CN218726859U - Detection system for detecting ion concentration of plating solution - Google Patents
Detection system for detecting ion concentration of plating solution Download PDFInfo
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- CN218726859U CN218726859U CN202222770892.6U CN202222770892U CN218726859U CN 218726859 U CN218726859 U CN 218726859U CN 202222770892 U CN202222770892 U CN 202222770892U CN 218726859 U CN218726859 U CN 218726859U
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
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Abstract
The utility model provides a detection system for detecting ion concentration of plating solution, which comprises a plating bath, a detection groove and a detection electrode arranged in the detection groove, wherein the plating bath is connected with the detection groove through a first pipeline, the first pipeline is provided with a first liquid pump and a valve, the first liquid pump is used for pumping the plating solution from the plating bath to the detection groove, and the detection groove is provided with a plating solution outlet; the detection system also comprises a controller and a display, wherein the controller is connected with the detection electrode and is used for receiving and processing the detection signal and displaying the obtained concentration value on the display. The utility model discloses a system detects the groove through setting up to with detecting electrode setting in detecting the inslot, when needing to detect the ion concentration of plating bath in the plating bath, with a small amount of plating baths extraction in the plating bath to detecting the groove, accomplish the detection back, will detect the liquid discharge of inslot, can avoid detecting electrode to soak in the plating bath for a long time, lead to the plating bath to produce the corrosive effects to the electrode, influence the measuring accuracy after detecting electrode.
Description
Technical Field
The utility model relates to an electroplate the field, specific theory relates to a detecting system who detects plating bath ion concentration.
Background
In the process of the electroplating process, in order to ensure the electroplating quality, a technician needs to detect the ion concentration of the plating solution in the electroplating bath so as to supplement the ion solution in time when the concentration of the plating solution is lower. The current method for detecting ion concentration is as follows: an ion detection electrode (an ion selective electrode) is directly soaked in a plating solution of a plating bath for detection, and the plating solution is always contained in the plating bath in the plating process, so that the detection electrode can be soaked in the plating solution for a long time, the plating solution corrodes the detection electrode, and the test precision of the detection electrode is influenced.
Therefore, how to improve the existing detection method for the plating solution in the plating tank to avoid the corrosion of the detection electrode in the plating tank after being soaked for a long time becomes a problem to be solved urgently in the industry.
SUMMERY OF THE UTILITY MODEL
In order to avoid the long-term soaking of detecting electrode in the plating bath, lead to detecting electrode to receive the corruption, and influence its measuring accuracy, the utility model provides a detect detecting system of plating bath ion concentration.
The utility model discloses technical scheme as follows:
a detection system for detecting ion concentration of plating solution comprises a plating bath, a detection groove and a detection electrode for detecting ion concentration, wherein the detection electrode is arranged in the detection groove, the plating bath is connected with the detection groove through a first pipeline, the first pipeline is provided with a first liquid pump and a valve, the first liquid pump is used for pumping the plating solution from the plating bath to the detection groove, and the detection groove is provided with a plating solution outlet; the detection system also comprises a controller and a display, wherein the controller is connected with the detection electrode and is used for receiving and processing the detection signal and displaying the obtained concentration value on the display.
Through adopting above-mentioned technical scheme, when the ion concentration of plating bath in the plating bath needs to be detected, open first drawing liquid pump and corresponding valve, extract an appropriate amount of plating bath to detecting the inslot, detection electrode carries out the ion concentration detection in detecting the inslot, detects the back, and the staff will detect the plating bath row in the inslot and clean, and the staff can be according to the ion concentration value that obtains, whether the selection adds the ion solution toward the plating bath in.
According to above scheme the utility model discloses, the plating bath export of detecting the groove includes first liquid outlet, the drain line of first liquid outlet connecting band valve, this drain line be used for with detect the liquid discharge of inslot.
According to the above scheme the utility model discloses, the plating bath export of detecting the groove still includes the second liquid outlet, the second liquid outlet is through the second pipe connection that has the valve the plating bath.
Further, the second pipeline is provided with a second liquid pump, and the second liquid pump is used for pumping the recyclable plating solution from the detection tank to the plating tank.
According to above scheme the utility model discloses, it is equipped with level sensor to detect the inslot, level sensor with the controller is connected.
According to the above scheme the utility model discloses, still include the ionic solution hold up tank, the ionic solution hold up tank with the plating bath passes through fluid infusion pipe connection, be equipped with on the fluid infusion pipeline and be controlled by the measuring pump and the valve of controller.
