CN219519819U

CN219519819U - Ultrasonic silicon wafer cleaning machine

Info

Publication number: CN219519819U
Application number: CN202320448324.6U
Authority: CN
Inventors: 姜李斌; 许晓辉; 孙文兵
Original assignee: Zhejiang Aike Semiconductor Equipment Co ltd
Current assignee: Zhejiang Aike Semiconductor Equipment Co ltd
Priority date: 2023-03-10
Filing date: 2023-03-10
Publication date: 2023-08-15
Anticipated expiration: 2033-03-10

Abstract

The utility model discloses an ultrasonic silicon wafer cleaning machine which comprises a cleaning machine body, wherein a cleaning tank is arranged on one side of the top end of the cleaning machine body, a vibration surface steel plate is fixedly arranged at the bottom of the cleaning tank, a plurality of ultrasonic transducers are fixedly arranged at the bottom of the cleaning tank at equal intervals, the top ends of the ultrasonic transducers are in contact connection with the bottom ends of the vibration surface steel plate, sliding grooves are formed in two sides of the inner wall of the cleaning tank, and sliding blocks are slidably connected in the two sliding grooves. According to the utility model, the trapezoidal screw is driven to rotate by the installed servo motor, the sliding block is driven to lift by the rotation of the trapezoidal screw, the metal filter screen is driven to lift by the movement of the sliding block, the cleaned silicon wafer is conveniently lifted by the lifting of the metal filter screen, the cleaned silicon wafer is conveniently filtered and lifted, and the cleaning water inside the cleaning tank is conveniently circulated by the water circulation mechanism, so that the clear effect of the ultrasonic silicon wafer is ensured.

Description

Ultrasonic silicon wafer cleaning machine

Technical Field

The utility model relates to the technical field of silicon wafer cleaning machines, in particular to an ultrasonic silicon wafer cleaning machine.

Background

The ultrasonic silicon wafer cleaning machine mainly comprises a loading table, a cleaning part, a transfer manipulator, a rotating mechanism, an air draft system and an electric control part.

According to patent number "CN216800909U" discloses an ultrasonic wave silicon chip cleaning machine, through when using the ultrasonic wave to vibrate the impurity removal, the bracket drives the silicon chip in the washing basket and reciprocates for the silicon chip can be abluent more thoroughly, but above-mentioned ultrasonic wave silicon chip cleaning machine is in the in-process of using, and abluent silicon chip is inconvenient to take out, and the abluent water of silicon chip does not carry out real-time circulation filtration simultaneously, influences the cleaning performance of silicon chip.

Disclosure of Invention

The utility model aims to provide an ultrasonic silicon wafer cleaning machine so as to solve the problems in the background art.

In order to achieve the above purpose, the present utility model provides the following technical solutions: the utility model provides an ultrasonic wave silicon chip cleaning machine, includes washs the organism, wash one side on organism top has been seted up the washing tank, the bottom fixed mounting of washing tank has the vibrations face steel sheet, washing tank bottom equidistance fixed mounting has a plurality of ultrasonic transducer, ultrasonic transducer's top and vibrations face steel sheet bottom contact connection, the spout has all been seted up to washing tank inner wall both sides, two the inside of spout is all sliding connection has the slider, two fixed mounting has the metal filter screen between the slider, two rotate between the top and the bottom of spout and be connected with trapezoidal lead screw, two trapezoidal lead screw and the middle part threaded connection of slider, first cavity has been seted up to the bottom of wasing the organism, two trapezoidal lead screw's bottom extends to the inside equal fixed mounting sprocket of first cavity, two the transmission is connected with the chain between the sprocket, the inside bottom fixed mounting of washorganism has servo motor, the output shaft and the bottom fixed connection of corresponding trapezoidal lead screw of servo motor, the opposite side of wasing the organism has seted up the second cavity, the inner wall fixed mounting of second cavity has hydrologic cycle mechanism.

Preferably, the water circulation mechanism comprises a circulating pump and a PP filter element, a fixed cylinder is fixedly arranged in the second cavity, the PP filter element is fixedly arranged in the fixed cylinder, the circulating pump is fixedly arranged at the top end of the second cavity, one end of the fixed cylinder is communicated with the inside of the cleaning tank, the water inlet end of the circulating pump is communicated with the other end of the fixed cylinder, and the water outlet end of the circulating pump is communicated with the inside of the cleaning tank.

Preferably, a sealing cover plate is hinged to one side of the top end of the cleaning tank, and a lifting block is fixedly arranged on one side of the top end of the sealing cover plate.

Preferably, a plurality of radiating holes are formed in one side of the cleaning machine body, the radiating holes are fixedly mounted in the radiating holes, and a dust screen is fixedly mounted in the radiating holes.

Preferably, the four corners of the bottom end of the cleaning machine body are fixedly provided with supporting legs, and the bottom ends of the four supporting legs are provided with evenly distributed anti-skid patterns.

