CN218567830U - Nano-imprinting process control device and nano-imprinting device - Google Patents
Nano-imprinting process control device and nano-imprinting device Download PDFInfo
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- CN218567830U CN218567830U CN202222290493.XU CN202222290493U CN218567830U CN 218567830 U CN218567830 U CN 218567830U CN 202222290493 U CN202222290493 U CN 202222290493U CN 218567830 U CN218567830 U CN 218567830U
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Abstract
The utility model relates to a nanometer impression process control device and nanometer impression device belongs to nanometer impression technical field, has solved the not good problem of structure uniformity that current nanometer impression device can lead to different positions in the waveguide piece structure uniformity, different pieces. The nano-imprinting process control device comprises a tension control system, a soft film moving device, a soft film fixing device and an imprinting roller; one end of the soft film with the surface relief pattern is connected with the soft film fixing device, and the other end of the soft film is connected with the soft film moving device and the tension control system; the soft film moving device can vertically move up and down; the embossing roller is positioned above the soft film. The nanoimprint process control device can control the tension of the soft film to be constant through the tension control system, so that the stretching degree of the surface relief grating on the soft film is consistent, and the filling consistency of the nanoimprint structures is realized.
Description
Technical Field
The utility model relates to a nanometer impression technical field especially relates to a nanometer impression process control device and nanometer impression device.
Background
The nanoimprint technology is one of the mainstream techniques for making the surface relief pattern of the AR diffraction optical waveguide. The method uses the nano-imprinting technology to copy the surface relief patterns on the master mask onto a glass wafer in a large batch at low cost, thereby manufacturing the AR diffraction optical waveguide sheet.
The nanoimprint device comprises a plurality of components, the nanoimprint process involves pressure application, pattern contact, imprint roller movement, pattern separation and the like, and due to the fact that a plurality of parameters can change in the nanoimprint process and parameters can also change between different imprint batches, the structural consistency of different positions in the waveguide sheet and the structural consistency of different sheets are poor.
SUMMERY OF THE UTILITY MODEL
In view of the foregoing analysis, the present invention is directed to a nanoimprint process control apparatus and a nanoimprint apparatus for solving the problem that the conventional nanoimprint apparatus may cause structural consistency at different positions in a waveguide chip, and the structural consistency of different chips is not good.
The purpose of the utility model is realized mainly through the following technical scheme:
in one aspect, the present invention provides a nanoimprint process control device, including a tension control system, a soft film moving device, a soft film fixing device, and an imprint roller;
one end of the soft film with the surface relief pattern is connected with the soft film fixing device, and the other end of the soft film is connected with the soft film moving device and the tension control system; the soft film moving device can vertically move up and down;
the embossing roller is positioned above the soft film.
Preferably, the nanoimprinting process control apparatus further includes a constant imprinting angle control system.
Preferably, the nanoimprinting process control apparatus further includes a constant imprinting pressure control system.
Preferably, the soft film moving device is a soft film moving roller, the tension control system comprises a guide wheel, a tension wheel and a soft film tension adjusting wheel, the height of the guide wheel is higher than the highest movable height of the soft film moving roller, the height of the tension wheel is lower than that of the guide wheel, and the soft film sequentially bypasses the lower part of the soft film moving roller, the upper part of the guide wheel and the lower part of the tension wheel and then is connected with the soft film tension adjusting wheel.
Preferably, the mantle mobile device is the mantle frame, tension control system includes the mantle dead lever, the mantle dead lever is located in the mantle frame, the other end of mantle with the mantle dead lever is connected, be provided with tension sensor on the mantle dead lever, the mantle dead lever can be at the mantle extending direction round trip movement.
Preferably, the tension control system further comprises a motor, and the motor is respectively connected with the soft membrane fixing rod and the tension sensor.
Preferably, the constant embossing angle control system comprises an embossing roller moving speed control unit and a soft film moving device moving speed control unit, wherein a first calculation module is arranged in the soft film moving device moving speed control unit, and the first calculation module calculates the soft film moving device moving speed according to formula (I):
V Y ＝tanA×V X formula (I);
wherein, V Y The moving speed of the soft film moving device; a is the angle of an included angle between the soft film and the glass wafer and is a constant value; v X The embossing roll movement speed is a known parameter value.
Preferably, the constant imprinting pressure control system comprises an imprinting roller pressure data set calculating unit, a PLC controller, an electric proportional valve and an air source device, wherein the air source device is connected with the imprinting roller, the electric proportional valve is arranged between the air source device and the imprinting roller, the imprinting roller pressure data set calculating unit is connected with the PLC controller, and the PLC controller is connected with the electric proportional valve; the embossing roller pressure data set calculating unit is provided with a second calculating module, and the second calculating module calculates the embossing roller pressure according to the formula (II) and the formula (III):
F1＝F2 Y + P × S formula (II);
wherein F1 is the pressure of the impression roller; f2 Y The component force of the tension of the soft film on the Y axis; p is a set constant pressure value; s is the pressed area of the glass wafer; l is the contact width of the embossing roller and the glass wafer; r is the radius of the glass wafer; and X is an imprinting distance.
