CN218727001U - Chemical plating detection system - Google Patents
Chemical plating detection system Download PDFInfo
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- CN218727001U CN218727001U CN202222937140.4U CN202222937140U CN218727001U CN 218727001 U CN218727001 U CN 218727001U CN 202222937140 U CN202222937140 U CN 202222937140U CN 218727001 U CN218727001 U CN 218727001U
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Abstract
The utility model relates to a chemical plating detection system in the technical field of chemical plating, which comprises a titrator, wherein the titrator is connected with a control system and is matched with an analysis cup; the analysis cup is connected with a plurality of plating tanks and is also connected with a cleaning component; the main liquid inlet pipe of the analysis cup is connected with the liquid outlet pipe of the corresponding plating tank through a plurality of liquid inlet branch pipes, and the plating tank is connected with a charging box; the cleaning assembly comprises a washing liquid tank and a waste liquid tank, the washing liquid tank is communicated with one end, close to the plating tank, of each liquid inlet branch pipe through a plurality of branch liquid guide pipes, a waste liquid outlet is formed in the analysis cup, and the waste liquid outlet is communicated with the waste liquid tank. The utility model has the advantages of reasonable overall structure, degree of automation is high, detects and reinforced combining together, can in time feed in raw material according to the testing result after detecting, has improved the ageing and the accuracy of testing and analyzing, has reduced the deviation, can carry out testing and analyzing one by one to the plating bath in each coating bath, is applicable to the production of modernization.
Description
Technical Field
The utility model belongs to the technical field of the chemical plating, concretely relates to chemical plating detecting system.
Background
The neodymium iron boron magnet is a third-generation rare earth permanent magnet, has the advantages of extremely high magnetic energy product, coercive force, high energy density and the like, and is widely applied to modern industry and electronic technology. The sintered neodymium iron boron is generally subjected to axial magnetization and radial magnetization, the application is wide, the corrosion is easy to carry out surface treatment, chemical nickel plating is a common surface treatment mode, a plated layer of a product subjected to chemical plating is uniform, the binding force is good, and the salt spray corrosion resistance can reach more than 96 hours generally. The chemical plating adopts metal salt and reducing agent, and the self-catalytic reaction is carried out on the surface of the material to obtain a plating layer. Therefore, as the reaction of the product proceeds, nickel ions in the plating bath are lost, and thus, it is necessary for a person to frequently check the concentration and pH of the nickel ions in the plating bath. The patent No. CN104677969B discloses an electroplating solution on-line detection system and a detection method, wherein a sample is pretreated by a sample pretreatment device and then enters a potentiometric titrator detection device for detection; the detection value is output to a terminal computer device, and the terminal computer device processes the detection value, performs point drawing, data display, data storage and data transmission to a user; the PLC control device controls the working state and working steps of the sample pretreatment device and also controls the detection start and detection period of the detection device of the potentiometric titrator; and the state monitoring device transmits the monitored system state to the terminal computer device on one hand, and the monitored system state is displayed by the terminal computer device. And the other side of the system is transmitted to a PLC control device, and the whole system operation mode is controlled by the PLC control device. The patent can only perform titration test and feedback test results. In the actual production process, not only the nickel ion concentration detection needs to be performed on a plurality of plating tanks, but also the plating solution needs to be added into the plating tanks according to the detected nickel ion concentration. The plating solution is added into the plating tank by the above patent, and another set of equipment is needed, which is not beneficial to the high-efficiency production. Therefore, there is a need for an electroless plating detection system that addresses the above-mentioned problems.
SUMMERY OF THE UTILITY MODEL
Aiming at the defects in the prior art, the utility model provides a chemical plating detection system, which comprises a titrator, wherein the titrator is connected with a control system and is matched with an analysis cup; the analysis cup is connected with a plurality of plating tanks and is also connected with a cleaning component;
the analysis cup is provided with a first liquid inlet pipe, the first liquid inlet pipe is connected with a main liquid inlet pipe, the main liquid inlet pipe is communicated with a plurality of liquid inlet branch pipes, the liquid inlet branch pipes are respectively connected with liquid outlet pipes of corresponding plating tanks, the liquid outlet pipes are provided with first switch valves, and the plating tanks are connected with charging boxes;
the cleaning assembly comprises a washing liquid tank and a waste liquid tank, a main liquid guide pipe is arranged on the washing liquid tank, a liquid pump is arranged on the main liquid guide pipe, the main liquid guide pipe is respectively communicated with one end, close to the plating tank, of each liquid inlet branch pipe through a plurality of branch liquid guide pipes, a second switch valve is arranged at the end, communicated with the main liquid guide pipe, of the second switch valve, a waste liquid outlet is formed in the analysis cup, the waste liquid outlet is communicated with the waste liquid tank, and a third switch valve is arranged on the waste liquid outlet.
