CN219042110U

CN219042110U - Film residue treatment device for etching line photoresist removing section

Info

Publication number: CN219042110U
Application number: CN202223260072.9U
Authority: CN
Inventors: 汪中平; 从光军; 李齐东; 刘永明
Original assignee: KUNSHAN HULI MICROELECTRONICS CO Ltd
Current assignee: KUNSHAN HULI MICROELECTRONICS CO Ltd
Priority date: 2022-12-06
Filing date: 2022-12-06
Publication date: 2023-05-16
Anticipated expiration: 2032-12-06

Abstract

The utility model discloses a film residue treatment device for an etching line photoresist removing section in the technical field of film residue treatment for the etching line photoresist removing section in the PCB industry, and aims to solve the problems of film residue dehydration, recovery and the like in the prior art. The device comprises a first stripping groove, a second stripping groove, a conveying device, a supporting platform, a liquid medicine collecting groove and dehydration equipment; the liquid medicine collecting groove is arranged above the supporting platform; the dewatering equipment is arranged above the liquid medicine collecting tank; one side of the dehydration equipment is provided with a film slag discharge channel; the two ends of the conveying device are respectively a motor end and a discharge end; a first funnel is arranged at the bottom outlet of the first stripping groove; the first funnel is arranged on the working surface of the dehydration equipment and is communicated with the discharge end of the conveying device; a second funnel is arranged at the bottom of the second stripping groove; the second hopper is communicated with the vicinity of the first motor end of the conveying device; the method is suitable for film residue treatment of the etching line photoresist removing section in the PCB industry, reduces the water content of the film residue, increases the recovery rate of liquid medicine, and avoids excessive waste of resources.

Description

Film residue treatment device for etching line photoresist removing section

Technical Field

The utility model relates to a film residue treatment device for an etching line photoresist removing section, and belongs to the technical field of film residue treatment of etching line photoresist removing sections in the PCB industry.

Background

The production process of the printed circuit board (printed circuit board) involves a large amount of acid and alkali etching production processes, wherein a large amount of film residues are generated in the normal operation production process of the etching line photoresist removing section, and the film residues have strong water absorption and high water content.

At present, film residues generated in the etching line photoresist removing section are collected by using a collecting box and a woven bag, and simple draining action is completed through the woven bag, so that dropped liquid medicine is recycled to the liquid medicine tank. When the membrane slag produces a certain amount, the woven bag filled with the membrane slag is lifted out, the collected membrane slag is required to be entrusted to a qualified hazardous waste manufacturer for treatment, the outsourcing treatment cost is in direct proportion to the weight of the membrane slag, the water content of the membrane slag in the woven bag is higher, the weight of the membrane slag can be greatly increased, and meanwhile, the water quantity of the recycled medicine is insufficient, so that a large amount of fresh medicine liquid is required to be supplemented to meet the requirement of normal production. The method for collecting and disposing the inner film slag in the PCB industry can raise the production cost and the dangerous waste disposal cost.

Disclosure of Invention

The utility model aims to overcome the defects in the prior art, and provides a film residue treatment device for a photoresist removing section of an etching line, which can discharge and collect liquid medicine in film residues, avoid waste, collect dehydrated film residues by adopting a film residue collecting trolley, reduce treatment cost and improve working efficiency.

In order to achieve the above purpose, the utility model is realized by adopting the following technical scheme:

the utility model provides a film residue treatment device of an etching line photoresist removing section, which comprises a first film removing groove, a second film removing groove, a conveying device, a supporting platform, a liquid medicine collecting groove and dewatering equipment, wherein the first film removing groove is arranged on the first film removing groove; the liquid medicine collecting groove is arranged above the supporting platform; the dehydration equipment is arranged above the liquid medicine collecting tank; a film slag discharging channel is arranged on one side of the dehydration equipment; the two ends of the conveying device are respectively a motor end and a discharge end;

a first funnel is arranged at the bottom outlet of the first stripping groove; the first hopper is arranged on the working surface of the dehydration equipment and is communicated with the discharge end of the conveying device; a second funnel is arranged at the bottom of the second stripping groove; the second hopper is communicated with the vicinity of the first motor end of the conveying device.

