CN218827195U - Uniform heating annealing device - Google Patents
Uniform heating annealing device Download PDFInfo
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- CN218827195U CN218827195U CN202222506149.XU CN202222506149U CN218827195U CN 218827195 U CN218827195 U CN 218827195U CN 202222506149 U CN202222506149 U CN 202222506149U CN 218827195 U CN218827195 U CN 218827195U
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Abstract
The utility model discloses an even heating annealing device, it is used for heating annealing to the base plate, include: the heating platform is provided with an exhaust port and an annular first sealing groove, and the first sealing groove is positioned on the outer ring of the exhaust port; the first sealing ring is arranged in the first sealing groove and protrudes out of the first sealing groove to support the substrate, and the vertical projection of the substrate on the heating platform can completely shield the first sealing ring; the upper cavity cover is detachably and hermetically connected with the heating platform, a heating cavity for accommodating the substrate is formed after the upper cavity cover is connected with the heating platform, and the pressure of the heating cavity is adjustable. Through the pressure difference between the increase base plate both sides, make the first sealing washer of base plate extrusion, first sealing washer pressurized deformation is until base plate and heating platform in close contact with to form good heat-conduction, and it is even to be heated, avoided warping strain and the contact failure problem because of being heated uneven and producing.
Description
Technical Field
The utility model relates to an annealing process technical field, in particular to even heating annealing device.
Background
Solar thin film cell: a solar thin film cell is also called a "solar chip" or a "photovoltaic cell", and is a photoelectric device that directly generates electricity by using sunlight.
In the production of the solar thin film cell, a large-area glass substrate needs to be used, and in order to ensure the quality of the large-area glass substrate and further ensure the service life of power generation equipment in the processing process, the large-area glass substrate needs to be subjected to an annealing process so as to reduce residual stress and reduce deformation and crack tendency. Specifically, the large-area glass substrate heating and annealing process is widely applied, for example: in the perovskite field, a large-area perovskite thin film is coated on a glass substrate, and then the glass substrate is annealed at 100-150 ℃ to complete thin film crystallization; in the field of photolithography, after coating a photoresist on a glass substrate, it is required to thermally anneal it, evaporate an excessive solvent, and the like.
Currently, the annealing process usually uses a heating plate to heat a large area of glass substrate to complete the annealing.
Specifically, a large-area glass substrate is placed on a heating plate, and when the large-area glass substrate is heated by the heating plate, the heating plate and the glass substrate are in contact to transfer heat in a heat conduction mode, so that heating is completed.
However, the heating method has the following problems:
1. deformation: when the large-area glass substrate is heated unevenly, warping strain is generated due to stress problem;
2. splitting: when the surface of the glass substrate is uneven or warps due to uneven heating, a part of area can not be in good contact with the heating plate, so that the heat transfer mode is changed from contact heat conduction to air convection, the temperature of the area is far lower than that of a normal contact area, and then a large temperature difference is formed to generate a splintering phenomenon.
Therefore, how to ensure uniform heating of the substrate to ensure the annealing effect of the substrate is an urgent problem to be solved by the technical personnel in the field.
SUMMERY OF THE UTILITY MODEL
In view of this, the utility model provides an even heating annealing device guarantees that the base plate is heated evenly to guarantee the annealing effect of base plate.
In order to achieve the above purpose, the utility model provides a following technical scheme:
a uniform thermal annealing apparatus for thermal annealing a substrate, comprising:
the heating platform is provided with an exhaust port and an annular first sealing groove, and the first sealing groove is positioned on the outer ring of the exhaust port;
the first sealing ring is arranged in the first sealing groove and protrudes out of the first sealing groove to support the substrate, and the vertical projection of the substrate on the heating platform can completely shield the first sealing ring;
the upper chamber lid, the upper chamber lid with heating platform detachable sealing connection, just the upper chamber lid with form the holding after the heating platform is connected the heating chamber of base plate, the pressure in heating chamber is adjustable.
