CN218590492U

CN218590492U - Device for producing high-viscosity photoresist

Info

Publication number: CN218590492U
Application number: CN202222744536.7U
Authority: CN
Inventors: 许箭; 崔世彬; 管艺真; 王亮乾
Original assignee: Guoke Tianji Binzhou New Materials Co ltd
Current assignee: Guoke Tianji Binzhou New Materials Co ltd
Priority date: 2022-10-18
Filing date: 2022-10-18
Publication date: 2023-03-10
Anticipated expiration: 2032-10-18

Abstract

The utility model provides a device for producing high-viscosity photoresist, which relates to the technical field of photoresist production, and comprises a reaction kettle, wherein the reaction kettle is connected with a heater and a refrigerating mechanism, a discharge port of the reaction kettle is connected with a detachable material return pipe, one end of the material return pipe is connected with a filter, the discharge end of the filter is connected with a material conveying pump, and the discharge end of the material conveying pump is communicated with a material guide pipe arranged on the reaction kettle through the material conveying pipe; the device not only greatly shortens the production period of the high-viscosity photoresist, but also effectively filters impurities in the production process of the high-viscosity photoresist, and has high use value.

Description

Device for producing high-viscosity photoresist

Technical Field

The utility model relates to a photoresist production technical field particularly, relates to a device of high viscosity photoresist production.

Background

The high-viscosity photoresist usually contains resin polymers, acid generators, additives, solvent components and other raw materials, and the traditional production method is to prepare the raw materials of the high-viscosity photoresist in a container at normal temperature (about 30 ℃), uniformly distribute and fully dissolve the additives by stirring, shaking and other methods, and then send the raw materials into a mixing kettle for preparation at normal temperature through a magnetic gear pump or a pneumatic pump, so that the dissolution speed of the resin and the additives is slow, the dissolution is not uniform, the dissolution time is long, and the consumption of 7-14 days is about needed when an ideal state is obtained, thereby greatly reducing the production efficiency of the mixing kettle. Need filter filling to packing bottle after high viscosity photoresist preparation, because photoresist viscosity is high, filter time is long and generally use single filtration, single filter effect is poor, can not reach the granule management and control requirement completely sometimes, and need doing over again, greatly increased manual work, water and electricity and time cost.

SUMMERY OF THE UTILITY MODEL

The utility model aims at solving the problem of proposing in the above-mentioned background art, then proposed a device of high viscosity photoresist production.

The utility model provides a technical scheme that its technical problem adopted is:

the utility model provides a device of high viscosity photoresist production, includes reation kettle, and reation kettle is connected with and is used for heating up to the heater and the refrigerating mechanism of the required temperature of experiment with reation kettle, and reation kettle's discharge gate department is connected with detachable feed back pipe, and feed back pipe one end is connected with the filter, and the discharge end of filter is connected with the conveying pump, and the discharge end of conveying pump passes through the conveying pipeline and communicates in order to realize the reintroduction to filtering back photoresist with the passage of setting on reation kettle.

Further, the discharging port of the reaction kettle is connected with the material return pipe through a flange so as to be convenient for detachment between the discharging port and the material return pipe.

Furthermore, the filter adopts a bag type filter, the filter adopts a folding inlet filter membrane, the filtering surface area is large, the filter is suitable for filtering a solution with a larger volume, the appearance of the filter is made of polypropylene materials, no adhesive or other chemical substances are contained, the sample is ensured not to be polluted, the filter has different pore sizes and can be subjected to high-pressure sterilization.

Furthermore, the delivery pump adopts one of a magnetic gear pump or a pneumatic pump.

The scheme is optimized, the material conveying pump adopts a pneumatic pump, the pneumatic pump adopts compressed air as a power source, and various corrosive liquids, liquids with particles, high-viscosity, volatile, inflammable and highly toxic liquids can be pumped and absorbed completely.

Further, the heater adopts a tubular electric heating element or a far infrared electric heating device.