Further, the second stripping grooves are provided with a plurality of second hopper, and are communicated with the conveying device through respective second hopper.

Further, a conveying screw is arranged in the conveying device; the first motor of the conveying device drives the conveying screw to rotate, and the film residue with the liquid medicine, which is discharged from the second film removing groove, is conveyed.

Further, the conveying device comprises a film slag conveying pipe; the conveying screw is arranged in the film slag conveying pipe; the pipe diameter of the film slag conveying pipe is 15cm.

Further, the pipe diameter of the liquid medicine conveying pipeline is 0.5cm.

Further, a plurality of supporting pieces are arranged at the bottom of the conveying device; the support piece comprises two support rods which are connected in an H shape; one end of the supporting rod is connected with the conveying device, and the other end of the supporting rod is supported on the ground.

Further, an extrusion double screw is arranged in the dehydration equipment; and the second motor of the dehydration equipment drives the extrusion double screw to rotate, and the membrane residues with the liquid medicine, which are discharged from the first membrane removing groove and the second membrane removing groove, are dehydrated.

Further, the device also comprises a liquid medicine conveying pipeline; one end of the liquid medicine conveying pipeline is communicated with the liquid medicine collecting tank; the other end is provided with a water suction pump.

Further, the device also comprises a membrane slag collecting trolley; the membrane slag collecting trolley is arranged below the discharge channel and is used for collecting the dehydrated membrane slag discharged by the dehydrating equipment.

Further, a PLC control system is arranged on the membrane slag collecting trolley.

Compared with the prior art, the utility model has the beneficial effects that:

the utility model provides a film residue treatment device of an etching line photoresist removing section, wherein film residues of a second film removing groove are conveyed into a first funnel of a first film removing groove through a conveying device and are discharged to a dehydration device through the first funnel simultaneously with the film residues of the first film residues, so that manual conveying of the film residues to the dehydration device is reduced; the dewatering equipment recovers the dewatered water through the liquid medicine collecting tank, and the dewatered membrane slag is discharged through a discharge channel.

The film slag collecting trolley with the PLC control system is arranged below the discharge channel, and the forward running distance and time of the film slag collecting trolley can be automatically adjusted through the PLC control system so as to prevent the generated film slag from single-point accumulation, and manual supervision is reduced.

Drawings

FIG. 1 is a schematic diagram of a film residue treatment device for an etching line photoresist removing section;

in the figure: 1. a first stripping groove; 2. a second stripping groove; 3. a conveying device; 4. a support platform; 5. a liquid medicine collecting tank; 6. a dewatering device; 7. a discharge passage; 8. a first funnel; 9. a second funnel; 10. a conveying screw; 11. a first motor; 12. a support; 13. extruding a double screw; 14. a second motor; 15. a film residue conveying pipe; 16. a liquid medicine delivery pipeline; 17. a water suction pump; 18. film residue collecting trolley; 19. and a PLC control system.

Detailed Description

The utility model is further described below with reference to the accompanying drawings. The following examples are only for more clearly illustrating the technical aspects of the present utility model, and are not intended to limit the scope of the present utility model.

In the description of the present utility model, it should be understood that the terms "center", "longitudinal", "lateral", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, are merely for convenience in describing the present utility model and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a specific orientation, be configured and operated in a specific orientation, and thus should not be construed as limiting the present utility model. Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first", "a second", etc. may explicitly or implicitly include one or more such feature. In the description of the present utility model, unless otherwise indicated, the meaning of "a plurality" is two or more.

In the description of the present utility model, it should be noted that, unless explicitly specified and limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be either fixedly connected, detachably connected, or integrally connected, for example; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements. The specific meaning of the above terms in the present utility model can be understood by those of ordinary skill in the art in a specific case.