Preferably, in the uniform thermal annealing apparatus, a shape of the first seal groove is identical to an edge profile of the substrate.
Preferably, in the above uniform heating annealing apparatus, the inner wall of the upper chamber cover is coated or adhered with a heat-insulating reflective layer.
Preferably, in the uniform heating annealing device, the upper chamber cover has a gas passage for communicating with the heating chamber and a control valve for controlling on/off of the gas passage.
Preferably, in the uniform heating annealing device, the upper chamber cover is further provided with a pressure detection device for monitoring the pressure in the heating chamber, and the pressure detection device is in signal connection with the control valve;
in the inflation process, when the pressure detection device detects that the pressure in the heating cavity reaches a preset value, the control valve is closed.
Preferably, in the uniform heating annealing device, the first sealing groove is an arc-shaped groove, the cross section of the first sealing ring is circular, and the first sealing ring is clamped in the first sealing groove through the notch of the first sealing groove in a limiting manner.
Preferably, in the uniform heating annealing apparatus, a relationship between a height h at which the first seal ring is installed in the first seal groove and protrudes from the heating platform and a diameter D of the first seal ring is:
10％D≤h≤50％D。
preferably, in the uniform heating annealing device, the heating platform is provided with a second sealing groove, the second sealing groove is located on an outer ring of the first sealing groove, and the upper cavity cover is connected with the heating platform in a sealing manner through a second sealing ring arranged in the second sealing groove.
Preferably, in the above uniform heating annealing apparatus, the upper chamber cover includes: the side wall is used for being in sealing contact with the second sealing ring;
the side wall is provided with a positioning assembly used for positioning the heating platform, and the positioning assembly comprises positioning guide columns which are arranged on the heating platform and can be clamped on two sides of the side wall.
Preferably, the uniform heating annealing apparatus further includes:
the driving transmission system is used for lifting the upper cavity cover;
and the guide piece is used for guiding the lifting of the upper cavity cover.
The utility model provides a uniform heating annealing device, when in use, a substrate to be processed is placed on a first sealing ring, and the first sealing ring is ensured to be completely attached to the substrate; then, the upper cavity cover is hermetically connected with the heating platform, and the substrate and the first sealing ring are ensured to be positioned in the heating cavity; adjusting the pressure in the heating cavity to increase the pressure in the heating cavity, and enabling the first sealing ring to deform under pressure until the substrate supported by the first sealing ring is completely attached to the heating platform, wherein in the process, gas between the substrate and the heating platform is exhausted through an exhaust port to increase the pressure difference on two sides of the substrate; and stopping boosting, and starting the heating platform for heating.
Through the pressure differential between the increase base plate both sides in this application, make the first sealing washer of base plate extrusion, first sealing washer pressurized deformation is until base plate and heating platform in close contact with to form good heat-conduction, and it is even to be heated, has avoided warping strain and contact failure's problem because of being heated uneven and producing.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
Fig. 1 is a schematic structural view of a uniform heating and annealing apparatus disclosed in an embodiment of the present invention;
fig. 2 is a schematic structural diagram of a uniform heating and annealing apparatus disclosed in an embodiment of the present invention before pressurization;
fig. 3 is a schematic structural diagram of the uniform heating annealing apparatus disclosed in the embodiment of the present invention after boosting;
fig. 4 is a top view of a heating platform of a uniform thermal annealer disclosed in an embodiment of the present invention;
fig. 5 is a front sectional view of a heating platform and a first seal ring of the uniform heating annealing apparatus disclosed in the embodiment of the present invention;
wherein the content of the first and second substances,
1 is a heating platform, 2 is an upper cavity cover, 3 is a base plate, 4 is an exhaust port, 5 is a first sealing ring, 6 is a second sealing ring, 7 is a gas channel, 8 is a control valve, and 9 is a pressure detection device;
reference numeral 11 denotes a first seal groove, and 12 denotes a second seal groove.
