CN219425102U - Cleaning device for etching VC soaking plate - Google Patents
Cleaning device for etching VC soaking plate Download PDFInfo
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- CN219425102U CN219425102U CN202320879294.4U CN202320879294U CN219425102U CN 219425102 U CN219425102 U CN 219425102U CN 202320879294 U CN202320879294 U CN 202320879294U CN 219425102 U CN219425102 U CN 219425102U
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- cleaning
- etching
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- cleaning tank
- spray
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The utility model provides a cleaning device for etching a VC soaking plate, which comprises an etching cleaning tank, wherein the outer surface of the etching cleaning tank is wrapped by a cleaning tank heat preservation layer, and the etching cleaning tank comprises an ultrasonic cleaning tank for ultrasonic cleaning and a spray cleaning tank for spray cleaning; a cleaning tank circulating heating pipe is arranged in the inner wall surface of the etching cleaning tank, and is completely immersed in a heat transfer fluid medium filled in the etching cleaning tank; according to the utility model, the etched CV soaking plate is quickly and effectively cleaned and cleaned in a mode of combining ultrasonic cleaning and spray cleaning, the etching liquid on the surface of the VC soaking plate is cleaned, the etching liquid is effectively removed by completely cleaning the VC soaking plate in a layered cleaning process, the cleaning degree of the surface of the VC soaking plate is ensured, the etching damage of the etching liquid to the VC soaking plate is avoided, the actual integrity of the VC soaking plate is ensured, and the cleaning work of the VC soaking plate is effectively realized, so that the VC soaking plate has practicability.
Description
Technical Field
The utility model relates to the technical field of etching of VC soaking plates, in particular to a cleaning device for etching of VC soaking plates.
Background
VC vapor plates (vapor chambers) are vacuum chambers with fine structures on the inner walls, typically made of copper. When heat is conducted from a heat source to an evaporation area, the cooling liquid in the cavity starts to generate the gasification phenomenon of the cooling liquid after being heated in the environment with low vacuum degree, at the moment, the cooling liquid absorbs heat energy and rapidly expands in volume, the whole cavity is rapidly filled with gas-phase cooling medium, and the phenomenon of condensation can be generated when the gas-phase working medium contacts a relatively cold area. The heat accumulated during evaporation is released by condensation, and the condensed cooling liquid returns to the evaporation heat source through the capillary channel of the microstructure, and the operation is repeatedly performed in the cavity. The heat pipe and the vapor chamber have almost the same working principle, but in the conduction mode, the heat pipe conducts heat in a one-dimensional linear heat conduction mode, and the vapor chamber conducts heat in a two-dimensional plane. Because the area of samming edition is great, the reduction hot spot that can be better realizes the isothermicity under the chip, has bigger performance advantage in the heat pipe, and samming edition is lighter and thinner simultaneously still, also accords with the development trend that current cell-phone is lighter and thinner more, space utilization is maximized more when quick absorption and giving off heat.
The existing soaking plate etching and cleaning device needs manual flushing in sequence by a worker in the using process, is low in flushing efficiency, does not have the function of circulating flushing, is high in processing cost, needs to be placed for a period of time after cleaning, waits for air drying, and does not have the function of rapidly cleaning accumulated water stains after cleaning.
Disclosure of Invention
Therefore, the main purpose of the utility model is to provide a cleaning device for etching a VC soaking plate, which combines ultrasonic cleaning and spray cleaning to realize rapid and effective cleaning and cleaning after etching the VC soaking plate, clean the etching liquid on the surface of the VC soaking plate, realize complete cleaning of the VC soaking plate through a layered cleaning process, effectively remove the etching liquid, ensure the cleaning degree of the surface of the VC soaking plate, avoid the etching damage of the VC soaking plate caused by the etching liquid, ensure the actual integrity of the VC soaking plate, effectively realize the cleaning work of the VC soaking plate, and have good practicability.
In order to achieve the aim of the utility model, the technical scheme adopted is as follows:
the cleaning device for etching the VC soaking plate comprises an etching cleaning tank, wherein the outer surface of the etching cleaning tank is wrapped by a cleaning tank heat insulation layer, and the etching cleaning tank comprises an ultrasonic cleaning tank for ultrasonic cleaning and a spray cleaning tank for spray cleaning; a cleaning tank circulating heating pipe is arranged in the inner wall surface of the etching cleaning tank, the cleaning tank circulating heating pipe is completely immersed in a heat transfer fluid medium filled in the etching cleaning tank, and a cleaning tank program controller is arranged on the outer side surface of the etching cleaning tank; the bottom surface of etching washing tank is provided with a plurality of ultrasonic generator that washs, and the lateral part installation of etching washing tank is provided with the auxiliary platform of spraying tank, and the installation of the auxiliary bench of spraying tank is provided with the auxiliary frame of spraying tank, and the installation of the up end of the auxiliary frame of spraying tank is provided with the spraying tank and sprays tank, and the front end installation that sprays tank is provided with the spraying tank program controller, and the lower part installation is provided with the spraying tank shower head.
