CN219475454U - Sample surface analysis device - Google Patents

Sample surface analysis device Download PDF

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Publication number
CN219475454U
CN219475454U CN202320625452.3U CN202320625452U CN219475454U CN 219475454 U CN219475454 U CN 219475454U CN 202320625452 U CN202320625452 U CN 202320625452U CN 219475454 U CN219475454 U CN 219475454U
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China
Prior art keywords
sample
chamber
stage
analysis
carrying platform
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CN202320625452.3U
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Chinese (zh)
Inventor
丁丁
张冬
王渊
梁枫
孙怀远
马志博
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Suzhou Huayang Scientific Instrument Co ltd
Gusu Laboratory of Materials
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Suzhou Huayang Scientific Instrument Co ltd
Gusu Laboratory of Materials
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Priority to CN202320625452.3U priority Critical patent/CN219475454U/en
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Abstract

The utility model belongs to the technical field of XPS detection, and discloses a sample surface analysis device, which comprises an analysis chamber, an irradiation mechanism and an energy analysis component, wherein a first carrying platform is arranged in the analysis chamber, the first carrying platform is configured to carry a sample, the irradiation mechanism comprises a ray source, an etching gun and an electron neutralization gun, the ray source, the etching gun and the electron neutralization gun are all in butt joint with the analysis chamber, the ray source emits X-rays to the sample carried on the first carrying platform, the etching gun emits an argon ion beam to the sample carried on the first carrying platform, so that the sample is etched, the multilayer structure of the sample can be exposed one by one, the electron neutralization gun emits an electron beam to the sample carried on the first carrying platform, so that the charge effect of the sample is avoided, the energy analysis component collects photoelectron beams excited by the sample surface and analyzes the photoelectron beams, and the energy analysis component can accurately determine the types, the element valence states and the relative contents of elements contained on the sample surface.

Description

Sample surface analysis device
Technical Field
The utility model relates to the technical field of XPS detection, in particular to a sample surface analysis device.
Background
An X-ray photoelectron spectroscopy (XPS) technique is a surface analysis means based on the photoelectric effect. When a beam of X-rays with specific energy is incident on the surface of a sample, core energy level electrons of all elements except hydrogen helium in the sample are excited into photoelectrons on the premise of meeting energy conservation, and the energy level of the elements is specific, and the change of chemical environment can regularly influence the energy of the energy level, so that the types, the element valence states and the relative content of the elements contained on the surface of the sample can be determined by measuring the energy and the intensity of the emitted photoelectrons.
Because the sample to be measured may be a multi-layer structure and the elements contained in each layer are different, the X-ray emitted by the sample surface analysis device in the prior art can only be emitted to the outer surface of the sample, that is, the sample surface analysis device in the prior art can only detect one layer located at the outermost side in the multi-layer structure of the sample, and for the sample with poor conductivity, a certain negative charge accumulation is generated on the surface of the sample in the detection process, so that a charge effect is generated, and the type, the element valence state and the relative content of the elements contained in the surface of the sample cannot be accurately measured.
Therefore, the above-described problems are to be solved.
Disclosure of Invention
The utility model aims to provide a sample surface analysis device which can detect a sample with a multilayer structure and can avoid the charge effect of the sample in the detection process so as to accurately determine the type, the element valence state and the relative content of elements contained on the surface of the sample.
To achieve the purpose, the utility model adopts the following technical scheme:
a sample surface analysis device comprising:
an analysis chamber having a first stage disposed therein, the first stage configured to carry a sample;
an illumination mechanism comprising a radiation source, an etching gun and an electron neutralization gun, the radiation source, the etching gun and the electron neutralization gun each interfacing with the analysis chamber, the radiation source configured to emit X-rays toward the sample supported on the first stage, the etching gun configured to emit an argon ion beam toward the sample supported on the first stage, the electron neutralization gun configured to emit an electron beam toward the sample supported on the first stage; and
an energy analysis member interfacing with the analysis chamber, the energy analysis member configured to collect and analyze a photoelectron beam excited by the sample surface.
Preferably, the sample surface analysis device further comprises a sample introduction mechanism, the sample introduction mechanism comprising:
the sample injection chamber is in butt joint with the analysis chamber through a first valve and in butt joint with the outside through a second valve;
the first vacuumizing module is configured to vacuumize the sample injection chamber; a kind of electronic device with high-pressure air-conditioning system
And the first feeding module is configured to feed the sample from the sample introduction chamber to the first stage.
