrier base plate and is fixed with first rotating handle.
Preferably, a bidirectional screw rod is movably installed in the adsorption frame, and one end of the bidirectional screw rod penetrates through the adsorption frame to be connected with a second rotating handle.
Preferably, the bidirectional screw rod is connected with a rod sleeve in a threaded manner, and the upper end of the rod sleeve is connected with an adsorption disc through a movable rod.
Preferably, a chute is formed in the adsorption frame, and a moving rod is movably arranged in the chute.
Preferably, the side end of the adsorption frame is fixedly provided with an air pump, one end of the air pump is connected with an air outlet through an air pipe in a sealing way, the other end of the air pump is connected with a three-way pipe fitting in a sealing way, and the three-way pipe fitting is connected with an air extraction opening in a sealing way through an air pipe.
Compared with the prior art, the utility model has the following beneficial effects:
1. according to the substrate carrier device of the horizontal magnetron sputtering coating machine, the second rotating handle is rotated to drive the bidirectional screw rod to rotate, and the rod sleeve is in threaded connection with the bidirectional screw rod, so that the rod sleeve can move in opposite directions or back directions on the bidirectional screw rod, at the moment, the moving rod moves in the chute, and the moving rod drives the adsorption disc to move in opposite directions or back directions, so that the adjustment of the spacing of the adsorption disc is realized, and the device is suitable for fixing glass substrates with different widths;
2. the substrate carrier device of the horizontal magnetron sputtering coating machine can enhance the stability of fixing the glass substrate through the adsorption mechanism, the air pump is started, the air pump pumps out the air in the vacuum chamber from the pumping hole through the air pipe and the tee pipe fitting, and the sucking disc is communicated with the vacuum chamber through the air, so that the air in the sucking disc is pumped out completely, the adsorption force of the sucking disc on the glass substrate is enhanced, and the stability of the carrier on the glass substrate is enhanced.
Drawings
FIG. 1 is a perspective view of the overall structure of the present utility model;
FIG. 2 is a split view of the adjustment mechanism of the present utility model;
FIG. 3 is a plan view of an adjustment structure of the present utility model;
FIG. 4 is a perspective view of an adsorption mechanism according to the present utility model;
FIG. 5 is a cross-sectional view of the adsorption disk of the present utility model.
In the figure: 1. an adjusting mechanism; 11. a carrier substrate; 12. fixing the support legs; 13. a guide groove; 14. a fixing frame; 15. a first rotating shaft; 16. a meshing gear; 17. a first slide bar with engagement teeth; 18. the second slide bar with engagement teeth; 19. a transmission belt; 110. a second rotating shaft; 111. a first rotating handle; 2. an adsorption mechanism; 21. an adsorption frame; 22. a two-way screw rod; 23. a second rotating handle; 24. a rod sleeve; 25. a chute; 26. a moving rod; 27. an adsorption plate; 271. a suction cup; 272. a vacuum bin; 273. an extraction opening; 28. an air pump; 29. an air pipe; 210. a three-way pipe fitting; 211. and an air outlet.
Detailed Description
The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
In order to solve the technical problem of how to adapt the substrate carrier to glass with different lengths, referring to fig. 1-3, the present embodiment provides the following technical solutions:
the utility model provides a horizontal magnetron sputtering coating machine base plate carrier device, including adjustment mechanism 1 and adsorption equipment 2, adjustment mechanism 1 includes carrier base plate 11 and first pivot 15, carrier base plate 11 passes through fixed stabilizer blade 12 detachable connection on horizontal magnetron sputtering coating machine's positioner, first pivot 15 and carrier base plate 11 swing joint, first pivot 15 is the symmetry setting from top to bottom and the top of first pivot 15 runs through carrier base plate 11 and is fixed with interlock gear 16, the side meshing of interlock gear 16 has first area interlock tooth slide bar 17 and second area interlock tooth slide bar 18, the upper surface of carrier base plate 11 is fixed with guide way 13, the interior removal of guide way 13 is equipped with first area interlock tooth slide bar 17 and second area interlock tooth slide bar 18.
The lower surface of the carrier substrate 11 is welded with a fixing frame 14, the bottom end of a first rotating shaft 15 is movably connected with the fixing frame 14, a second rotating shaft 110 is rotatably arranged at the side end of the first rotating shaft 15, the second rotating shaft 110 is connected with the first rotating shaft 15 through a transmission belt 19, and a first rotating handle 111 is fixed at the top end of the second rotating shaft 110 penetrating through the carrier substrate 11.
