CN219285587U

CN219285587U - Partition exposure plate

Info

Publication number: CN219285587U
Application number: CN202320263737.7U
Authority: CN
Inventors: 王智浩; 张金胜; 冯丽彬; 张登巍; 李鑫
Original assignee: Suzhou Dingxin Photoelectric Technology Co ltd
Current assignee: Suzhou Dingxin Photoelectric Technology Co ltd
Priority date: 2023-02-21
Filing date: 2023-02-21
Publication date: 2023-06-30
Anticipated expiration: 2033-02-21

Abstract

The utility model relates to a zoned exposure plate, which comprises a mark plate, a plurality of exposure plates and a plurality of exposure plates, wherein the mark plate is provided with a plurality of light-transmitting areas; the light barrier is coaxial with the marking disc and is rotationally connected with the marking disc, the light barrier is divided into a plurality of equally-divided sector areas, and the light barrier is provided with sector notches which are equal to the sector areas in size; when the marking disc and the light barrier rotate relatively, a plurality of light-transmitting areas sequentially enter the range of the sector-shaped notch, and a light-transmitting channel is arranged in the area where the marking disc and the sector-shaped notch are not overlapped; the zoned light barrier disclosed by the utility model realizes zoned exposure of the wafer by rotating the sector notch, and is provided with the mark of the mark disc, so that the photosensitive areas of the wafer and the photoresist are limited, the utilization rate of the wafer is improved, the cost of the photoresist and the wafer in a test is greatly reduced, the manpower resource is saved, the operation is simple, and the working efficiency is high.

Description

Partition exposure plate

Technical Field

The utility model relates to the technical field of photoetching, in particular to a partitioned exposure plate.

Background

Because photoresist, wafer and photoresist removing liquid are all consumable materials for semiconductor process, the cost is low, the photoresist removing liquid plays an indispensable role in process development, and in order to save single process cost, multi-position and regional exposure is often carried out on a single wafer so as to reduce process cost. Thereby fumbling for different conditions of exposure, development, etc.

In photolithography, an exposure machine typically includes a light source, a reticle, and a lens. The mask is a quartz plate covered by patterns formed by chromium metal, a light source passes through a light-transmitting area of the mask and irradiates on a wafer coated with photoresist, so that the photoresist exposure area is denatured, after being soaked by developing solution, a photoresist-free area and a photoresist-covered substrate area on the surface of a substrate are left, after being processed by processes such as RIE, PVD and the like, the photoresist is removed, and thus, the patterns on the mask are completely copied to the surface of the wafer.

In the prior art, a whole wafer is used for testing, so that the wafer is easy to waste; in the actual use process, if the requirement of projecting the pattern part on the mask plate, namely, the photoresist on the surface of the wafer is partially exposed, the utilization rate of the wafer can be improved. Therefore, a light shielding and blocking plate can be additionally arranged between the mask plate and the wafer, the part which does not need to be exposed is blocked by the light shielding plate to block light from transmitting, the light is limited to the part which needs to be exposed, and the area of the light irradiation area is controlled by the light shielding plate, so that partial exposure can be realized.

The common mode is that if the aluminum foil paper is cut into a 3/4 light blocking circle and a 1/4 light transmitting circle, the aluminum foil paper is used for shielding the light source above the mask in a partition manner, so that the 4-partition exposure of the photoresist on the surface of the wafer is realized, the method is relatively crude, and the aluminum foil paper has the defects of easiness in raising, low light shielding efficiency and the like in a test; in addition, it is difficult to realize the reuse and the rotation at a fixed angle. Slicing method: cutting a whole wafer into a plurality of areas, and performing different exposure dose tests after gluing, wherein the defects of the method are mainly slicing before gluing, and the edge area after spin gluing has a thick edge effect, so that a mask plate cannot effectively contact the central area of the photoresist to cause light diffraction and scattering, and the defects of saw-tooth patterns and the like; the other is cracking after gluing, and the method is difficult to remove particulate matters and the like brought by slicing. Because the mask plate is in direct contact with the photoresist on the surface of the wafer during exposure, the photoresist is easy to fall off and adhere to the surface of the mask plate, so that the photoetching of the next wafer cannot be performed on the premise of not cleaning the mask plate; at present, a good edging method for a wafer with a non-whole wafer cannot be realized.

Disclosure of Invention

Therefore, the technical problem to be solved by the utility model is to overcome the defects of low efficiency of the photoresist for the partition exposure of the aluminum foil paper and the problem that the aluminum foil paper is difficult to realize rotation at a fixed angle in the prior art, and further provide the partition exposure plate which accurately realizes the partition exposure of the photoresist, and has high exposure efficiency and simple operation.

