CN219425080U - Spray device without spray pipe for silicon wafer cleaning tank - Google Patents
Spray device without spray pipe for silicon wafer cleaning tank Download PDFInfo
- Publication number
- CN219425080U CN219425080U CN202320178820.4U CN202320178820U CN219425080U CN 219425080 U CN219425080 U CN 219425080U CN 202320178820 U CN202320178820 U CN 202320178820U CN 219425080 U CN219425080 U CN 219425080U
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- infusion
- plate
- cleaning tank
- infusion plate
- tank
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The utility model relates to a spray device without a spray pipe for a silicon wafer cleaning tank, which is provided with a cleaning tank, wherein the upper parts of the left side wall and the right side wall are provided with mounting holes and spray heads; the upper parts of the left and right outer tank walls provided with the spray heads are provided with left and right side infusion plates, the inner side surfaces of the two side infusion plates are provided with infusion grooves and reinforcing ribs, two long sides and one end of each side infusion plate are provided with sealing edges, and the other end is an opening; a front infusion plate is arranged at the upper part of the front wall of the cleaning tank between the two opening ends of the left infusion plate and the right infusion plate, an infusion tank is arranged on the inner side surface of the front infusion plate, and two ends of the front infusion plate are communicated with the two opening ends of the left infusion plate and the right infusion plate in a sealing way; the plate body of the front infusion plate is provided with a liquid inlet connector which is communicated with a liquid supply and a liquid infusion tank. A water outlet is arranged at the bottom of the cleaning tank. The utility model is suitable for cleaning wafers. The cleaning tank has the advantages of simple and reasonable structure, increased internal volume of the cleaning tank, safe and convenient operation, easy manufacture and good cleaning effect.
Description
Technical Field
The utility model relates to the technical field of cleaning equipment used in a semiconductor wafer cleaning process, in particular to a spray device without a spray pipe for a silicon wafer cleaning tank, and an improved spray device without a spray pipe for a cleaning tank.
Background
In the traditional silicon wafer cleaning process, a water channel of a spraying pipeline is required to be additionally arranged in a cleaning tank structure of the used spraying equipment, the pipeline is additionally arranged in the tank body, protrudes out of a side plate of the tank body, and occupies an effective space in the tank body. In order to ensure that the effective space inside the tank body meets the use requirement, the whole size of the tank body needs to be enlarged, so that the whole size of the tank body is increased, the material cost and the manufacturing cost are increased, and the silicon wafer is easy to collide with the spray pipe due to the fact that the spray pipe protrudes out of the tank body, and the silicon wafer is damaged due to careless operation of an operator. Therefore, improvements in the shower structure of the existing cleaning tanks are needed.
Disclosure of Invention
In order to solve the technical problems, the utility model provides the spray device without the spray pipe for the silicon wafer cleaning tank, which is provided with the external spray structure of the cleaning tank, and omits the spray pipe of the spray structure, and the improved spray structure has the advantages of simplicity, reasonability, increased internal volume of the cleaning tank, safe and convenient cleaning operation, easy manufacture and good use effect.
The utility model adopts the following technical scheme:
a spray device without a spray pipe for a silicon wafer cleaning tank is provided with a cleaning tank, wherein the cleaning tank is provided with a tank wall, and mounting holes for mounting spray heads and spray heads mounted in the mounting holes are arranged at the upper parts of the left side wall and the right side wall in the tank wall; the upper part of the outer wall of the cleaning tank is provided with a side infusion plate which is horizontally arranged, namely a left side infusion plate and a right side infusion plate, the inner side surfaces of the two infusion plates are provided with infusion grooves and reinforcing ribs between the infusion grooves, two long sides and one end of each side infusion plate are provided with sealing edges, and the other end is an opening; a front transfusion plate which is horizontally arranged is arranged at the upper part of the front wall of the washing tank between the two opening ends of the left transfusion plate and the right transfusion plate, a transfusion groove is arranged on the inner side surface of the front transfusion plate, and two ends of the front transfusion plate are communicated with the two opening ends of the left transfusion plate and the right transfusion plate in a sealing way; the plate body of the front infusion plate is provided with a liquid inlet connector which is communicated with a liquid supply source and a liquid conveying groove of the cleaning liquid. A water outlet is arranged at the bottom of the cleaning tank.
The utility model further perfects and implements the optimization scheme as follows:
the cleaning tank body and the infusion plate are made of corrosion-resistant PVDF materials.
The width of the front infusion plate and the left and right infusion plates is 3-5cm; the thickness is 0.5-0.8cm.
The specific working procedure of the utility model is as follows: the front infusion plate, the left infusion plate and the right infusion plate which are welded outside the silicon wafer cleaning tank are used as channels for cleaning liquid used for the silicon wafer, the cleaning liquid enters the infusion grooves of the front infusion plate through the liquid inlet connector, then enters the infusion grooves of the left infusion plate and the right infusion plate through the infusion grooves of the front infusion plate, and finally is sprayed by the cleaning nozzles arranged on the left inner wall and the right inner wall of the cleaning tank, so that the wafer cleaning process is completed.
