CN219657482U - HF concentration detection device in uranium enrichment process system - Google Patents
HF concentration detection device in uranium enrichment process system Download PDFInfo
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- CN219657482U CN219657482U CN202223038901.9U CN202223038901U CN219657482U CN 219657482 U CN219657482 U CN 219657482U CN 202223038901 U CN202223038901 U CN 202223038901U CN 219657482 U CN219657482 U CN 219657482U
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- 238000001514 detection method Methods 0.000 title claims abstract description 46
- 229910052770 Uranium Inorganic materials 0.000 title claims abstract description 26
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 title claims abstract description 26
- 238000000034 method Methods 0.000 title claims description 45
- 238000010521 absorption reaction Methods 0.000 claims description 37
- 238000005070 sampling Methods 0.000 claims description 23
- 238000003795 desorption Methods 0.000 claims description 16
- 230000003287 optical effect Effects 0.000 claims description 9
- 238000002372 labelling Methods 0.000 claims description 8
- 238000002386 leaching Methods 0.000 claims description 4
- 238000012544 monitoring process Methods 0.000 claims description 4
- 238000005260 corrosion Methods 0.000 claims description 3
- 230000007797 corrosion Effects 0.000 claims description 3
- 229910052594 sapphire Inorganic materials 0.000 claims description 3
- 239000010980 sapphire Substances 0.000 claims description 3
- 238000011144 upstream manufacturing Methods 0.000 claims description 3
- 230000003321 amplification Effects 0.000 claims 1
- 238000003199 nucleic acid amplification method Methods 0.000 claims 1
- 238000005516 engineering process Methods 0.000 abstract description 13
- 230000035945 sensitivity Effects 0.000 abstract description 4
- 239000007789 gas Substances 0.000 description 55
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 7
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 7
- 238000000605 extraction Methods 0.000 description 5
- 239000000523 sample Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000000862 absorption spectrum Methods 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000011148 porous material Substances 0.000 description 4
- 238000004445 quantitative analysis Methods 0.000 description 4
- 238000001228 spectrum Methods 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- 238000000357 thermal conductivity detection Methods 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000001186 cumulative effect Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001285 laser absorption spectroscopy Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- SANRKQGLYCLAFE-UHFFFAOYSA-H uranium hexafluoride Chemical compound F[U](F)(F)(F)(F)F SANRKQGLYCLAFE-UHFFFAOYSA-H 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 238000004566 IR spectroscopy Methods 0.000 description 1
- 229910000792 Monel Inorganic materials 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
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- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004868 gas analysis Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000010249 in-situ analysis Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 238000001307 laser spectroscopy Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000004451 qualitative analysis Methods 0.000 description 1
- 238000011155 quantitative monitoring Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
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Abstract
The utility model belongs to the technical field of uranium enrichment technology, and particularly discloses an HF concentration detection device in a uranium enrichment technology system. The utility model has low sensitivity and wide application range of temperature and pressure.
Description
Technical Field
The utility model belongs to the technical field of uranium enrichment processes, and particularly relates to an HF concentration detection device in a uranium enrichment process system.
Background
Hydrogen fluoride is one of the products of the reaction of uranium hexafluoride with water. Because of the wide presence of water, systems with uranium hexafluoride as the working medium may contain hydrogen fluoride. In the uranium concentration production process, the concentration of hydrogen fluoride is always an important control parameter from the processes of raw material purification, concentration, tail gas treatment and the like because of the safety or the requirement of the process. At present, indirect methods such as heat conduction sensing or pressure judgment are common in the industry.
The detection method of HF mainly includes ion selective electrode, electrochemical probe, ion chromatograph, thermal conductivity detection, infrared spectrum, etc. The thermal conductivity detection and the infrared spectrometry can be used as a process on-line analysis means, the thermal conductivity detection belongs to a semi-quantitative method, components cannot be identified, and the pressure and the flow velocity of a material flow can influence the detection result.
HF gas has absorption peaks in both near infrared and mid infrared regions, so gas detection techniques using infrared laser spectroscopy are considered to be ideal methods for continuous in-situ detection of HF gas at present.