In order to solve the technical problems, the utility model provides a partition exposure plate, which comprises a mark plate, a plurality of light-transmitting areas and a plurality of light-transmitting areas, wherein the mark plate is provided with a plurality of light-transmitting areas;

the light barrier is coaxial with the marking disc and is rotationally connected with the marking disc, the light barrier is divided into a plurality of equally-divided sector areas, and the light barrier is provided with sector notches which are equal to the sector areas in size; when the sign board and the light barrier rotate relatively, a plurality of light-transmitting areas sequentially enter the range of the sector-shaped notch, and a light-transmitting channel is arranged in the area where the sign board and the sector-shaped notch are not coincident.

In one embodiment of the utility model, the sign board has a diameter smaller than the diameter of the light barrier.

In one embodiment of the utility model, the marking disc is equally provided with a plurality of marking subareas which are in one-to-one correspondence with the sector areas, and the plurality of light transmission areas are evenly distributed on the marking subareas.

In one embodiment of the present utility model, the plurality of light-transmitting regions are non-uniform in shape.

In one embodiment of the utility model, the center of the light barrier is provided with a limit column.

In one embodiment of the utility model, a through hole is arranged in the center of the marking disc, and the through hole is sleeved on the limit post.

In one embodiment of the utility model, the light blocking plate further comprises a circular ring, and the circular ring and the light blocking plate are coaxially arranged.

In one embodiment of the utility model, the ring is provided with a circular groove, and the light barrier is arranged in the circular groove.

In one embodiment of the utility model, the ring is provided with a scale, the scale ranging from 1 ° to 360 °.

In one embodiment of the utility model, the ring is coaxially provided with a limiting ring, the limiting ring is arranged on one side of the ring opposite to the marking disc, and the limiting ring extends along the axial direction of the ring.

Compared with the prior art, the technical scheme of the utility model has the following advantages:

the utility model relates to a partition exposure plate, which comprises a mark plate, a plurality of light-transmitting areas and a plurality of light-transmitting areas, wherein the mark plate is provided with a plurality of light-transmitting areas; the light barrier is coaxial with the marking disc and is rotationally connected with the marking disc, the light barrier is divided into a plurality of equally-divided sector areas, and the light barrier is provided with sector notches which are equal to the sector areas in size; when the marking disc and the light barrier rotate relatively, a plurality of light-transmitting areas sequentially enter the range of the sector-shaped notch, and a light-transmitting channel is arranged in the area where the marking disc and the sector-shaped notch are not overlapped; the zonal exposure to the wafer is realized through rotating the fan-shaped notch, the photosensitive areas of the wafer and the photoresist are limited, the utilization rate of the wafer is improved, the marking disc is provided with the light transmission areas, different light transmission areas rotate to the upper part of the fan-shaped notch, the light source can play a role in marking the wafer on the photoresist through the light transmission areas to expose the areas, the zonal exposure accuracy is further improved, and the manpower resources are saved.

Drawings

In order that the utility model may be more readily understood, a more particular description of the utility model will be rendered by reference to specific embodiments thereof that are illustrated in the appended drawings, in which

Fig. 1 is a schematic diagram of a top view of a zoned barrier in a preferred embodiment of the present utility model.

Fig. 2 is a schematic structural diagram of a top view of the zoned light barrier shown in fig. 1.

Fig. 3 is a schematic structural diagram of a side view of the zoned light barrier shown in fig. 1.

Fig. 4 is a schematic structural view of a bottom view of the partition wall shown in fig. 1.

Fig. 5 is a schematic structural view of the sign board of the partition wall shown in fig. 1.

Fig. 6 is a schematic view of the ring of the partition wall shown in fig. 1.

Description of the specification reference numerals: 1. a circular ring; 2. a light barrier; 3. a fan-shaped notch; 4. a sign plate; 5. a light-transmitting region; 6. a limiting ring; 7. a limit column; 8. a light transmission channel; 9. a through hole; 10. a groove.

Detailed Description

The present utility model will be further described with reference to the accompanying drawings and specific examples, which are not intended to be limiting, so that those skilled in the art will better understand the utility model and practice it.

Examples

In one embodiment of the present utility model, referring to fig. 1, the partition exposure plate of the present utility model includes a marking disc 4, where the marking disc 4 is an auxiliary tool capable of freely rotating, and is mainly composed of a black antistatic and opaque material, the marking disc 4 may be made of a material with high mechanical strength such as stainless steel material, hard alumina, etc., so as to ensure the strength and stability of the marking disc 4, the marking disc 4 is provided with a transparent area 5, and the transparent area 5 may be a number or other pattern which is easy for human eyes to respectively; the light source of the photoetching machine can make patterns or numbers on the photoresist through the light-transmitting area 5, the size of the light-transmitting area 5 is larger than that of the patterns on the mask, and whether the photoresist in the area is exposed can be judged by observing whether the light-transmitting area 5 exists or not on the wafer.

