CN219329260U - Packaging structure - Google Patents

Packaging structure Download PDF

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CN219329260U
CN219329260U CN202223433523.4U CN202223433523U CN219329260U CN 219329260 U CN219329260 U CN 219329260U CN 202223433523 U CN202223433523 U CN 202223433523U CN 219329260 U CN219329260 U CN 219329260U
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pad
layer
metal layer
dielectric layer
package structure
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谢孟伟
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Advanced Semiconductor Engineering Inc
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Advanced Semiconductor Engineering Inc
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Abstract

本实用新型涉及一种封装结构,封装结构包括线路层。线路层包括介电层和焊盘,焊盘内埋于介电层内,并且焊盘由介电层的顶表面暴露,焊盘的上表面与介电层的顶表面对齐。封装结构还包括金属层,金属层设置在焊盘与介电层之间的界面上方。本申请的上述技术方案通过在介电层和焊盘之间的界面上方设置金属层,至少可以避免介电层与焊盘之间的界面处分层问题。

Figure 202223433523

The utility model relates to a packaging structure, which includes a circuit layer. The circuit layer includes a dielectric layer and a pad, the pad is embedded in the dielectric layer, and the pad is exposed from the top surface of the dielectric layer, and the top surface of the pad is aligned with the top surface of the dielectric layer. The package structure also includes a metal layer disposed over the interface between the pad and the dielectric layer. The above technical solution of the present application can at least avoid the problem of delamination at the interface between the dielectric layer and the pad by disposing the metal layer above the interface between the dielectric layer and the pad.

Figure 202223433523

Description

封装结构Package structure

技术领域technical field

本实用新型涉及半导体技术领域,更具体地,涉及一种封装结构。The utility model relates to the technical field of semiconductors, in particular to a packaging structure.

背景技术Background technique

参考图1A至图1D所示,现行芯片后装(chip last)制程可以包括以下步骤:参考图1A所示,在重分布层(RDL,Redistribution Layer)载体10上形成扇出(Fan-out)重分布层20;参考图1B所示,在重分布层20上连接电子器件32并使用模塑料36模制电子器件32,并且在模塑料36和电子器件32上方设置载体40;参考图1C所示,去除图1B中的重分布层载体10,暴露重分布层20的介电层22和焊盘24;参考图1D所示,将图1C所示的结构倒置,再在重分布层20的暴露的焊盘24上形成焊球50。Referring to FIG. 1A to FIG. 1D, the current chip last process may include the following steps: Referring to FIG. 1A, fan-out (Fan-out) is formed on a redistribution layer (RDL, Redistribution Layer) carrier 10 Redistribution layer 20; as shown in FIG. 1B, connect electronic device 32 on redistribution layer 20 and use molding compound 36 to mold electronic device 32, and set carrier 40 above molding compound 36 and electronic device 32; refer to FIG. 1C As shown, the redistribution layer carrier 10 in FIG. 1B is removed, and the dielectric layer 22 and the pad 24 of the redistribution layer 20 are exposed; as shown in FIG. 1D, the structure shown in FIG. Solder balls 50 are formed on the exposed pads 24 .

在上述现行芯片后装制程中,在去除图1B中连接焊盘24的重分布层载体10之后,因焊盘24的用以连接焊球50的接合面与介电层22的表面接近齐平且彼此不覆盖(见图1D),因此可能面临以下两个问题:In the above-mentioned current chip post-assembly process, after removing the redistribution layer carrier 10 connecting the pads 24 in FIG. And do not cover each other (see Figure 1D), so the following two problems may be faced:

(1)如图1E所示,介电层22的表面和焊盘24的接合面齐平,容易因热应力使介电层22与焊盘24之间的界面处有产生分层55的风险。(1) As shown in FIG. 1E , the surface of the dielectric layer 22 is flush with the bonding surface of the pad 24 , and there is a risk of delamination 55 at the interface between the dielectric layer 22 and the pad 24 due to thermal stress. .