Measurement principle: each gas molecule can be absorbed by resonance with photons of a specific wavelength, so that an absorption spectrum can be used as a fingerprint for identifying different gas molecules, the light absorption intensity obeys Beer-Lambert law, and the integral absorbance of a certain isolated absorption line can be expressed as:
the composition and concentration of the molecules can be determined from the wavelength and intensity of the absorption line. The HF gas molecule has typical spectral strong absorption characteristic in near infrared band (1260-1320 nm), the detection limit can reach 1ppm when the effective optical path is 1m, and the gas concentration is measured according to the 'frequency-selective absorption' of the gas molecule to the laser energy, and the actual online in-situ analysis of the gas is performed. The method utilizes single line spectrum and modulation spectrum technology to avoid cross interference of impurity gas and continuously monitor gas to be measured on site; the technology has the advantages of sensitivity, high selectivity, dynamic and rapid calculation, quantitative calculation and long service period.
TLAS (Tunable Laser Absorption Spectroscopy) is simply called diode laser absorption spectrum, and the detection principle is that a semiconductor tunable laser absorption spectrum technology is adopted to analyze and measure the concentration of a gas to be measured for a certain specific wavelength spectral line, namely, a certain characteristic spectral line of the gas to be measured. With the development of semiconductor laser gas analysis technology, semiconductor laser gas measurement technology has gradually replaced the conventional gas detection technology. The TLAS technology has the advantages of being capable of adapting to the detected gas environment with high temperature, high moisture, high dust, strong corrosiveness and high flow rate, and being free of a sampling pretreatment system, and being capable of realizing large-scale gas high-sensitivity continuous online detection by combining the TLAS technology with a modulation spectrum signal and a long-optical-path optical technology, and meeting the requirements of industrial process HF gas online detection and process system safety monitoring.
Currently, the detection of the HF concentration of a process system of the nuclear industry is temporarily unavailable in China by utilizing a tunable diode laser absorption technology.
Disclosure of Invention
The utility model aims to provide an HF concentration detection device in a uranium enrichment process system, which is based on a diode laser absorption spectroscopy (TLAS), and comprises a signal generator, a laser driver, a laser, a labeling gas tank, an infrared gas absorption tank, a detector and a phase-locked amplifier to form a pipeline extraction type HF detector, wherein the output wavelength of the laser is tuned by changing the input current or temperature of the laser so as to scan a single or a plurality of complete absorption lines of gas molecules, so that a high-resolution gas absorption spectrum is obtained, and the spectrum is analyzed to obtain HF gas parameter information. The device can effectively solve the defects of short service cycle, low sensitivity, small application range of temperature and pressure, incapability of quantitative analysis and the like in the prior HF detection.
The technical scheme for realizing the purpose of the utility model comprises the following steps:
the device comprises a signal generator, a laser driver, a laser, an infrared gas absorption tank, a detector, a phase-locked amplifier and a computer, wherein the signal generator, the laser driver, the laser, the infrared gas absorption tank, the detector, the phase-locked amplifier and the computer are sequentially connected, the signal generator outputs a high-frequency sine wave and a low-frequency sawtooth wave to obtain a superimposed voltage signal of the high-frequency sine wave and the low-frequency sawtooth wave, the superimposed voltage signal is transmitted to the laser driver, the laser driver converts the superimposed voltage signal into a current signal and transmits the current signal to the laser, the laser controls the laser emission wavelength, the laser is transmitted to the detector through the infrared gas absorption tank, the detector receives an optical signal containing absorption information, the optical signal is converted into an electric signal and is transmitted to the phase-locked amplifier after being amplified by a fixed multiple, the phase-locked amplifier outputs a harmonic signal, and the harmonic signal is transmitted to the computer, and the superimposed voltage signal is transmitted to the computer to obtain the cumulative amount of the concentration and the volume of HF.
The device also comprises a labeling gas pool, wherein the labeling gas pool is connected with the laser and used for receiving the laser emission wavelength transmitted by the laser.
The device also comprises a detector, and the detector is connected with the phase-locked amplifier for monitoring harmonic signals.
The detector comprises a desorption device inlet, a flow meter orifice plate, a sampling valve, an outlet valve, a differential pressure flowmeter, a second valve and an HF detector host, wherein the desorption device inlet, the flow meter orifice plate and the sampling orifice plate are sequentially connected, the flow meter orifice plate is connected with a computer through the second valve and the differential pressure flowmeter, the sampling orifice plate is connected with the HF detector host through the outlet valve and a gas absorption tank, the HF detector host is connected with the computer, and the HF detector host is connected with an HF leaching tower through the gas absorption tank and the sampling valve.