Preferably, the spray cleaning tank is installed on the etching cleaning tank in a bridging way, the spray cleaning tank is not contacted with the bottom surface of the etching cleaning tank, and the surface of the spray cleaning tank contacted with the etching cleaning liquid is provided with a cleaning tank leakage net.
Preferably, a cleaning solution outlet is arranged at the bottom end of the side part of the etching cleaning tank, and is connected with the bottom surface of the inner side of the etching cleaning tank to guide the etching cleaning solution out of the etching cleaning tank.
Preferably, a spray liquid conveying pump is arranged at the lower part of the etching cleaning tank, which is opposite to the auxiliary table of the spray tank, and is directly connected with the spray tank of the spray tank through a spray liquid conveying pipe.
Preferably, the bottom end surface of the spray cleaning tank is higher than the horizontal liquid level of the etching cleaning liquid in the etching cleaning tank, and the horizontal liquid level of the etching cleaning liquid is controlled through the cleaning liquid discharge port on the side of the etching cleaning tank.
Preferably, the cleaning tank programmer is electrically connected with the cleaning tank circulating heating pipe and the cleaning ultrasonic generator, and controls the program control input of the cleaning tank circulating heating pipe and the cleaning ultrasonic generator.
Preferably, the spray tank program controller is electrically connected with the spray liquid conveying pump and the spray tank spray header and controls program control input of the spray liquid conveying pump and the spray tank spray header.
The utility model provides a turnover plate etching machine for titanium mesh etching, which has the following advantages:
according to the utility model, the etched CV soaking plate is quickly and effectively cleaned and cleaned in a mode of combining ultrasonic cleaning and spray cleaning, the etching liquid on the surface of the VC soaking plate is cleaned, the VC soaking plate is completely cleaned through a layering cleaning process, the etching liquid is effectively removed, the cleaning degree of the surface of the VC soaking plate is ensured, the etching damage of the etching liquid to the VC soaking plate is avoided, the actual integrity of the VC soaking plate is ensured, the cleaning work of the VC soaking plate is effectively realized, and the VC soaking plate cleaning device has good practicability.
Drawings
Fig. 1 is a schematic side view of a cleaning device for etching a VC vapor chamber according to the present utility model 1.
Fig. 2 is a schematic top view of the cleaning device for etching a VC soaking plate according to the present utility model 2.
Fig. 3 is a schematic side view of a cleaning device for etching a VC vapor chamber according to the present utility model.
In the figure: 1. etching the cleaning tank; 2. a cleaning tank heat preservation layer; 3. an ultrasonic cleaning tank; 4. spraying a cleaning tank; 5. a cleaning tank leaks out of the net; 6. etching the cleaning solution; 7. a heat transfer fluid medium; 8. a cleaning tank circulating heating pipe; 9. a cleaning tank program controller; 10. cleaning an ultrasonic generator; 11. a cleaning liquid outlet; 12. a spray liquid delivery pump; 13. a spray liquid delivery pipe; 14. a spray tank auxiliary table; 15. a spray tank auxiliary frame; 16. a spray tank of the spray tank; 17. a spray tank program controller; 18. spray header of spray tank.
Detailed Description
The utility model is further illustrated and described below in conjunction with specific embodiments and the accompanying drawings.
The present utility model will be described in further detail with reference to the accompanying drawings, in order to make the objects, technical solutions and advantages of the present utility model more apparent. It will be apparent that the described embodiments are only some, but not all, embodiments of the utility model. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
In the description of the present utility model, it should be understood that the directions or positional relationships indicated by the terms "upper", "lower", "horizontal", "inner", "outer", etc., are based on the directions or positional relationships shown in the drawings, are merely for convenience in describing the present utility model and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as limiting the present utility model.
Example 1
As shown in fig. 1 and 2, a cleaning device for etching a VC soaking plate comprises an etching cleaning tank 1, wherein a cleaning tank heat insulation layer 2 is wrapped on the outer surface of the etching cleaning tank 1, the etching cleaning tank 1 comprises an ultrasonic cleaning tank 3 for ultrasonic cleaning and a spray cleaning tank 4 for spray cleaning, the spray cleaning tank 4 is installed on the etching cleaning tank 1 in a bridging way, the spray cleaning tank 4 is not contacted with the bottom surface of the etching cleaning tank 1, and a cleaning tank leakage net 5 is arranged on the surface, contacted with the etching cleaning liquid 6, of the spray cleaning tank 4; a cleaning tank circulation heating pipe 8 is installed in the inner wall surface of the etching cleaning tank 1, and the cleaning tank circulation heating pipe 8 is completely immersed in the heat transfer fluid medium 7 filled in the etching cleaning tank 1.