(2)如图1F所示,焊盘24的接合面为非碗形结构,落球(ball drop)后的回流过程中,焊球50会有滑动风险,造成焊球50未连接在焊盘24上,或可能造成焊球50桥接(ballbridge)。现有的焊球形成良率预估只有80%,可靠度风险较高。(2) As shown in FIG. 1F , the bonding surface of the pad 24 is a non-bowl-shaped structure. During the reflow process after the ball drop (ball drop), the solder ball 50 may slide, causing the solder ball 50 to not be connected to the pad 24 On, or may cause solder ball 50 bridge (ballbridge). The existing solder ball formation yield is estimated to be only 80%, and the reliability risk is relatively high.

如图2所示,上述问题虽然可以利用另外一层介电层62覆盖重分布层20的介电层22与焊盘24之间的界面来解决如图1E所示的分层问题,并且可以通过在介电层22上开孔暴露焊盘24形成碗形结构来解决如图1F所示的焊球滑动风险,但是将使介电层62覆盖部分焊盘24,而影响电性效能。As shown in FIG. 2, although the above problem can be solved by using another layer of dielectric layer 62 to cover the interface between the dielectric layer 22 of the redistribution layer 20 and the pad 24 to solve the delamination problem shown in FIG. 1E, and can Opening holes on the dielectric layer 22 to expose the pads 24 to form a bowl-shaped structure can solve the risk of solder ball sliding as shown in FIG. 1F , but the dielectric layer 62 will cover part of the pads 24 and affect electrical performance.

实用新型内容Utility model content

针对相关技术中的上述问题,本实用新型提出一种封装结构,至少可以解决焊盘与介电层之间界面处的分层问题。In view of the above problems in the related art, the utility model proposes a packaging structure, which can at least solve the delamination problem at the interface between the pad and the dielectric layer.

根据本实用新型的实施例,提供了一种封装结构。封装结构包括线路层。线路层包括介电层和焊盘,焊盘内埋于介电层内,并且焊盘由介电层的顶表面暴露,焊盘的上表面与介电层的顶表面对齐。封装结构还包括金属层,金属层设置在焊盘与介电层之间的界面上方。According to an embodiment of the present invention, a packaging structure is provided. The encapsulation structure includes a wiring layer. The circuit layer includes a dielectric layer and a pad, the pad is embedded in the dielectric layer, and the pad is exposed from the top surface of the dielectric layer, and the top surface of the pad is aligned with the top surface of the dielectric layer. The package structure also includes a metal layer disposed over the interface between the pad and the dielectric layer.

在一些实施例中,封装结构还包括电连接件,金属层具有暴露焊盘的开口,电连接件穿过开口连接到焊盘,使得电连接件位于焊盘上方。In some embodiments, the package structure further includes an electrical connector, the metal layer has an opening exposing the pad, and the electrical connector is connected to the pad through the opening so that the electrical connector is located above the pad.

在一些实施例中,金属层为环形结构,并暴露焊盘的上表面的一部分。In some embodiments, the metal layer is a ring structure and exposes a portion of the upper surface of the pad.

在一些实施例中,封装结构还包括电连接件,电连接件接触金属层及焊盘的上表面的一部分。In some embodiments, the package structure further includes an electrical connector contacting the metal layer and a portion of the upper surface of the pad.

在一些实施例中,封装结构还包括晶种层,晶种层位于界面与金属层之间。In some embodiments, the package structure further includes a seed layer located between the interface and the metal layer.

在一些实施例中,金属层的下表面的一部分接触介电层的顶表面,金属层的下表面的另一部分接触焊盘的上表面。In some embodiments, a portion of the lower surface of the metal layer contacts the top surface of the dielectric layer and another portion of the lower surface of the metal layer contacts the upper surface of the pad.

在一些实施例中,焊盘的上表面为第一上表面,焊盘还具有低于第一上表面的第二上表面,金属层从第一上表面延伸到第二上表面上。In some embodiments, the upper surface of the pad is a first upper surface, the pad further has a second upper surface lower than the first upper surface, and the metal layer extends from the first upper surface to the second upper surface.

在一些实施例中,第一上表面围绕第二上表面,金属层暴露焊盘的第二上表面的一部分。In some embodiments, the first upper surface surrounds the second upper surface, and the metal layer exposes a portion of the second upper surface of the pad.

在一些实施例中,封装结构还包括电连接件,电连接件接触金属层及焊盘的第二上表面的一部分。In some embodiments, the package structure further includes an electrical connector contacting the metal layer and a portion of the second upper surface of the bonding pad.