According to the above scheme the utility model discloses, still include the pure water case, the pure water case with it passes through the third pipe connection to detect the groove, be equipped with third drawing liquid pump and valve on the third pipeline, the third drawing liquid pump is used for following the pure water case extracts the pure water extremely detect the groove.
According to above scheme the utility model discloses, still include the standard solution tank, the standard solution tank with it passes through the fourth pipe connection to detect the groove, be equipped with fourth drawing liquid pump and valve on the fourth pipeline, the fourth drawing liquid pump is used for following standard solution tank extraction standard solution extremely detect the groove.
According to the utility model discloses of above-mentioned scheme, the plating bath is electroplating mother's groove.
According to above-mentioned scheme the utility model discloses, the detection electrode is chloride ion detection electrode.
According to above-mentioned scheme the utility model discloses, the valve that detecting system adopted is solenoid valve or peristaltic valve.
According to the above scheme the utility model discloses, its beneficial effect lies in:
the system of the utility model is provided with the detection groove, and the detection electrode is arranged in the detection groove, when the ion concentration of the plating solution in the plating bath needs to be detected, a small amount of plating solution in the plating bath is extracted to the detection groove, after the detection is finished, the liquid in the detection groove is discharged, so that the detection electrode can be prevented from being soaked in the plating solution for a long time, the plating solution can generate a corrosion effect on the electrode, and the test precision after the detection electrode is influenced; and the whole process of detecting the ion concentration does not influence the plating solution in the plating bath, and the plating bath can continuously provide the plating solution for the plating operation.
Drawings
Fig. 1 is a schematic structural diagram of a first embodiment of the present invention;
fig. 2 is a schematic structural diagram of a second embodiment of the present invention;
fig. 3 is a schematic structural view of a third embodiment of the present invention;
fig. 4 is a schematic structural diagram of a preferred embodiment of the present invention.
In the figure, 1, an electroplating bath; 12. a first pipe; 120. a first liquid pump;
2. a detection tank; 20. a liquid level sensor; 21. a second conduit; 210. a second liquid pump; 22. a liquid discharge conduit;
3. a detection electrode; 4. a controller;
5. an ionic solution storage tank; 51. a fluid infusion pipeline; 510. a metering pump;
6. a pure water tank; 62. a third pipeline; 620. a third liquid pump;
7. a standard solution tank; 72. a fourth conduit; 720. a fourth liquid pump;
8. and (4) a valve.
Detailed Description
For better understanding of the objects, technical solutions and technical effects of the present invention, the present invention will be further explained with reference to the accompanying drawings and embodiments. It is to be noted that the following examples are only for explaining the present invention and are not intended to limit the present invention.
It will be understood that when an element is referred to as being "secured to" or "disposed on" another element, it can be directly on the other element or intervening elements may also be present, and when an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present.
The terms "first", "second", "third" and "fourth" are used merely for descriptive purposes and are not to be construed as indicating or implying relative importance or as implying the number of technical features.
Example one
As shown in fig. 1, a detection system for detecting ion concentration of plating solution includes a plating bath 1, a detection tank 2 and a detection electrode 3 for detecting ion concentration, the detection electrode 3 is disposed in the detection tank 2, the plating bath 1 and the detection tank 2 are connected by a first pipeline 12, the first pipeline 12 is provided with a first liquid pump 120 and a valve 8, when ion concentration of plating solution in the plating bath 1 needs to be detected, the first liquid pump 120 is started, and a proper amount of plating solution is pumped from the plating bath 1 to the detection tank 2; the detection system further comprises a controller 4 and a display (not shown in the figure), the controller 4 is connected with the detection electrode 3, the controller 4 receives a detection signal and processes the signal to obtain a concentration value, the obtained concentration value is displayed on the display, and a worker can obtain whether the ion concentration of the plating solution in the plating tank 1 reaches the standard or meets the requirement according to the detected ion concentration value, and further select whether to add the ion solution into the plating tank 1 to supplement the ion concentration of the plating solution in the plating tank 1.
After the detection work is finished, the plating solution in the detection tank 2 can be discharged through a plating solution outlet, so that the detection electrode 3 is prevented from being continuously soaked in the plating solution, the corrosion effect of the plating solution on the electrode is avoided, and the testing precision of the detection electrode 3 is influenced; the whole process of detecting the ion concentration does not influence the plating solution in the plating tank 1, and the plating tank 1 can continuously provide the plating solution for the plating operation.