As shown in fig. 3, a cleaning device for etching a VC soaking plate is provided, and a cleaning tank programmer 9 is installed on the outer side surface of an etching cleaning tank 1; a plurality of cleaning ultrasonic generators 10 are arranged on the bottom surface of the etching cleaning tank 1, a spraying tank auxiliary table 14 is arranged on the side part of the etching cleaning tank 1, a spraying tank auxiliary frame 15 is arranged on the spraying tank auxiliary table 14, a spraying tank 16 is arranged on the upper end surface of the spraying tank auxiliary frame 15, a spraying tank program controller 17 is arranged at the front end of the spraying tank 16, a spraying tank spray header 18 is arranged at the lower part of the spraying tank 16, a cleaning liquid discharge port 11 is arranged at the bottom end of the side part of the etching cleaning tank 1, the cleaning liquid discharge port 11 is connected with the bottom surface of the inner side of the etching cleaning tank 1, etching cleaning liquid 6 is led out from the etching cleaning tank 1, a spraying liquid delivery pump 12 is arranged at the lower part of the side of the etching cleaning liquid discharge port 11, which is opposite to the spraying tank auxiliary table 14, the spray liquid conveying pump 12 is directly connected with the spray tank 16 through the spray liquid conveying pipe 13, the bottom end surface of the spray cleaning tank 4 is higher than the horizontal liquid level of etching cleaning liquid 6 in the etching cleaning tank 1, the horizontal liquid level of the etching cleaning liquid 6 is controlled through the cleaning liquid discharge port 11 at the side part of the etching cleaning tank 1, the cleaning tank programmer 9 is electrically connected with the cleaning tank circulating heating pipe 8 and the cleaning ultrasonic generator 10, the program control input of the cleaning tank circulating heating pipe 8 and the cleaning ultrasonic generator 10 is controlled, the spray tank programmer 17 is electrically connected with the spray liquid conveying pump 12 and the spray tank spray header 18, and the program control input of the spray liquid conveying pump 12 and the spray tank spray header 18 is controlled.
When the device is used, the etched VC soaking plate is firstly placed in an ultrasonic cleaning tank 3 in an etching cleaning tank 1, etching cleaning liquid 6 is added to completely submerge the VC soaking plate, the bottom end surface of a spray cleaning tank 4 is higher than the horizontal liquid level of the etching cleaning liquid 6 in the etching cleaning tank 1, a cleaning tank program controller 9 is used for simultaneously controlling a cleaning tank circulating heating pipe 8 and a cleaning ultrasonic generator 10 to work, the cleaning ultrasonic generator 10 is started to send out ultrasonic waves to carry out vibration cleaning on a VC etching plate, the temperature of the cleaning tank circulating heating pipe 8 is increased and heated to be transmitted to the etching cleaning tank 1 through a heat transfer fluid medium 7, and then the temperature is transmitted to the etching cleaning liquid 6 to be matched with ultrasonic cleaning;
after ultrasonic cleaning is completed, etching cleaning liquid 6 in the etching cleaning tank 1 is discharged from a cleaning liquid discharge port 11, all VC soaking plates are arranged in a spraying cleaning tank 4, a spraying tank program controller 17 simultaneously controls a spraying liquid conveying pump 12 and a spraying tank spray header 18 to work, the spraying liquid conveying pump 12 directly conveys the spraying cleaning liquid to a spraying tank spray tank 16 for storage through a spraying liquid conveying pipe 13, then the spraying cleaning liquid is released from the spraying tank spray header 18 through the spraying tank spray tank 16, the VC soaking plates in the spraying cleaning tank 4 are sprayed and cleaned, and the spraying cleaning liquid enters the etching cleaning tank 1 through a cleaning tank drain screen 5 on the spraying cleaning tank 4 and is discharged from the cleaning liquid discharge port 11;
the ultrasonic cleaning and the spray cleaning of the VC soaking plate can be completely carried out simultaneously.
Example 2
This embodiment differs from embodiment 1 in that:
a plurality of cleaning ultrasonic generators 10 are simultaneously arranged on the wall surface of the spray cleaning tank 4 of the etching cleaning tank 1, and when the VC soaking plate is used for spray cleaning in the spray cleaning tank 4, the cleaning ultrasonic generators 10 are started to carry out ultrasonic spray cleaning, so that the cleaning efficiency of spray cleaning is greatly improved.