Preferably, a nitrogen source is docked on the sample injection chamber, an air inlet valve is arranged between the sample injection chamber and the nitrogen source, and the nitrogen source is configured to introduce nitrogen into the sample injection chamber.
Preferably, the sample surface analysis device further includes an expansion preparation mechanism including:
an expansion preparation chamber which is in butt joint with the analysis chamber through a third valve, wherein a first interface for being in butt joint with a sample preparation tool is arranged on the expansion preparation chamber, and the sample fed into the analysis chamber can be conveyed into the expansion preparation chamber; a kind of electronic device with high-pressure air-conditioning system
And a second evacuating module configured to evacuate the extended preparation chamber.
Preferably, a second stage and a second feeding module are disposed in the extended preparation chamber, and the second feeding module is configured to convey the sample between the first stage and the second stage.
Preferably, the analysis chamber is abutted with a four-axis driving module, the first carrying platform is mounted on the four-axis driving module, the four-axis driving module can drive the first carrying platform to move along an X-axis direction, a Y-axis direction and a Z-axis direction, the X-axis direction, the Y-axis direction and the Z-axis direction are perpendicular to each other, the X-axis direction is parallel to a bearing surface of the first carrying platform, and the four-axis driving module can also drive the first carrying platform to rotate around the X-axis direction.
Preferably, the first carrying platform is provided with a containing groove, an opening is formed in one side of the containing groove, the sample can be moved into the containing groove through the opening, the first carrying platform is provided with a pressing plate which is made of elastic materials and is located on one side, away from the bottom of the containing groove, one side, along the opening direction, of the containing groove is fixedly connected to the first carrying platform, and the pressing plate can be pushed to turn towards one side, away from the containing groove, of the sample when the sample moves into the containing groove through the opening.
Preferably, a heating module is provided on the first stage, the heating module being configured to heat the sample.
Preferably, the analysis chamber is provided with a viewing window.
Preferably, the energy analysis means includes a camera which is disposed opposite to the first stage and is capable of acquiring an image of the surface of the sample carried on the first stage.
The utility model has the beneficial effects that: in the utility model, the ray source can emit X-rays to the sample to excite and generate photoelectrons, and the etching gun can emit an argon ion beam to the sample to etch the sample, so that the multilayer structure of the sample can be exposed one by one, and the X-rays can irradiate the multilayer structure of the sample one by one.
Drawings
FIG. 1 is a schematic view of a sample surface analysis device according to an embodiment of the present utility model;
FIG. 2 is a schematic view of the structure of an analysis chamber, an irradiation mechanism, and an energy analysis member in an embodiment of the present utility model;
FIG. 3 is a schematic diagram of a first stage and a four-axis driving module according to an embodiment of the present utility model;
FIG. 4 is an enlarged view of a portion of FIG. 3 at A;
FIG. 5 is a schematic diagram of a sample injection mechanism according to an embodiment of the present utility model;
FIG. 6 is a second schematic structural diagram of the sample injection mechanism according to the embodiment of the present utility model;
fig. 7 is a schematic structural view of an extended preparation mechanism in an embodiment of the present utility model.
In the figure:
1. an analysis chamber; 11. a first stage; 111. a receiving groove; 1111. an opening; 112. a pressing plate; 113. a heating module; 1131. a heating wire; 12. a four-axis driving module; 121. a first mounting frame; 1221. a first mounting block; 1222. a second mounting block; 123. a third mounting frame; 124. a first driving member; 125. a second driving member; 126. a third driving member; 127. a bellows; 13. a second interface; 14. a monochromator; 15. an ion pump; 16. a molecular pump; 17. an ion gauge;
2. an irradiation mechanism; 21. a radiation source; 22. etching gun; 23. an electron neutralization gun;
3. an energy analysis means;
4. a sample injection mechanism; 41. a sample introduction chamber; 411. an intake valve; 412. a third interface; 413. a fourth interface; 421. a full range gauge; 43. a first feeding module;
5. an expansion preparation mechanism; 51. expanding the preparation chamber; 511. a first interface.