Referring to fig. 1, the embodiment provides a film residue treatment device of an etching line photoresist removing section, which comprises a first photoresist removing groove 1, a second photoresist removing groove 2, a conveying device 3, a supporting platform 4, a liquid medicine collecting groove 5 and a dewatering device 6. The support platform 4 is placed on the working floor. The liquid medicine collecting vat 5 is fixedly connected above the supporting platform 4, and the dewatering equipment 6 is arranged above the liquid medicine collecting vat 5, so that the removed liquid medicine can fall into the liquid medicine collecting vat 5 conveniently. A side of the dehydrating apparatus 6 is discharged from the discharging passage 7, and when the dehydrating apparatus 6 dehydrates the film slag, the dehydrated film slag is discharged from the discharging passage 7.

The first membrane removing groove 1 is arranged above the dewatering table, and a first funnel 8 connected with the bottom of the first membrane removing groove 1 is arranged on the working surface of the dewatering equipment 6, so that membrane residues discharged from the first membrane removing groove 1 can enter the dewatering equipment 6 through the first funnel 8 to be dewatered. The two ends of the conveying device 3 are respectively a discharge end and a motor end. The discharge end is communicated with a first funnel 8 of the first stripping groove 1, a second stripping groove 2 is arranged near the motor end, and a second funnel 9 arranged at the bottom of the second stripping groove 2 is communicated with the conveying device 3. The conveying device 3 conveniently conveys the membrane residues discharged from the second membrane removing tank 2 into the first hopper 8 and then into the dehydration equipment 6.

A plurality of second stripping grooves 2 can be additionally arranged on the conveying device 3, and the second hopper 9 of each second stripping groove 2 is respectively communicated with the conveying device 3, so that the film residues in the plurality of second stripping grooves 2 can be conveniently conveyed into the dewatering equipment 6 through the conveying device 3. The conveying device 3 comprises a film slag conveying pipe 15 and a conveying screw rod 10, the conveying screw rod 10 is arranged in the film slag conveying pipe 15, a first motor 11 of the conveying device 3 is arranged at the motor end of the film slag conveying pipe 15, and a protective cover is arranged outside the first motor 11. When the first motor 11 of the conveying device 3 is started, the conveying screw 10 is driven to rotate, and film residues in the second film groove are conveyed to the dewatering equipment 6 for dewatering through the rotation of the conveying screw 10.

Optionally, the pipe diameter of the film slag conveying pipe 15 can be set to be 15cm, and the film slag conveying pipe 15 is made of 316 stainless steel, so that the liquid medicine in the film slag is effectively prevented from corroding the pipeline of the film slag conveying pipe 15; the 316 stainless steel film slag conveying pipe 15 is high-temperature resistant, and the film slag conveying pipe 15 can be effectively prevented from being damaged by heating after the conveying screw 10 works for a long time.

Optionally, the pipe diameter of the liquid medicine conveying pipeline 16 can be set to be 0.5cm, and the liquid medicine conveying pipeline 16 can be made of polyethylene, so that the liquid medicine conveying pipeline 16 can be ensured to reduce the absorption of liquid medicine, and the liquid medicine conveying pipeline is not easy to wet and has a certain insulation effect.

Optionally, the bottom of the conveyor 3 is equipped with a plurality of supports 12, so that the conveyor 3 can be in the same plane as possible with the working surface of the dewatering device 6, horizontally convey the film residues, refresh the conveying efficiency. Each supporting member 12 comprises two supporting rods connected in an H-shape, one ends of the two supporting rods are respectively fixed on the conveying device 3, and the other ends of the two supporting rods are supported on the ground.

Optionally, a motor and an extrusion double screw 13 are arranged in the dehydration equipment 6, and the membrane residues are extruded and dehydrated by the extrusion double screw, so that the dehydration effect of the membrane residues is improved. The second motor 14 of the dewatering device 6 controls the extrusion twin screw 13 to rotate, so that the film slag entering the dewatering device 6 is dewatered, and a protective cover is arranged outside the second motor 14.

Optionally, the film residue treatment device of the etching line photoresist removing section further comprises a liquid medicine conveying pipeline 16. One end of the liquid medicine conveying pipeline 16 is communicated with the liquid medicine collecting tank 5, and the other end is provided with a water suction pump 17. When the liquid medicine in the liquid medicine collecting tank 5 is too much, the water suction pump 17 can be turned on to suck out the liquid medicine in the liquid medicine collecting tank 5 and send the liquid medicine into other containers for storage.