Specifically, by manually rotating the first rotating handle 111, the first rotating handle 111 drives the second rotating shaft 110 to rotate, the second rotating shaft 110 drives the first rotating shaft 15 to rotate through the driving belt 19, the first rotating shaft 15 rotates to drive the meshing gear 16 fixed with the first rotating shaft 15 to rotate, and the meshing gear 16 rotates to drive the first meshing-tooth sliding rod 17 and the second meshing-tooth sliding rod 18 to do reverse translational motion, so that the distance between the adsorption frames 21 is adjusted, and the glass substrate fixing device is suitable for fixing glass substrates with different lengths.
It should be noted that the guide groove 13 is designed to make the movement of the first and second slide bars 17 and 18 more stable.
In order to solve the technical problem of how to adapt the substrate carrier to glass with different widths, referring to fig. 4, the present embodiment provides the following technical solutions:
the adsorption mechanism 2 comprises an adsorption frame 21 and an adsorption disc 27, the adsorption frame 21 is fixed at two side ends of the first slide bar 17 with the occluding teeth and the second slide bar 18 with the occluding teeth respectively, the adsorption disc 27 is movably arranged at the upper end of the adsorption frame 21, a bidirectional screw rod 22 is movably arranged in the adsorption frame 21, and one end of the bidirectional screw rod 22 penetrates through the adsorption frame 21 and is connected with a second rotating handle 23.
The bidirectional screw rod 22 is connected with a rod sleeve 24 in a threaded manner, the upper end of the rod sleeve 24 is connected with an adsorption disc 27 through a movable rod 26, a chute 25 is formed in the adsorption frame 21, and the movable rod 26 is movably arranged in the chute 25.
Specifically, by manually rotating the second rotating handle 23, the second rotating handle 23 drives the bidirectional screw rod 22 to rotate, and since the rod sleeve 24 is in threaded connection with the bidirectional screw rod 22, the rod sleeve 24 makes opposite or reverse translational movement on the bidirectional screw rod 22, and since the rod sleeve 24 is fixed with the adsorption disc 27 through the moving rod 26, the moving rod 26 slides in the sliding groove 25 and drives the adsorption disc 27 to make opposite or reverse movement while the rod sleeve 24 moves, so that the adjustment of the space between the adsorption discs 27 is realized, and the device is suitable for fixing glass substrates with different widths.
In order to solve the technical problem of how to improve the stability of the substrate carrier to the fixation of the glass substrate, referring to fig. 5, the present embodiment provides the following technical scheme:
the adsorption plate 27 comprises a sucking disc 271 and a vacuum bin 272, the sucking disc 271 is arranged at the upper end of the vacuum bin 272 and is in gas communication with the vacuum bin 272, and the vacuum bin 272 is hollow and has an extraction opening 273 at the bottom end.
The side end of the adsorption frame 21 is fixedly provided with an air pump 28, one end of the air pump 28 is connected with an air outlet 211 in a sealing way through an air pipe 29, the other end of the air pump 28 is connected with a three-way pipe fitting 210 in a sealing way, and the outside of the three-way pipe fitting 210 is connected with an air extraction opening 273 in a sealing way through the air pipe 29.
Specifically, by starting the air pump 28, the air pump 28 pumps out all air in the vacuum chamber 272 from the pumping hole 273 through the three-way pipe fitting 210 and the air pipe 29, and is discharged through the air outlet 211, and as the suction cup 271 is communicated with the air in the vacuum chamber 272, the air in the suction cup 271 is pumped out by the air pump 28, so that the adsorption force of the suction cup 271 is improved, and the stability of fixing the glass substrate is further enhanced.
Working principle: when the horizontal magnetron sputtering coating machine substrate carrier device is used, the first rotating handle 111 is manually rotated, the first rotating handle 111 drives the second rotating shaft 110 to rotate, the second rotating shaft 110 drives the first rotating shaft 15 to rotate through the transmission belt 19, the first rotating shaft 15 drives the meshing gear 16 fixed with the first rotating shaft 15 to rotate, the meshing gear 16 drives the first meshing toothed sliding rod 17 meshed with the meshing gear and the second meshing toothed sliding rod 18 to do reverse translational motion, the adjustment of the distance between the suction frames 21 is achieved until the distance is consistent with the length of a substrate to be coated, then the second rotating handle 23 is manually rotated, the second rotating handle 23 drives the bidirectional screw rod 22 to rotate, the bidirectional screw rod 22 rotates to drive the rod sleeve 24 to do reverse translational motion, the rod sleeve 24 drives the suction disc 27 to move through the moving rod 26, the distance between the suction disc 27 is adjusted until the distance is consistent with the width of the substrate to be coated, then the glass substrate is placed on the suction disc 27, and the air pump 28 pumps all air in the suction disc 271 and the vacuum bin 272 are pulled out, so that the suction force of the suction disc 271 is enhanced, and the glass substrate is fixed.