Detailed Description
The utility model is described in further detail below with reference to the drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the utility model and are not limiting thereof. It should be further noted that, for convenience of description, only some, but not all of the structures related to the present utility model are shown in the drawings.
In the description of the present utility model, unless explicitly stated and limited otherwise, the terms "connected," "connected," and "fixed" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communicated with the inside of two elements or the interaction relationship of the two elements. The specific meaning of the above terms in the present utility model will be understood in specific cases by those of ordinary skill in the art.
In the present utility model, unless expressly stated or limited otherwise, a first feature "above" or "below" a second feature may include both the first and second features being in direct contact, as well as the first and second features not being in direct contact but being in contact with each other through additional features therebetween. Moreover, a first feature being "above," "over" and "on" a second feature includes the first feature being directly above and obliquely above the second feature, or simply indicating that the first feature is higher in level than the second feature. The first feature being "under", "below" and "beneath" the second feature includes the first feature being directly under and obliquely below the second feature, or simply means that the first feature is less level than the second feature.
In the description of the present embodiment, the terms "upper", "lower", "left", "right", and the like are orientation or positional relationships based on those shown in the drawings, merely for convenience of description and simplicity of operation, and do not indicate or imply that the apparatus or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as limiting the utility model. Furthermore, the terms "first," "second," and the like, are used merely for distinguishing between descriptions and not for distinguishing between them.
Referring to fig. 1 to 7, in the present embodiment, there is provided a sample surface analysis apparatus, the sample surface analysis apparatus including an analysis chamber 1, an irradiation mechanism 2, and an energy analysis member 3, wherein a first stage 11 is disposed inside the analysis chamber 1, the first stage 11 is configured to carry a sample, the irradiation mechanism 2 includes a radiation source 21, an etching gun 22, and an electron neutralization gun 23, the radiation source 21, the etching gun 22, and the electron neutralization gun 23 are all interfaced with the analysis chamber 1, the radiation source 21 is configured to emit X-rays to the sample carried on the first stage 11, the etching gun 22 is configured to emit an argon ion beam to the sample carried on the first stage 11, the electron neutralization gun 23 is configured to emit an electron beam to the sample carried on the first stage 11, the energy analysis member 3 is interfaced with the analysis chamber 1, and the energy analysis member 3 is configured to collect an photoelectron beam excited by the sample surface and analyze the electron beam.
In this embodiment, the radiation source 21 can emit X-rays to the sample to excite and generate photoelectrons, and the etching gun 22 can emit an argon ion beam to the sample to etch the sample, so that the multilayer structure of the sample can be exposed one by one, and the X-rays can be irradiated to the multilayer structure of the sample one by one, and in the detection process, the electron neutralization gun 23 can emit an electron beam to the sample, so as to eliminate negative charge accumulation generated on the sample, that is, the electron neutralization gun 23 can make the sample always in the neutral state, so as to avoid charging effect generated on the sample, and further ensure that the energy analysis component 3 can accurately determine the type, the element valence state and the relative content of the element contained on the surface of the sample.
Specifically, after one layer structure of the sample is irradiated by X-rays and is measured by the energy analysis component 3, the etching gun 22 emits an argon ion beam to the sample, so as to etch the sample to expose the next layer structure, so that the X-rays can be irradiated to the next layer structure of the sample, further the measurement of the next layer structure of the sample is realized, and in the detection process, the electron neutralization gun 23 emits an electron beam to the sample, so that negative charge accumulation generated at the exposed positions of the layer structures of the sample is eliminated, and the charging effect of the sample is avoided.
It should be noted that, in this embodiment, the energy analysis component 3 is composed of main components such as an electron optical lens (not shown in the figure), an energy analyzer (not shown in the figure), a multi-channel electron multiplier amplifier (not shown in the figure), a fluorescent screen (not shown in the figure), and a matched control power supply (not shown in the figure) and data analysis software, so as to perform energy analysis and data conversion on photoelectrons emitted from the surface of the sample, and since the specific structure and working principle of each component are all the prior art, the description thereof is omitted in this embodiment.
It will be appreciated that the etching gun 22 is capable of cleaning the surface of the sample in addition to etching the sample, thereby further ensuring that the energy analysis means 3 is capable of accurately determining the type, valence and relative content of the element contained on the surface of the sample.