Preferably, a control panel is fixedly arranged at the top of the cleaning machine body, and the ultrasonic transducer, the servo motor and the circulating pump are all electrically connected with an external power supply through the control panel.

The utility model has the technical effects and advantages that:

1. the servo motor drives the trapezoidal screw rod to rotate, the trapezoidal screw rod rotates to drive the sliding block to lift, the metal filter screen is driven to lift through the movement of the sliding block, the cleaned silicon wafer is conveniently lifted through the lifting of the metal filter screen, and the cleaned silicon wafer is conveniently filtered and lifted.

2. Through the hydrologic cycle mechanism of installation, hydrologic cycle mechanism is convenient for realize the inside washing water internal circulation processing of washing tank, has ensured the clear effect of ultrasonic wave silicon chip.

Drawings

FIG. 1 is a schematic diagram of an ultrasonic silicon wafer cleaning machine according to the present utility model.

FIG. 2 is a schematic cross-sectional view of an ultrasonic silicon wafer cleaning machine according to the present utility model.

FIG. 3 is an enlarged view of part of the ultrasonic wafer cleaning machine of FIG. 2 at A according to the present utility model.

FIG. 4 is a schematic diagram showing the internal structure of a second cavity of the ultrasonic silicon wafer cleaning machine according to the present utility model.

In the figure: 1. cleaning a machine body; 2. support legs; 3. a heat radiation hole; 4. a dust screen; 5. a cleaning tank; 6. sealing the cover plate; 7. lifting the block; 8. a control panel; 9. a metal filter screen; 10. a chute; 11. a slide block; 12. a trapezoidal screw rod; 13. a vibration surface steel plate; 14. an ultrasonic transducer; 15. a first cavity; 16. a sprocket; 17. a chain; 18. a servo motor; 19. a second cavity; 20. a circulation pump; 21. PP filter element.

Detailed Description

The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.

The utility model provides an ultrasonic silicon wafer cleaning machine as shown in figures 1-4, which comprises a cleaning machine body 1, wherein one side of the top end of the cleaning machine body 1 is provided with a cleaning tank 5, the bottom of the cleaning tank 5 is fixedly provided with a vibrating surface steel plate 13, the bottom of the cleaning tank 5 is fixedly provided with a plurality of ultrasonic transducers 14 at equal intervals, the top end of the ultrasonic transducers 14 is in contact connection with the bottom end of the vibrating surface steel plate 13, both sides of the inner wall of the cleaning tank 5 are provided with sliding grooves 10, the interiors of the two sliding grooves 10 are respectively and slidably connected with a sliding block 11, a metal filter screen 9 is fixedly arranged between the two sliding blocks 11, trapezoidal screw rods 12 are rotatably connected between the tops and the bottoms of the two sliding grooves 10, the two trapezoidal screw rods 12 are in threaded connection with the middle part of the sliding blocks 11, the bottom of the cleaning machine body 1 is provided with a first cavity 15, the bottom ends of the two trapezoidal screw rods 12 extend to the interiors of the first cavity 15 and are respectively fixedly provided with chain wheels 16, the bottom ends of the two chain wheels 16 are in transmission connection with chains 17, the interiors of the cleaning machine body 1 are fixedly provided with servo motors 18, output shafts of the servo motors 18 are fixedly connected with the bottoms of the corresponding trapezoidal screw rods 12, the other sides of the cleaning machine body 1 are respectively, and the inner wall of the second cavity 19 is fixedly provided with a water circulation mechanism.

The servo motor 18 drives the trapezoidal screw rod 12 to rotate, the trapezoidal screw rod 12 rotates to drive the sliding block 11 to lift, and the sliding block 11 lifts the metal filter screen 9 to facilitate the lifting and water filtering of the cleaned silicon wafer.

According to the illustration of fig. 1, fig. 2 and fig. 4, the water circulation mechanism comprises a circulation pump 20 and a PP filter element 21, a fixed cylinder is fixedly installed in the second cavity 19, the PP filter element 21 is fixedly installed in the fixed cylinder, the circulation pump 20 is fixedly installed at the top end of the second cavity 19, one end of the fixed cylinder is communicated with the inside of the cleaning tank 5, the water inlet end of the circulation pump 20 is communicated with the other end of the fixed cylinder, the water outlet end of the circulation pump 20 is communicated with the inside of the cleaning tank 5, and cleaning liquid in the cleaning tank 5 is filtered by the PP filter element 21 and then flows back into the cleaning tank 5 through the circulation pump 20, so that the cleaning effect is ensured.

According to the figures 1, 2 and 4, a sealing cover plate 6 is hinged to one side of the top end of the cleaning tank 5, a lifting block 7 is fixedly arranged on one side of the top end of the sealing cover plate 6, and the sealing cover plate 6 is conveniently opened and covered through the arrangement of the lifting block 7.