In one embodiment of the present utility model, referring to fig. 1, the light barrier 2 is coaxially and rotationally connected with the marking disc 4, the light barrier 2 is mainly made of black antistatic and opaque materials, and the light barrier 2 can be made of stainless steel materials, hard aluminum oxide and other materials with high mechanical strength, so that the light barrier 2 is ensured to have high strength, good stability and high shielding efficiency; the light barrier 2 is provided with a 1/4 large sector notch 3 and four sector partitions with equal areas, the sector notch 3 is equal to the sector partitions in size, and it is noted that a plurality of sector partitions with equal areas are divided in area and are not spliced by a single physical structure; a 1/4 light source of the photoetching machine irradiates a 1/4 area on a wafer through the sector notch 3 and exposes the wafer; the 3/4 light source of the photoetching machine is blocked by the light barrier 2, and the corresponding 3/4 wafer cannot be exposed; the sector notch 3 is aligned to different areas of the wafer by rotating the light barrier 2, so that a new exposure area of the photoresist is tightly connected with an already exposed area, thereby realizing the partitioned exposure of the wafer and improving the utilization rate of the wafer; the area of the marking disc 4, which is not overlapped with the sector-shaped notch 3, is provided with a light transmission channel 8, and the area of the marking disc 4, which is overlapped with the sector-shaped notch 3, is far smaller than the light transmission channel 8; a light source of the photoetching machine enters the sector notch 3 through the light-transmitting channel 8; when the marking disc 4 rotates relative to the light barrier 2, different light-transmitting areas 5 sequentially enter the areas of the sector-shaped notch 3, and the sector-shaped notch 3 corresponds to one light-transmitting area 5, so as to ensure that part of light sources of the photoetching machine can simultaneously etch the shape of the light-transmitting area 5 on a wafer through the light-transmitting area 5, the exposed wafer is engraved with patterns of the light-transmitting area 5 and patterns of a mask, and the patterns of the light-transmitting area 5 reach the effect of marking the exposed area.

In one embodiment of the utility model, as shown in fig. 1 and 5, the diameter of the sign board 4 is smaller than the diameter of the light barrier 2, and the area of the overlapping area of the sign board 4 and the sector-shaped notch 3 is much smaller than the area of the light-transmitting channel 8, so as to prevent the sign board 4 from blocking most of the light source entering the sector-shaped notch 3 by the lithography machine.

In one embodiment of the present utility model, referring to fig. 1, the sign board 4 is equally divided into a plurality of sign partitions corresponding to the sector areas one by one, it should be noted that the sign partitions are divided in area, and are not a splice of a single physical structure, a plurality of light-transmitting areas 5 are correspondingly arranged on the sign partitions one by one, the light barrier 2 and the sign board 4 rotate by the same angle, and the light-transmitting areas 5 can coincide with the sector gaps 3; the light-transmitting area 5 is in millimeter or centimeter level, and can be observed by human eyes or a microscope, and the micron-level pattern relative to the mask can be identified relatively simply, and whether the photoresist in the area is carved with the pattern of the mask can be judged by identifying whether the photoresist has numbers or the pattern.

In one embodiment of the present utility model, referring to fig. 1, the transparent regions 5 of each mark section are not uniform in shape, the transparent regions 5 may be digital and have a pattern that can be easily recognized, and a plurality of exposure regions on the wafer may be marked by different patterns of transparent regions 5 engraved on the photoresist.

In one embodiment of the present utility model, referring to fig. 3, a limit post 7 is welded to the center of the light barrier 2, and the limit post 7 is perpendicular to the light barrier 2.

In one embodiment of the present utility model, referring to fig. 5, a through hole 9 is provided at the center of the marking disc 4, the through hole 9 is sleeved on the limiting post 7, and the marking disc 4 can rotate around the limiting post 7.

In one embodiment of the present utility model, referring to fig. 1 and 2, the light barrier 2 further comprises a circular ring 1, and stainless steel, hard aluminum oxide or other materials with high mechanical strength can be used for the light barrier 2; the circular ring 1 and the light barrier 2 are coaxially arranged, and the circular ring 1 is larger than the diameter of the light barrier 2; the circular ring 1 is provided with scales in a ring mode, the scales correspond to two sides of the sector-shaped notch 3, and the sector-shaped notch 3 can rotate according to a precise angle.

In one embodiment of the present utility model, referring to fig. 1 and 6, the circular ring 1 is provided with a circular groove 10, the light barrier 2 can be just placed in the circular groove 10, the surface of the circular groove 10 is smooth, the light barrier 2 can rotate in the circular groove 10 by a human hand, and the circular groove 10 can horizontally limit the light barrier 2.