Preferably, an observation window (not shown in the figure) is provided on the analysis chamber 1 in the present embodiment, specifically, the observation window is a lead glass window, and a plurality of second interfaces 13 are provided on the analysis chamber 1, wherein one or more than two second interfaces 13 are provided with the observation window, so that a worker can observe the sample and the conditions in the analysis chamber 1.
It will be appreciated that the radiation source 21, the etching gun 22, the electron neutralization gun 23 and the energy analysis component 3 are all interfaced to the analysis chamber 1 via a second interface 13.
It should be noted that, in this embodiment, the analysis chamber 1 is further connected to a monochromator 14, and the monochromator 14 and the radiation source 21 together form a monochromator radiation source, so as to ensure that the core level electrons of all elements except hydrogen helium in the sample can be excited into photoelectrons.
The energy analysis means 3 in this embodiment includes, in addition to the electron optical lens, the energy analyzer, the multi-channel electron multiplier amplifier, and the phosphor screen, a camera (not shown in the drawing) which is disposed opposite to the first stage 11 and is capable of acquiring an image of the surface of the sample carried on the first stage 11, thereby being capable of magnifying the sample surface image to assist signal debugging and sample detection.
Since the detection of the sample needs to be performed in a vacuum environment, the ion pump 15, the molecular pump 16 and the ion gauge 17 are also connected to the analysis chamber 1 in a butt joint manner, wherein the ion pump 15 and the molecular pump 16 are used for vacuumizing the analysis chamber 1, and the ion gauge 17 is used for detecting the vacuum degree in the analysis chamber 1, so that the sample is ensured to be in the vacuum environment.
Based on the foregoing, in order to reduce the influence on the vacuum environment inside the analysis chamber 1, the sample surface analysis device in this embodiment further includes a sample feeding mechanism 4, where the sample feeding mechanism 4 includes a sample feeding chamber 41, a first vacuumizing module and a first feeding module 43, where the sample feeding chamber 41 is docked with the analysis chamber 1 through a first valve (not shown in the drawing) and is docked with the outside through a second valve (not shown in the drawing), specifically, a third interface 412 is provided on the sample feeding chamber 41, the second valve is provided at the third interface 412, the first vacuumizing module is configured to vacuumize the sample feeding chamber 41, the first feeding module 43 is configured to send a sample from the sample feeding chamber 41 to the first stage 11, that is, in this embodiment, send a sample into the analysis chamber 1 through the sample feeding mechanism 4, specifically, the first valve is in a closed state, the second valve is in an open state, after the sample is sent into the sample feeding chamber 41 from the outside, the second valve is closed, the first vacuumizing module performs vacuumizing of the sample feeding chamber 41 to the sample feeding chamber 41, so that the sample feeding mechanism is able to detect the sample feeding mechanism 1 in the same degree as that the sample feeding chamber 1 is in the sample feeding chamber 1 after the first vacuumizing module is opened, and the sample feeding mechanism is able to detect the sample feeding mechanism 1.
The first vacuumizing module includes a full-range gauge 421 and the above-mentioned molecular pump 16, which are in butt joint with the sample chamber 41, the molecular pump 16 is used for vacuumizing the sample chamber 41, and the full-range gauge 421 is used for detecting the vacuum degree in the sample chamber 41, so as to ensure that the vacuum degree in the sample chamber 41 can be the same as the vacuum degree in the analysis chamber 1. It will be appreciated that each of the structures of the first evacuation module is interfaced to the sample chamber 41 via a fourth interface 413 provided to the sample chamber 41.
The first feeding module 43 includes a sample grabbing head (not shown in the drawing) and a magnetic rod (not shown in the drawing), when the second valve is in an open state, a worker can send a sample into the sample injection chamber 41 from the outside and fix the sample onto the sample grabbing head, and the magnetic rod can move the sample grabbing head between the analysis chamber 1 and the sample injection chamber 41.
Further, a nitrogen source (not shown in the figure) is docked on the sample injection chamber 41 in this embodiment, and an air inlet valve 411 is disposed between the sample injection chamber 41 and the nitrogen source, the nitrogen source is configured to introduce nitrogen into the sample injection chamber 41, and before the second valve is opened, the nitrogen source can introduce nitrogen into the sample injection chamber 41, and since the speed of pumping nitrogen is faster than that of pumping air, the working efficiency of the surface analysis device in this embodiment is higher compared with that of introducing air into the sample injection chamber 41 before the second valve is opened.
