CN219553575U

CN219553575U - Semiconductor etching workbench convenient to clean

Info

Publication number: CN219553575U
Application number: CN202222787233.3U
Authority: CN
Inventors: 全宰弘; 尹培云; 陈欣鑫
Original assignee: Yaxin Semiconductor Technology Wuxi Co ltd
Current assignee: Yaxin Semiconductor Technology Wuxi Co ltd
Priority date: 2022-10-24
Filing date: 2022-10-24
Publication date: 2023-08-18
Anticipated expiration: 2032-10-24

Abstract

The utility model discloses a semiconductor etching workbench convenient to clean, which comprises a frame body, wherein a clearance groove is formed in one side of the frame body, two guide frames are fixedly connected to the upper surface of the frame body, one ends of the guide frames are positioned in the clearance groove, sliding blocks are movably connected in the two guide frames, a fluted disc is movably connected to one side of the sliding blocks, a circular ring is fixedly connected to one side of the fluted disc, an auxiliary gear is movably connected to one side of the sliding blocks, and the auxiliary gear is meshed with the fluted disc. The utility model not only can eliminate the need of manual cleaning, reduce the labor capacity of workers, save time and improve the cleaning convenience of the semiconductor etching workbench, but also can prevent waste scraps from scattering on the ground, improve the cleaning efficiency of the semiconductor etching workbench, and also can prevent the semiconductor etching workbench from shaking when in use and improve the use stability of the semiconductor etching workbench.

Description

Semiconductor etching workbench convenient to clean

Technical Field

The utility model relates to the technical field of semiconductor processing, in particular to a semiconductor etching workbench convenient to clean.

Background

The etching technology is a technology for selectively etching or stripping the surface of the semiconductor substrate or the surface covering film according to mask patterns or design requirements in the semiconductor process, and the etching can be divided into wet etching and dry etching, wherein an etching machine is required for etching the semiconductor, and a workbench is arranged in the etching machine and used for placing the semiconductor.

After the etching machine is etched, the workbench is cleaned by manually using tools such as a hairbrush, the space in the etching machine is relatively small, the cleaning of workers is troublesome, time is wasted, and the next work of the semiconductor etching workbench is delayed, so that the semiconductor etching workbench convenient to clean is very necessary.

Disclosure of Invention

The utility model aims to solve the defects in the prior art and provides a semiconductor etching workbench which is convenient to clean.

In order to achieve the above purpose, the present utility model adopts the following technical scheme:

the utility model provides a semiconductor etching workstation convenient to clearance, includes the support body, keep away the position groove has been seted up to one side of support body, the last fixed surface of support body is connected with two leading truck, and the one end of leading truck is located keeps away the position inslot, two equal swing joint has the slider in the leading truck, one side swing joint of slider has the fluted disc, one side fixedly connected with ring of fluted disc, one side swing joint of slider has auxiliary gear, and auxiliary gear meshes with the fluted disc, one side swing joint of slider has driven gear, and driven gear meshes with auxiliary gear, one side fixedly connected with connecting rod of driven gear, the outside fixedly connected with a plurality of brushes of connecting rod, one side fixedly connected with two multisection electric telescopic handle of support body, and multisection electric telescopic handle passes the support body and is fixed mutually with the slider.

As a still further scheme of the utility model, a plurality of anti-skid patterns are arranged on the outer side of the circular ring, and the anti-skid patterns are uniformly distributed.

As a still further proposal of the utility model, one side of the frame body is fixedly connected with a collecting box.

As a still further proposal of the utility model, the top of the collecting box is movably connected with a cover plate, and the upper surface of the cover plate is provided with a pull groove.

As a still further proposal of the utility model, the bottom of the frame body is fixedly connected with a plurality of support rods which are uniformly distributed.

As a still further proposal of the utility model, a fixed rod is fixedly connected between two adjacent support rods.

As a still further proposal of the utility model, the bottom end of the supporting rod is fixedly connected with a fixed seat, and the upper surface of the fixed seat is provided with a fixed hole.

As a still further scheme of the utility model, the bottom of the fixing seat is fixedly connected with a rubber pad, and the rubber pad is equal to the fixing seat in length.

The beneficial effects of the utility model are as follows:

1. through the setting of brush, after the semiconductor etching workstation used up, start multisection electric telescopic handle, multisection electric telescopic handle extension promotes the slider and removes, and the slider drives the connecting rod and removes, can make the connecting rod take place to rotate through the meshing relation between auxiliary gear, driven gear and the fluted disc simultaneously to make the brush rotate and clear up the semiconductor etching workstation, do not need the manual work to clear up, reduced workman's amount of labour, saved the time, improved the convenience of the clearance of semiconductor etching workstation.