在一些实施例中,电连接件通过金属层与介电层的顶表面隔开。In some embodiments, the electrical connections are separated from the top surface of the dielectric layer by the metal layer.

本申请的上述封装结构,通过在介电层和焊盘之间的界面上方设置金属层,可以避免介电层与焊盘之间界面处的分层问题;可以将电连接件限位在金属层和焊盘上,因此降低了电连接件相对于焊盘的位置偏移,可以解决焊盘的上表面与介电层的顶表面齐平时的滑动风险。另外,与现有通过使用介电层覆盖部分焊盘来解决分层问题和滑动风险会影响电性效能的方式相比,本申请的封装结构可以避免对电性效能的不利影响。The above-mentioned packaging structure of the present application can avoid the delamination problem at the interface between the dielectric layer and the pad by arranging the metal layer above the interface between the dielectric layer and the pad; the electrical connector can be limited to the metal layer layer and pad, thus reducing the positional offset of the electrical connector relative to the pad, which can solve the risk of slippage when the upper surface of the pad is flush with the top surface of the dielectric layer. In addition, compared with the existing method of using a dielectric layer to cover part of the pads to solve the delamination problem and the risk of sliding that will affect the electrical performance, the packaging structure of the present application can avoid adverse effects on the electrical performance.

附图说明Description of drawings

当结合附图进行阅读时,从以下详细描述可最佳理解本实用新型的各个方面。应当注意,根据工业中的标准实践,各个部件并非按比例绘制。事实上,为了清楚讨论,各个部件的尺寸可以任意增大或减小。Aspects of the present invention are best understood from the following detailed description when read with the accompanying drawings. It should be noted that, in accordance with the standard practice in the industry, various features are not drawn to scale. In fact, the dimensions of the various features may be arbitrarily increased or decreased for clarity of discussion.

图1A至图1D现有技术中形成一种封装结构的多个阶段的截面示意图。1A to 1D are schematic cross-sectional views of various stages of forming a packaging structure in the prior art.

图1E和图1F分别是现有技术中产生的分层风险和焊球滑动风险的结构示意图。FIG. 1E and FIG. 1F are structural schematic diagrams of delamination risk and solder ball sliding risk generated in the prior art, respectively.

图2是现有技术中另一种封装结构的截面示意图。FIG. 2 is a schematic cross-sectional view of another package structure in the prior art.

图3A是根据本申请的一个实施例的封装结构的截面示意图。FIG. 3A is a schematic cross-sectional view of a package structure according to an embodiment of the present application.

图3B是图3A所示的金属层的俯视示意图。FIG. 3B is a schematic top view of the metal layer shown in FIG. 3A .

图4是根据本申请的另一实施例的封装结构的截面示意图。FIG. 4 is a schematic cross-sectional view of a package structure according to another embodiment of the present application.

图5是根据本申请的另一实施例的封装结构的截面示意图。FIG. 5 is a schematic cross-sectional view of a package structure according to another embodiment of the present application.

图6A至图6E是根据本申请的实施例形成封装结构的多个阶段的截面示意图。6A to 6E are schematic cross-sectional views of various stages of forming a package structure according to an embodiment of the present application.

具体实施例specific embodiment

下列公开提供了许多用于实现所提供主题的不同特征的不同实施例或实例。下面将描述元件和布置的特定实例以简化本实用新型。当然这些仅仅是实例并不旨在限定本实用新型。例如,在以下描述中,在第二部件上方或上形成第一部件可以包括第一部件和第二部件直接接触的实施例,也可以包括在第一部件和第二部件之间形成额外的部件使得第一部件和第二部件可以不直接接触的实施例。而且,本实用新型在各个实例中可重复参考数字和/或字母。这种重复仅是为了简明和清楚,其自身并不表示所论述的各个实施例和/或配置之间的关系。The following disclosure provides many different embodiments or examples for implementing different features of the presented subject matter. Specific examples of components and arrangements are described below to simplify the present disclosure. Of course, these are just examples and are not intended to limit the utility model. For example, in the following description, forming a first component over or on a second component may include embodiments in which the first component and the second component are in direct contact, or may include forming an additional component between the first component and the second component An embodiment such that the first part and the second part may not be in direct contact. Also, the present invention may repeat reference numerals and/or letters in various instances. This repetition is for brevity and clarity only and does not in itself indicate a relationship between the various embodiments and/or configurations discussed.

