CN218692293U - Wafer box cleaning machine - Google Patents
Wafer box cleaning machine Download PDFInfo
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- CN218692293U CN218692293U CN202222758448.2U CN202222758448U CN218692293U CN 218692293 U CN218692293 U CN 218692293U CN 202222758448 U CN202222758448 U CN 202222758448U CN 218692293 U CN218692293 U CN 218692293U
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- cleaning machine
- box cleaning
- wafer box
- air suction
- type fan
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Abstract
The utility model provides a wafer box cleaning machine. The spool box cleaning machine includes: the cleaning cavity is positioned in the center of the wafer box cleaning machine; the air suction type fan is positioned inside the edge of the wafer box cleaning machine and used for sucking particles generated by mechanical parts when the wafer box cleaning machine operates; the air suction type fan passes through the ventilation hole of spool box cleaning machine is with the outside air suction inside the spool box cleaning machine, the ventilation hole with air suction type fan mutually perpendicular sets up. According to the technical scheme, the original air blowing type fan of the wafer box cleaning machine is replaced by the air suction type fan, when heat is dissipated, particles generated inside the wafer box cleaning machine during operation are extracted from the machine body, the particle concentration inside the wafer box cleaning machine is greatly reduced, and secondary pollution after cleaning is avoided.
Description
Technical Field
The utility model relates to a semiconductor manufacturing field especially relates to a wafer box cleaning machine.
Background
In the semiconductor manufacturing process, there are strict requirements for a dust-free environment, and equipment and consumables for manufacturing semiconductor products are also strictly controlled. Wafer cassettes are commonly used for storage and transport of semiconductors and it is necessary to avoid particle generation altogether.
In the prior art, a wafer box cleaning machine is used for cleaning a wafer box, however, in the normal operation process of the wafer box cleaning machine, particles can be generated due to the movement of a mechanical part of equipment. Therefore, how to improve the situation of generating particles when the wafer box cleaning machine operates is a problem to be solved currently.
Disclosure of Invention
The utility model aims to solve the technical problem that the condition of producing the granule when improving the spool box cleaning machine operation provides a spool box cleaning machine.
In order to solve the problem, the utility model provides a wafer box cleaning machine, include: the cleaning cavity is positioned in the center of the wafer box cleaning machine; the air suction type fan is positioned inside the edge of the wafer box cleaning machine and used for sucking particles generated by mechanical parts when the wafer box cleaning machine operates; the air suction type fan passes through the ventilation hole of spool box cleaning machine is with the outside air suction inside the spool box cleaning machine, the ventilation hole with air suction type fan mutually perpendicular sets up.
Above-mentioned technical scheme through changing the original air blowing formula fan of spool box cleaning machine into bleeder fan, when the radiating, outside the granule pump that produces inside when running spool box cleaning machine, greatly reduced the inside granule concentration that exists of spool box cleaning machine, avoided the secondary pollution after the washing.
Drawings
FIG. 1 is a schematic structural diagram of a wafer box cleaning machine in the prior art.
Fig. 2 is a schematic structural diagram of a specific embodiment of the wafer box cleaning machine of the present invention.
Detailed Description
The following will explain in detail the specific embodiments of the magazine cleaning machine provided by the present invention with reference to the accompanying drawings.
FIG. 1 is a schematic diagram showing the structure of a cassette cleaning machine 10 of the prior art, which comprises a cleaning chamber 11, an air blowing fan 12 and a vent hole 13. The cleaning cavity 11 is located inside the wafer box cleaning machine 10 and used for cleaning the wafer box. An air blowing fan 12 is positioned inside the edge of the wafer cassette cleaning machine 10, blows air into the wafer cassette cleaning machine 10 from the edge of the wafer cassette cleaning machine 10, and is exhausted from a vent hole 13 arranged on the edge of the wafer cassette cleaning machine 10 perpendicular to the air blowing fan 12.
When the cartridge cleaning machine 10 stops operating, the particles in the environment are substantially 0. However, during operation of the cassette washer 10, the mechanical movement generates particles, resulting in an increased concentration of particles in the surrounding environment. Through detection, the concentration of the particles is the highest within the distance range of 0.2-0.6 m around the wafer box cleaning machine 10. Particle concentration's increase is probably causing the secondary pollution after the washing in the surrounding environment, consequently, in order to improve this problem, the utility model provides a new spool box cleaning machine structure.