Preferably, the constant imprinting pressure control system includes a gasket.
In a second aspect, the present invention provides a nanoimprint apparatus including the aforementioned nanoimprint process control apparatus.
Compared with the prior art, the utility model discloses can realize one of following beneficial effect at least:
1. the utility model discloses a nanometer impression process control device includes tension control system, tension control system control mantle tension is invariable to realize the uniformity that is filled by tensile degree unanimity and impression structure of the surperficial relief (sculpture) grating on the mantle.
2. The utility model discloses a nanometer impression process control device still includes invariable impression angle control system, and invariable impression angle control system can control the impression angle for the constancy value to exhaust velocity and mantle upper surface relief pattern's deformation degree is unanimous in making the impression, and then makes the filling structure unanimous.
3. The utility model discloses a nanometer impression process control device still includes invariable impression pressure control system, and invariable impression pressure control system can control the pressure that the glass wafer received invariable to make the filling structure unanimous.
The utility model discloses in, can also make up each other between the above-mentioned each technical scheme to realize more preferred combination scheme. Additional features and advantages of the invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. The objectives and other advantages of the invention will be realized and attained by the structure particularly pointed out in the written description and drawings.
Drawings
The drawings, in which like reference numerals refer to like parts throughout, are for the purpose of illustrating particular embodiments only and are not to be considered limiting of the invention.
FIG. 1 is a flow chart of a nanoimprinting apparatus and a process for performing nanoimprinting using the same;
fig. 2 is a nanoimprint process control apparatus of the present invention;
fig. 3 is a structural diagram of a tension pulley in the nanoimprint process control apparatus of the present invention;
fig. 4 is another nanoimprint process control apparatus of the present invention;
fig. 5 is a system diagram of tension control of another nanoimprint process control apparatus of the present invention;
FIG. 6 is an impression angle control analysis;
FIG. 7 is a force analysis diagram of the imprinting apparatus;
FIG. 8 is an analysis view of the area of the imprint;
FIG. 9 is a graph showing the variation of the pressed area;
fig. 10 is a constant imprinting pressure control system of the present invention;
fig. 11 is another constant imprinting pressure control system of the present invention.
Reference numerals:
1-a soft membrane moving device; 2-a soft membrane fixing device; 3-UV exposure device; 4-embossing roller; 5-a carrying platform; 6-soft film; 7-surface relief pattern; 8-impression glue; 9-a glass wafer; 10-a guide wheel; 11-a tension pulley; 1101-wheel body; 1102-a pressure sensor; 12-a soft film tension adjusting wheel; 13-a motor; 14-a tension sensor; 15-soft membrane fixing rod; 16-a soft film frame; 17-a guide rail; 18-impression roll pressure data set; 19-a PLC controller; 20-voltage data set; 21-an electric proportional valve; 22-air pressure data set; 23-a gas source device; 24-shim.
Detailed Description
The following detailed description of the preferred embodiments of the invention, which is to be read in connection with the accompanying drawings, forms a part of this application, and together with the embodiments of the invention, serve to explain the principles of the invention and not to limit its scope.
The nanoimprint is carried out based on the nanoimprint device shown in fig. 1, the nanoimprint device is of a structure of a soft film and an imprint roller, and comprises five parts: the end part with the surface relief pattern is arranged on a soft film, a stamping roller, a glass wafer with stamping glue, a glass wafer bearing platform and a UV exposure mechanism in a soft film frame. The nanoimprint principle is as follows: firstly, a stamping roller applies pressure to a soft film to enable a surface relief pattern on the soft film to be in line contact with stamping glue on a wafer; secondly, after lamination, the embossing roller moves from right to left to enable the embossed patterns on the upper surface of the soft film to be in surface contact with the embossing glue on the wafer, and meanwhile, the soft film frame (the soft film moving device) moves downwards to transfer all the embossed patterns on the upper surface of the soft film to the wafer in a stamping and copying manner; thirdly, converting the transferred microstructure from a liquid state to a solid state through UV light of a UV exposure mechanism, thereby playing a role in structural shaping; and fourthly, after the UV exposure is completed, the soft film frame moves upwards, and the embossing roller moves rightwards at the same time, so that the embossed patterns on the upper surface of the soft film are separated from the embossed patterns on the upper surface of the embossed wafer, the embossed wafer with the embossed patterns is obtained, and then the whole AR diffraction optical waveguide sheet is obtained through processes of coating, cutting, laminating and the like. The problems of poor structural consistency of different positions on the waveguide sheet and poor structural consistency of different sheets can occur in the imprinting process.