根据本申请的实施例提供了一种封装结构。图3A是根据本申请的一个实施例的封装结构100的截面示意图。参考图3A所示,封装结构100包括线路层120。在一些实施例中,线路层120是重分布层。线路层120可以包括介电层121和内埋于介电层121内的焊盘126。线路层120还可以包括位于介电层121下方另外的介电层122、123、124。图3A中示出了线路层120总共包括四个堆叠设置的介电层121、122、123、124,但是也可以包括其他数量的介电层。介电层121是线路层120的介电层121、122、123、124中最上一层的介电层。Embodiments according to the present application provide a packaging structure. FIG. 3A is a schematic cross-sectional view of a package structure 100 according to an embodiment of the present application. Referring to FIG. 3A , the packaging structure 100 includes a wiring layer 120 . In some embodiments, the wiring layer 120 is a redistribution layer. The wiring layer 120 may include a dielectric layer 121 and a pad 126 embedded in the dielectric layer 121 . The wiring layer 120 may further include another dielectric layer 122 , 123 , 124 located under the dielectric layer 121 . FIG. 3A shows that the circuit layer 120 includes four dielectric layers 121 , 122 , 123 , and 124 stacked in total, but may also include other numbers of dielectric layers. The dielectric layer 121 is the uppermost dielectric layer among the dielectric layers 121 , 122 , 123 , 124 of the wiring layer 120 .

焊盘126的上表面126u由介电层121的顶表面121t暴露。焊盘126的上表面126u与介电层121的顶表面121t对齐,即共面。焊盘126与介电层121之间具有界面125。封装结构100还包括金属层130,金属层130设置在焊盘126与介电层121之间的界面125上方。通过在介电层121和焊盘126之间的界面125上方设置金属层130,可以避免介电层121与焊盘126之间界面125处的分层问题。由于避免了分层问题,所以焊盘126的全部侧面可均与介电层121接触以形成界面125。The upper surface 126u of the pad 126 is exposed by the top surface 121t of the dielectric layer 121 . The upper surface 126u of the pad 126 is aligned with, ie, coplanar with, the top surface 121t of the dielectric layer 121 . There is an interface 125 between the pad 126 and the dielectric layer 121 . The package structure 100 also includes a metal layer 130 disposed over the interface 125 between the pad 126 and the dielectric layer 121 . By disposing the metal layer 130 over the interface 125 between the dielectric layer 121 and the pad 126, delamination problems at the interface 125 between the dielectric layer 121 and the pad 126 can be avoided. Since the delamination problem is avoided, all sides of the pad 126 can be in contact with the dielectric layer 121 to form the interface 125 .

金属层130从介电层121的顶表面121t跨过界面125延伸到焊盘126的上表面126u上。这样,金属层130的下表面130b的一部分130b1接触介电层121的顶表面121t,金属层130的下表面130b的另一部分130b2接触焊盘126的上表面126u。封装结构100还包括连接焊盘126的电连接件150。电连接件150位于焊盘126和金属层130上。在一些实施例中,电连接件150可以是焊球等用以电性连接的部件。电连接件150不与介电层121接触,电连接件150通过金属层130与介电层121的顶表面121t隔开。Metal layer 130 extends from top surface 121 t of dielectric layer 121 across interface 125 to upper surface 126 u of pad 126 . Thus, a portion 130b1 of the lower surface 130b of the metal layer 130 contacts the top surface 121t of the dielectric layer 121 , and another portion 130b2 of the lower surface 130b of the metal layer 130 contacts the upper surface 126u of the pad 126 . The package structure 100 also includes electrical connections 150 to the pads 126 . Electrical connections 150 are located on pads 126 and metal layer 130 . In some embodiments, the electrical connector 150 may be a component for electrical connection such as a solder ball. The electrical connector 150 is not in contact with the dielectric layer 121 , and the electrical connector 150 is separated from the top surface 121 t of the dielectric layer 121 by the metal layer 130 .