It is noted that relational terms such as first and second, and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Moreover, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.
Although embodiments of the present utility model have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made therein without departing from the principles and spirit of the utility model, the scope of which is defined in the appended claims and their equivalents.
Claims (7)
1. The utility model provides a horizontal magnetron sputtering coating machine base plate carrier device, includes adjustment mechanism (1) and adsorption mechanism (2), its characterized in that: the adjusting mechanism (1) comprises a carrier substrate (11) and a first rotating shaft (15), the carrier substrate (11) is detachably connected to a positioning device of the horizontal magnetron sputtering coating machine through a fixed support leg (12), the first rotating shaft (15) is movably connected with the carrier substrate (11), the first rotating shaft (15) is symmetrically arranged up and down, the top end of the first rotating shaft (15) penetrates through the carrier substrate (11) to be fixed with a meshing gear (16), and the side end of the meshing gear (16) is meshed with a first meshing tooth sliding rod (17) and a second meshing tooth sliding rod (18);
the adsorption mechanism (2) comprises an adsorption frame (21) and an adsorption disc (27), the adsorption frame (21) is fixed at two side ends of a first slide bar (17) with occluding teeth and a second slide bar (18) with occluding teeth respectively, the adsorption disc (27) is movably arranged at the upper end of the adsorption frame (21), the adsorption disc (27) comprises a sucking disc (271) and a vacuum bin (272), the sucking disc (271) is arranged at the upper end of the vacuum bin (272) and is communicated with the vacuum bin (272) in a gas mode, and an extraction opening (273) is formed in the hollow inside of the vacuum bin (272) and in the bottom end of the vacuum bin.
2. The substrate carrier device of a horizontal magnetron sputtering coating machine according to claim 1, wherein: the upper surface of the carrier substrate (11) is fixedly provided with a guide groove (13), and a first sliding rod (17) with engagement teeth and a second sliding rod (18) with engagement teeth are arranged in the guide groove (13).
3. The substrate carrier device of a horizontal magnetron sputtering coating machine according to claim 1, wherein: the lower surface welding of carrier base plate (11) has mount (14), the bottom and the mount (14) swing joint of first pivot (15), the side of first pivot (15) rotates and is equipped with second pivot (110), and second pivot (110) link to each other with first pivot (15) through drive belt (19), and the top of second pivot (110) runs through carrier base plate (11) and is fixed with first knob (111).
4. The substrate carrier device of a horizontal magnetron sputtering coating machine according to claim 1, wherein: the adsorption frame (21) is internally and movably provided with a bidirectional screw rod (22), and one end of the bidirectional screw rod (22) penetrates through the adsorption frame (21) to be connected with a second rotating handle (23).
5. The substrate carrier device of a horizontal magnetron sputtering coating machine according to claim 4, wherein: the bidirectional screw rod (22) is connected with a rod sleeve (24) in a threaded manner, and the upper end of the rod sleeve (24) is connected with an adsorption disc (27) through a movable rod (26).
6. The substrate carrier device of a horizontal magnetron sputtering coating machine according to claim 1, wherein: a chute (25) is formed in the adsorption frame (21), and a moving rod (26) is movably arranged in the chute (25).
7. The substrate carrier device of a horizontal magnetron sputtering coating machine according to claim 1, wherein: the side end of adsorption frame (21) is fixed with air pump (28), and air pump (28) one end is passed through trachea (29) sealing connection and is had gas outlet (211), and air pump (28) other end sealing connection has tee bend pipe fitting (210), and tee bend pipe fitting (210) are passed through trachea (29) and extraction opening (273) sealing connection outward.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321327877.2U CN219824337U (en) | 2023-05-29 | 2023-05-29 | Substrate carrier device of horizontal magnetron sputtering coating machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321327877.2U CN219824337U (en) | 2023-05-29 | 2023-05-29 | Substrate carrier device of horizontal magnetron sputtering coating machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN219824337U true CN219824337U (en) | 2023-10-13 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202321327877.2U Active CN219824337U (en) | 2023-05-29 | 2023-05-29 | Substrate carrier device of horizontal magnetron sputtering coating machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN219824337U (en) |
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2023
- 2023-05-29 CN CN202321327877.2U patent/CN219824337U/en active Active
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