Fig. 2 is a schematic structural diagram of a specific embodiment of the cartridge cleaning machine 20 according to the present invention. The wafer box cleaning machine 20 comprises a cleaning cavity 21 and an air suction fan 22. The cleaning cavity 21 is located in the center of the wafer box cleaning machine 20 and used for cleaning the wafer box. An extraction fan 22 is located within the edge of the pod washer 20 for extracting particles generated by the mechanical components of the pod washer 20 during operation. In a specific embodiment, the extraction fan 22 is located inside the electric cabinet 29. The suction fan 22 sucks external air into the inside of the cassette cleaning machine 20 through the vent hole 23 of the cassette cleaning machine 20, and the vent hole 23 and the suction fan 22 are perpendicular to each other. As a specific embodiment, the vent holes 23 are located on both sides of the cartridge cleaning machine 20. In addition, an electric cabinet exhaust duct (not shown) is disposed outside the cassette cleaning machine 20 for exhausting the gas exhausted by the suction fan 22 when the cassette cleaning machine 20 is in operation. The electric control cabinet exhaust duct is connected with an electric control cabinet 29.
The cassette washer 20 further includes a motor, a transformer, and a machine heat dissipation and exhaust pipeline (not shown). The motor is connected with the cleaning cavity 21, the transformer is connected with the motor, and the machine heat dissipation exhaust pipeline is connected with the 20 machines of the wafer box cleaning machine and used for machine heat dissipation to enable the machines to keep constant temperature. The running temperature of the motor is 27-28 ℃. The operation temperature of the transformer is 30-31 ℃. After detection, the air blowing type heat dissipation is changed into air suction type heat dissipation, and the temperature of the motor and the temperature of the transformer are basically not influenced.
According to the technical scheme, the original air blowing type fan 12 of the wafer box cleaning machine 20 is replaced by the air suction type fan 22, and when heat is dissipated, particles generated inside the wafer box cleaning machine 20 during operation are drawn out of the machine body, so that the concentration of the particles existing inside the wafer box cleaning machine 20 is greatly reduced. Through detection, when the equipment normally operates, the concentration of particles in the ambient environment is basically 0, and secondary pollution after cleaning is avoided.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, a plurality of improvements and decorations can be made without departing from the principle of the present invention, and these improvements and decorations should also be regarded as the protection scope of the present invention.
Claims (5)
1. A cartridge cleaning machine, comprising:
the cleaning cavity is positioned in the center of the wafer box cleaning machine;
the air suction type fan is positioned inside the edge of the wafer box cleaning machine and used for sucking particles generated by mechanical parts when the wafer box cleaning machine operates;
the air suction type fan passes through the ventilation hole of spool box cleaning machine is with the outside air suction inside the spool box cleaning machine, the ventilation hole with air suction type fan mutually perpendicular sets up.
2. The cassette cleaning machine of claim 1, wherein an electric cabinet exhaust duct is provided outside the cassette cleaning machine for exhausting gas pumped by the suction fan when the cassette cleaning machine is in operation.
3. The cassette cleaning machine of claim 1, further comprising:
the motor is connected with the cleaning cavity;
the transformer is connected with the motor;
and the machine station heat dissipation exhaust pipeline is connected with the wafer box cleaning machine station.
4. A cartridge cleaning machine as defined in claim 3, wherein the motor operating temperature is 27-28 ℃.
5. A cartridge cleaning machine according to claim 3, wherein the transformer operates at a temperature of 30 ℃ to 31 ℃.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202222758448.2U CN218692293U (en) | 2022-10-19 | 2022-10-19 | Wafer box cleaning machine |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202222758448.2U CN218692293U (en) | 2022-10-19 | 2022-10-19 | Wafer box cleaning machine |
Publications (1)
Publication Number | Publication Date |
---|---|
CN218692293U true CN218692293U (en) | 2023-03-24 |
Family
ID=85587501
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202222758448.2U Active CN218692293U (en) | 2022-10-19 | 2022-10-19 | Wafer box cleaning machine |
Country Status (1)
Country | Link |
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CN (1) | CN218692293U (en) |
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2022
- 2022-10-19 CN CN202222758448.2U patent/CN218692293U/en active Active
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