The utility model discloses an inventor discovers, in the impression process, it so can lead to the structure of different positions in the wafer to fill the uniformity, the structure uniformity of different pieces is all not good, because the mantle tension produces undulantly easily in the impression process, and current device is uncontrollable to mantle tension, mantle tension change can lead to the surperficial relief (sculpture) grating on the mantle because of being stretched the degree inconsistent and lead to the micro-deformation degree inconsistent, mantle tension change also can influence the size of actual pressure on the wafer, thereby influence the filling uniformity of surperficial relief (sculpture) grating.
Based on this, a specific embodiment of the present invention discloses a nanoimprint process control device, which includes a tension control system, a soft film moving device 1, a soft film fixing device 2, and an imprint roller 4;
one end of a soft film 6 with a surface relief pattern 7 is connected with the soft film fixing device 2, and the other end of the soft film 6 is sequentially connected with the soft film moving device 1 and the tension control system; the soft film moving device 1 can vertically move up and down;
the embossing roller 4 is located above the soft film 6.
When the tension control system is used, the tension of the soft film is controlled to be constant by the tension control system.
Compared with the prior art, the utility model discloses a nanometer impression process control device includes tension control system, through tension control system control mantle tension is invariable to realize the uniformity that is filled by the tensile degree unanimity and impression structure of surperficial relief (sculpture) grating on the mantle.
In the existing device, the imprinting angle is not constant in the imprinting process, and the non-constant imprinting angle can cause inconsistent deformation degrees of the exhaust speed and the embossed grating on the upper surface of the soft film in the imprinting process, so that the consistency of structure filling is influenced.
In order to keep the imprinting angle constant and further improve the consistency of the structure filling, the nanoimprinting process control device further comprises a constant imprinting angle control system. The constant imprinting angle control system is used for controlling the imprinting angle to be constant. The stamping angle refers to an included angle between the soft film and the wafer.
In the conventional imprinting device, since the glass wafer is circular, as shown in fig. 8 and 9, in the imprinting process, the contact area between the imprinting roller and the glass wafer is changed consistently, the stressed area of different positions of the glass wafer may change in a parabolic rule, and the actual pressure at different positions on the wafer is not constant. The non-constant pressure can cause the filling degree of the structures at different positions on the wafer to be inconsistent, and further influence the consistency of the relief grating structure on the surface of the product.
Therefore, in order to further improve the filling consistency of structures at different positions on the wafer, the nanoimprint process control device further comprises a constant imprinting pressure control system, and the constant imprinting pressure control system is used for controlling the pressure on the glass wafer to be constant.
In a preferred embodiment, as shown in fig. 2, the soft film moving device 1 is a soft film moving roller, the tension control system includes a guide wheel 10, a tension wheel 11 and a soft film tension adjusting wheel 12, the height of the guide wheel 10 is higher than the highest movable height of the soft film moving roller, the height of the tension wheel 11 is lower than the height of the guide wheel 10, and the soft film 6 sequentially passes under the soft film moving roller, above the guide wheel 10 and below the tension wheel 11 and is connected to the soft film tension adjusting wheel 12.
The tension wheel 11 is used for monitoring the tension of the soft film, displaying tension information in real time and outputting the tension information to the soft film tension adjusting wheel 12 in time. The tension pulley 11 can be provided with 1 or more, and when the tension pulley is provided with a plurality of tension pulleys, the tension pulley can be arranged at different positions of the soft film, and meanwhile, the included angle between the tension pulley 11 and the soft film is kept constant.
Specifically, as shown in fig. 3, the tension pulley 11 includes a pulley body 1101 and pressure sensors 1102 respectively disposed at two ends of the pulley body 1101, the flexible film 6 is wound around the pulley body 1101, pressure is formed on the pulley body 1101, and the pressure, i.e., the tension of the flexible film, is monitored by the pressure sensors 1102.
The guide wheel 10 is used for ensuring that an included angle between the tension wheel 11 and the soft film 6 is constant, and reducing fluctuation of the included angle caused by tension in the imprinting process to influence the tension monitoring precision.
The soft film tension adjusting wheel 12 is used for adjusting the soft film tension according to the tension information fed back by the tension wheel in real time, so that the tension in the imprinting process is stable. Specifically, the tail end of the soft film 6 is wound on the soft film tension adjusting wheel 12, and when the soft film tension becomes large, the soft film tension adjusting wheel 12 releases the length of the soft film so as to reduce the soft film tension; when the tension of the soft film is reduced, the soft film tension adjusting wheel 12 can tighten the soft film to increase the tension.
Exemplarily, the tension control system further comprises a rotating shaft motor, the rotating shaft motor is respectively connected with the soft film tension adjusting wheel 12 and the tension wheel 11, the tension wheel 11 feeds back tension information to the rotating shaft motor, and the rotating shaft motor rotates forwards or backwards according to the tension information fed back by the tension wheel in real time to control the soft film tension adjusting wheel 12 to release or tension the soft film, so that the tension of the soft film is adjusted and the tension is constant.