Based on the foregoing, after the first feeding module 43 sends the sample into the analysis chamber 1 and the first valve is closed, the ion gauge 17 abutted on the analysis chamber 1 can detect the vacuum degree in the analysis chamber 1, and if the vacuum degree in the analysis chamber 1 does not meet the requirement, the ion pump 15 and the molecular pump 16 abutted on the analysis chamber 1 vacuumize the analysis chamber 1 so that the vacuum degree of the analysis chamber 1 meets the requirement.
Further, the sample surface analysis device in this embodiment further includes an extended preparation mechanism 5, the extended preparation mechanism 5 includes an extended preparation chamber 51 and a second vacuumizing module (not shown in the figure), the extended preparation chamber 51 is docked with the analysis chamber 1 through a third valve (not shown in the figure), a first interface 511 for docking with a sample preparation tool (not shown in the figure) is provided on the extended preparation chamber 51, the sample in the analysis chamber 1 can be delivered into the extended preparation chamber 51, the second vacuumizing module is configured to vacuumize the extended preparation chamber 51, based on the above, the sample surface analysis device in this embodiment can also prepare the sample in addition to XPS detection of the sample, that is, the extended preparation chamber 51 is docked with the analysis chamber 1 through the third valve (not shown in the figure), after the sample is delivered into the analysis chamber 1, the third valve is opened, the sample can be delivered into the extended preparation chamber 51 through the analysis chamber 1, after the third valve is closed, the sample surface analysis device in this embodiment can also perform various functions on the sample preparation in the sample preparation chamber 1 through the third valve, and after the third valve is closed, the sample surface analysis device in this embodiment can perform a vacuum environment in the extended preparation chamber 1, on the sample preparation chamber is opened, and the sample preparation process chamber is opened, and the sample preparation environment can be guaranteed.
Based on the above, the sample preparation tool may be an evaporation source or the like, and is specifically selected according to the preparation process to be performed on the sample, which is not particularly limited in this embodiment.
It should be noted that, the structure of the second vacuumizing module is the same as that of the first vacuumizing module, and detailed description of the structure of the second vacuumizing module is omitted in this embodiment.
It should be noted that, in this embodiment, the first valve, the second valve and the third valve are all ultra-high vacuum gate valves to meet the vacuum requirements of the analysis chamber 1, the sample injection chamber 41 and the expansion preparation chamber 51, and of course, in other alternative embodiments, the first valve, the second valve and the third valve may be other gate valves, which is not limited in this embodiment.
It can be understood that the specific structure and working principle of the ultra-high vacuum gate valve are all in the prior art, and this will not be described in detail in this embodiment.
The first, second, third and fourth interfaces 511, 13, 412 and 413 are flange interfaces, and the detailed structure of the flange interfaces is the prior art, so that the description thereof is omitted in this embodiment.
Based on the foregoing, a second stage (not shown) and a second feeding module (not shown) are disposed in the extended preparation chamber 51, the second feeding module is configured to convey the sample between the first stage 11 and the second stage, that is, after the sample is sent into the analysis chamber 1, the third valve is opened, the second feeding module can take the sample from the analysis chamber 1 and send the sample from the analysis chamber 1 into the extended preparation chamber 51, after that, the third valve is closed, the sample is subjected to a corresponding preparation process in the extended preparation chamber 51, after the preparation is completed, the third valve is opened, and the second feeding module sends the sample from the extended preparation chamber 51 into the analysis chamber 1.
It is understood that the structure of the second feeding module is the same as that of the first feeding module 43, and detailed description of the structure of the second feeding module is omitted in this embodiment.
Preferably, the analysis chamber 1 in this embodiment is docked with a four-axis driving module 12, the first stage 11 is mounted on the four-axis driving module 12, the four-axis driving module 12 can drive the first stage 11 to move along the X-axis direction, the Y-axis direction and the Z-axis direction, the X-axis, the Y-axis and the Z-axis are perpendicular to each other, the X-axis is parallel to the bearing surface of the first stage 11, and the four-axis driving module 12 can also drive the first stage 11 to rotate around the X-axis, so as to adjust the position of the sample in the analysis chamber 1, and further ensure that the X-rays emitted by the radiation source 21, the argon ion beam emitted by the etching gun 22 and the electron beam emitted by the electron neutralization gun 23 can be accurately irradiated on the surface of the sample, so as to further ensure that the energy analysis member 3 can accurately measure the type, the valence state and the relative content of the element contained in the surface of the sample.