2. Through the setting of collecting box, the sweeps that are cleared up by the brush on the semiconductor etching workstation can fall into in the collecting box, and the collecting box is collected the sweeps to unify the collection to the sweeps, avoid the sweeps to scatter on the ground, do not need the workman to clear up again and collect, improved the cleaning efficiency of semiconductor etching workstation.

3. Through the setting of fixing base, place the semiconductor etching workstation subaerial through the fixing base, the staff can use fixing bolt to fix the semiconductor etching workstation subaerial this moment, avoids the semiconductor etching workstation to appear rocking when using, has improved the stability that the semiconductor etching workstation used.

Drawings

FIG. 1 is a schematic perspective view of a semiconductor etching table for cleaning in accordance with the present utility model;

FIG. 2 is a schematic diagram of a partial cross-sectional structure of a semiconductor etching station for cleaning in accordance with the present utility model;

fig. 3 is a schematic view of a partial enlarged structure of a semiconductor etching table for cleaning according to the present utility model.

In the figure: 1. a frame body; 2. a clearance groove; 3. a support rod; 4. a fixed rod; 5. a fixing seat; 6. a rubber pad; 7. a collection box; 8. a cover plate; 9. drawing a groove; 10. a guide frame; 11. a multi-section electric telescopic rod; 12. a slide block; 13. a connecting rod; 14. fluted disc; 15. a circular ring; 16. anti-skid lines; 17. an auxiliary gear; 18. a driven gear; 19. a brush.

Detailed Description

The following description of the embodiments of the present utility model will be made with reference to the accompanying drawings, in which embodiments of the present utility model are shown, and in which embodiments are shown, by way of illustration, only, and not all embodiments of the utility model. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.

Referring to fig. 1-3, a semiconductor etching workbench convenient to clean comprises a frame body 1, a clearance groove 2 is formed in one side of the frame body 1, two guide frames 10 are welded on the upper surface of the frame body 1, one ends of the guide frames 10 are positioned in the clearance groove 2, a slide block 12 is connected in a sliding manner in the two guide frames 10, a fluted disc 14 is connected to one side of the slide block 12 in a rotating manner, a circular ring 15 is welded on one side of the fluted disc 14, the circular ring 15 is contacted with the frame body 1, an auxiliary gear 17 is connected to one side of the slide block 12 in a rotating manner, the auxiliary gear 17 is meshed with the fluted disc 14, a driven gear 18 is connected to one side of the slide block 12 in a rotating manner, the driven gear 18 is meshed with the auxiliary gear 17, a connecting rod 13 is fixed on one side of the driven gear 18 through bolts, a plurality of brushes 19 are fixed on the outer side of the connecting rod 13 through bolts, two multi-section electric telescopic rods 11 are fixed on one side of the frame body 1 through bolts, the multi-section electric telescopic rods 11 penetrate through the frame body 1 and are fixed with the sliding blocks 12, when a semiconductor etching workbench is required to be cleaned, the multi-section electric telescopic rods 11 are started, the multi-section electric telescopic rods 11 stretch to push the sliding blocks 12 to move, the sliding blocks 12 drive the connecting rods 13 and the fluted discs 14 to move, the fluted discs 14 drive the annular rings 15 to move, the annular rings 15 drive the fluted discs 14 to rotate due to friction force between the annular rings 15 and the frame body 1 in the moving process, the fluted discs 14 drive the auxiliary gears 17 to rotate, the auxiliary gears 17 drive the driven gears 18 to drive the connecting rods 13 to rotate, the connecting rods 13 drive the hairbrushes 19 to rotate, so that the hairbrushes 19 clean the semiconductor etching workbench, manual cleaning is not required, labor of workers is reduced, and time is saved, the cleaning convenience of the semiconductor etching workbench is improved.