The function of the soft film moving roller is to keep the soft film ascending and descending without influencing the soft film tension and the stamping angle.
In another preferred embodiment, as shown in fig. 4 and 5, the soft membrane moving device 1 is a soft membrane frame 16, the tension control system comprises a soft membrane fixing rod 15, the soft membrane fixing rod 15 is located in the soft membrane frame 16, the other end of the soft membrane 6 is connected with the soft membrane fixing rod 15, a tension sensor 14 is arranged on the soft membrane fixing rod 15, and the soft membrane fixing rod 15 can move back and forth in the extending direction of the soft membrane 6.
The tension sensor 14 can sense the force of the stretched soft membrane 6, the soft membrane 6 is stretched from relaxation to being stretched and flat, the state is a soft membrane unstressed stage, the soft membrane 6 is continuously stretched, namely the soft membrane starts to be stressed, the stage is a stressed stage, the force sensed by the tension sensor 14 changes from unstressed to stressed, the change value is the magnitude of the force sensed by the soft membrane, and therefore the tension sensor 14 can detect the tension of the soft membrane 6.
The soft film fixing rod 15 moves in the soft film frame 16 according to the tension information fed back by the tension sensor 14, and keeps the tension constant.
Illustratively, the tension control system further comprises a motor 13, and the motor 13 is respectively connected with the soft membrane fixing rod 15 and the tension sensor 14. The motor 13 controls the soft film fixing rod 15 to move in the soft film frame 16 according to the tension information fed back by the tension sensor 14, and the tension is kept constant. Specifically, when the tension of the soft membrane becomes larger, the motor 13 controls the soft membrane fixing rod 15 to move, so as to loosen the soft membrane, and thus the tension of the soft membrane is reduced; when the tension of the soft membrane becomes small, the motor 13 controls the soft membrane fixing rod 15 to move, and the soft membrane is tensioned, so that the tension of the soft membrane is increased.
The motor 13 may be mounted on a film frame 16, as shown in fig. 5; or may be provided outside the film frame 16 as shown in fig. 4.
Further, in order to facilitate the movement of the soft film fixing rod 15 in the soft film frame 16, a guide rail 17 is provided on the soft film frame 16.
Specifically, the guide rails 17 are disposed on two opposite side frames of the soft film frame 16, and two ends of the soft film fixing rod 15 are respectively located in the guide rails 17 and can move in the guide rails 17.
In order to improve the accuracy of tension monitoring, tension sensors 14 are respectively arranged at two ends of the soft membrane fixing rod 15.
In order to keep the stamping angle constant, i.e. the angle between the film and the wafer is consistent during stamping, it can be seen from fig. 6 that the triangle formed by the stamping initial position and the stamping process is a triangle scaled by the same scale when the stamping angle is constant.
As is clear from FIG. 6, L is clear because the movement time of the film transfer device 1 and the press-transferring time of the press roller 4 are the same, and L is the same Y /V Y ＝L X /V X Wherein L is X Is the diameter of the glass wafer, which is a known parameter; v X The moving speed of the embossing roller is a known parameter; l is Y Can be calculated from the wafer diameter and the known angle A, i.e. L Y ＝tanA×L X Moving speed V of film frame Y Can be calculated by the above formula, i.e. V Y ＝tanA×L X ×V X /L X ＝tanA×V X 。
Therefore, in order to further improve the consistency of the structure filling, the constant stamping angle control system comprises a stamping roller moving speed control unit and a soft film moving device moving speed control unit, wherein a first calculation module is arranged in the soft film moving device moving speed control unit, and the first calculation module calculates the soft film moving device moving speed according to the formula (I):
V Y ＝tanA×V X formula (I);
wherein, V Y Is softA membrane movement device movement speed; a is the angle of an included angle between the soft film and the glass wafer and is a constant value; v X The embossing roll movement speed is a known parameter value.
For the imprinting pressure, the pressure P is the product of the contact area S and the pressure applied, and the force applied during the imprinting process is shown in fig. 7. By definition of pressure, since F2y is known and constant (the impression angle is constant and known, and the film tension F2 is also constant and known) in order to keep the pressure constant, the pressure P can be constant by adjusting F1 accordingly with S.
During the imprinting process, F2y can be measured by sensing the tension F2 and the imprinting angle A from a tension sensor (F2 y = F2 x SinA), and the contact area S of the wafer and the imprinting roller can be measured from the imprinting position and the diameter of the wafer (S = roller contact width)
Wherein R is the radius of the wafer and X is the imprinting distance. The roller contact width L is a constant value, which can be derived from the sensing paper test), F1 can be calculated from the pressure equation, with the actual pressure remaining known and constant: f1= F2 Y + P × S. That is, F1 is adjusted accordingly with S to make the actual pressure P constant.