Based on the above, the four-axis driving module 12 includes the first mounting frame 121, the second mounting frame 123, the third mounting frame 123, the first driving member 124, the second driving member 125, and the third driving member 126, the first mounting frame 121 is abutted to the analysis chamber 1, the second mounting frame and the third mounting frame 123 are both slidably connected to the first mounting frame 121 in the X-axis direction, the second mounting frame includes the first mounting block 1221 and the second mounting block 1222, the first mounting block 1221 is slidably connected to the third mounting frame 123 in the Y-axis direction, the second mounting block 1222 is slidably connected to the first mounting block 1221 in the Z-axis direction, the first stage 11 is fixedly connected to the second mounting block 1222, the first driving piece 124 is used for driving the second installation piece 1222 to move along the Z-axis direction relative to the first installation piece 1221, the second driving piece 125 is used for driving the first installation piece 1221 and the second installation piece 1222 to move along the Y-axis direction relative to the third installation frame 123, the third driving piece 126 is used for driving the second installation frame and the third installation frame 123 to move along the X-axis direction relative to the first installation frame 121, a corrugated pipe 127 is connected between the second installation piece 1222 and the first installation frame 121, the joint of the corrugated pipe 127, the second installation piece 1222 and the first installation frame 121 is in a sealing arrangement, and the first carrying platform 11 is positioned inside the corrugated pipe 127, so that the influence on the vacuum environment inside the analysis chamber 1 is avoided.
It is understood that the specific structures of the first driving member 124, the second driving member 125 and the third driving member 126 are all related art, and the sliding structures between the second mounting frame and the third mounting frame 123 and the first mounting frame 121, between the first mounting block 1221 and the second mounting block 1222, and between the first mounting block 1221 and the third mounting frame 123 are all related art, which will not be described in detail in this embodiment.
Further, the first carrying platform 11 is provided with a containing groove 111, an opening 1111 is formed on one side of the containing groove 111, a sample can be moved into the containing groove 111 from the opening 1111, the first carrying platform 11 is provided with a pressing plate 112, the pressing plate 112 is made of elastic materials and is located on one side of the containing groove 111 away from the bottom of the containing groove, one side of the pressing plate 112 along the opening direction of the opening 1111 is fixedly connected to the first carrying platform 11, and the pressing plate 112 can be pushed by the sample to turn towards one side away from the containing groove 111 when the sample moves into the containing groove 111 from the opening 1111, so that the sample is pushed onto the first carrying platform 11 after the sample moves into the containing groove 111 from the opening 1111, and the sample is prevented from moving relative to the first carrying platform 11 in the detection process.
Further, the first stage 11 in the present embodiment is provided with a heating module 113, and the heating module 113 is configured to heat the sample, specifically, the heating module 113 includes a heating wire 1131, the heating wire 1131 is mounted on the first stage 11, and the heating wire 1131 can heat the sample, so that the sample can be dried before detection, and can be at different temperatures, so as to realize detection of the sample at different temperatures.
It should be noted that the sample surface analysis apparatus further includes a baking module (not shown in the drawing) for baking the analysis chamber 1 to dry the inside of the analysis chamber 1.
It can be understood that the structure of the baking module is in the prior art, and this will not be described in detail in this embodiment.
It is to be understood that the above examples of the present utility model are provided for clarity of illustration only and are not limiting of the embodiments of the present utility model. Various obvious changes, rearrangements and substitutions can be made by those skilled in the art without departing from the scope of the utility model. It is not necessary here nor is it exhaustive of all embodiments. Any modification, equivalent replacement, improvement, etc. which come within the spirit and principles of the utility model are desired to be protected by the following claims.