金属层130可以由任何适用的金属材料形成。可以和电连接件150形成共晶的材料均可用于形成金属层130。在一些实施例中,金属层130的材料可以是铜,即金属层130为铜层。在另一些实施例中,金属层130的材料可以包括镍和金,在这样的实施例中,金属层130包括由化学镍金(ENIG)制程形成的镍层和镍层上的金层。在一些实施例中,金属层130与焊盘126可以由相同的材料形成,例如金属层130和焊盘126的材料可以都是铜。在另一些实施例中,金属层130与焊盘126可以由不同的材料形成。Metal layer 130 may be formed of any suitable metal material. Materials that can form a eutectic with the electrical connector 150 can be used to form the metal layer 130 . In some embodiments, the material of the metal layer 130 may be copper, that is, the metal layer 130 is a copper layer. In other embodiments, the material of the metal layer 130 may include nickel and gold. In such an embodiment, the metal layer 130 includes a nickel layer formed by an electroless nickel gold (ENIG) process and a gold layer on the nickel layer. In some embodiments, the metal layer 130 and the bonding pad 126 may be formed of the same material, for example, the metal layer 130 and the bonding pad 126 may be made of copper. In other embodiments, the metal layer 130 and the bonding pad 126 may be formed of different materials.

图3B是图3A所示的金属层130的俯视示意图。为了简明,图3B所示的俯视图对应于金属层130和焊盘126上未形成电连接件150(见图3A)时的俯视图。参考图3B所示,金属层130为环形结构。结合图3A和图3B所示,环形结构的金属层130可以具有暴露焊盘126的开口132,开口132暴露焊盘126的上表面126u的一部分。电连接件150接触金属层130及焊盘126的上表面126u由金属层130暴露的一部分。电连接件150穿过由金属层130限定的开口132连接到焊盘126,使得电连接件150位于焊盘126上方。FIG. 3B is a schematic top view of the metal layer 130 shown in FIG. 3A . For simplicity, the top view shown in FIG. 3B corresponds to the top view when no electrical connection 150 (see FIG. 3A ) is formed on the metal layer 130 and pad 126 . Referring to FIG. 3B , the metal layer 130 is a ring structure. As shown in FIG. 3A and FIG. 3B , the metal layer 130 of the ring structure may have an opening 132 exposing the pad 126 , and the opening 132 exposes a part of the upper surface 126 u of the pad 126 . The electrical connector 150 contacts the metal layer 130 and a portion of the upper surface 126 u of the pad 126 exposed by the metal layer 130 . Electrical connection 150 is connected to pad 126 through opening 132 defined by metal layer 130 such that electrical connection 150 is located over pad 126 .

根据本申请的实施例,金属层130配置为降低电连接件150的位置偏移。由于金属层130突出于焊盘126的上表面126u和介电层121的顶表面121t,因此金属层130与焊盘126可以构造成边缘高中央低的碗形结构。由于金属层130与焊盘126形成了边缘高中央低的碗形结构,当将电连接件150形成在焊盘126上时,可以将电连接件150限位在金属层130和焊盘126处,因此可以解决焊盘126的上表面126u与介电层的顶表面121t齐平时的滑动风险,降低了电连接件150相对于焊盘126的位置偏移,在不增加线路层120厚度的情况下提升了制程良率、增加了结构可靠度,焊球形成良率可以高于99.9%,可靠度的检测失败率可以达到接近0%。另外,与图2所示的通过使用介电层62覆盖部分焊盘24来解决分层问题和滑动风险会影响电性效能的方式相比,本申请的实施例通过设置覆盖部分焊盘126且可导电的金属层130,可以避免对电性效能的不利影响。According to an embodiment of the present application, the metal layer 130 is configured to reduce positional deviation of the electrical connector 150 . Since the metal layer 130 protrudes from the upper surface 126 u of the pad 126 and the top surface 121 t of the dielectric layer 121 , the metal layer 130 and the pad 126 can be configured into a bowl-shaped structure with high edges and low center. Since the metal layer 130 and the pad 126 form a bowl-shaped structure with high edges and a low center, when the electrical connector 150 is formed on the pad 126, the electrical connector 150 can be limited to the metal layer 130 and the pad 126. , so the risk of sliding when the upper surface 126u of the pad 126 is flush with the top surface 121t of the dielectric layer can be solved, and the positional deviation of the electrical connector 150 relative to the pad 126 can be reduced without increasing the thickness of the circuit layer 120 The process yield is improved and the structural reliability is increased. The solder ball formation yield can be higher than 99.9%, and the reliability detection failure rate can reach close to 0%. In addition, compared with the way shown in FIG. 2 by using the dielectric layer 62 to cover part of the pad 24 to solve the problem of delamination and the risk of sliding will affect the electrical performance, the embodiment of the present application covers the part of the pad 126 and The conductive metal layer 130 can avoid adverse effects on electrical performance.

