CN219609440U - Conveying mechanism of exposure machine - Google Patents

Conveying mechanism of exposure machine Download PDF

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Publication number
CN219609440U
CN219609440U CN202321041859.8U CN202321041859U CN219609440U CN 219609440 U CN219609440 U CN 219609440U CN 202321041859 U CN202321041859 U CN 202321041859U CN 219609440 U CN219609440 U CN 219609440U
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CN
China
Prior art keywords
protective cover
clamping
hook
exposure machine
conveying mechanism
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Active
Application number
CN202321041859.8U
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Chinese (zh)
Inventor
李华
王晓军
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Shanghai Tanyue Semiconductor Equipment Co ltd
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Shanghai Tanyue Semiconductor Equipment Co ltd
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Priority to CN202321041859.8U priority Critical patent/CN219609440U/en
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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

The utility model discloses a conveying mechanism of an exposure machine, which comprises a bracket, a conveyor belt arranged on the bracket, and further comprises: the protective cover is arranged at the top of the bracket, mounting openings are formed in two sides of the protective cover, an air inlet is formed in the top of the protective cover, and the air inlet is positioned at the feeding end of the conveyor belt; the observation window is arranged on the side surface of the protective cover and is used for sealing the mounting opening; the air supply pipe is connected with an air source and communicated with the air inlet; and the electric heater is arranged in the air supply pipe and is used for heating the gas in the air supply pipe. The utility model effectively isolates the contact between the wafer on the conveyor belt and the outside through the protective cover, and the heating gas sent out from the gas supply pipe dries the wafer, thereby effectively preventing the wafer from being damped and oxidized and avoiding the pollution and corrosion problem of the wafer in the conveying process.