In the imprinting process, S is a group of data which continuously changes, and the pressure at different positions on the wafer is adjusted, so that the pressure is correspondingly adjusted along with the contact area S between the pressing roller and the wafer, and the continuous stability of the actual pressure on the wafer is realized. The corresponding F1 data set can be calculated from the formula.
Thus, as shown in fig. 10, the constant nip pressure control system includes a nip roller pressure data set calculation unit, a PLC controller 19, an electric proportional valve 21, and a gas source device 23, the gas source device 23 is connected to the nip roller 4, the electric proportional valve 21 is provided between the gas source device 23 and the nip roller 4, the nip roller pressure data set calculation unit is connected to the PLC controller 19, and the PLC controller 19 is connected to the electric proportional valve 21; the embossing roller pressure data set calculating unit is provided with a second calculating module, and the second calculating module calculates the embossing roller pressure according to the formula (II) and the formula (III):
F1＝F2 Y + P × S formula (II);
wherein F1 is the pressure of the impression roller; f2 Y Is the component force of the tension of the soft membrane on the Y axis; p is a set constant pressure value; s is the pressed area of the glass wafer; l is the contact width of the embossing roller and the glass wafer; r is the radius of the glass wafer; and X is the stamping distance. The embossing distance X refers to the distance over which the embossing roller rolls on a diameter perpendicular to the embossing roller.
The working principle of the electric proportional valve 21 is as follows: the larger the input voltage supplied to the electric proportional valve 21 by the PLC controller 19, the larger the air pressure output from the electric proportional valve 21.
In the imprinting process, the PLC 19 outputs a voltage data set 20 to the electric proportional valve 21 according to the imprinting roller pressure data set 18, the electric proportional valve 21 outputs a corresponding air pressure data set 22 according to the voltage data set 20, and the imprinting roller 4 applies corresponding pressure to the soft film 6 according to the air pressure data set 22, so that the pressure applied to the glass wafer 9 is constant.
The constant imprinting pressure control system may also be a spacer, which is disposed around the glass wafer as shown in fig. 11, and forms a square with the glass wafer with one side parallel to the imprinting roller. Since the gasket and the glass wafer form a complete square shape, the contact area is constant when the embossing roller moves from one side to the other side in the direction, and the pressure on the glass wafer is constant.
In a second aspect, the present invention also provides a nanoimprint device, which includes the aforementioned nanoimprint process control device. The tension of the soft film is controlled to be constant by a tension control system in the nanoimprint process control device, so that the stretching degree consistency of the surface relief grating on the soft film and the consistency of the filling of the imprinting structure are realized; the constant stamping angle control system can control the stamping angle to be a constant value, so that the exhaust speed in stamping and the deformation degree of the relief pattern on the upper surface of the soft film are consistent, and the filling structure is consistent; the constant pressure exerted on the glass wafer can be controlled by the constant imprinting pressure control system, so that the filling structure is consistent.
The nano-imprinting device further comprises a UV exposure device 3 and a bearing platform 5. The glass wafer 9 and the impression adhesive 8 are sequentially stacked on the bearing platform 5 from bottom to top, the soft film fixing device 2 is close to one end of the bearing platform 5, and the soft film moving device 1 is close to the other end of the bearing platform 5; the UV exposure device 3 is disposed above the soft film 6 and the platen roller 4.
Next, the nanoimprint process control apparatus of the present invention will be described with reference to specific examples.
Example 1
A nanoimprint process control device comprises a tension control system, a constant imprinting angle control system, a constant imprinting pressure control system, a soft film moving device, a soft film fixing device, a UV exposure device and an imprinting roller; the flexible film moving device is a flexible film moving roller, the tension control system comprises a guide wheel, a tension wheel and a flexible film tension adjusting wheel, the height of the guide wheel is higher than the highest movable height of the flexible film moving roller, the height of the tension wheel is lower than that of the guide wheel, and the flexible film sequentially bypasses the lower part of the flexible film moving roller, the upper part of the guide wheel and the lower part of the tension wheel and then is connected with the flexible film tension adjusting wheel; the constant embossing angle control system comprises an embossing roller moving speed control unit and a soft film moving device moving speed control unit, wherein a first calculation module is arranged in the soft film moving device moving speed control unit, and the first calculation module calculates the moving speed of the soft film moving device according to the formula (I) in the text; the constant imprinting pressure control system comprises an imprinting roller pressure data set calculating unit, a PLC (programmable logic controller), an electric proportional valve and an air source device, wherein the air source device is connected with the imprinting roller, the electric proportional valve is arranged between the air source device and the imprinting roller, the imprinting roller pressure data set calculating unit is connected with the PLC, and the PLC is connected with the electric proportional valve; and a second calculating module is arranged in the embossing roller pressure data group calculating unit and used for calculating the embossing roller pressure according to the formulas (II) and (III).