此外,线路层120的与电连接件150相对的一侧可以连接电子器件110。电子器件110可以例如是芯片等。电子器件110由模塑料115包封。电子器件110连接至由线路层120中的最下一层介电层124暴露的焊盘129。In addition, the side of the circuit layer 120 opposite to the electrical connector 150 may be connected to the electronic device 110 . The electronic device 110 may be, for example, a chip or the like. Electronic device 110 is encapsulated by molding compound 115 . The electronic device 110 is connected to pads 129 exposed by the lowermost dielectric layer 124 in the wiring layer 120 .

图4是根据本申请的另一实施例的封装结构100’的截面示意图。参考图4所示,焊盘126和介电层121之间的界面125与金属层130之间可以设置有晶种层127。晶种层127的侧面可以与金属层130的对应侧面垂直对齐。Fig. 4 is a schematic cross-sectional view of a package structure 100' according to another embodiment of the present application. Referring to FIG. 4 , a seed layer 127 may be disposed between the interface 125 between the pad 126 and the dielectric layer 121 and the metal layer 130 . Sides of the seed layer 127 may be vertically aligned with corresponding sides of the metal layer 130 .

图5是根据本申请的另一实施例的封装结构200的截面示意图。在图5所示的封装结构200中,焊盘126的上表面126u包括第一上表面126u1和低于第一上表面126u1的第二上表面126u2。第一上表面126u1对应于焊盘126的边缘区域中,第二上表面126u2对应于焊盘126的中央区域。第一上表面126u1围绕第二上表面126u2。金属层230覆盖焊盘126的第一上表面126u1。金属层230暴露焊盘126的第二上表面126u2的一部分。电连接件150接触金属层230及由金属层230暴露的焊盘126的第二上表面126u2的一部分。FIG. 5 is a schematic cross-sectional view of a package structure 200 according to another embodiment of the present application. In the package structure 200 shown in FIG. 5 , the upper surface 126u of the pad 126 includes a first upper surface 126u1 and a second upper surface 126u2 lower than the first upper surface 126u1 . The first upper surface 126u1 corresponds to the edge region of the bonding pad 126 , and the second upper surface 126u2 corresponds to the central region of the bonding pad 126 . The first upper surface 126u1 surrounds the second upper surface 126u2. The metal layer 230 covers the first upper surface 126u1 of the pad 126 . The metal layer 230 exposes a portion of the second upper surface 126u2 of the pad 126 . The electrical connector 150 contacts the metal layer 230 and a portion of the second upper surface 126u2 of the pad 126 exposed by the metal layer 230 .

金属层230从第一上表面126u1延伸到第二上表面126u2上。可以通过去除焊盘126的一部分而在焊盘126上形成凹槽,从而限定焊盘126的第一上表面126u1和第二上表面126u2。金属层230从介电层121的顶表面121t延伸跨过介电层121和焊盘126之间的界面125,再延伸经过焊盘126的第一上表面126u1,然后向下延伸到焊盘126的第二上表面126u2上。电连接件150不与介电层121接触,电连接件150通过金属层230与介电层121的顶表面121t隔开。The metal layer 230 extends from the first upper surface 126u1 to the second upper surface 126u2. A groove may be formed on the pad 126 by removing a portion of the pad 126 , thereby defining a first upper surface 126u1 and a second upper surface 126u2 of the pad 126 . The metal layer 230 extends from the top surface 121t of the dielectric layer 121 across the interface 125 between the dielectric layer 121 and the bonding pad 126, then extends across the first upper surface 126u1 of the bonding pad 126, and then extends down to the bonding pad 126. on the second upper surface 126u2. The electrical connector 150 is not in contact with the dielectric layer 121 , and the electrical connector 150 is separated from the top surface 121 t of the dielectric layer 121 by the metal layer 230 .