Detailed Description
The utility model discloses an even heating annealing device guarantees that the base plate is heated evenly to guarantee the annealing effect of base plate. In addition, the utility model also discloses an even heating annealing method.
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
In the following, the terms "first", "second" are used for descriptive purposes only and are not to be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature.
As shown in fig. 1-3, the utility model discloses an even heating annealing device for heat annealing substrate 3, it specifically includes: heating platform 1, first sealing washer 5 and upper chamber lid 2. The heating platform 1 is provided with an exhaust port 4 and an annular first sealing groove 11, and the first sealing groove 11 is positioned on the outer ring of the exhaust port 4; the first seal ring 5 is a closed annular member, and the first seal ring 5 is deformable when compressed, and the first seal ring 5 is fixed in the first seal ring 11 when installed. During the use, place base plate 3 on first sealing washer 5, it is required to be injectd that the vertical projection of base plate 3 on heating platform 1 can shelter from first sealing washer 5 completely, so, can guarantee that first sealing washer 5 is laminated with base plate 3 completely, and at this moment, foretell gas vent 4 is located between first sealing washer 5, heating platform 1 and the base plate 3. The upper cavity cover 2 is detachably and hermetically connected with the heating platform 1, and the upper cavity cover 2 is connected with the heating platform 1 to form a heating cavity for accommodating the substrate 3.
When in use, the substrate 3 to be processed is placed on the first sealing ring 5, and the first sealing ring 5 is ensured to be completely attached to the substrate 3; then, the upper cavity cover 2 is hermetically connected with the heating platform 1, and the substrate 3 and the first sealing ring 5 are ensured to be positioned in the heating cavity; adjusting the pressure in the heating cavity to increase the pressure in the heating cavity, wherein the first sealing ring 5 is pressed and deformed until the substrate 3 supported by the first sealing ring 5 is completely attached to the heating platform 1, and in the process, gas between the substrate 3 and the heating platform 1 is exhausted through the exhaust port 4 to increase the pressure difference on two sides of the substrate 3; and stopping boosting, and starting the heating platform 1 for heating.
Through the pressure differential between the 3 both sides of increase base plate in this application, make base plate 3 extrusion first sealing washer 5, first sealing washer 5 compressive deformation until base plate 3 and heating platform 1 in close contact with to form good heat-conduction, and it is even to be heated, has avoided warping strain and the contact failure problem because of being heated the uneven production.
In an embodiment, the shape of the first sealing ring 5 is the same as the edge profile of the base plate 3, and as shown in fig. 4, the first sealing ring 5 may be a rectangular ring, and correspondingly, the base plate 3 is a rectangular plate. Through the arrangement, the substrate 3 can be conveniently contacted and stressed with the first sealing ring 5, and the substrate 3 can be prevented from inclining when being pressed. In practice, when the base plate 3 is a circular disk, the first sealing ring 5 may be provided as a circular ring. It will be understood by those skilled in the art that the shape of the first sealing ring 5 and the edge profile of the base plate 3 may be set according to different requirements and be within the protection range.
Because first sealing washer 5 assembles in first seal groove 11, consequently, the shape of first sealing washer 5 can be injectd to the shape of injecing first seal groove 11, can set up first seal groove 11 into the rectangular ring shape groove, then through the limiting displacement of first seal groove 11, can make flexible first sealing washer 5 block in first seal groove 11 to the shape of first sealing washer 5 has been injectd simultaneously.
In a further embodiment, the inner wall of the upper cavity cover 2 is coated or adhered with a heat-insulating reflective layer. The energy utilization rate in the upper cavity cover 2 can be improved by arranging the heat insulation reflecting layer. For the heat insulation reflecting layer, a glass fiber layer and the like can be used.