Furthermore, the tubular electric heating element is inversely inserted into the jacket of the reaction kettle to heat the hot heating oil so as to transmit the heat energy to the high-viscosity photoresist raw material in the reaction kettle.

Furthermore, the tubular electric heating elements are directly inserted into the reaction kettle or are uniformly distributed on the periphery of the inner wall of the reaction kettle.

Furthermore, the electric heater of the far infrared electric heating device wraps the bottom, the middle part and the lower part of the reaction kettle so as to realize uniform heat release, can control the upper part, the middle part and the lower part in a segmented manner and has good heating effect.

Furthermore, refrigerating mechanism includes refrigerator and backward flow condenser pipe, and the condenser is connected with the trachea that sets up on reation kettle, and the last inlet of water and the lower delivery port of condenser pipe all are connected with the refrigerator and realize the control of refrigerator to reation kettle temperature.

Compared with the prior art, the beneficial effects of the utility model are that:

the utility model connects the reaction kettle with the heater and the refrigerating mechanism, and connects and combines the filter and the delivery pump, thereby not only greatly shortening the production period of the high-viscosity photoresist, but also effectively filtering the impurities in the production process of the high-viscosity photoresist; after the raw materials in the reaction kettle are fully dissolved, the circulation filtration is started, the effective filtration times are greatly increased, the filtration effect is improved, and the viscosity is reduced and the filtration speed is increased because the photoresist solution is in a heating state.

Drawings

Fig. 1 is a schematic structural view of the present invention;

wherein: 1. a reaction kettle; 11. a material guide pipe; 12. an air pipe; 2. a refrigeration mechanism; 21. a refrigerator; 22. a reflux condenser tube; 3. a material return pipe; 31. a filter; 4. a delivery pump; 41. a delivery pipe; 5. a heater.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts all belong to the protection scope of the present invention. The invention will be further explained by the following embodiments with reference to the drawings:

as shown in fig. 1, a device for producing high viscosity photoresist comprises a reaction kettle 1, wherein the reaction kettle 1 is connected with a heater 5 and a refrigerating mechanism 2 so as to heat the reaction kettle 1 to the temperature (40-100 ℃) required by the experiment, a discharge port of the reaction kettle 1 is connected with a material return pipe 3 through a flange, one end of the material return pipe 3 is connected with a filter 31 for filtering photoresist impurities, the filter 31 can adopt a bag filter, the filter adopts a folding inlet filter membrane, the filtering surface area is large, the device is suitable for filtering solution with larger volume, and the surface of the filter is made of polypropylene materials without adhesives or other chemical substances, so that samples are not polluted, the filter has different pore diameters and can be selected for high-pressure sterilization; the discharge end of the filter 31 is connected with a delivery pump 4 for circulating material guiding, the delivery pump 4 adopts one of a magnetic gear pump or a pneumatic pump, the pneumatic pump is adopted in the design, compressed air is adopted as a power source, and various corrosive liquids, liquids with particles, high-viscosity, volatile, inflammable and highly toxic liquids can be pumped and absorbed completely; the discharging end of the material delivery pump 4 is communicated with a material guide pipe 11 arranged on the reaction kettle 1 through a material delivery pipe 41 to realize the reintroduction of the filtered photoresist.

It is worth to say that the heater 5 adopts a flange type tubular electric heating element or a far infrared electric heating device; in the specific implementation process, the flange type tubular electric heating element has two layout modes, one of which is that the flange type tubular electric heating element is inversely inserted into the jacket of the reaction kettle 1 to heat hot heating oil and transmit the heat energy to the high-viscosity photoresist raw material in the reaction kettle 1; the other is that tubular electric heating elements are directly inserted into the reaction kettle 1 or electric heating pipes are evenly distributed around the wall. However, the far infrared electric heating device is adopted in the design, namely, the electric heater of the far infrared electric heating device wraps the bottom and the middle-lower part of the reaction kettle 1 to heat, the far infrared electric heating device has the advantages of large heating area, stable and quick temperature rise, uniform heat release, convenient temperature control, sectional control of the upper part, the middle part and the lower part, easy control of the temperature of the kettle wall in the kettle, no side effect on the material fuel in the kettle, no material carbonization phenomenon, no noise in operation, no pollution, long service life and obvious energy conservation.