图5所示的金属层230的形状可以增加金属层230与焊盘126的接触面积,可将介电层121与焊盘126扣合在一起,进一步避免介电层121与焊盘126发生分层,另外图5所示的金属层230的形状也能增加金属层230与电连接件150的接触面积,确保电连接件150的固定效果。The shape of the metal layer 230 shown in FIG. 5 can increase the contact area between the metal layer 230 and the pad 126, and can fasten the dielectric layer 121 and the pad 126 together, further preventing separation between the dielectric layer 121 and the pad 126. In addition, the shape of the metal layer 230 shown in FIG. 5 can also increase the contact area between the metal layer 230 and the electrical connector 150 to ensure the fixing effect of the electrical connector 150 .

图5所示的封装结构200的其他方面可以与以上参考图3A和图4所描述的类似,此处不再赘述。Other aspects of the package structure 200 shown in FIG. 5 may be similar to those described above with reference to FIG. 3A and FIG. 4 , and will not be repeated here.

图6A至图6E是根据本申请的实施例形成封装结构的多个阶段的截面示意图。首先参考图6A所示,提供线路层载体610以及形成在线路层载体610上的线路层120。在本实施例中,线路层120可以包括依次形成的四个介电层121、122、123、124。在此阶段,与线路层载体610接触的介电层121中内埋有焊盘126,焊盘126由介电层121暴露且与线路层载体610接触。线路层120的与线路层载体610相对一侧的介电层124中设置有焊盘129,焊盘129由介电层124暴露。6A to 6E are schematic cross-sectional views of various stages of forming a package structure according to an embodiment of the present application. Referring first to FIG. 6A , a circuit layer carrier 610 and a circuit layer 120 formed on the circuit layer carrier 610 are provided. In this embodiment, the circuit layer 120 may include four dielectric layers 121 , 122 , 123 , 124 formed in sequence. At this stage, pads 126 are embedded in the dielectric layer 121 in contact with the circuit layer carrier 610 , and the pads 126 are exposed by the dielectric layer 121 and are in contact with the circuit layer carrier 610 . A pad 129 is disposed in the dielectric layer 124 on the side opposite to the circuit layer carrier 610 of the circuit layer 120 , and the pad 129 is exposed by the dielectric layer 124 .

参考图6B所示,例如利用SMT(Surface Mounted Technology,表面组装技术)制程将电子器件110连接在线路层120的焊盘129上。使用模塑料115模制电子器件110。可以通过研磨制程使模塑料115与电子器件110的表面齐平。然后,在模塑料115和电子器件110上方附接载体620。Referring to FIG. 6B , for example, the electronic device 110 is connected to the pad 129 of the circuit layer 120 by using an SMT (Surface Mounted Technology, surface mount technology) process. The electronic device 110 is molded using a molding compound 115 . The molding compound 115 may be flushed with the surface of the electronic device 110 through a lapping process. Then, a carrier 620 is attached over the molding compound 115 and the electronic device 110 .

参考图6C所示,去除图6B中的线路层载体610,暴露线路层120的介电层121和焊盘126。Referring to FIG. 6C , the circuit layer carrier 610 in FIG. 6B is removed to expose the dielectric layer 121 and the pad 126 of the circuit layer 120 .

参考图6D所示,将图6C所示的结构倒置。此时,介电层121的顶表面121t和焊盘126的上表面126u齐平。介电层121与焊盘126之间具有界面125。接着形成设置在界面125上方的金属层130。金属层130可以类似于以上参考图3A至图3B所描述的金属层130。在一些实施例中,如参考图4所描述的,可以在形成金属层130之前形成首先晶种层127、再在晶种层127上形成金属层130。Referring to FIG. 6D, the structure shown in FIG. 6C is inverted. At this time, the top surface 121t of the dielectric layer 121 is flush with the top surface 126u of the pad 126 . There is an interface 125 between the dielectric layer 121 and the bonding pad 126 . A metal layer 130 disposed over interface 125 is then formed. The metal layer 130 may be similar to the metal layer 130 described above with reference to FIGS. 3A to 3B . In some embodiments, as described with reference to FIG. 4 , before forming the metal layer 130 , the seed layer 127 may be formed first, and then the metal layer 130 may be formed on the seed layer 127 .