In the scheme, the detection electrode is an ion selective electrode, and is an electrochemical sensor for measuring the concentration of ions in a solution by using a membrane potential, and when the detection electrode is contacted with the solution containing ions to be measured, a membrane potential directly related to the ion concentration is generated on a phase interface of a sensitive membrane of the detection electrode and the solution; the concentration of the analyte is determined by measuring the potential, from a calibration curve or by calculation.
In this embodiment, the plating solution outlet of the detection tank 2 includes a first liquid outlet, and the first liquid outlet is connected with a liquid discharge pipe 22 having a valve 8, and the liquid discharge pipe 22 is used for discharging the liquid in the detection tank 2. When the detection is completed, the valve 8 of the liquid discharge pipe 22 is opened to discharge the plating liquid in the detection tank 2.
Example two
As shown in fig. 2, a detection system for detecting the ion concentration of a plating solution includes a plating bath 1, a detection tank 2 and a controller 4, wherein a first pipeline 12 and a second pipeline 21 are arranged between the plating bath 1 and the detection tank 2, the second pipeline 21 is connected to a second liquid outlet of the detection tank 2, the second pipeline 21 is provided with a valve 8, when the valve 8 on the second pipeline 21 is opened, the plating solution in the detection tank 2 can flow to the plating bath 1, so as to realize the recycling of the plating solution. Unlike the first embodiment, the plating solution in the detection tank 2 is recycled to the plating tank 1 instead of being drained, so that the consumption and waste of the plating solution can be reduced. It should be noted that the detection tank 2 should be disposed higher than the plating tank 1 so that the plating solution in the detection tank 2 flows to the plating tank 1 after the valve 8 of the second pipe 21 is opened.
In a preferred embodiment, the second pipe 21 is further provided with a second pumping liquid pump 210, and the second pumping liquid pump 210 is used for pumping the plating solution from the detection tank 2 to the plating tank 1. The technical scheme can increase the flexibility of the arrangement positions of the detection groove 2 and the electroplating groove 1, and is not limited to arranging the detection groove at the high position of the electroplating groove.
EXAMPLE III
As shown in fig. 3, the other structure of a detection system for detecting the concentration of plating solution ions is the same as that of the second embodiment, except that: the electroplating bath 1 is connected with an ionic solution storage tank 5 through a liquid supplementing pipeline 51, and the ionic solution storage tank 5 is filled with ionic solution with known concentration and has higher concentration value; the ion concentration of the plating solution in the plating vessel 1 can be replenished after the ion solution in the ion solution storage vessel 5 is supplied to the plating vessel 1. The solution-replenishing pipe 51 is provided with a metering pump 510 and a valve which are controlled by the controller 4, and when the controller 4 judges that the ion concentration is lower than a preset value, the amount of the ionic solution to be added is calculated, and the metering pump 510 and the valve are controlled to be opened, so that the ionic solution is input into the plating tank 1.
Example four
As shown in fig. 4, the other structure of a detection system for detecting the concentration of plating solution ions is the same as that of the third embodiment, except that: the detection system further comprises a pure water tank 6, the pure water tank 6 is connected with the detection tank 2 through a third pipeline 62, and a third liquid pump 620 and a valve are arranged on the third pipeline 62 and used for inputting pure water into the detection tank 2 and cleaning the detection electrode 3 and the detection tank 2, so that the detection precision is prevented from being influenced by the dirt of the detection electrode 3 during the next detection; the cleaned sewage may be discharged through the drain line 22.
EXAMPLE five
As shown in fig. 4, the other structure of a detection system for detecting the concentration of plating solution ions is the same as that of the fourth embodiment, except that: the detection system further comprises a standard solution tank 7, the standard solution tank 7 is connected with the detection tank 2 through a fourth pipeline 72, a fourth liquid pump 720 and a valve are arranged on the fourth pipeline 72, and the fourth liquid pump 720 is used for pumping the standard solution from the standard solution tank 7 to the detection tank 2. The standard solution is a plating solution of known concentration value and can be used as a reference. After the detection electrode 3 is used for a long time, the detection precision will slowly decline, so the staff need not know whether the detection precision of the detection electrode 3 still reaches the standard in an indefinite time. During operation, the detection tank 2 is ensured to be in an empty tank state, then the standard solution in the standard solution tank 7 is input into the detection tank 2, the detection electrode 3 is used for detecting the standard solution, a detected value is compared with a known concentration value, if the two values are equal or close to each other, the detection precision of the detection electrode 3 is not a problem, and if the difference between the two values is large, a worker can replace the detection electrode 3.