Description

Conveying mechanism of exposure machine
Technical Field
The utility model relates to the technical field of semiconductor production, in particular to a conveying mechanism of an exposure machine.
Background
Silicon wafers, also known as wafers, are fabricated from silicon ingots, and millions of transistors can be etched on a silicon wafer by specialized processes, which are widely used in the fabrication of integrated circuits. Silicon belongs to a semiconductor material, and its conductivity is not very good. However, its resistivity can be precisely controlled by adding appropriate dopants. Before semiconductor fabrication, silicon must be converted to wafers. This begins with the growth of a silicon ingot. Monocrystalline silicon is a solid in which atoms periodically form in a three-dimensional spatial pattern that extends throughout the material. Polysilicon is formed as a single crystal of a plurality of small single crystals having different crystal orientations, and cannot be used as a semiconductor circuit. The polysilicon must be melted into a single crystal for processing into wafers used in semiconductor applications. Processing silicon wafers to produce a silicon ingot takes a week to a month, depending on many factors, including size, quality and end-user requirements. More than 75% of single crystal silicon wafers are grown by the Czochralski method. Semiconductors or chips are produced from silicon. Millions of transistors are etched into a wafer, which are hundreds of times finer than human hair. Semiconductors manage data by controlling current to form various words, numbers, sounds, images and colors. They are widely used in integrated circuits and indirectly by everyone on earth. Some of these applications are everyday applications such as computer, telecommunications and television, and still others are in advanced microwave delivery, laser conversion systems, medical diagnostic and therapeutic equipment, defense systems and NASA space shuttle.
At present, a wafer is an indispensable semiconductor material, and is extremely easy to be corroded by air pollution in the production and transportation processes, so that a conveying mechanism of an exposure machine is provided, and the problem of air pollution and corrosion of wafers in the transportation processes is effectively avoided.
Disclosure of Invention
In order to solve the problems in the prior art, the utility model provides a conveying mechanism of an exposure machine, which effectively solves the problem of air pollution and corrosion of wafers in the transportation process.
In order to achieve the above purpose, the present utility model adopts the following technical scheme:
the utility model provides a conveying mechanism of exposure machine, includes support and installs the conveyer belt on the support, still includes:
the protective cover is arranged at the top of the bracket, mounting openings are formed in two sides of the protective cover, an air inlet is formed in the top of the protective cover, and the air inlet is positioned at the feeding end of the conveyor belt;
the observation window is arranged on the side surface of the protective cover and is used for sealing the mounting opening;
the air supply pipe is connected with an air source and communicated with the air inlet;
and the electric heater is arranged in the air supply pipe and is used for heating the gas in the air supply pipe.
Further, one side of the protection cover is rotationally connected with the support, and the other side of the protection cover is in clamping fit with the support through a clamping structure.
Further, the clamping structure comprises a clamping hook and a clamping plate, a sliding groove matched with the clamping hook in a sliding manner is formed in the top of the support, a guide surface capable of being contacted with the clamping plate is formed in a chamfer at the top of the clamping hook, the clamping plate is formed by inwards folding a side plate of the protection plate, the clamping plate can be matched with the clamping hook in a clamping manner, a spring is arranged on one side, close to the rotating end of the protection cover, of the clamping hook, and a limiting block is arranged on the support and is abutted against the end part of the spring;
in the initial state, the two ends of the spring are respectively abutted against the clamping hook and the limiting block, and the end part of the clamping hook is abutted against the end part of the sliding groove.
Further, be provided with the push rod that can run through the pothook on the pothook, set up in the spout with push rod complex locating hole, promote the push rod, the pothook slides and compresses the spring towards one side of stopper, works as the push rod is located directly over the locating hole, the cardboard can break away from with the pothook, the push rod inserts in the locating hole and fixes a position the position of pothook.
Further, a connecting pipe is arranged at the top of the protective cover and is fixedly connected with the air supply pipe.
Further, the electric heater is installed in the connection pipe.
Further, a lamp body structure is arranged at the top of the protective cover.
Further, the lamp body structure includes LED lamp and lamp shade, the top at the protection casing is installed to the LED lamp, the lamp shade is even light board, the lamp shade sets up along the length direction of protection casing.
Compared with the prior art, the utility model has the following beneficial effects:
according to the utility model, the protective cover is arranged on the conveyor belt, so that the wafers in the conveying process are effectively protected, dust in the air is prevented from falling onto the wafers, and meanwhile, heated gas is introduced into the top of the protective cover, so that the wafers are dried, the wafers are effectively prevented from being damped and oxidized, and the pollution and corrosion problems of the wafers in the conveying process are avoided;
according to the utility model, one end of the protective cover is rotatably arranged with the support, the other end of the protective cover is clamped and installed on the support, when the conveyor belt fails, the clamping between the protective cover and the support is released, and the protective cover is turned over to one side of the support, so that the conveyor belt is convenient to maintain;
the lamp body structure is arranged at the top of the protective cover and is used for lighting, and when the external environment is darker, the light rays emitted by the lamp body structure irradiate on the products of the conveyor belt, so that the conveying condition of the wafer can be conveniently observed through the observation window.