Preferably, the first switch valve, the second switch valve, the third switch valve and the liquid pump are all connected with a control system.
Preferably, the analysis cup is arranged in a reaction kettle shape, a liquid inlet pipe II and a liquid discharge pipe are further arranged on the analysis cup, a switch valve IV is arranged on the liquid inlet pipe II, a switch valve V is arranged on the liquid discharge pipe, the liquid discharge pipe is located at the bottom of the analysis cup, and the waste liquid outlet is located at the top of the analysis cup.
Preferably, the fourth switch valve and the fifth switch valve are both connected with the control system.
Preferably, still be equipped with the stirring subassembly in the analysis cup, the stirring subassembly includes (mixing) shaft, rotation motor, horizontal puddler and vertical puddler, the one end of (mixing) shaft and the output shaft who rotates the motor, the other end of (mixing) shaft stretches into in the analysis cup, vertical puddler passes through horizontal puddler and is connected with the puddler, vertical puddler contacts with the lateral wall of analysis cup.
Preferably, the rotating motor is connected with a control system.
Preferably, the charging box is an automatic charging box, and the charging box is connected with the control system.
The utility model discloses still including other subassemblies that can make a chemical plating detecting system normal use, for example, the control assembly who rotates the motor, switching valve one, switching valve two, switching valve three, switching valve four, switching valve five, control assembly etc. of liquid pump are the conventional technical means in this field. In addition, the device or the assembly which is not limited in the utility model adopts the conventional technical means in the field, for example, the coating bath, the liquid pump, the control system, the charging box and the like are the conventional equipment in the field. The utility model can also carry out PH test, namely, the PH probe is put into the analyzing cup after the plating solution enters the analyzing cup, and the PH value of the plating solution can be detected in real time.
The working principle of the utility model is that, except that each coating bath and the feed liquor branch pipe and the dosing tank are separately used, all the other components are public in the chemical plating detection system. The pipeline and the analysis cup are washed by the washing liquid tank before each test, so that the residue of the plating liquid tested before is washed clean, and the test result of the plating liquid in the other plating tank is not influenced.
The specific working steps are as follows: 1. sampling: sampling a plating solution in a plating tank to be tested, wherein the plating solution passes through a liquid inlet branch pipe and a liquid inlet main pipe and enters an analysis cup;
2. pretreatment: adding pure water and ammonia water and mixing uniformly;
3. and (3) analysis: carrying out titration detection on the pretreated plating solution by using a titrator, dripping the solution to a detection end point, and automatically calculating to obtain a detection value of nickel ions;
4. feeding: judging whether the material needs to be added into the plating tank through a feeding box according to the detection value, if so, calculating the addition amount and adding the material;
5. cleaning: the liquid inlet branch pipe, the liquid inlet main pipe and the analysis cup are washed by the liquid washing tank, and the washed waste liquid flows into the waste liquid tank to be treated, so that the previously-measured plating solution residue is washed clean, and the test result of the next plating solution cannot be influenced;
6. if charging is needed, sampling the plating solution in the plating tank again after a period of time is set for testing in steps 1-5;
7. if the feeding is not needed, the plating solution in the other plating tank is detected. Repeating the steps 1-6.
The beneficial effects of the utility model, overall structure is reasonable, and degree of automation is high, detects and combines together with reinforced, can in time feed in raw material after the detection according to the testing result, has improved the ageing and the accuracy of testing and analyzing, has reduced the deviation, can carry out testing and analyzing one by one to the plating bath in each coating bath, is applicable to the production of modernization.
Drawings
The present invention will be further explained with reference to the drawings and examples.
FIG. 1 is a schematic structural view of a chemical plating detection system of the present invention;
FIG. 2 is a schematic view of the structure of the analyzing cup of FIG. 1.
In the figure: 1. an analyzing cup; 2. a titrator; 3. a control system; 4. a waste liquid tank; 5. a washing solution tank; 6. a liquid inlet main pipe; 7. liquid inlet branch pipes; 8. plating bath; 9. a feed box; 10. a branch liquid guide pipe; 11. a vertical stirring rod; 12. a horizontal stirring rod; 13. a stirring shaft; 14. a liquid inlet pipe II; 15. rotating the motor; 16. a liquid inlet pipe I; 17. a liquid discharge pipe; 18. and (6) a waste liquid outlet.