The embossing roller applies pressure to the soft film to enable the surface relief pattern on the soft film to be in line contact with the embossing glue on the glass wafer; after pressing, the embossing roller rolls from the soft film fixing device to the soft film moving device to apply pressure to the soft film, so that the surface relief patterns on the soft film are in surface contact with the embossing glue on the glass wafer, and meanwhile, the soft film moving device moves downwards along with the rolling of the embossing roller; shaping the transferred microstructure by UV light of a UV exposure device; the soft film moving device moves upwards, and the embossing roller rolls from the soft film moving device to the soft film fixing device at the same time, so that the surface relief pattern on the soft film is separated from the embossing pattern on the glass wafer;
in the imprinting process, the tension of the soft film is monitored through a tension pulley, and a soft film tension adjusting pulley is controlled to adjust the tension of the soft film according to tension information fed back by the tension pulley in real time, so that the tension of the soft film is kept constant; specifically, the tension wheel feeds back the tension information to the rotating shaft motor, and the rotating shaft motor rotates forwards or backwards according to the tension information fed back by the tension wheel in real time to control the soft film tension adjusting wheel to release or tighten the soft film, so that the tension of the soft film is adjusted and is constant.
In the imprinting process, the angle of an included angle between the soft film and the glass wafer is always kept to be a constant value, and the moving speed of the soft film moving device 1 is calculated according to the formula (I) above;
in the imprinting process, the PLC outputs a voltage data set to the electric proportional valve according to the imprinting roller pressure data set, the electric proportional valve outputs a corresponding air pressure data set according to the voltage data set, the imprinting roller applies corresponding pressure to the soft film according to the air pressure data set, so that the pressure applied to the glass wafer is constant, and the imprinting roller pressure is calculated according to the above formula (II) and formula (III).
Example 2
A nanoimprint process control device comprises a tension control system, a constant imprinting angle control system, a constant imprinting pressure control system, a soft film moving device, a soft film fixing device, a UV exposure device and an imprinting roller; the flexible membrane moving device is a flexible membrane frame, the tension control system comprises a flexible membrane fixing rod, the flexible membrane fixing rod is located in the flexible membrane frame, the other end of the flexible membrane is connected with the flexible membrane fixing rod, a tension sensor is arranged on the flexible membrane fixing rod, the flexible membrane fixing rod can move back and forth in the extension direction of the flexible membrane, and the tension control system further comprises a motor which is respectively connected with the flexible membrane fixing rod and the tension sensor; the constant embossing angle control system comprises an embossing roller moving speed control unit and a soft film moving device moving speed control unit, wherein a first calculation module is arranged in the soft film moving device moving speed control unit, and the first calculation module calculates the moving speed of the soft film moving device according to the formula (I) in the text; the constant imprinting pressure control system comprises an imprinting roller pressure data set calculating unit, a PLC (programmable logic controller), an electric proportional valve and an air source device, wherein the air source device is connected with the imprinting roller, the electric proportional valve is arranged between the air source device and the imprinting roller, the imprinting roller pressure data set calculating unit is connected with the PLC, and the PLC is connected with the electric proportional valve; and a second calculating module is arranged in the embossing roller pressure data group calculating unit and used for calculating the embossing roller pressure according to the formulas (II) and (III).
The embossing roller applies pressure to the soft film to enable the surface relief pattern on the soft film to be in line contact with the embossing glue on the glass wafer; after pressing, the embossing roller rolls from the soft film fixing device to the soft film moving device to apply pressure to the soft film, so that the surface relief patterns on the soft film are in surface contact with the embossing glue on the glass wafer, and meanwhile, the soft film moving device moves downwards along with the rolling of the embossing roller; shaping the transferred microstructure by UV light of a UV exposure device; the soft film moving device moves upwards, and the embossing roller rolls from the soft film moving device to the soft film fixing device at the same time, so that the surface relief pattern on the soft film is separated from the embossing pattern on the glass wafer;
in the imprinting process, the tension of the soft film is monitored by a tension sensor on the soft film fixing rod, and the motor controls the soft film fixing rod to move back and forth in the soft film frame according to the tension information fed back by the tension sensor in real time so as to keep the tension of the soft film constant;
in the imprinting process, the angle of the included angle between the soft film and the glass wafer is always kept to be a constant value, and the moving speed of the soft film moving device is calculated according to the formula (I) above:
in the imprinting process, the PLC outputs a voltage data set to the electric proportional valve according to the imprinting roller pressure data set, the electric proportional valve outputs a corresponding air pressure data set according to the voltage data set, the imprinting roller applies corresponding pressure to the soft film according to the air pressure data set, so that the pressure applied to the glass wafer is constant, and the imprinting roller pressure is calculated according to the above formula (II) and formula (III).