Drawings
FIG. 1 is a schematic overall structure of an embodiment of the present utility model;
FIG. 2 is a side view of an embodiment of the present utility model;
FIG. 3 is a schematic view of a protective cover according to an embodiment of the present utility model;
fig. 4 is a schematic cross-sectional view of an embodiment of the present utility model.
The reference numerals of the drawings:
1. a bracket; 11. a chute; 12. positioning holes; 2. a conveyor belt; 3. a protective cover; 31. a connecting pipe; 32. an air outlet; 4. an observation window; 5. an air supply pipe; 51. a pump body; 52. a gas source; 6. a heater; 7. a hinge; 8. a clamping structure; 81. a clamping hook; 82. a clamping plate; 83. a spring; 84. a limiting block; 85. a push rod; 9. a lamp body structure.
Detailed Description
The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments.
The utility model provides a conveying mechanism of an exposure machine.
As shown in fig. 1 to 4, the conveying mechanism of the exposure machine comprises a bracket 1, a conveyor belt 2, a protective cover 3, an observation window 4, an air supply pipe 5 and an electric heater 6.
Wherein, the conveyer belt 2 is installed on the support 1, and conveyer belt 2 and support 1 are conventional structure in prior art.
The protection casing 3 is the housing of stainless steel or aluminum alloy structure, and protection casing 3 installs at the top of support 1, and protection casing 3 is used for covering conveyer belt 2 and establishes. The installing port has been seted up to the both sides of protection casing 3, and observation window 4 fixed mounting is in the side of protection casing 3, and observation window 4 is used for sealing the installing port. An air inlet is formed in the top of the protective cover 3 and is located at the feeding end of the conveyor belt 2, the air supply pipe 5 is connected with an air source 52 and is communicated with the air inlet, and the air source 52 is oxygen or nitrogen. An electric heater 6 is installed in the air feed pipe 5, and the electric heater 6 is used for heating the air in the air feed pipe 5.
When the protective cover 3 is used, dust in the air is prevented from falling onto the wafers, and heated gas is introduced from the top of the protective cover 3 to dry the wafers, so that the wafers are effectively prevented from being damped and oxidized, and the pollution and corrosion problems of the wafers in the conveying process are avoided.
As shown in fig. 1 and 2, in this embodiment, one side of the protection cover 3 is rotationally connected with the support 1 through the hinges 7, the number of the hinges 7 is two, the two hinges are uniformly distributed on the protection cover 3, and the other side of the protection cover 3 is in clamping fit with the support 1 through the clamping structure 8.
The number of the clamping structures 8 is two, the two clamping structures 8 are uniformly distributed on the protective cover 3, one of the clamping structures 8 is elaborated, and the clamping structures 8 comprise a clamping hook 81, a clamping plate 82, a spring 83 and a limiting plate.
The hook 81 is formed by three plates, including a bottom plate, a connecting plate and a hook plate, and two ends of the connecting plate are respectively fixed with the ends of the bottom plate and the hook plate.
The top of the bracket 1 is provided with a sliding groove 11 which is in sliding fit with the bottom plate of the clamping hook 81, the sliding groove 11 is communicated with the inner side surface of the bracket 1, and the sliding groove 11 is T-shaped. The top chamfer of the hook plate of the hook 81 is provided with a guide surface which can be contacted with the clamping plate 82, the clamping plate 82 is formed by inwards folding the side plate of the protection plate, and the clamping plate 82 can be matched with the hook 81 in a clamping way.
A spring 83 is arranged on one side of the clamping hook 81, which is close to the rotating end of the protective cover 3, a limiting block 84 is fixed on the support 1, and the limiting block 84 is abutted against the end part of the spring 83. In the initial state, two ends of the spring 83 respectively collide with the hook 81 and the limiting block 84, and the end of the bottom plate of the hook 81 collides with the end of the chute 11.
In order to facilitate the connection between the protective cover 3 and the bracket 1, a push rod 85 capable of penetrating the hook 81 is mounted on the bottom plate of the hook 81, and a positioning hole 12 matched with the push rod 85 is formed in the chute 11. When the clamping fixation of the protective cover 3 and the support 1 is released, the push rod 85 is pushed, the clamping hook 81 slides towards one side of the limiting block 84 and compresses the spring 83, the push rod 85 moves to be positioned right above the positioning hole 12, at the moment, the clamping plate 82 can be separated from the clamping hook 81, the push rod 85 is inserted into the positioning hole 12 to position the clamping hook 81, and the protective cover 3 can be overturned to the other side of the support 1.
In addition, in order to facilitate the overturning of the protective cover 3, a handle can be arranged on the protective cover 3, and the protective cover 3 is driven to move by grasping the handle.
In this embodiment, a connecting pipe 31 is fixed on the top of the protective cover 3, an electric heater 6 is installed in the connecting pipe 31, the connecting pipe 31 is fixedly connected with an air supply pipe 5, the air supply pipe 5 is connected with an air source 52 through a pump body 51, and the air source 52 is in a tank structure for filling oxygen or nitrogen.
When the environment is dark, the wafer is transported through the observation window 4, which is inconvenient. Thus, a lamp body structure 9 is mounted on top of the protective cover 3.
The lamp body structure 9 includes LED lamp and lamp shade, and the top at protection casing 3 is installed to the LED lamp, and the lamp shade is even light board, and the lamp shade sets up along the length direction of protection casing 3, and even light board makes the light that the LED lamp sent evenly shine on conveyer belt 2, is convenient for see the transportation condition of wafer through observation window 4.
The foregoing is only a preferred embodiment of the present utility model, but the scope of the present utility model is not limited thereto, and any person skilled in the art, who is within the scope of the present utility model, should make equivalent substitutions or modifications according to the technical scheme of the present utility model and the inventive concept thereof, and should be covered by the scope of the present utility model.