According to the utility model, the outer side of the circular ring 15 is provided with a plurality of anti-skid patterns 16, the anti-skid patterns 16 are uniformly distributed, friction force between the circular ring 15 and the frame body 1 can be increased, the circular ring 15 can rotate better, the collecting box 7 is fixed on one side of the frame body 1 through bolts, the top of the collecting box 7 is rotationally connected with the cover plate 8, scraps cleaned by the hairbrush 19 on a semiconductor etching workbench can fall into the collecting box 7, the collecting box 7 collects the scraps uniformly, the scraps are prevented from scattering on the ground, workers do not need to clean and collect the scraps again, cleaning efficiency of the semiconductor etching workbench is improved, pull grooves 9 are formed in the upper surface of the cover plate 8, a plurality of support rods 3 are fixed at the bottom of the frame body 1 through bolts, the support rods 3 are uniformly distributed, fixing rods 4 are welded between the two adjacent support rods 3, a fixing seat 5 is welded at the bottom end of the support rods 3, a fixing hole is formed in the upper surface of the fixing seat 5, the semiconductor etching workbench is placed on the ground through the fixing seat 5, the fixing seat 5 can be used for fixing the semiconductor etching workbench on the semiconductor etching workbench, the semiconductor etching workbench is prevented from being adhered to the bottom of the fixing seat 5 through the fixing seat 5, and the semiconductor etching workbench is prevented from shaking the semiconductor etching workbench, and the bottom is prevented from being adhered to the bottom by the fixing seat 5.

Working principle: when the semiconductor etching workbench is required to be cleaned, the multi-section electric telescopic rod 11 is started, the multi-section electric telescopic rod 11 stretches to push the sliding block 12 to move, the sliding block 12 drives the connecting rod 13 and the fluted disc 14 to move, the fluted disc 14 drives the annular ring 15 to move, and in the moving process of the annular ring 15, the annular ring 15 drives the fluted disc 14 to rotate due to friction force between the annular ring 15 and the frame body 1, the fluted disc 14 drives the auxiliary gear 17 to rotate through meshing with the auxiliary gear 17, the auxiliary gear 17 drives the driven gear 18 to rotate through meshing with the driven gear 18, the driven gear 18 drives the connecting rod 13 to rotate, and the connecting rod 13 drives the hairbrush 19 to rotate, so that the hairbrush 19 is used for cleaning the semiconductor etching workbench, manual cleaning is not required, labor amount of workers is reduced, time is saved, and convenience in cleaning the semiconductor etching workbench is improved.

Finally, it should be noted that: modifications of the embodiments described in the foregoing will be readily apparent to those skilled in the art, and equivalents may be substituted for elements thereof. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present utility model should be included in the protection scope of the present utility model.

Claims

1. The utility model provides a semiconductor etching workstation convenient to clearance, includes support body (1), its characterized in that, keep away position groove (2) have been seted up to one side of support body (1), the upper surface fixedly connected with of support body (1) two leading truck (10), and the one end of leading truck (10) is located keeps away position groove (2), two equal swing joint has slider (12) in leading truck (10), one side swing joint of slider (12) has fluted disc (14), one side fixedly connected with ring (15) of fluted disc (14), one side swing joint of slider (12) has auxiliary gear (17), and auxiliary gear (17) mesh with fluted disc (14), one side swing joint of slider (12) has driven gear (18), and driven gear (18) mesh with auxiliary gear (17), one side fixedly connected with connecting rod (13) of driven gear (18), the outside fixedly connected with a plurality of brushes (19) of connecting rod (13), one side fixedly connected with two multisection electric rod (11) of slider (1), and multisection electric rod (11) pass telescopic link (1) mutually.

2. The semiconductor etching workbench convenient to clean according to claim 1, wherein a plurality of anti-skidding patterns (16) are arranged on the outer side of the circular ring (15), and the anti-skidding patterns (16) are uniformly distributed.

3. The semiconductor etching workbench convenient to clean according to claim 1, wherein a collecting box (7) is fixedly connected to one side of the frame body (1).

4. A semiconductor etching workbench convenient to clean according to claim 3, wherein the top of the collection box (7) is movably connected with a cover plate (8), and a pull groove (9) is formed in the upper surface of the cover plate (8).

5. The semiconductor etching workbench convenient to clean according to claim 1, wherein a plurality of support rods (3) are fixedly connected to the bottom of the frame body (1), and the support rods (3) are uniformly distributed.

6. A semiconductor etching table according to claim 5, characterized in that a fixing rod (4) is fixedly connected between two adjacent support rods (3).

7. The semiconductor etching workbench convenient to clean according to claim 5, wherein the bottom end of the supporting rod (3) is fixedly connected with a fixing seat (5), and a fixing hole is formed in the upper surface of the fixing seat (5).

8. The semiconductor etching workbench convenient to clean according to claim 7, wherein a rubber pad (6) is fixedly connected to the bottom of the fixing seat (5), and the rubber pad (6) is equal in length to the fixing seat (5).