Detailed Description
The present invention will be described more clearly with reference to the accompanying drawings and specific embodiments in the embodiments of the present invention, and the description herein is only for explaining the present invention, but not for limiting the present invention. Based on the embodiments of the present invention, any modifications, equivalent replacements, improvements, etc. made by other embodiments obtained by those skilled in the art without creative efforts should be included in the protection scope of the present invention.
Examples
As shown in fig. 1-2, the utility model provides a chemical plating detection system, including titrator 2, titrator 2 is EDTA titration tester, titrator 2 is connected with control system 3, and control system adopts PLC control, and this control is prior art, no longer gives details, and titrator cooperates with analysis cup 1; the analysis cup 1 is connected with a plurality of plating tanks 8, and the analysis cup 1 is also connected with a cleaning assembly;
a first liquid inlet pipe 16 is arranged on the analysis cup 1, the first liquid inlet pipe 16 is connected with a main liquid inlet pipe 6, a plurality of liquid inlet branch pipes 7 are communicated with the main liquid inlet pipe 6, the liquid inlet branch pipes 7 are respectively connected with liquid outlet pipes of corresponding plating tanks 8, a first switch valve is arranged on each liquid outlet pipe, and the plating tanks 8 are connected with a charging box 9;
the cleaning assembly comprises a washing liquid tank 5 and a waste liquid tank 4, a main liquid guide pipe is arranged on the washing liquid tank 5, a liquid pump is arranged on the main liquid guide pipe, the main liquid guide pipe is respectively communicated with one end, close to the plating tank 8, of each liquid inlet branch pipe 7 through a plurality of branch liquid guide pipes 10, a switch valve II is arranged at the end, communicated with the main liquid guide pipe 10, of the branch liquid guide pipe 10, a waste liquid outlet 18 is arranged on the analysis cup 1, the waste liquid outlet 18 is communicated with the waste liquid tank 4, and a switch valve III is arranged on the waste liquid outlet 18.
The first switch valve, the second switch valve, the third switch valve and the liquid pump are all connected with the control system 3.
The analysis cup 1 is arranged to be in a reaction kettle shape, the analysis cup 1 is further provided with a liquid inlet pipe II 14 and a liquid discharge pipe 17, the liquid inlet pipe II 14 is provided with a switch valve IV, the liquid discharge pipe 17 is provided with a switch valve V, the liquid discharge pipe 17 is arranged at the bottom of the analysis cup 1, the waste liquid outlet 18 is arranged at the top of the analysis cup 1, cleaning liquid can be discharged from the waste liquid outlet 18 at the top of the analysis cup 1 at the position, efficient and thorough cleaning of the analysis cup 1 is guaranteed, a water suction pump can be arranged at the position of the waste liquid outlet 18, thorough discharge of the cleaning liquid is facilitated, and the cleaning liquid which cannot be completely discharged can be discharged from the liquid discharge pipe 17 at the bottom.
And the fourth switch valve and the fifth switch valve are connected with the control system 3.
Still be equipped with the stirring subassembly in the analysis cup 1, the stirring subassembly includes (mixing) shaft 13, rotates motor 15, horizontal mixing rod 12 and vertical puddler 11, the one end of (mixing) shaft 13 and the output shaft who rotates motor 15, the other end of (mixing) shaft 13 stretches into in the analysis cup 1, vertical puddler 11 passes through horizontal mixing rod 12 and (mixing) shaft 13 fixed connection, vertical puddler 11 and the lateral wall contact of analysis cup 1, this department sets up and not only plays the stirring effect, still can carry out thorough cleaning to analysis cup 1 inner wall when wasing, avoids remaining.
The rotating motor 15 is connected to the control system 3.
The feed box 9 is automatic feed box, feed box 9 is connected with control system, and automatic feed box is prior art, and is no longer described here.