The detector also comprises a temperature sensor which is connected between the inlet of the desorption device and the computer.
The detector also comprises a pressure sensor connected between the upstream of the sampling orifice plate and the HF detector host.
The detector also includes a first valve coupled between the downstream of the flow meter orifice and the differential pressure flow meter.
The infrared gas absorption cell uses a corrosion-resistant sapphire window sheet, a 3-layer shell.
The beneficial technical effects of the utility model are as follows:
1. the HF concentration detection device in the uranium enrichment process system provided by the utility model adopts the novel HF detector, so that the HF concentration detection sensitivity is improved, and the real-time measurement detection range and quantitative analysis are realized;
2. according to the HF concentration detection device in the uranium enrichment process system, a TLAS technology is adopted to replace a traditional electrochemical principle HF concentration detection mode, so that the service life is longer; and the performance is reliable and stable through testing in the actual production process.
3. The HF concentration detection device in the uranium enrichment process system provided by the utility model expands the detection pressure of HF to 5KPa-300KPa and expands the detection temperature of HF to 16-300 ℃.
4. The HF detector host in the HF concentration detection device in the uranium enrichment process system provided by the utility model has the capability of instantaneous concentration and accumulated volume, and overcomes the defect that the traditional detector can only perform qualitative analysis.
5. According to the utility model, the metal protective cover is added to the gas absorption tank in the HF concentration detection device in the uranium enrichment process system, so that the safety is improved.
Drawings
FIG. 1 is a block diagram of an HF concentration detection device in a uranium enrichment process system provided by the present utility model;
fig. 2 is a process flow diagram of a detector in an HF concentration detection device in a uranium enrichment process system provided by the present utility model.
In the figure:
1-a signal generator; a 2-laser driver; a 3-laser; 4-labeling a gas pool; 5-an infrared gas absorption cell; 6-a detector; 7-a detector; an 8-lock-in amplifier; 9-a computer; a 10-HF leaching tower;
61-a desorption device inlet; 62-flowmeter orifice plate; 63-sampling well plate; 65-sampling valve; 67-outlet valve; 68-a pressure sensor; 69-a first valve; 610 differential pressure flow meter; 611-a second valve; 612—a temperature sensor; 614-HF detector host.
Detailed Description
The utility model is described in further detail below with reference to the drawings and examples.
As shown in fig. 1, the HF concentration detection device in the uranium enrichment process system provided by the utility model comprises a detector 6, a computer 9, a photoelectric device, an air circuit and a connecting device; the photoelectric device includes: a signal generator 1, a laser driver 2, a laser 3, a lock-in amplifier 8, a computer system 9; the connection device includes: an optical electronic connection device, a fixing device; the gas circuit part includes: a gas to be detected in the pipeline, an infrared gas absorption tank 5 and the like.
The signal generator 1, the laser driver 2, the laser 3, the infrared gas absorption cell 5, the detector 6, the lock-in amplifier 8 and the computer 9 are sequentially connected, the signal generator 1 outputs a high-frequency sine wave and a low-frequency sawtooth wave, a superimposed voltage signal of the high-frequency sine wave and the low-frequency sawtooth wave is obtained, the superimposed voltage signal is transmitted to the laser driver 2, the laser driver 2 converts the superimposed voltage signal into a current signal and transmits the current signal to the diode laser 3, the diode laser 3 controls the laser emission wavelength, the light signal containing absorption information is transmitted to the detector 6 through the infrared gas absorption cell 5, the detector 6 receives the light signal, the light signal is converted into an electric signal, the electric signal is amplified by a fixed multiple and then is transmitted to the lock-in amplifier 8, the lock-in amplifier 8 outputs a harmonic signal, the harmonic signal is transmitted to the computer 9, and the cumulative amount of concentration and volume of HF is obtained through processing.
The HF concentration detection device in the uranium enrichment process system further comprises a labeling gas tank 4 and a detector 7, wherein the labeling gas tank 4 is connected with the laser 3 and receives laser emission wavelength transmitted by the laser 3; the detector 7 is connected to a lock-in amplifier 8 for monitoring the harmonic signal.