Claims (10)

1. A sample surface analysis device, comprising:
an analysis chamber (1) inside which a first stage (11) is arranged, the first stage (11) being configured to carry a sample;
an irradiation mechanism (2) comprising a radiation source (21), an etching gun (22) and an electron neutralization gun (23), the radiation source (21), the etching gun (22) and the electron neutralization gun (23) each interfacing with the analysis chamber (1), the radiation source (21) being configured to emit X-rays towards the sample supported on the first stage (11), the etching gun (22) being configured to emit an argon ion beam towards the sample supported on the first stage (11), the electron neutralization gun (23) being configured to emit an electron beam towards the sample supported on the first stage (11); and
an energy analysis member (3) interfacing with the analysis chamber (1), the energy analysis member (3) being configured to collect and analyze a photoelectron beam excited by the sample surface.
2. The sample surface analysis device according to claim 1, further comprising a sample introduction mechanism (4), the sample introduction mechanism (4) comprising:
the sample injection chamber (41) is in butt joint with the analysis chamber (1) through a first valve and in butt joint with the outside through a second valve;
a first evacuating module configured to evacuate the sample introduction chamber (41); a kind of electronic device with high-pressure air-conditioning system
A first feeding module (43) configured to feed the sample from the sample introduction chamber (41) to the first stage (11).
3. The sample surface analysis device according to claim 2, wherein a nitrogen source is docked to the sample introduction chamber (41), an air intake valve (411) is provided between the sample introduction chamber (41) and the nitrogen source, and the nitrogen source is configured to introduce nitrogen into the sample introduction chamber (41).
4. The sample surface analysis device according to claim 1, further comprising an extension preparation mechanism (5), the extension preparation mechanism (5) comprising:
an expansion preparation chamber (51) which is in butt joint with the analysis chamber (1) through a third valve, wherein a first interface (511) for being in butt joint with a sample preparation tool is arranged on the expansion preparation chamber (51), and the sample fed into the analysis chamber (1) can be conveyed into the expansion preparation chamber (51); a kind of electronic device with high-pressure air-conditioning system
A second evacuation module configured to evacuate the extended preparation chamber (51).
5. The sample surface analysis device according to claim 4, characterized in that a second stage and a second feeding module are provided within the extended preparation chamber (51), the second feeding module being configured to transport the sample between the first stage (11) and the second stage.
6. The sample surface analysis device according to claim 1, wherein a four-axis driving module (12) is docked on the analysis chamber (1), the first carrying platform (11) is mounted on the four-axis driving module (12), the four-axis driving module (12) can drive the first carrying platform (11) to move along an X-axis direction, a Y-axis direction and a Z-axis direction, the X-axis, the Y-axis and the Z-axis are perpendicular to each other, the X-axis is parallel to a carrying surface of the first carrying platform (11), and the four-axis driving module (12) can also drive the first carrying platform (11) to rotate around the X-axis.
7. The sample surface analysis device according to claim 1, wherein a receiving groove (111) is formed in the first carrying platform (11), an opening (1111) is formed in one side of the receiving groove (111), the sample can be moved into the receiving groove (111) through the opening (1111), a pressing plate (112) is arranged on the first carrying platform (11), the pressing plate (112) is made of an elastic material and is located on one side of the receiving groove (111) away from the groove bottom, one side of the pressing plate (112) along the opening direction of the opening (1111) is fixedly connected to the first carrying platform (11), and the pressing plate (112) can be pushed by the sample to turn over towards one side away from the receiving groove (111) when the sample is moved into the receiving groove (111) through the opening (1111).
8. The sample surface analysis device according to claim 1, characterized in that a heating module (113) is provided on the first stage (11), the heating module (113) being configured to heat the sample.
9. A sample surface analysis device according to claim 1, characterized in that the analysis chamber (1) is provided with a viewing window.
10. The sample surface analysis device according to claim 1, characterized in that the energy analysis means (3) comprise a camera, which is arranged opposite the first stage (11) and is capable of acquiring an image of the surface of the sample carried on the first stage (11).
CN202320625452.3U 2023-03-27 2023-03-27 Sample surface analysis device Active CN219475454U (en)

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CN116908234A (en) * 2023-09-13 2023-10-20 季华实验室 Data analysis method, system and medium for multilayer sample structure

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116908234A (en) * 2023-09-13 2023-10-20 季华实验室 Data analysis method, system and medium for multilayer sample structure
CN116908234B (en) * 2023-09-13 2023-11-24 季华实验室 XPS data analysis method, system and medium for multilayer sample structure

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