In this embodiment, the specific implementation steps are as follows: 1. sampling: sampling (5 ml) a plating solution in a plating tank to be tested, opening a corresponding switch valve, and leading the plating solution to be in an analysis cup through a liquid inlet branch pipe and a liquid inlet main pipe;
2. pretreatment: opening a switch valve IV, adding 50ml of pure water and 10ml of ammonia water into the two-way analysis cup through the liquid inlet pipe, and uniformly mixing;
3. and (3) analysis: carrying out titration detection on the pretreated plating solution by using an EDTA titrator, dripping to a detection end point, and automatically calculating to obtain a detection value of nickel ions;
4. feeding: judging whether the material needs to be added into the plating tank through a feeding box according to the detection value, if so, calculating the addition amount and adding the material;
5. cleaning: the first switch valve is closed, the corresponding second switch valve is opened, the liquid inlet branch pipe, the liquid inlet main pipe and the analysis cup are washed through the liquid washing tank, after washing is finished, the third switch valve is opened, waste liquid flows into the waste liquid tank to be treated, the fact that the previously measured plating solution residues are washed clean is guaranteed, and the testing result of the next plating solution cannot be influenced;
6. if the materials need to be added, sampling the plating solution of the plating tank again after setting a period of time (5 min) to carry out the test of the steps 1-5;
7. if the feeding is not needed, the plating solution in the other plating tank is detected. Repeating the steps 1-6.
The operation can be automatically recorded through a data computer, and the process tracing of subsequent products is facilitated.
The foregoing description of the embodiments of the invention has been presented for purposes of illustration and not limitation, and is not intended to be exhaustive or limited to the embodiments disclosed. Many modifications and variations will be apparent to those of ordinary skill in the art without departing from the scope and spirit of the illustrated embodiments. Any modification, equivalent replacement, and improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (7)
1. A chemical plating detection system comprises a titrator, wherein the titrator is connected with a control system and is matched with an analysis cup; the method is characterized in that: the analysis cup is connected with a plurality of plating tanks and is also connected with a cleaning component;
the analysis cup is provided with a first liquid inlet pipe, the first liquid inlet pipe is connected with a main liquid inlet pipe, the main liquid inlet pipe is communicated with a plurality of liquid inlet branch pipes, the liquid inlet branch pipes are respectively connected with liquid outlet pipes of corresponding plating tanks, the liquid outlet pipes are provided with first switch valves, and the plating tanks are connected with charging boxes;
the cleaning assembly comprises a washing liquid tank and a waste liquid tank, a main liquid guide pipe is arranged on the washing liquid tank, a liquid pump is arranged on the main liquid guide pipe, the main liquid guide pipe is respectively communicated with one end, close to the plating tank, of each liquid inlet branch pipe through a plurality of branch liquid guide pipes, a second switch valve is arranged at the end, communicated with the main liquid guide pipe, of the second switch valve, a waste liquid outlet is formed in the analysis cup, the waste liquid outlet is communicated with the waste liquid tank, and a third switch valve is arranged on the waste liquid outlet.
2. The electroless plating detection system according to claim 1, wherein: the first switch valve, the second switch valve, the third switch valve and the liquid pump are all connected with the control system.
3. The electroless plating detection system according to claim 1, wherein: the analysis cup is arranged to be in a reaction kettle shape, a liquid inlet pipe II and a liquid discharge pipe are further arranged on the analysis cup, a switch valve IV is arranged on the liquid inlet pipe II, a switch valve V is arranged on the liquid discharge pipe, the liquid discharge pipe is located at the bottom of the analysis cup, and the waste liquid outlet is located at the top of the analysis cup.
4. The electroless plating detection system according to claim 3, wherein: and the fourth switch valve and the fifth switch valve are connected with the control system.
5. The electroless plating detection system according to claim 1, wherein: still be equipped with the stirring subassembly in the analysis cup, the stirring subassembly includes (mixing) shaft, rotation motor, horizontal puddler and vertical puddler, the one end of (mixing) shaft and the output shaft who rotates the motor, the other end of (mixing) shaft stretches into in the analysis cup, vertical puddler passes through horizontal puddler and is connected with the puddler, vertical puddler contacts with the lateral wall of analysis cup.
6. The electroless plating detection system according to claim 5, wherein: the rotating motor is connected with the control system.
7. The electroless plating detection system according to claim 1, wherein: the charging box is an automatic charging box, and the charging box is connected with a control system.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222937140.4U CN218727001U (en) | 2022-11-04 | 2022-11-04 | Chemical plating detection system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222937140.4U CN218727001U (en) | 2022-11-04 | 2022-11-04 | Chemical plating detection system |
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| Publication Number | Publication Date |
|---|---|
| CN218727001U true CN218727001U (en) | 2023-03-24 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202222937140.4U Active CN218727001U (en) | 2022-11-04 | 2022-11-04 | Chemical plating detection system |
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| Country | Link |
|---|---|
| CN (1) | CN218727001U (en) |
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- 2022-11-04 CN CN202222937140.4U patent/CN218727001U/en active Active
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