Claims (8)

1. The utility model provides a conveying mechanism of exposure machine, includes support (1) and installs conveyer belt (2) on support (1), its characterized in that still includes:
the protective cover (3), the protective cover (3) is arranged at the top of the bracket (1), mounting openings are formed in two sides of the protective cover (3), an air inlet is formed in the top of the protective cover (3), and the air inlet is located at the feeding end of the conveyor belt (2);
the observation window (4) is arranged on the side surface of the protective cover (3), and the observation window (4) is used for sealing the mounting opening;
the air supply pipe (5) is connected with the air source (52) and communicated with the air inlet;
and an electric heater (6), wherein the electric heater (6) is installed in the air supply pipe (5), and the electric heater (6) is used for heating the gas in the air supply pipe (5).
2. The conveying mechanism of an exposure machine according to claim 1, wherein one side of the protective cover (3) is rotationally connected with the support (1), and the other side of the protective cover (3) is in clamping fit with the support (1) through a clamping structure (8).
3. The conveying mechanism of an exposure machine according to claim 2, wherein the clamping structure (8) comprises a clamping hook (81) and a clamping plate (82), a sliding groove (11) which is in sliding fit with the clamping hook (81) is formed in the top of the support (1), a guide surface which can be in contact with the clamping plate (82) is formed by chamfering the top of the clamping hook (81), the clamping plate (82) is formed by inwards folding a side plate of the protection plate, the clamping plate (82) can be in clamping fit with the clamping hook (81), a spring (83) is arranged on one side, close to a rotating end of the protection cover (3), of the clamping hook (81), and a limiting block (84) is arranged on the support (1), and the limiting block (84) is in contact with the end part of the spring (83);
in an initial state, two ends of the spring (83) respectively collide with the clamping hook (81) and the limiting block (84), and the end part of the clamping hook (81) collides with the end part of the sliding groove (11).
4. A conveying mechanism of an exposure machine according to claim 3, characterized in that a push rod (85) capable of penetrating the hook (81) is arranged on the hook (81), a positioning hole (12) matched with the push rod (85) is formed in the sliding groove (11), the push rod (85) is pushed, the hook (81) slides towards one side of the limiting block (84) and compresses a spring (83), when the push rod (85) is located right above the positioning hole (12), the clamping plate (82) can be separated from the hook (81), and the push rod (85) is inserted into the positioning hole (12) to position the hook (81).
5. The conveying mechanism of an exposure machine according to claim 2, wherein a connecting pipe (31) is arranged at the top of the protective cover (3), and the connecting pipe (31) is fixedly connected with the air supply pipe (5).
6. A delivery mechanism of an exposure machine according to claim 5, characterized in that the electric heater (6) is mounted in a connecting pipe (31).
7. A delivery mechanism for an exposure machine according to claim 1, characterized in that the top of the protective cover (3) is provided with a lamp body structure (9).
8. The conveying mechanism of an exposure machine according to claim 7, wherein the lamp body structure (9) comprises an LED lamp and a lamp shade, the LED lamp is arranged at the top of the protective cover (3), the lamp shade is a light homogenizing plate, and the lamp shade is arranged along the length direction of the protective cover (3).
CN202321041859.8U 2023-05-05 2023-05-05 Conveying mechanism of exposure machine Active CN219609440U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202321041859.8U CN219609440U (en) 2023-05-05 2023-05-05 Conveying mechanism of exposure machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202321041859.8U CN219609440U (en) 2023-05-05 2023-05-05 Conveying mechanism of exposure machine

Publications (1)

Publication Number Publication Date
CN219609440U true CN219609440U (en) 2023-08-29

Family

ID=87742839

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202321041859.8U Active CN219609440U (en) 2023-05-05 2023-05-05 Conveying mechanism of exposure machine

Country Status (1)

Country Link
CN (1) CN219609440U (en)

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