The utility model has the beneficial effects that: the device can finish the cleaning and spraying operation of the wafer without arranging a pipeline additionally, so that the cleaning equipment is simple and easy to manufacture, and the cost is reduced. And the cleaning speed and the cleaning quality of the wafer are improved. And the operation is safe, and the wafer is not easy to damage. The front infusion plate and the side infusion plate are welded outside the silicon wafer cleaning tank in a pasting way, and the strength of the cleaning tank body can be further increased.
Drawings
Fig. 1 is a schematic diagram of the overall front view structure of the present utility model.
Fig. 2 is an enlarged schematic view of a portion a in fig. 1.
Fig. 3 is a schematic side view of the overall structure of the present utility model.
Fig. 4 is an enlarged schematic view of a portion B in fig. 3.
Fig. 5 is a schematic perspective view of the present utility model.
Fig. 6 is a schematic perspective view of a wall of a cleaning tank according to the present utility model.
Fig. 7 is a schematic view of the front infusion plate structure of the present utility model.
Fig. 8 is a schematic view of a side infusion plate structure of the present utility model.
Detailed Description
The utility model is further described below with reference to the drawings and examples.
A spray device without spray pipe for a silicon wafer cleaning tank is provided with a cleaning tank, wherein the cleaning tank is provided with a tank wall, and a mounting hole 51 for mounting a spray head and a spray head 5 mounted in the mounting hole are arranged at the upper parts of a left side wall 6 and a right side wall 7 in the tank wall; the upper part of the outer wall of the cleaning tank wall provided with the spray head is provided with a side infusion plate which is horizontally arranged, namely a left infusion plate 8 and a right infusion plate 9, the inner side surfaces of the two infusion plates are provided with infusion grooves 42 and reinforcing ribs 43 between the infusion grooves, two long sides 4 and one end 41 of each side infusion plate are provided with sealing edges, and the other end is an opening; a front infusion plate 2 which is horizontally arranged is arranged on the front wall of the cleaning tank between the two opening ends of the left infusion plate and the right infusion plate, the inner side surface of the front infusion plate is provided with an infusion groove 22, and the two ends of the front infusion plate are communicated with the two opening ends of the left infusion plate and the right infusion plate in a sealing way; the plate body of the front infusion plate is provided with a liquid inlet connector 3 which is communicated with a liquid supply and a liquid delivery tank. A water outlet 10 is arranged at the bottom of the cleaning tank body. In this embodiment, the tank body and the infusion plate are made of corrosion-resistant PVDF material. The width of the front infusion plate and the left and right infusion plates is 4cm; the thickness was 0.6cm.
It should be noted that, on the basis of the basic technical scheme of the present utility model, some technical schemes of different sizes and improvements can be made, but all the technical schemes are within the protection scope of the present patent, and the products are regarded as infringement products.
Claims (3)
1. A spray device without a spray pipe for a silicon wafer cleaning tank is provided with a cleaning tank, wherein the cleaning tank is provided with a tank wall, and a mounting hole (51) for mounting a spray head and the spray head (5) mounted in the mounting hole are arranged at the upper parts of a left side wall (6) and a right side wall (7) in the tank wall; the upper part of the outer wall of the cleaning tank wall provided with the spray head is provided with a side infusion plate which is horizontally arranged, namely a left side infusion plate (8) and a right side infusion plate (9), the inner side surfaces of the two infusion plates are provided with infusion grooves (42) and reinforcing ribs (43) between the infusion grooves, two long sides (4) and one end (41) of each side infusion plate are provided with sealing edges, and the other end is an opening; a front infusion plate (2) which is horizontally arranged is arranged at the upper part of the front wall of the cleaning tank between the two opening ends of the left infusion plate and the right infusion plate, an infusion groove (22) is arranged on the inner side surface of the front infusion plate, and two ends of the front infusion plate are communicated with the two opening ends of the left infusion plate and the right infusion plate in a sealing way; the front infusion plate body is provided with a liquid inlet connector (3) which is communicated with a liquid supply source of cleaning liquid and an infusion groove, and the bottom of the cleaning groove is provided with a water outlet (10).
2. The shower-free spray device of claim 1, wherein: the tank body and the infusion plate of the cleaning tank are made of corrosion-resistant PVDF materials.
3. The shower-free spray device of claim 1, wherein: the width of the front infusion plate and the left and right infusion plates is 3-5cm; the thickness is 0.5-0.8cm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320178820.4U CN219425080U (en) | 2023-02-10 | 2023-02-10 | Spray device without spray pipe for silicon wafer cleaning tank |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320178820.4U CN219425080U (en) | 2023-02-10 | 2023-02-10 | Spray device without spray pipe for silicon wafer cleaning tank |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN219425080U true CN219425080U (en) | 2023-07-28 |
Family
ID=87345358
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202320178820.4U Active CN219425080U (en) | 2023-02-10 | 2023-02-10 | Spray device without spray pipe for silicon wafer cleaning tank |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN219425080U (en) |
-
2023
- 2023-02-10 CN CN202320178820.4U patent/CN219425080U/en active Active
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