The upper chamber cover 2 disclosed in this application has a gas passage 7 for communicating with the heating chamber and a control valve 8 for controlling the on-off of the gas passage 7. During the use, can open control valve 8, switch on gas passage 7 to fill gas into the heating chamber through gas passage 7, make the pressure rise in the heating chamber, and extrude to the direction of heating platform 1, in this process, first sealing washer 5 pressurized deformation, and the air between base plate 3 and the heating platform 1 is then discharged through gas vent 4, thereby makes base plate 3 both sides appear the pressure differential, is extruded on heating platform 1, guarantees base plate 3 and the abundant contact of heating platform 1.
After heating is finished, the control valve 8 is opened to conduct the gas channel 7, and then the heating cavity is communicated with the external atmospheric pressure to realize the pressure relief process; then separate upper chamber lid 2 and heating platform 1 again, take out base plate 3, at this in-process, because the reduction of pressure, first sealing washer 5 resumes to former size, can make base plate 3 raise, is convenient for take out base plate 3 and also avoids heating platform 1's surplus temperature to produce the influence to base plate 3.
On the basis of the technical scheme, the upper cavity cover 2 is also provided with a pressure detection device 9 for monitoring the pressure in the heating cavity, and the pressure detection device 9 is in signal connection with the control valve 8. Specifically, in the inflation process, when the pressure detection device 9 detects that the pressure in the heating cavity reaches a preset value, the control valve 8 is closed. Through pressure measurement 9 and 8 signal connection of control valve, realized whole control process's automation, can improve control valve 8's response speed, be favorable to improving the accuracy to pressure control, avoid base plate 3 pressurized too big, and the problem of damage.
In a specific embodiment, as shown in fig. 5, the first seal groove 11 is an arc-shaped groove, and the cross section of the first seal ring 5 is circular, specifically, the first seal ring 5 is in limited clamping connection in the first seal groove 11 through a notch of the first seal groove 11. Here, a manner of assembling the sealing groove and the sealing ring is disclosed, and in practice, in order to provide a margin for deformation of the sealing ring, the arc-shaped groove of the first sealing groove 11 may be provided as an elliptical arc-shaped groove, and the major diameter of the elliptical arc is slightly larger than the diameter of the first sealing ring 5. The specific size and shape of the first seal groove 11 can be set according to the deformation of the first seal ring 5 and the size of the first seal ring 5 inside.
In practice, when the pressure is applied, if the height of the first sealing ring 5 protruding out of the heating platform 1 is too large, the first sealing ring cannot be completely deformed, so that the substrate 3 and the heating platform 1 cannot be in good contact with each other; if the height of the first sealing ring 5 protruding the heating platform 1 is too small, a good sealing effect cannot be achieved. The dimensions of the first sealing ring 5 are specifically defined, requiring the relationship between the height h of the projecting heating platform and the diameter D of the first sealing ring: 10% by weight of D.ltoreq.h.ltoreq.50% by weight of D, as described in connection with FIG. 5.
In a further embodiment, as shown in fig. 4, the heating platform 1 is provided with a second sealing groove 12, the second sealing groove 12 is located at an outer ring of the first sealing groove 11, and the upper cavity cover 2 and the heating platform 1 are hermetically connected through a second sealing ring 6 disposed in the second sealing groove 12. The upper cavity cover 2 is connected with the heating platform 1 in a sealing mode through the second sealing ring 6, and the sealing performance in the heating cavity can be effectively guaranteed. In practice, the first sealing groove 11 and the second sealing groove 12 may be rectangular annular grooves, and specifically, need to be matched with the shape of the substrate 3.
On the basis of the technical scheme, in order to realize the relative motion between the upper cavity cover 2 and the heating platform 1, a driving transmission system for driving the lifting of the upper cavity cover 2 and a guide piece for guiding the lifting of the upper cavity cover 2 are further arranged in the application. Wherein, the actuating drive system can include motor and ball structure, realizes the lift of upper chamber lid 2 through ball's rotation promptly, in the reality, if adopt ball can accomplish the direction of the lift of upper chamber lid 2 simultaneously. In practice, the driving transmission system can be set as a cylinder, that is, the cylinder rod is telescopic to realize the lifting driving of the upper cavity cover 2. Meanwhile, the guide piece can be the matching of the guide post and the guide sleeve.