According to the utility model, the rapid and effective cleaning and cleaning of the etched VC soaking plate are realized by combining ultrasonic cleaning and spray cleaning, the etching liquid on the surface of the VC soaking plate is cleaned, the VC soaking plate is completely cleaned through the layering cleaning process, the etching liquid is effectively removed, the cleaning degree of the surface of the VC soaking plate is ensured, the etching damage of the etching liquid to the VC soaking plate is avoided, the actual integrity of the VC soaking plate is ensured, the cleaning work of the VC soaking plate is effectively realized, and the VC soaking plate has good practicability.
The foregoing has described in detail the embodiments of the present utility model, and specific embodiments have been employed to illustrate the principles and implementations of the embodiments of the present utility model, the above description of the embodiments being only useful for aiding in the understanding of the principles of the embodiments of the present utility model; meanwhile, as for those skilled in the art, according to the embodiments of the present utility model, there are variations in the specific embodiments and the application scope, and the present description should not be construed as limiting the present utility model.
Claims (7)
1. A cleaning device for etching of VC soaking plate, its characterized in that: the device comprises an etching cleaning tank (1), wherein a cleaning tank heat preservation layer (2) is wrapped and arranged on the outer surface of the etching cleaning tank (1), and the etching cleaning tank (1) comprises an ultrasonic cleaning tank (3) for ultrasonic cleaning and a spray cleaning tank (4) for spray cleaning;
a cleaning tank circulating heating pipe (8) is arranged in the inner wall surface of the etching cleaning tank (1), the cleaning tank circulating heating pipe (8) is completely immersed in a heat transfer fluid medium (7) filled in the etching cleaning tank (1), and a cleaning tank program controller (9) is arranged on the outer side surface of the etching cleaning tank (1);
the etching cleaning tank is characterized in that a plurality of cleaning ultrasonic generators (10) are arranged on the bottom surface of the etching cleaning tank (1), a spraying tank auxiliary table (14) is arranged on the side portion of the etching cleaning tank (1), a spraying tank auxiliary frame (15) is arranged on the spraying tank auxiliary table (14), a spraying tank (16) is arranged on the upper end face of the spraying tank auxiliary frame (15), a spraying tank program controller (17) is arranged at the front end of the spraying tank (16), and a spraying tank spray header (18) is arranged at the lower portion of the front end of the spraying tank.
2. The cleaning device for VC vapor chamber etching according to claim 1, wherein: the spray cleaning tank (4) is installed on the etching cleaning tank (1) in a bridging way, the spray cleaning tank (4) is not in contact with the bottom surface of the etching cleaning tank (1), and the surface of the spray cleaning tank (4) in contact with the etching cleaning liquid (6) is provided with a cleaning tank leakage net (5).
3. The cleaning device for VC vapor chamber etching according to claim 2, wherein: the bottom end of the side part of the etching cleaning tank (1) is provided with a cleaning solution outlet (11), the cleaning solution outlet (11) is connected with the bottom surface of the inner side of the etching cleaning tank (1), and etching cleaning solution (6) is led out from the etching cleaning tank (1).
4. A cleaning device for VC vapor chamber etching according to claim 3, wherein: the etching cleaning tank (1) is provided with a cleaning solution outlet (11), a spraying solution delivery pump (12) is arranged at the lower part of the side, opposite to the spraying tank auxiliary table (14), of the cleaning solution outlet, and the spraying solution delivery pump (12) is directly connected with a spraying tank (16) through a spraying solution delivery pipe (13).
5. A cleaning device for VC vapor chamber etching according to claim 3, wherein: the bottom end surface of the spray cleaning tank (4) is higher than the horizontal liquid level of the etching cleaning liquid (6) in the etching cleaning tank (1), and the horizontal liquid level of the etching cleaning liquid (6) is controlled through a cleaning liquid outlet (11) at the side part of the etching cleaning tank (1).
6. The cleaning device for VC vapor chamber etching according to claim 1, wherein: the cleaning tank program controller (9) is electrically connected with the cleaning tank circulating heating pipe (8) and the cleaning ultrasonic generator (10) and controls program control input of the cleaning tank circulating heating pipe (8) and the cleaning ultrasonic generator (10).
7. The cleaning device for etching a VC vapor chamber according to claim 1 or 4, wherein: the spray tank program controller (17) is electrically connected with the spray liquid conveying pump (12) and the spray tank spray header (18) and controls program control input of the spray liquid conveying pump (12) and the spray tank spray header (18).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320879294.4U CN219425102U (en) | 2023-04-19 | 2023-04-19 | Cleaning device for etching VC soaking plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320879294.4U CN219425102U (en) | 2023-04-19 | 2023-04-19 | Cleaning device for etching VC soaking plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN219425102U true CN219425102U (en) | 2023-07-28 |
Family
ID=87335146
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202320879294.4U Active CN219425102U (en) | 2023-04-19 | 2023-04-19 | Cleaning device for etching VC soaking plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN219425102U (en) |
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2023
- 2023-04-19 CN CN202320879294.4U patent/CN219425102U/en active Active
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