The HF concentration detection flow of the HF concentration detection device in the uranium enrichment process system provided by the utility model is as follows:
the method comprises the steps that a process pipeline is connected with sampling HF gas, a high-frequency sine wave (modulation signal) and a low-frequency sawtooth wave (scanning signal) are output through a signal generator 1, and the high-frequency sine wave (modulation signal) and the low-frequency sawtooth wave (scanning signal) which drives the wavelength change of a laser are sent into an adder together to obtain a superposition signal of the high-frequency sine wave (modulation signal) and the low-frequency sawtooth wave (scanning signal); the superimposed voltage signal is sent to the laser driver 2, the voltage signal is converted into a current signal and is applied to the diode laser 3, and meanwhile, the diode laser 3 is subjected to accurate current and temperature control, so that the emission wavelength is controlled, and overload protection of current and temperature is provided; the diode laser 3 is controlled by the laser driver 2 to emit modulated laser with a certain wavelength range for scanning, an optical signal is collimated by a collimator after passing through an infrared gas absorption tank 5 (sample absorption) in an air chamber, the optical signal containing absorption information is received by a photoelectric detector 6 and converted into an electric signal to be sent to a preamplifier, the electric signal is amplified by a fixed multiple and then is input to a signal input end of a phase-locked amplifier 8, and a certain harmonic signal is detected in the phase-locked amplifier 8 together with a reference signal generated by a signal generator; the gas absorption tank adopts 0.5m and reflects once; the phase-locked amplifier 8 (phase-locked module) outputs a harmonic signal, then inputs the harmonic signal into the computer for the data acquisition card, and after AD conversion, sends the harmonic signal into the computer 9 for acquisition and corresponding processing and operation, thus obtaining the accumulation of concentration and volume of HF.
The infrared gas absorption cell 5 uses a corrosion-resistant sapphire window sheet and a 3-layer shell, so that leakage can not occur in the detection process.
As shown in fig. 2, the detector 6 includes a desorption device inlet 61, a flow meter orifice 62, a sampling orifice 63, a sampling valve 65, an outlet valve 67, a pressure sensor 68, a first valve 69, a differential pressure flow meter 610, a second valve 611, a temperature sensor 612, and an HF detector host 614.
The desorption device inlet 61, the flowmeter orifice plate 62 and the sampling orifice plate 63 are sequentially connected, and the desorption device inlet 61 is connected with the computer 9 through the temperature sensor 612; the flowmeter orifice plate 62 is connected with the computer 9 through a second valve 611 and a differential pressure flowmeter 610, and a first valve 69 is connected between the downstream of the flowmeter orifice plate 62 and the differential pressure flowmeter 610; the sampling pore plate 63 is connected with the HF detector main machine 614 through the outlet valve 67 and the gas absorption tank 5, the pressure sensor 68 is connected between the upstream of the sampling pore plate 63 and the HF detector main machine 614, and the sampling valve 65 is connected between the downstream of the sampling pore plate 63 and the gas absorption tank 5; the HF detector host 614 is connected to the computer 9; the HF detector main unit 614 is connected with the HF leaching tower 10 through the gas absorption cell 5 and the sampling valve 65.
The HF concentration detection device in the uranium enrichment process system provided by the utility model is used for carrying out HF concentration detection, and comprises the following operation steps:
and (1) selecting an adsorption and desorption process system, installing a pipeline extraction type hydrogen fluoride detector, and carrying out on-line measurement, display and alarm on the concentration of HF gas in a desorption process pipeline. The standard orifice plate flange is made of 316L material, and is welded with the main desorption process pipeline by argon arc welding after the desorption process pipeline is cut; the flange material of the orifice plate flowmeter is Monel material, and after the desorption process pipeline is cut, the orifice plate flange and the process pipeline are welded by argon arc welding; the gas in the desorption process pipeline is extracted through an air inlet pipe, an air inlet valve, an analysis air chamber and an air return pipe;
and (2) in the process of desorbing HF in the NaF adsorption tower by controlling the temperature, generating a pressure difference by using a pore plate to sample and analyze the concentration of the pipeline HF, switching on the pipeline HF, and after the analysis instrument is normally started, enabling the instrument to enter a working state, slowly opening an air inlet valve, enabling sample gas to enter an air chamber, and displaying the current sample gas value by the instrument. Detecting and receiving the detection data through laser contrast by absorbing the HF in the gas absorption tank, and alarming and interlocking when the concentration detection value of the HF is lower than a set value;
step (3), after the analyzer is used, applying N 2 Cleaning the analysis air chamber, closing the air inlet valve after cleaning, closing the air inlet valve, and removingThe analyzer is not used for a long time, and the air switch is not required to be closed generally;
step (4) by testing the developed HF detector in the actual process, it can be found from the data in Table 1 that as the test proceeds, the temperature of the tail gas is increased and then kept stable, the concentration of HF is increased and then reduced, and finally the HF accumulation volume is measured to be 2.02m 3 . The pipeline extraction type hydrogen fluoride detector developed by the method can normally operate, various detection values and detection ranges meet design requirements, and the pipeline extraction type hydrogen fluoride detector can be used for on-site quantitative analysis and monitoring.