In one embodiment of the present utility model, referring to fig. 1, the ring 1 is provided with a scale, the scale ranges from 1 ° to 360 °, the circumference of the scale is disposed on the ring 1, and by combining two edges of the sector-shaped notch 3, the light barrier 2 can precisely rotate at a certain angle, and the scale can be engraved on the surface of the ring 1, so that the scale is not affected by abrasion caused by extending in use.

In one embodiment of the present utility model, referring to fig. 4, the ring 1 is coaxially provided with a limiting ring 6, the limiting ring 6 extends axially, and the limiting ring 6 is used for being embedded into a groove of a photolithography machine for adsorbing a mask clamp, so as to realize the limiting of the light barrier 2 in the horizontal direction; the limiting ring 6 is welded on one side of the circular ring 1, which is opposite to the light barrier 2, the limiting ring 6 is coaxial with the circular ring 1, the diameter of the limiting ring 6 is larger than that of the light barrier 2, and the limiting ring 6 does not affect the propagation of a light source.

The working principle of the partition exposure plate provided by the utility model is as follows:

the circular ring 1 is horizontally placed above the upper mask, the limiting ring 6 is embedded into a groove of the mask clamp of the photoetching machine to limit the circular ring 1 in the horizontal direction, and then the light barrier 2 is placed in the circular groove 10; the mask plate is arranged below the light barrier 2, and a wafer is arranged below the mask plate; the light source of the photoetching machine irradiates on the surface of the light barrier 2, part of the light source is blocked by the light barrier 2 and cannot reach the mask, part of the light source irradiates on the mask through the sector-shaped notch 3, the light source further exposes photoresist through the mask, meanwhile, part of the light source passes through the light-transmitting area 5, only the light source of the light-transmitting area 5 irradiating on the sector-shaped notch can irradiate on the mask, and the light sources of other light-transmitting areas 5 are blocked by the light barrier 2; the shape of the light-transmitting area 5 on the sector-shaped notch 3 plays a role in marking the exposure area on the wafer because the light-transmitting area is remained on the photoresist, so that the identification degree of the exposure area is improved; after the light source completes exposure of the area of one sector area of the wafer, the light barrier 2 is manually rotated, so that the sector notch 2 is rotated to the next exposure area of the wafer; simultaneously rotating the marking disc 4 to enable different light-transmitting areas 5 to rotate to the range of the sector-shaped notch 2, and continuously exposing the wafer by the light source of the photoresist; the sizes of the sector notch 3 and the sector partition of the light barrier 2 can be designed to flexibly control the exposure area of the photoresist, improve the utilization rate of the wafer and reduce the production cost; the light barrier 2 is rotatably connected with the marking disc 4 and can relatively and freely rotate, so that different light-transmitting areas 5 can be formed on the photoresist; the circular ring 1 is provided with scales, and the scales are matched with two edges of the sector-shaped notch, so that the light barrier 2 can be controlled to accurately rotate according to a certain angle.

It is apparent that the above examples are given by way of illustration only and are not limiting of the embodiments. Other variations and modifications of the present utility model will be apparent to those of ordinary skill in the art in light of the foregoing description. It is not necessary here nor is it exhaustive of all embodiments. And obvious variations or modifications thereof are contemplated as falling within the scope of the present utility model.

Claims

1. A zoned exposure plate is characterized by comprising,

a sign plate provided with a plurality of light-transmitting areas;

2. A segmented exposure plate as claimed in claim 1, wherein the sign plate has a diameter smaller than the diameter of the light barrier.

3. The partitioned exposure plate according to claim 1, wherein the marking disc is equally divided into a plurality of marking partitions corresponding to the sector areas one by one, and a plurality of the light-transmitting areas are evenly distributed on the marking partitions.

4. The segmented exposure plate of claim 1, wherein a plurality of the light-transmitting regions are non-uniform in shape.

5. The partitioned exposure panel of claim 1, wherein the center of the light barrier is provided with a limit post.

6. The partitioned exposure plate of claim 5, wherein a through hole is formed in the center of the marking plate, and the through hole is sleeved on the limiting column.

7. The segmented exposure plate of claim 1, further comprising a ring disposed coaxially with the light barrier.

8. The segmented exposure plate of claim 7, wherein the annular ring is provided with a circular recess, and the light barrier is disposed within the circular recess.

9. The segmented exposure plate of claim 7, wherein the annular ring is provided with graduations ranging from 1 ° to 360 °.

10. The segmented exposure plate of claim 7, wherein the ring is coaxially provided with a stop ring disposed on a side of the ring opposite the marker disc, the stop ring extending axially thereof.