参考图6E所示,在金属层130上和焊盘126上形成焊球150。由于在界面125上方设置了金属层130,在形成焊球150时可以将电连接件150限位在焊盘126上,降低了电连接件150相对于焊盘126的位置偏移,可以解决焊盘126的上表面126u与介电层121的顶表面121t齐平时的滑动风险。在一些实施例中,在形成焊球150之后,可以去除载体620,而得到如图3A所示的封装结构100。Referring to FIG. 6E , solder balls 150 are formed on the metal layer 130 and on the pads 126 . Since the metal layer 130 is provided above the interface 125, the electrical connector 150 can be limited on the pad 126 when the solder ball 150 is formed, the positional deviation of the electrical connector 150 relative to the pad 126 is reduced, and the soldering problem can be solved. Risk of slippage when the upper surface 126u of the disk 126 is flush with the top surface 121t of the dielectric layer 121 . In some embodiments, after the solder balls 150 are formed, the carrier 620 can be removed to obtain the package structure 100 as shown in FIG. 3A .

在图6E中形成的焊盘126的上表面160u是平坦表面。在另一实施例中,可以在图6C所示的阶段之后,去除焊盘126的一部分而在焊盘126的上表面处形成凹槽,然后再形成延伸至凹槽中的金属层230而得到如图5所示的封装结构200。The upper surface 160u of the pad 126 formed in FIG. 6E is a flat surface. In another embodiment, after the stage shown in FIG. 6C , a part of the pad 126 may be removed to form a groove on the upper surface of the pad 126, and then a metal layer 230 extending into the groove may be formed to obtain The packaging structure 200 shown in FIG. 5 .

上述内容概括了几个实施例的特征使得本领域技术人员可更好地理解本公开的各个方面。本领域技术人员应该理解,可以很容易地使用本实用新型作为基础来设计或更改其他的处理和结构以用于达到与本实用新型所介绍实施例相同的目的和/或实现相同优点。本领域技术人员也应该意识到,这些等效结构并不背离本实用新型的精神和范围,并且在不背离本实用新型的精神和范围的情况下,可以进行多种变化、替换以及改变。The foregoing summarizes features of several embodiments so that those skilled in the art may better understand the various aspects of the present disclosure. Those skilled in the art should understand that it is easy to use the present invention as a basis to design or modify other processes and structures to achieve the same purpose and/or realize the same advantages as the embodiments introduced in the present invention. Those skilled in the art should also realize that these equivalent structures do not depart from the spirit and scope of the present invention, and that various changes, substitutions and changes can be made without departing from the spirit and scope of the present invention.

Claims (10)

1. A package structure, comprising:
a wiring layer, the wiring layer comprising:
a dielectric layer;
a pad buried within the dielectric layer and exposed by a top surface of the dielectric layer, an upper surface of the pad being aligned with the top surface of the dielectric layer;
and a metal layer disposed over an interface between the pad and the dielectric layer.
2. The package structure of claim 1, further comprising:
an electrical connector, the metal layer having an opening exposing the pad, the electrical connector being connected to the pad through the opening such that the electrical connector is located over the pad.
3. The package structure of claim 1, wherein,
the metal layer is of a ring-shaped structure and exposes a portion of the upper surface of the bonding pad.
4. The package structure of claim 3, further comprising:
an electrical connection contacting the metal layer and the portion of the upper surface of the pad.
5. The package structure of claim 1, further comprising:
a seed layer located between the interface and the metal layer.
6. The package structure of claim 1, wherein,
a portion of a lower surface of the metal layer contacts the top surface of the dielectric layer and another portion of the lower surface of the metal layer contacts the upper surface of the pad.
7. The package structure of claim 1, wherein,
the upper surface of the pad is a first upper surface, the pad further has a second upper surface lower than the first upper surface, and the metal layer extends from the first upper surface onto the second upper surface.
8. The package structure of claim 7, wherein,
the first upper surface surrounds the second upper surface, and the metal layer exposes a portion of the second upper surface of the pad.
9. The package structure of claim 8, further comprising:
an electrical connection contacting the metal layer and the portion of the second upper surface of the pad.
10. The package structure of claim 2, wherein,
the electrical connection is separated from the top surface of the dielectric layer by the metal layer.
CN202223433523.4U 2022-12-21 2022-12-21 Packaging structure Active CN219329260U (en)

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Publication Number Publication Date
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