Table 1 pipeline extraction type hydrogen fluoride detector test result table
The present utility model has been described in detail with reference to the drawings and the embodiments, but the present utility model is not limited to the embodiments described above, and various changes can be made within the knowledge of those skilled in the art without departing from the spirit of the present utility model. The utility model may be practiced otherwise than as specifically described.
Claims (7)
1. The HF concentration detection device in the uranium enrichment process system is characterized by comprising a signal generator (1), a laser driver (2), a laser (3), an infrared gas absorption tank (5), a detector (6), a phase-locked amplifier (8) and a computer (9), wherein the signal generator (1), the laser driver (2), the laser (3), the infrared gas absorption tank (5), the detector (6), the phase-locked amplifier (8) and the computer (9) are sequentially connected, the signal generator (1) outputs a high-frequency sine wave and a low-frequency sawtooth wave to obtain a superposition voltage signal of the high-frequency sine wave and the low-frequency sawtooth wave, the superposition voltage signal is transmitted to the laser driver (2), the laser driver (2) converts the superposition voltage signal into a current signal and transmits the current signal to the laser (3), the laser (3) controls the laser emission wavelength, the infrared gas absorption tank (5) is transmitted to the detector (6), the detector (6) receives an optical signal containing absorption information, converts the optical signal into an electrical signal, performs fixed multiple amplification and transmits the electrical signal to the amplifier (8), and outputs a harmonic wave to the frequency-locked amplifier (8), and the harmonic wave is processed by the computer (9);
the detector (6) comprises a desorption device inlet (61), a flow meter orifice plate (62), a sampling orifice plate (63), a sampling valve (65), an outlet valve (67), a differential pressure flowmeter (610), a second valve (611) and an HF detector host (614), wherein the desorption device inlet (61), the flow meter orifice plate (62) and the sampling orifice plate (63) are sequentially connected, the flow meter orifice plate (62) is connected with a computer (9) through the second valve (611) and the differential pressure flowmeter (610), the sampling orifice plate (63) is connected with the HF detector host (614) through the outlet valve (67) and the infrared gas absorption tank (5), the HF detector host (614) is connected with the computer (9), and the HF detector host (614) is connected with the HF leaching tower (10) through the infrared gas absorption tank (5) and the sampling valve (65).
2. The HF concentration detection device in a uranium concentration process system according to claim 1, further including a labeling gas tank (4), the labeling gas tank (4) being connected to the laser (3) and receiving a laser emission wavelength transmitted by the laser (3).
3. The HF concentration detection device in a uranium enrichment process system according to claim 2, further comprising a detector (7), the detector (7) being connected to a lock-in amplifier (8) for harmonic signal monitoring.
4. The HF concentration detection device in a uranium concentration process system according to claim 1, wherein the detector (6) further includes a temperature sensor (612), the temperature sensor (612) being connected between the desorption device inlet (61) and the computer (9).
5. The HF concentration detection device in a uranium enrichment process system according to claim 4, wherein the detector (6) further includes a pressure sensor (68), the pressure sensor (68) being connected between an upstream of the sampling orifice (63) and an HF detector host (614).
6. The HF concentration detection device in a uranium concentration process system of claim 5, wherein the detector (6) further includes a first valve (69), the first valve (69) being connected between a downstream of the flow meter orifice (62) and a differential pressure flow meter (610).
7. The HF concentration detection device in a uranium concentration process system according to claim 6, wherein the infrared gas absorption cell (5) uses a corrosion resistant sapphire window, a 3-layer housing.
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