Specifically, the refrigeration mechanism 2 includes a refrigerator 21 and a reflux condenser pipe 22, the condenser is connected to the gas pipe 12 disposed on the reaction kettle 1, and an upper water inlet and a lower water outlet of the condenser pipe are both connected to the refrigerator 21 to control the temperature of the reaction kettle 1 by the refrigerator 21.

The device comprises the following specific operation steps in the use process:

1. starting a heater 5 and a refrigerating mechanism 2, and heating the reaction kettle 1 to the temperature (40-100 ℃) required by the experiment;

2. placing the raw material for producing the high-viscosity photoresist into the reaction kettle 1 through the feed inlet of the reaction kettle 1 and closing the feed inlet cover;

3. starting the reaction kettle 1, and fully stirring and dissolving the photoresist raw material by a stirring device in the reaction kettle 1;

4. after the dissolution is finished, opening a discharge port at the lower end of the reaction kettle 1, and starting a filter 31 and a material conveying pump 4 to circularly filter the photoresist solution in the reaction kettle 1;

5. and after the circulating filtration is finished, the material return pipe 3 is disconnected from the discharge hole to fill the product.

Through tests, the design shortens the time for completing mixing to 1-2 days by 7-14 days, and the dissolving effect of the resin and the additive is greatly improved.

The foregoing illustrates and describes the principles, general features, and advantages of the present invention. It should be understood by those skilled in the art that the present invention is not limited to the above embodiments, and the description in the above embodiments and the specification is only for explaining the principle of the present invention, and that the present invention can also have various changes and modifications without departing from the spirit and scope of the present invention, and these changes and modifications all fall into the scope of the present invention as claimed. The scope of the invention is defined by the appended claims and equivalents thereof.

Claims

1. The utility model provides a device of high viscosity photoresist production, including reation kettle (1), its characterized in that, reation kettle (1) is connected with heater (5) and refrigeration mechanism (2), the discharge gate department of reation kettle (1) is connected with detachable feed back pipe (3), feed back pipe (3) one end is connected with filter (31), the discharge end of filter (31) is connected with conveying pump (4), the discharge end of conveying pump (4) passes through conveying pipeline (41) and passes through guide pipe (11) the intercommunication of setting on reation kettle (1).

2. An apparatus for producing a high viscosity photoresist according to claim 1, wherein the filter (31) is a bladder filter.

3. The apparatus for producing a high viscosity photoresist according to claim 1, wherein the delivery pump (4) is one of a magnetic gear pump and a pneumatic pump.

4. The apparatus for producing a high viscosity photoresist according to claim 1, wherein the heater (5) employs a tubular electric heating element or a far infrared electric heating device.

5. A high viscosity photoresist production apparatus according to claim 4, wherein the tubular electric heating element is inserted upside down in the jacket of the reaction vessel (1).

6. A device for producing high viscosity photoresist according to claim 4, wherein the tubular electric heating elements are directly inserted into the reaction vessel (1) or are uniformly distributed around the inner wall of the reaction vessel (1).

7. The apparatus for producing a high viscosity photoresist according to claim 4 wherein the electric heater of the far infrared electric heating apparatus covers the bottom and the middle-lower portion of the reaction vessel (1).

8. The apparatus for producing a high viscosity photoresist according to claim 1, wherein the refrigerating mechanism (2) comprises a refrigerator (21) and a reflux condenser tube (22), the condenser is connected with a gas tube (12) arranged on the reaction vessel (1), and an upper water inlet and a lower water outlet of the condenser tube are both connected with the refrigerator (21).