As shown in fig. 2 and fig. 3, the upper cavity cover 2 in the present application includes a top plate and a side wall disposed along a circumferential direction of the top plate, specifically, the top plate and the side wall may be an integral structure, that is, the upper cavity cover 2 is a cylindrical structure with an opening, and the side wall is used for being in sealing contact with the second sealing ring 6, so as to achieve the sealing connection between the upper cavity cover 2 and the heating platform 1. Preferably, the side wall is provided with a positioning assembly for positioning the heating platform 1, and the positioning assembly comprises a positioning guide pillar which is arranged on the heating platform 1 and can be clamped on two sides of the side wall. The positioning method of the upper cover 2 and the heating platform 1 is disclosed, and specifically, the positioning of the sidewall and the second sealing ring 6 ensures the accuracy of the positions of the second sealing ring 6 and the upper cover 2, and avoids the occurrence of offset to affect the sealing effect.
In combination with the above, the heating platform 1 disclosed in the present application may be a microcrystalline glass heating plate, and the microcrystalline glass heating plate is adopted, so that the temperature uniformity of the surface can be ensured, and the heating efficiency is high.
In addition, the application also discloses a uniform heating annealing method, which mainly applies the heating annealing device disclosed in the embodiment and specifically comprises the following steps:
step S1: assembling a substrate;
the substrate to be processed is placed on the first sealing ring of the heating platform, the substrate is lifted away from the heating platform through the attachment of the first sealing ring and the bottom surface of the substrate, in the process, the first sealing ring is of a complete closed-loop structure and can be completely attached to the bottom surface of the substrate, and therefore a sealed cavity is formed inside the first sealing ring and between the substrate and the heating platform.
Step S2: sealing the chamber;
and moving the upper cavity cover to enable the upper cavity cover to be hermetically connected with the heating platform and form a heating cavity for accommodating the substrate. The upper cavity cover and the heating platform can be sealed through a second sealing ring arranged on the heating platform. In order to guarantee that the substrate is coated in the heating cavity, the second sealing ring is required to be positioned on the outer ring of the first sealing ring, and the second sealing ring can be arranged at a specific position according to the size of the substrate. The sealed heating cavity is formed by sealing the upper cavity cover and the heating platform, so that the waste of energy is avoided.
And step S3: boosting the pressure;
and filling inert gas into the heating cavity, and increasing the pressure in the heating cavity until the first sealing ring deforms until the substrate is completely attached to the heating platform. In the process, gas in the sealing cavity among the first sealing ring, the substrate and the heating platform is exhausted through the exhaust port on the heating platform, so that pressure difference is formed between the upper side and the lower side of the substrate, and the substrate extrudes the first sealing ring under the action of the pressure difference until the substrate is completely attached to the heating platform.
And step S4: heating;
and after the substrate is completely attached to the heating platform, starting the heating platform to heat the substrate until the heating requirement is met. The heating temperature for the heating platform can be set according to different requirements and is in a protection range.
Step S5: and (5) sorting and taking out.
And closing the heating function of the heating platform, completing the annealing process, releasing the pressure in the heating cavity, opening the upper cavity cover and taking out the substrate.
Through the pressure differential between the increase base plate both sides in this application, make the first sealing washer of base plate extrusion, first sealing washer pressurized deformation is until base plate and heating platform in close contact with to form good heat-conduction, and it is even to be heated, has avoided warping strain and contact failure's problem because of being heated uneven and producing.
As used in the present application and in the claims, the terms "a," "an," "the," and/or "the" are not intended to be exhaustive or to include the plural as well, unless the context clearly indicates otherwise. In general, the terms "comprises" and "comprising" merely indicate that steps and elements are included which are explicitly identified, that the steps and elements do not form an exclusive list, and that a method or apparatus may include other steps or elements. An element defined by the phrase "comprising a component of ' 8230 ' \8230; ' does not exclude the presence of additional identical elements in the process, method, article, or apparatus that comprises the element.