Example 3
A nano-imprinting process control device comprises a tension control system, a constant imprinting angle control system, a constant imprinting pressure control system, a soft film moving device, a soft film fixing device, a UV exposure device and an imprinting roller; the flexible film moving device is a flexible film moving roller, the tension control system comprises a guide wheel, a tension wheel and a flexible film tension adjusting wheel, the height of the guide wheel is higher than the highest movable height of the flexible film moving roller, the height of the tension wheel is lower than that of the guide wheel, and the flexible film sequentially bypasses the lower part of the flexible film moving roller, the upper part of the guide wheel and the lower part of the tension wheel and then is connected with the flexible film tension adjusting wheel; the constant embossing angle control system comprises an embossing roller moving speed control unit and a soft film moving device moving speed control unit, wherein a first calculation module is arranged in the soft film moving device moving speed control unit, and the first calculation module calculates the moving speed of the soft film moving device according to the formula (I) in the text; the constant imprinting pressure control system is a gasket.
The embossing roller applies pressure to the soft film to enable the surface relief pattern on the soft film to be in line contact with the embossing glue on the glass wafer; after pressing, the embossing roller rolls from the soft film fixing device to the soft film moving device to apply pressure to the soft film, so that the surface relief patterns on the soft film are in surface contact with the embossing glue on the glass wafer, and meanwhile, the soft film moving device moves downwards along with the rolling of the embossing roller; shaping the transferred microstructure by UV light of a UV exposure device; the soft film moving device moves upwards, and the embossing roller rolls from the soft film moving device to the soft film fixing device at the same time, so that the surface relief pattern on the soft film is separated from the embossing pattern on the glass wafer;
in the imprinting process, the tension of the soft film is monitored by a tension pulley, and the tension of the soft film is adjusted by controlling a soft film tension adjusting pulley according to the tension information fed back by the tension pulley in real time, so that the tension of the soft film is kept constant; specifically, the tension wheel feeds back the tension information to the rotating shaft motor, and the rotating shaft motor rotates forwards or backwards according to the tension information fed back by the tension wheel in real time to control the soft film tension adjusting wheel to release or tighten the soft film, so that the tension of the soft film is adjusted and is constant.
In the imprinting process, the angle of the included angle between the soft film and the glass wafer is always kept at a constant value, and the moving speed of the soft film moving device 1 is calculated according to the formula (I) above.
The gasket and the glass wafer form a square with one side parallel to the embossing roller. The imprinting pressure was unchanged.
Example 4
A nanoimprint process control device comprises a tension control system, a constant imprinting angle control system, a constant imprinting pressure control system, a soft film moving device, a soft film fixing device, a UV exposure device and an imprinting roller; the flexible membrane moving device is a flexible membrane frame, the tension control system comprises a flexible membrane fixing rod, the flexible membrane fixing rod is located in the flexible membrane frame, the other end of the flexible membrane is connected with the flexible membrane fixing rod, a tension sensor is arranged on the flexible membrane fixing rod, the flexible membrane fixing rod can move back and forth in the extension direction of the flexible membrane, and the tension control system further comprises a motor which is respectively connected with the flexible membrane fixing rod and the tension sensor; the constant embossing angle control system comprises an embossing roller moving speed control unit and a soft film moving device moving speed control unit, wherein a first calculation module is arranged in the soft film moving device moving speed control unit, and the first calculation module calculates the moving speed of the soft film moving device according to the formula (I) in the text; the constant imprinting pressure control system is a shim.
The embossing roller applies pressure to the soft film to enable the surface relief pattern on the soft film to be in line contact with the embossing glue on the glass wafer; after pressing, the embossing roller rolls from the soft film fixing device to the soft film moving device to apply pressure to the soft film, so that the surface relief patterns on the soft film are in surface contact with the embossing glue on the glass wafer, and meanwhile, the soft film moving device moves downwards along with the rolling of the embossing roller; shaping the transferred microstructure by UV light of a UV exposure device; the soft film moving device moves upwards, and the embossing roller rolls from the soft film moving device to the soft film fixing device at the same time, so that the surface relief patterns on the soft film are separated from the embossing patterns on the glass wafer;
in the imprinting process, the tension of the soft film is monitored through a tension sensor on the soft film fixing rod, and the motor controls the soft film fixing rod to move back and forth in the soft film frame according to the tension information fed back by the tension sensor in real time, so that the tension of the soft film is kept constant;
in the imprinting process, the angle of the included angle between the soft film and the glass wafer is always kept to be a constant value, and the moving speed of the soft film moving device is calculated according to the formula (I) above.
The gasket and the glass wafer form a square with one side parallel to the embossing roller. The imprinting pressure was unchanged.