A plurality of louvres 3 have been seted up to one side of wasing organism 1, and the inside of a plurality of louvres 3 is all fixed mounting has louvres 3, and the inside fixed mounting of louvres 3 has dust screen 4, through the louvre 3 of seting up, conveniently washs the heat dissipation of organism 1.

Four corners of the bottom end of the cleaning machine body 1 are fixedly provided with supporting legs 2, the bottom ends of the four supporting legs 2 are provided with evenly distributed anti-skidding lines, and the stability of the cleaning machine body 1 is ensured through the anti-skidding lines provided at the bottom ends of the supporting legs 2.

The top of the cleaning machine body 1 is fixedly provided with a control panel 8, and the ultrasonic transducer 14, the servo motor 18 and the circulating pump 20 are all electrically connected with an external power supply through the control panel 8.

The working principle of the utility model is as follows: when the ultrasonic silicon wafer cleaning machine is used, firstly, a silicon wafer to be cleaned is placed at the top end of a metal filter screen 9, then a servo motor 18 is manually opened, the rotation of the servo motor 18 drives a trapezoidal screw rod 12 to rotate, the two trapezoidal screw rods 12 are driven by a chain wheel 16 and a chain 17, so that the two trapezoidal screw rods 12 synchronously rotate, the sliding block 11 is driven to lift by the rotation of the trapezoidal screw rods 12, the metal filter screen 9 is driven to lift by the lifting of the sliding block 11, and the cleaned silicon wafer is conveniently lifted and drained;

the circulation pump 20 and the ultrasonic transducer 14 are turned on during the cleaning, and the water inside the cleaning tank 5 is circulated and filtered by the circulation pump 20, thereby ensuring the cleaning effect.

What is not described in detail in this specification is prior art known to those skilled in the art. The specific embodiments described herein are offered by way of example only to illustrate the spirit of the utility model. Those skilled in the art may make various modifications or additions to the described embodiments or substitutions thereof without departing from the spirit of the utility model or exceeding the scope of the utility model as defined in the accompanying claims.

Claims

1. The utility model provides an ultrasonic wave silicon chip cleaning machine, includes washs organism (1), its characterized in that, washing tank (5) have been seted up to one side on organism (1) top, the bottom fixed mounting of washing tank (5) has vibrations face steel sheet (13), a plurality of ultrasonic transducer (14) have been installed to washing tank (5) tank bottom equidistance fixed mounting, spout (10) have all been seted up to the top and vibrations face steel sheet (13) bottom contact connection of ultrasonic transducer (14), spout (10) have all been seted up to washing tank (5) inner wall both sides, two the inside of spout (10) sliding connection has slider (11), two fixed mounting has metal filter screen (9) between slider (11), two rotate between the top and the bottom of spout (10) is connected with trapezoidal lead screw (12), two trapezoidal lead screw (12) and the middle part threaded connection of slider (11), first cavity (15) have been seted up to the bottom of organism (1), two trapezoidal lead screw (12)'s bottom extends to first cavity (15) inside fixed mounting sprocket (16), two between driving motor (16) have fixed connection sprocket (17) and servo motor (18) the inside of organism (18) corresponds the bottom of washing the servo motor (18), a second cavity (19) is formed in the other side of the cleaning machine body (1), and a water circulation mechanism is fixedly arranged on the inner wall of the second cavity (19).

2. The ultrasonic silicon wafer cleaning machine according to claim 1, wherein the water circulation mechanism comprises a circulating pump (20) and a PP filter element (21), a fixed cylinder is fixedly installed in the second cavity (19), the PP filter element (21) is fixedly installed in the fixed cylinder, the circulating pump (20) is fixedly installed at the top end in the second cavity (19), one end of the fixed cylinder is communicated with the inside of the cleaning tank (5), the water inlet end of the circulating pump (20) is communicated with the other end of the fixed cylinder, and the water outlet end of the circulating pump (20) is communicated with the inside of the cleaning tank (5).

3. The ultrasonic silicon wafer cleaning machine according to claim 1, wherein a sealing cover plate (6) is hinged to one side of the top end of the cleaning tank (5), and a lifting block (7) is fixedly arranged on one side of the top end of the sealing cover plate (6).

4. The ultrasonic silicon wafer cleaning machine according to claim 1, wherein a plurality of radiating holes (3) are formed in one side of the cleaning machine body (1), the radiating holes (3) are fixedly installed in the radiating holes (3), and a dust screen (4) is fixedly installed in the radiating holes (3).

5. The ultrasonic silicon wafer cleaning machine according to claim 1, wherein supporting legs (2) are fixedly arranged at four corners of the bottom end of the cleaning machine body (1), and uniformly distributed anti-skidding patterns are formed at the bottom ends of the four supporting legs (2).

6. The ultrasonic silicon wafer cleaning machine according to claim 1, wherein a control panel (8) is fixedly arranged at the top of the cleaning machine body (1), and the ultrasonic transducer (14), the servo motor (18) and the circulating pump (20) are electrically connected with an external power supply through the control panel (8).