Optionally, the film residue treatment apparatus of the etching line photoresist removing section further includes a film residue collecting trolley 18. A film residue collecting trolley 18 is provided below the discharge passage 7 of the dehydrating apparatus 6 for collecting the dehydrated film residue discharged from the dehydrating apparatus 6. Be equipped with PLC control system 19 on the membrane sediment collection dolly 18, the membrane sediment is collected the dolly 18 and is independently controlled through PLC control system 19 for the membrane sediment is collected the distance and the time of dolly 18 automatic forward running in order to prevent that the single-point condition of piling up from appearing in the membrane sediment that produces, reduces artificial supervision, promotes the holistic automation of the membrane sediment processing apparatus of etching line photoresist removal section processing membrane sediment.

The foregoing is merely a preferred embodiment of the present utility model, and it should be noted that modifications and variations could be made by those skilled in the art without departing from the technical principles of the present utility model, and such modifications and variations should also be regarded as being within the scope of the utility model.

Claims

1. The film residue treatment device of the etching line photoresist removing section is characterized by comprising a first film removing groove, a second film removing groove, a conveying device, a supporting platform, a liquid medicine collecting groove and a dewatering device; the liquid medicine collecting groove is arranged above the supporting platform; the dehydration equipment is arranged above the liquid medicine collecting tank; a film slag discharging channel is arranged on one side of the dehydration equipment; the two ends of the conveying device are respectively a motor end and a discharge end; a first funnel is arranged at the bottom outlet of the first stripping groove; the first hopper is arranged on the working surface of the dehydration equipment and is communicated with the discharge end of the conveying device; a second funnel is arranged at the bottom of the second stripping groove; the second hopper is communicated with the vicinity of the first motor end of the conveying device.

2. The film residue treatment apparatus of an etching line photoresist removing section according to claim 1, wherein a plurality of second stripping grooves are provided and are communicated with the conveying device through respective second funnels.

3. The film residue treatment device of the etching line photoresist removing section according to claim 1, wherein a conveying screw is arranged in the conveying device; the first motor of the conveying device drives the conveying screw to rotate and is used for conveying the film residue with the liquid medicine discharged by the second film removing groove.

4. A film residue treatment apparatus for an etching line photoresist removing section according to claim 3, wherein said conveying means comprises a film residue conveying pipe; the conveying screw is arranged in the film slag conveying pipe; the pipe diameter of the film slag conveying pipe is 15cm.

5. The film residue treatment device of the etching line photoresist removing section according to claim 1, further comprising a liquid medicine conveying pipeline; one end of the liquid medicine conveying pipeline is communicated with the liquid medicine collecting tank; the other end is provided with a water suction pump.

6. The film residue treatment device of the etching line photoresist removing section according to claim 1, wherein a plurality of supporting pieces are arranged at the bottom of the conveying device; the support piece comprises two support rods which are connected in an H shape; one end of the supporting rod is connected with the conveying device, and the other end of the supporting rod is supported on the ground.

7. The film residue treatment device of the etching line photoresist removing section according to claim 1, wherein an extrusion double screw is arranged in the dehydration equipment; and the second motor of the dehydration equipment drives the extrusion double screw to rotate, and the membrane residues with the liquid medicine, which are discharged from the first membrane removing groove and the second membrane removing groove, are dehydrated.

8. The apparatus for treating film residue in a photoresist stripping section of an etching line according to claim 5, wherein the pipe diameter of the liquid medicine conveying pipe is 0.5cm.

9. The film residue treatment apparatus of the etching line photoresist removing section according to claim 1, further comprising a film residue collecting trolley; the membrane slag collecting trolley is arranged below the discharge channel and is used for collecting the dehydrated membrane slag discharged by the dehydrating equipment.

10. The film residue treatment device of the etching line photoresist removing section according to claim 9, wherein a PLC control system is arranged on the film residue collecting trolley.