In a preferred embodiment, a liquid level sensor 20 is disposed in the detection tank 2, the liquid level sensor 20 is connected to the controller 4, and the controller 4 controls the first drawing pump 120 to stop drawing liquid when the liquid level sensor 20 receives a liquid level signal. In the embodiment, by providing the liquid level sensor 20, the first liquid pump 120 can automatically stop liquid pumping after pumping out a proper amount of solution to be detected, so that the automation degree and the working efficiency of the system are improved.
In the utility model, the electroplating bath 1 is an electroplating mother bath, and the electroplating mother bath is used for supplying liquid for each electroplating sub-bath in the electroplating process, so that the solution concentration of each electroplating sub-bath is the same.
The utility model discloses in, the valve that detecting system adopted is solenoid valve or peristaltic valve. The plating solution adopts the plating solution containing chloride ions, and the detection electrode 3 is a chloride ion detection electrode; the utility model discloses except being used for the chloridion to detect, can also be used to other conventional plating bath ion detection.
The technical features of the above embodiments can be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the above embodiments are not described, but should be considered as the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above examples only represent some embodiments of the present invention, and the description thereof is more specific and detailed, but not to be construed as limiting the scope of the present invention. It should be noted that, for those skilled in the art, without departing from the concept of the present invention, several variations and modifications can be made, which all fall within the scope of the present invention. Therefore, the protection scope of the present invention should be subject to the appended claims.
Claims (10)
1. A detection system for detecting ion concentration of plating solution is characterized by comprising a plating bath, a detection groove and a detection electrode for detecting ion concentration, wherein the detection electrode is arranged in the detection groove, the plating bath is connected with the detection groove through a first pipeline, the first pipeline is provided with a first liquid pump and a valve, the first liquid pump is used for pumping the plating solution from the plating bath to the detection groove, and the detection groove is provided with a plating solution outlet;
the detection system for detecting the concentration of the plating solution ions further comprises a controller and a display, wherein the controller is connected with the detection electrode and is used for receiving and processing detection signals and displaying the obtained concentration value on the display.
2. The system of claim 1, wherein the bath outlet of the detection tank includes a first outlet, and the first outlet is connected to a drain line of a valve for draining the liquid in the detection tank.
3. The system of claim 1, wherein the bath outlet of the detection tank further comprises a second outlet connected to the plating tank via a second pipe having a valve.
4. The system for detecting ion concentration of plating solution according to claim 3, wherein the second pipeline is provided with a second liquid pump for pumping recyclable plating solution from the detection tank to the plating tank.
5. The system of claim 1, wherein a level sensor is disposed in the detection tank, and the level sensor is connected to the controller.
6. The system of claim 1, further comprising an ionic solution storage tank, wherein the ionic solution storage tank is connected to the plating tank via a fluid infusion line, and the fluid infusion line is provided with a metering pump and a valve controlled by the controller.
7. The system of claim 1, further comprising a pure water tank connected to the detection tank via a third pipeline, wherein a third pump and a valve are disposed on the third pipeline, and the third pump is used for pumping pure water from the pure water tank to the detection tank.
8. The system according to claim 1, further comprising a standard solution tank, wherein the standard solution tank is connected to the detection tank through a fourth pipeline, a fourth liquid pump and a valve are disposed on the fourth pipeline, and the fourth liquid pump is configured to pump a standard solution from the standard solution tank to the detection tank.
9. The system for detecting the ion concentration of a plating solution according to claim 1, wherein the detection electrode is a chloride ion detection electrode.
10. The system for detecting the ion concentration of a plating solution according to claim 1, wherein the valve used in the detection system is an electromagnetic valve or a peristaltic valve.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222770892.6U CN218726859U (en) | 2022-10-20 | 2022-10-20 | Detection system for detecting ion concentration of plating solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222770892.6U CN218726859U (en) | 2022-10-20 | 2022-10-20 | Detection system for detecting ion concentration of plating solution |
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| Publication Number | Publication Date |
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| CN218726859U true CN218726859U (en) | 2023-03-24 |
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| CN202222770892.6U Active CN218726859U (en) | 2022-10-20 | 2022-10-20 | Detection system for detecting ion concentration of plating solution |
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