The embodiments in the present description are described in a progressive manner, each embodiment focuses on differences from other embodiments, and the same and similar parts among the embodiments are referred to each other.
The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (10)
1. A uniform thermal annealing apparatus for thermal annealing a substrate (3), comprising:
the heating device comprises a heating platform (1), wherein an exhaust port (4) and an annular first sealing groove (11) are formed in the heating platform (1), and the first sealing groove (11) is located on the outer ring of the exhaust port (4);
a first seal ring (5) which can deform under pressure, wherein the first seal ring (5) is arranged in the first seal groove (11), the first seal ring (5) protrudes out of the first seal groove (11) and is used for supporting the substrate (3), and the vertical projection of the substrate (3) on the heating platform (1) can completely shield the first seal ring (5);
go up chamber lid (2), go up chamber lid (2) with heating platform (1) detachable sealing connection, just go up chamber lid (2) with form the holding after heating platform (1) is connected the heating chamber of base plate (3), the pressure in heating chamber is adjustable.
2. The homogeneous thermal annealer of claim 1, wherein the first sealing groove (11) has the same shape as the edge profile of the base plate (3).
3. The apparatus according to claim 1, wherein the inner wall of the upper chamber cover (2) is coated or stuck with a heat-insulating reflective layer.
4. The homogeneous thermal annealing apparatus according to claim 1, wherein the upper chamber cover (2) has a gas passage (7) for communicating with the heating chamber and a control valve (8) for controlling on/off of the gas passage (7).
5. The homogeneous heating and annealing device according to claim 4, wherein the upper chamber cover (2) is further provided with a pressure detection device (9) for monitoring the pressure in the heating chamber, and the pressure detection device (9) is in signal connection with the control valve (8);
in the air inflation process, when the pressure detection device (9) detects that the pressure in the heating cavity reaches a preset value, the control valve (8) is closed.
6. The uniform heating annealing device according to any one of claims 1 to 5, wherein the first sealing groove (11) is an arc-shaped groove, the cross section of the first sealing ring (5) is circular, and the first sealing ring (5) is in limit clamping connection in the first sealing groove (11) through a notch of the first sealing groove (11).
7. Uniform heat annealing device according to claim 6, characterized in that the first sealing ring (5) is mounted in the first sealing groove (11) at a height h protruding from the heating platform (1) and the diameter D of the first sealing ring (5) in relation to each other:
10％D≤h≤50％D。
8. the uniform heating annealing device according to any one of claims 1 to 5, wherein the heating platform (1) is provided with a second sealing groove (12), the second sealing groove (12) is located at the outer ring of the first sealing groove (11), and the upper cavity cover (2) is in sealing connection with the heating platform (1) through a second sealing ring (6) arranged in the second sealing groove (12).
9. The homogeneous thermal annealing apparatus according to claim 8, wherein the upper chamber cover (2) comprises:
the top plate and a side wall arranged along the circumferential direction of the top plate are used for being in sealing contact with the second sealing ring (6);
the side wall is provided with a positioning assembly used for positioning the heating platform (1), and the positioning assembly comprises positioning guide columns which are arranged on the heating platform (1) and can be clamped on two sides of the side wall.
10. The apparatus according to claim 9, further comprising:
a drive transmission system for lifting the upper cavity cover (2);
and the guide piece is used for guiding the lifting of the upper cavity cover (2).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222506149.XU CN218827195U (en) | 2022-09-21 | 2022-09-21 | Uniform heating annealing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222506149.XU CN218827195U (en) | 2022-09-21 | 2022-09-21 | Uniform heating annealing device |
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| Publication Number | Publication Date |
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| CN218827195U true CN218827195U (en) | 2023-04-07 |
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| CN202222506149.XU Active CN218827195U (en) | 2022-09-21 | 2022-09-21 | Uniform heating annealing device |
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| CN (1) | CN218827195U (en) |
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