Examples 1-4 the relief patterns on the glass wafers produced by nanoimprinting had a higher consistency of structure filling. The relief pattern structure on the glass wafer prepared by nanoimprint lithography in the embodiment 1 is consistent in filling and has a good structural appearance.
Comparative example 1
The device and method shown in fig. 1 are adopted: the embossing roller 4 applies pressure to the soft film 6 to enable the surface relief pattern 7 on the soft film 6 to be in line contact with the embossing glue 8 on the glass wafer 9; after pressing, the embossing roller 4 rolls from the soft film fixing device 2 to the soft film moving device 1 to press the soft film 6, so that the surface relief pattern 7 on the soft film 6 is in surface contact with the embossing glue 8 on the glass wafer 9, and meanwhile, the soft film moving device 1 moves downwards along with the rolling of the embossing roller 4; the transferred microstructure is shaped by UV light of a UV exposure device 3; the film transfer device 1 moves upward while the platen roller 4 rolls from the film transfer device 1 to the film fixing device 2, and separates the surface relief pattern 7 on the film 6 from the platen pattern on the glass wafer 9. I.e. no monitoring and adjustment of the film tension, impression angle and pressure is performed.
Comparative example 1 the relief pattern structure on the glass wafer prepared by nanoimprint had poor filling consistency and poor structural morphology.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention should be covered by the present invention.
Claims (10)
1. A nano-imprinting process control device is characterized by comprising a tension control system, a soft film moving device (1), a soft film fixing device (2) and an imprinting roller (4);
one end of a soft film (6) with a surface relief pattern (7) is connected with the soft film fixing device (2), and the other end of the soft film (6) is sequentially connected with the soft film moving device (1) and the tension control system; the soft film moving device (1) can vertically move up and down;
the embossing roller (4) is positioned above the soft film (6).
2. The nanoimprint process control device of claim 1, further comprising a constant imprint angle control system.
3. The nanoimprint process control apparatus of claim 2, further comprising a constant imprint pressure control system.
4. The nanoimprint process control apparatus as defined in claim 1, wherein the soft film moving device (1) is a soft film moving roller, the tension control system comprises a guide wheel (10), a tension wheel (11) and a soft film tension adjusting wheel (12), the height of the guide wheel (10) is higher than the highest movable height of the soft film moving roller, the height of the tension wheel (11) is lower than the height of the guide wheel (10), and the soft film (6) sequentially bypasses below the soft film moving roller, above the guide wheel (10) and below the tension wheel (11) and then is connected with the soft film tension adjusting wheel (12).
5. The nanoimprint process control apparatus as defined in claim 1, wherein the soft film moving apparatus (1) is a soft film frame (16), the tension control system comprises a soft film fixing rod (15), the soft film fixing rod (15) is located in the soft film frame (16), the other end of the soft film (6) is connected with the soft film fixing rod (15), a tension sensor (14) is arranged on the soft film fixing rod (15), and the soft film fixing rod (15) can move back and forth in the extending direction of the soft film (6).
6. The nanoimprint process control apparatus of claim 5, characterized in that the tension control system further comprises a motor (13), and the motor (13) is connected to the soft film fixing rod (15) and the tension sensor (14), respectively.
7. The nanoimprint process control apparatus of claim 2, wherein the constant imprint angle control system includes an imprint roller movement speed control unit and a soft film movement device movement speed control unit, and a first calculation module is provided in the soft film movement device movement speed control unit, and the first calculation module calculates a soft film movement speed according to formula (I):
V Y ＝tanA×V X formula (I);
wherein, V Y The moving speed of the soft film moving device; a is the angle of an included angle between the soft film and the glass wafer and is a constant value; v X The embossing roll movement speed is a known parameter value.
8. The nanoimprint process control apparatus of claim 3, characterized in that the constant imprint pressure control system includes an imprint roller pressure data set calculation unit, a PLC controller (19), an electric proportional valve (21), and a gas supply device (23), the gas supply device (23) being connected to the imprint roller (4), the electric proportional valve (21) being disposed between the gas supply device (23) and the imprint roller (4), the imprint roller pressure data set calculation unit being connected to the PLC controller (19), the PLC controller (19) being connected to the electric proportional valve (21); the embossing roller pressure data set calculating unit is provided with a second calculating module which calculates the embossing roller pressure according to the formulas (II) and (III):
F1＝F2 Y + PxS formula (II);
wherein F1 is the pressure of the impression roller; f2 Y The component force of the tension of the soft film on the Y axis; p is a set constant pressure value; s is the pressed area of the glass wafer; l is the contact width of the embossing roller and the glass wafer; r is the radius of the glass wafer; and X is an imprinting distance.
9. The nanoimprinting process control apparatus of claim 3, wherein the constant imprinting pressure control system includes a gasket (24).
10. A nanoimprinting apparatus characterized by comprising the nanoimprinting process control apparatus as recited in any one of claims 1 to 9.
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